Film forming apparatus, film forming method, and semiconductor device
    1.
    发明授权
    Film forming apparatus, film forming method, and semiconductor device 有权
    成膜装置,成膜方法和半导体装置

    公开(公告)号:US08614500B2

    公开(公告)日:2013-12-24

    申请号:US13048612

    申请日:2011-03-15

    IPC分类号: H01L23/58

    摘要: According one embodiment, a film forming apparatus includes a stage, a coating section, a vapor supply section, a blower section, and a controller. On the stage, an coating target is placed. The coating section applies a material to a predetermined region on the coating target placed on the stage to form a coating film. The vapor supply section generates solvent vapor capable of dissolving the coating film. The blower section blows the solvent vapor generated by the vapor supply section onto the coating film on the coating target placed on the stage. The controller controls an amount of the solvent vapor to be blown by the blower section so that: the coating film is dissolved; viscosity in a part of the coating film on a surface layer side is lower than that in a part thereof on the coating target side; and the viscosity in the part on the surface layer side and the viscosity of the coating target side take such values that prevent the coating film on the coating target from spreading.

    摘要翻译: 根据一个实施例,一种成膜装置包括载物台,涂布部分,蒸气供应部分,鼓风机部分和控制器。 在舞台上放置涂层目标。 涂布部分将材料施加到放置在载物台上的涂布靶上的预定区域上以形成涂膜。 蒸气供给部产生能够溶解涂膜的溶剂蒸气。 鼓风机部分将由蒸汽供应部分产生的溶剂蒸气吹到放置在载物台上的涂覆靶上的涂膜上。 控制器控制由鼓风机部分吹送的溶剂蒸气的量,使得涂膜溶解; 表面层侧的一部分涂膜的粘度比涂布目标侧的一部分的粘度低; 并且表面层侧的部分中的粘度和涂布目标侧的粘度取得防止涂布靶上的涂膜扩散的值。

    APPARATUS AND METHOD OF PROCESSING SUBSTRATE
    2.
    发明申请
    APPARATUS AND METHOD OF PROCESSING SUBSTRATE 审中-公开
    装置和处理基板的方法

    公开(公告)号:US20120067847A1

    公开(公告)日:2012-03-22

    申请号:US13223555

    申请日:2011-09-01

    IPC分类号: C23F1/00 C23F1/08

    摘要: According to one embodiment, an apparatus of processing a substrate includes a treatment chamber, a holder, a feed device, and a temperature control device. The holder is provided in the treatment chamber and is configured to rotatably hold the substrate. The feed device includes a nozzle configured to eject an etching solution to a surface of the substrate held by the holder. The temperature control device includes first and second devices, and a controller. The first device is configured to heat and/or cool an atmosphere inside the treatment chamber. The second device is configured to heat and/or cool the etching solution. The controller is configured to control operation of the first and second devices such that a temperature of the atmosphere is higher than that of the etching solution in the nozzle and that difference between the temperature of the atmosphere and that of the etching solution is maintained constant.

    摘要翻译: 根据一个实施例,处理基板的装置包括处理室,保持器,进给装置和温度控制装置。 保持器设置在处理室中并且构造成可旋转地保持基板。 进料装置包括喷嘴,该喷嘴构造成将蚀刻溶液喷射到由保持器保持的基板的表面上。 温度控制装置包括第一和第二装置以及控制器。 第一装置被配置为加热和/或冷却处理室内的气氛。 第二装置被配置为加热和/或冷却蚀刻溶液。 控制器被配置为控制第一和第二装置的操作,使得气氛的温度高于喷嘴中的蚀刻溶液的温度,并且气氛的温度与蚀刻溶液的温度之间的差保持恒定。

    INK JET SYSTEM AND METHOD FOR REMOVING AIR BUBBLES INSIDE OF AN INK JET NOZZLE
    3.
    发明申请
    INK JET SYSTEM AND METHOD FOR REMOVING AIR BUBBLES INSIDE OF AN INK JET NOZZLE 有权
    喷墨喷嘴系统和移除喷墨喷嘴内的空气泡沫的方法

    公开(公告)号:US20090201352A1

    公开(公告)日:2009-08-13

    申请号:US12365400

    申请日:2009-02-04

    IPC分类号: B41J2/19

    CPC分类号: B41J2/19 B41J2/1707

    摘要: An ink jet system according to the present invention is provided with an air bubble removing unit including: an ink jet body having a plurality of ink supply path; a nozzle plate connected to an end of the ink jet body and having a plurality of spaced nozzle holes therein; and a cap configured to cover the nozzle holes formed in the nozzle plate wherein a first ink channel space is formed continuous to the nozzle holes and the plurality of ink supply path, and a second ink channel space is formed between a recess of the cap and a surface of the nozzle plate, so that the second ink channel space and the first ink channel space are continuous through the nozzle holes.

    摘要翻译: 根据本发明的喷墨系统设置有气泡去除单元,其包括:具有多个供墨路径的喷墨体; 喷嘴板,其连接到喷墨体的端部并且在其中具有多个间隔开的喷嘴孔; 以及帽,其构造成覆盖形成在喷嘴板中的喷嘴孔,其中形成与喷嘴孔和多个供墨路径连续的第一墨水通道空间,并且在盖的凹部和 喷嘴板的表面,使得第二墨水通道空间和第一墨水通道空间通过喷嘴孔连续。

    ULTRASONIC CLEANING APPARATUS
    4.
    发明申请
    ULTRASONIC CLEANING APPARATUS 有权
    超声波清洗装置

    公开(公告)号:US20090044844A1

    公开(公告)日:2009-02-19

    申请号:US12248514

    申请日:2008-10-09

    IPC分类号: B08B13/00

    摘要: An ultrasonic cleaning apparatus which cleans a material at a surface by supplying an ultrasonic wave from an ultrasonic wave application head to a cleaning liquid on the surface, and cleans the surface, wherein the ultrasonic wave application head has an ultrasonic wave transmission member which is provided opposite the surface, and has a curved portion on a first plane placed close to the surface, an ultrasonic transducer which is provided on a second plane placed opposite the first plane of the ultrasonic wave transmission member, and generates and applies an ultrasonic wave to a cleaning liquid on the surface through the ultrasonic wave transmission member, and a preventive portion which is provided in the ultrasonic wave transmission member, and prevents the ultrasonic wave applied to the cleaning liquid and reflected on the surface from entering the ultrasonic transducer through the ultrasonic wave transmission member.

    摘要翻译: 一种超声波清洗装置,其通过从超声波施加头向表面上的清洗液提供超声波来清洗表面的材料,并且清洁表面,其中超声波施加头具有设置有超声波传递部件 在与表面相邻的第一平面上具有弯曲部分,设置在与超声波传播部件的第一平面相对的第二平面上的超声波换能器,并且产生并施加超声波到 通过超声波传递部件在表面上清洗液体,以及设置在超声波传递部件中的防止部,防止施加到清洗液上并在表面上反射的超声波通过超声波进入超声波换能器 传输部件。