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公开(公告)号:US20240218225A1
公开(公告)日:2024-07-04
申请号:US18604183
申请日:2024-03-13
发明人: Todd M. COTTER , Francois WAGNER , Rene G. DEMERS , Richard J. KLOK , Alexandra MARAZANO , Adam D. LIOR , James A. SALVATORE , Sujatha K. IYENGAR , David F. LOUAPRE , Sidath S. WIJESOORIYA , Ronald Christopher MOTTA , Gary A. GUERTIN , Michael D. KAVANAUGH , Doruk O. YENER , Jennifer H. CZEREPINSKI , Jun JIA , Frederic JOSSEAUX , Ralph BAUER , Frank J. CSILLAG , Yang ZHONG , James P. STEWART , Mark P. DOMBROWSKI , Sandhya JAYARAMAN RUKMANI , Amandine MARTIN , Stephen E. FOX , Nilanjan SARANGI , Dean S. MATSUMOTO
IPC分类号: C09K3/14 , B01J2/26 , B24D3/14 , B24D99/00 , C04B35/111 , C04B35/56 , C04B35/58 , C04B35/624
CPC分类号: C09K3/1409 , B24D3/14 , B24D99/00 , C04B35/1115 , C04B35/56 , C04B35/58 , C04B35/624 , B01J2/26 , C04B2235/3206 , C04B2235/5427 , C04B2235/6021 , C04B2235/6023 , C04B2235/785 , C04B2235/786 , C04B2235/94
摘要: Various shaped abrasive particles are disclosed. Each shaped abrasive particle includes a body having at least one major surface and a side surface extending from the major surface.
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公开(公告)号:US11978849B2
公开(公告)日:2024-05-07
申请号:US17444654
申请日:2021-08-06
发明人: Vladimir Ouspenski , Gaurav Assat
IPC分类号: H01M10/0562 , H01M10/052
CPC分类号: H01M10/0562 , H01M10/052 , H01M2300/008
摘要: A solid electrolyte material can include a halide-based material having a crystalline structure including a disorder. In an embodiment, the solid electrolyte material can include a crystalline structure include stacking faults. In another embodiment, the solid electrolyte material can include a crystalline phase including a crystalline structure represented by a space group of the hexagonal crystal system or a space group of a rhombohedral lattice system. In another embodiment, the solid electrolyte material can include a crystalline phase including a crystalline structure represented by a monoclinic space group and a unit cell containing a reduced number of halogen atoms.
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公开(公告)号:US20240141219A1
公开(公告)日:2024-05-02
申请号:US18408277
申请日:2024-01-09
发明人: Ralph BAUER , Jennifer H. CZEREPINSKI , Lucie FRAICHARD , Flavien FREMY , Jun JIA , Frederic JOSSEAUX , David F. LOUAPRE , Samuel S. MARLIN , Doruk O. YENER
IPC分类号: C09K3/14 , B01J2/00 , B01J2/20 , B24D11/00 , C04B35/111
CPC分类号: C09K3/1409 , B01J2/006 , B01J2/20 , B24D11/00 , C04B35/1115 , C09K3/1436 , B24D2203/00 , C04B2235/3208
摘要: A shaped abrasive particle including a body having a first major surface, a second major surface, and a side surface joined to the first major surface and the second major surface, and the body has at least one partial cut extending from the side surface into the interior of the body.
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4.
公开(公告)号:US11932802B2
公开(公告)日:2024-03-19
申请号:US18061279
申请日:2022-12-02
发明人: Todd M. Cotter , Francois Wagner , Rene G. Demers , Richard J. Klok , Alexandra Marazano , Adam D. Lior , James A. Salvatore , Sujatha K. Iyengar , David F Louapre , Sidath S. Wijesooriya , Ronald Christopher Motta , Gary A. Guertin , Michael D. Kavanaugh , Doruk O. Yener , Jennifer H. Czerepinski , Jun Jia , Frederic Josseaux , Ralph Bauer , Frank J. Csillag , Yang Zhong , James P. Stewart , Mark P. Dombrowski , Sandhya Jayaraman Rukmani , Amandine Martin , Stephen E. Fox , Nilanjan Sarangi , Dean S. Matsumoto
IPC分类号: C09K3/14 , B24D3/14 , B24D99/00 , C04B35/111 , C04B35/56 , C04B35/58 , C04B35/624 , B01J2/26
CPC分类号: C09K3/1409 , B24D3/14 , B24D99/00 , C04B35/1115 , C04B35/56 , C04B35/58 , C04B35/624 , B01J2/26 , C04B2235/3206 , C04B2235/5427 , C04B2235/6021 , C04B2235/6023 , C04B2235/785 , C04B2235/786 , C04B2235/94
摘要: Various shaped abrasive particles are disclosed. Each shaped abrasive particle includes a body having at least one major surface and a side surface extending from the major surface.
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公开(公告)号:US11926781B2
公开(公告)日:2024-03-12
申请号:US16804343
申请日:2020-02-28
发明人: Doruk O. Yener , Paul Braun
IPC分类号: B24D3/00 , C04B35/01 , C04B35/111 , C04B35/56 , C04B35/58 , C04B35/628 , C09K3/14 , B24D3/02 , B24D11/00 , B24D18/00
CPC分类号: C09K3/1436 , C04B35/01 , C04B35/1115 , C04B35/56 , C04B35/58 , C04B35/62802 , C04B2235/3201 , C04B2235/3205 , C04B2235/3224 , C04B2235/3239 , C04B2235/3244 , C04B2235/3251 , C04B2235/3256 , C04B2235/6021 , C04B2235/75 , C04B2235/94 , C04B2235/95
摘要: A method of forming a shaped abrasive particle including extruding a mixture into a form, applying a dopant material to an exterior surface of the form, and forming a precursor shaped abrasive particle from the form.
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公开(公告)号:US20240038543A1
公开(公告)日:2024-02-01
申请号:US18360042
申请日:2023-07-27
发明人: Renjie ZHOU , Lin FU , Chun-Lung KUAN
IPC分类号: H01L21/321 , C09K3/14 , C09G1/02
CPC分类号: H01L21/3212 , C09K3/1409 , C09G1/02
摘要: In one embodiment, a polishing composition can comprise abrasive particles including zirconia, an oxidizing agent including hydroxylamine and water. The polishing composition can have a high copper removal rate of at least 3500 Å/min, and a polishing selectivity of copper to silicon dioxide(Cu:SiO2) can be at least 2.5:1. In another embodiment, a combination product can comprise a first polishing composition and a second polishing composition, wherein each of the first polishing composition and the second polishing composition can comprise abrasive particles including zirconia and an oxidizing agent including hydroxylamine, wherein a hydroxylamine weight % ratio of the first polishing composition to the second polishing composition may be at least 5:1.
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公开(公告)号:US11814317B2
公开(公告)日:2023-11-14
申请号:US15552386
申请日:2016-02-24
IPC分类号: C04B35/66 , C04B35/185 , C04B41/87 , C04B41/00 , C04B41/50 , C04B35/657 , C03B5/43
CPC分类号: C04B35/185 , C03B5/43 , C04B35/657 , C04B35/66 , C04B41/009 , C04B41/5037 , C04B41/87 , C04B2235/3217 , C04B2235/3222 , C04B2235/3227 , C04B2235/3229 , C04B2235/3232 , C04B2235/3241 , C04B2235/3243 , C04B2235/3267 , C04B2235/3272 , C04B2235/3274 , C04B2235/3279 , C04B2235/3293 , C04B2235/3418 , C04B2235/3813 , C04B2235/5409 , C04B2235/5436 , C04B2235/5445 , C04B2235/72 , C04B2235/77 , C04B2235/80 , C04B41/009 , C04B35/185
摘要: A refractory article includes a body including a ceramic having an aluminosilicate present in an amount of at least 70 wt % and not greater than 99 wt % for a total weight of the body, and the body further includes a dopant including a Mg-containing oxide compound and a Fe-containing oxide compound, and the dopant is present in an amount within a range including at least 1 wt % and not greater than 12 wt %.
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公开(公告)号:US20230352688A1
公开(公告)日:2023-11-02
申请号:US18338781
申请日:2023-06-21
发明人: Ruofan WANG , Yuto TAKAGI , Michael McGAHAN , Vladimir OUSPENSKI , Gaurav ASSAT , Chuanping LI
IPC分类号: H01M4/36 , H01M4/505 , H01M10/0565 , H01M10/0525 , H01M4/60 , H01M4/62
CPC分类号: H01M4/60 , H01M4/366 , H01M4/505 , H01M4/623 , H01M10/0525 , H01M10/0565 , H01M2004/021 , H01M2300/0085
摘要: An ion conductive layer can include a hygroscopic ion conductive material, such as a halide-based material. In an embodiment, the ion conductive layer can include an organic material, ammonium halide, or a combination thereof.
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9.
公开(公告)号:US20230261258A1
公开(公告)日:2023-08-17
申请号:US18296132
申请日:2023-04-05
发明人: Vladimir OUSPENSKI , Gaurav ASSAT , John M. FRANK
IPC分类号: H01M10/0562 , H01M10/0525 , C30B23/08 , C30B29/12
CPC分类号: H01M10/0562 , H01M10/0525 , C30B23/08 , C30B29/12 , H01M2300/008
摘要: A solid ion conductive material can include a complex metal halide. The complex metal halide can include at least one alkali metal element. In an embodiment, the solid ion conductive material including the complex metal halide can be a single crystal. In another embodiment, the ion conductive material including the complex metal halide can be a crystalline material having a particular crystallographic orientation. A solid electrolyte can include the ion conductive material including the complex metal halide.
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公开(公告)号:US11674066B2
公开(公告)日:2023-06-13
申请号:US16536157
申请日:2019-08-08
发明人: Stefan Vujcic , Ralph Bauer
IPC分类号: C09K3/14 , C04B35/628 , C01F7/441 , C04B35/111
CPC分类号: C09K3/1436 , C01F7/441 , C04B35/1115 , C04B35/6281 , C09K3/1409 , C01P2002/52 , C01P2002/54 , C01P2004/20 , C04B2235/3206 , C04B2235/3217 , C04B2235/85 , C09K3/1418
摘要: A particulate material having a body including a dopant contained in the body, the dopant is non-homogenously distributed throughout the body and the body has a maximum normalized dopant content difference of at least 35%.
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