Electrolyte material and methods of forming

    公开(公告)号:US11978849B2

    公开(公告)日:2024-05-07

    申请号:US17444654

    申请日:2021-08-06

    IPC分类号: H01M10/0562 H01M10/052

    摘要: A solid electrolyte material can include a halide-based material having a crystalline structure including a disorder. In an embodiment, the solid electrolyte material can include a crystalline structure include stacking faults. In another embodiment, the solid electrolyte material can include a crystalline phase including a crystalline structure represented by a space group of the hexagonal crystal system or a space group of a rhombohedral lattice system. In another embodiment, the solid electrolyte material can include a crystalline phase including a crystalline structure represented by a monoclinic space group and a unit cell containing a reduced number of halogen atoms.

    COMPOSITION AND METHOD FOR CONDUCTING A MATERIAL REMOVING OPERATION

    公开(公告)号:US20240038543A1

    公开(公告)日:2024-02-01

    申请号:US18360042

    申请日:2023-07-27

    IPC分类号: H01L21/321 C09K3/14 C09G1/02

    摘要: In one embodiment, a polishing composition can comprise abrasive particles including zirconia, an oxidizing agent including hydroxylamine and water. The polishing composition can have a high copper removal rate of at least 3500 Å/min, and a polishing selectivity of copper to silicon dioxide(Cu:SiO2) can be at least 2.5:1. In another embodiment, a combination product can comprise a first polishing composition and a second polishing composition, wherein each of the first polishing composition and the second polishing composition can comprise abrasive particles including zirconia and an oxidizing agent including hydroxylamine, wherein a hydroxylamine weight % ratio of the first polishing composition to the second polishing composition may be at least 5:1.