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公开(公告)号：US08755935B2
公开(公告)日：2014-06-17
申请号：US13405918
申请日：2012-02-27
申请人： Yuichi Douki , Tokutarou Hayashi , Naruaki Iida , Suguru Enokida
发明人： Yuichi Douki , Tokutarou Hayashi , Naruaki Iida , Suguru Enokida
CPC分类号： H01L21/68 , H01L21/6715 , H01L21/67748 , H01L21/681 , H01L21/68707 , H01L22/10 , H01L2924/0002 , H01L2924/00
摘要： A substrate holder positioning method, capable of positioning a substrate holder without using any positioning jig, includes: measuring a first position of a substrate held on a substrate holder included in a substrate carrying mechanism; carrying the substrate held on the substrate holder to a substrate rotating unit for holding and rotating the substrate; turning the substrate held by the substrate rotating unit through a predetermined angle by the substrate rotating unit; transferring the substrate turned by the substrate rotating unit from the substrate rotating unit to the substrate holder; measuring a second position of the substrate transferred from the substrate rotating unit to the substrate holder; determining the position of the center of rotation of the substrate rotating unit on the basis of the first and the second position; and positioning the substrate holder on the basis of the position of the center of rotation.
摘要翻译： 一种能够在不使用任何定位夹具的情况下定位基板支架的基板支架定位方法，包括：测量保持在基板承载机构中的基板保持器上的基板的第一位置; 将保持在所述基板保持器上的所述基板承载到用于保持和旋转所述基板的基板旋转单元; 通过基板旋转单元将由基板旋转单元保持的基板转动预定角度; 将由基板旋转单元转动的基板从基板旋转单元传送到基板保持器; 测量从所述基板旋转单元转移到所述基板保持器的所述基板的第二位置; 基于第一位置和第二位置确定基板旋转单元的旋转中心的位置; 并且基于旋转中心的位置来定位衬底保持器。
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公开(公告)号：US08534936B2
公开(公告)日：2013-09-17
申请号：US13178037
申请日：2011-07-07
CPC分类号： G03F7/708 , H01L21/6715
摘要： A coating and developing apparatus includes a processing block having at least one coating film-forming unit block stack and a vertically stacked developing unit block stack. Each unit block stack includes vertically stacked unit blocks, and each unit block includes processing modules containing liquid processing modules and heating modules. Each unit block includes a transport mechanism moveable along a transport passage from a carrier block side to an interface block side, to transport a substrate between the processing modules belonging to the unit block. Transfer units are provided on the carrier block sides of the coating film-forming unit blocks and the developing unit blocks respectively, for transferring a substrate to and from the transport mechanism of the associated coating film-forming or developing unit blocks. A first transfer mechanism transfers a substrate removed from a carrier to one of the transfer units associated with the coating film-forming unit blocks.
摘要翻译： 涂覆和显影装置包括具有至少一个涂膜形成单元块堆叠和垂直堆叠的显影单元块堆叠的处理块。 每个单元块堆叠包括垂直堆叠的单元块，并且每个单元块包括包含液体处理模块和加热模块的处理模块。 每个单元块包括可沿着运输通道从承载块侧移动到接口块侧的运输机构，以在属于单元块的处理模块之间输送基板。 分别在涂膜形成单元块和显影单元块的承载块侧设置传送单元，用于将基板传送到相关的涂膜形成或显影单元块的传送机构。 第一传送机构将从载体移除的基板传送到与涂膜形成单元块相关联的转印单元之一。
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公开(公告)号：US08441618B2
公开(公告)日：2013-05-14
申请号：US12820417
申请日：2010-06-22
CPC分类号： H01L21/67742 , G03B27/52 , H01L21/67748 , H01L21/67754
摘要： A substrate transfer apparatus, for transferring a substrate from a first module to a second module, includes a moving base having a Y-motion axis for moving the moving base in Y-direction, and a substrate holding member mounted to the moving base via X-motion axis so as to move relative to the moving base to be in an advanced position and a retracted position relative to the moving base. The X-motion axis operates when the Y-motion axis is operating, if the X-motion axis must be parallel to the Y-motion axis when transferring the substrate from the substrate holding member to the second module.
摘要翻译： 一种用于将基板从第一模块传送到第二模块的基板传送装置，包括：具有用于沿Y方向移动移动基座的Y运动轴的移动基座，以及经由X安装到移动基座的基板保持构件 运动轴线相对于移动基座移动到相对于移动基座处于提前位置和缩回位置。 如果X轴运动轴在从衬底保持构件转移到第二模块时必须平行于Y运动轴，X运动轴运行。
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公开(公告)号：US08419299B2
公开(公告)日：2013-04-16
申请号：US13219955
申请日：2011-08-29
IPC分类号： G03D5/00
CPC分类号： H01L21/6715 , G03F7/16 , G03F7/3021 , H01L21/67178 , H01L21/67184
摘要： In one embodiment, a coating and developing apparatus is provided with a processing block including a liquid processing block disposed on the carrier block side and a heating processing block disposed on the interface block side. The liquid processing block includes a first unit block, a second unit block, and one or more of developing unit blocks overlying or underlying a stack of the first unit block and the second unit block. The first unit block includes antireflection film-forming modules and resist film-forming modules disposed on both sides of the transport passage thereof. The second unit block includes upper film-forming modules and hardening modules disposed on both sides of the transport passage thereof.
摘要翻译： 在一个实施例中，涂覆和显影装置设置有处理块，其包括设置在承载块侧的液体处理块和设置在界面块侧上的加热处理块。 液体处理块包括第一单元块，第二单元块以及覆盖在第一单元块和第二单元块的堆叠之下或下面的一个或多个显影单元块。 第一单元块包括设置在其输送通道两侧的防反射膜形成模块和抗蚀剂膜形成模块。 第二单元块包括设置在其输送通道两侧的上成膜模块和硬化模块。
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公开(公告)号：US20120015307A1
公开(公告)日：2012-01-19
申请号：US13182572
申请日：2011-07-14
CPC分类号： H01L21/67178 , G03F7/16 , G03F7/162 , G03F7/30 , G03F7/3021 , H01L21/67184 , H01L21/67225 , H01L21/6723
摘要： In one embodiment, a coating and developing apparatus is provided with transfer units, provided between a stack of early-stage processing unit blocks and a stack of later-stage processing unit blocks to transfer a substrate between the transport mechanisms of laterally-adjacent unit blocks, and a vertically-movable auxiliary transfer mechanism for transporting a substrate between the transfer units. A stack of first developing unit blocks is stacked on the stack of early-stage processing unit blocks, and a stack of second developing unit blocks is stacked on the stack of later-stage processing unit blocks.
摘要翻译： 在一个实施例中，涂覆和显影装置设置有转移单元，其设置在一堆早期处理单元块和一堆后期处理单元块之间，用于在横向相邻单元块的传送机构之间传送基板 以及用于在转印单元之间输送基板的可垂直移动的辅助转印机构。 一堆第一显影单元块堆叠在早期处理单元块的堆叠上，并且第二显影单元块的堆叠堆叠在后级处理单元块的堆叠上。
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6.发明授权Inspection device, inspection method and non-transitory storage medium for inspecting deformation of substrate holding member, and substrate processing system including the inspection device 有权用于检查基板保持构件的变形的检查装置，检查方法和非暂时性存储介质，以及包括检查装置的基板处理系统公开(公告)号：US09030656B2
公开(公告)日：2015-05-12
申请号：US13278496
申请日：2011-10-21
申请人： Hideki Kajiwara , Junnosuke Maki , Suguru Enokida
发明人： Hideki Kajiwara , Junnosuke Maki , Suguru Enokida
IPC分类号： G01N21/00 , G01B11/02 , G01B11/08 , H01L21/67 , H01L21/677
CPC分类号： H01L21/67265 , H01L21/67742
摘要： Disclosed is an inspection device for inspecting deformation of a substrate holding member of a substrate transport apparatus. The substrate holding member is moved in the forward-and-backward direction relative to the transport base to pass across a light path of the detection light formed by an optical detection unit. The position, with respect to a direction transverse to the forward-and-backward direction, of the substrate holding member is detected based on a detection signal of the optical detection unit. Based on a correlation data expressing the relationship between a first parameter indicative of a change of a position of the substrate holding member with respect to the forward-and-backward direction and a second parameter indicative of the change of the position of the substrate holding member with respect to the direction transverse to the forward-and-backward direction, whether or not deformation occurs in the substrate holding member is judged.
摘要翻译： 公开了一种用于检查基板输送装置的基板保持部件的变形的检查装置。 基板保持构件相对于输送基座在前后方向上移动，以穿过由光学检测单元形成的检测光的光路。 基于光检测单元的检测信号来检测基板保持部件的相对于前后方向的方向的位置。 基于表示表示基板保持部件的位置相对于前后方向的变化的第一参数与表示基板保持部件的位置的变化的第二参数之间的关系的相关数据 相对于横向于前后方向的方向，判断基板保持部件是否发生变形。
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公开(公告)号：US08888387B2
公开(公告)日：2014-11-18
申请号：US13177976
申请日：2011-07-07
IPC分类号： G03D5/00 , H01L21/67 , H01L21/677
CPC分类号： H01L21/6715 , H01L21/67178 , H01L21/67288 , H01L21/67745
摘要： In one embodiment, a coating and developing apparatus includes a processing block including a vertical stack of early-stage processing unit blocks; a vertical stack of later-stage processing unit blocks disposed laterally adjacent to respective ones of the early-stage processing unit blocks; a vertical stack of developing unit blocks stacked on the early-stage processing unit blocks; a vertical stack of auxiliary processing unit blocks disposed laterally adjacent to respective ones of the developing unit blocks; first transfer units, each of which are disposed between the laterally adjacent early-stage processing unit and later-stage processing unit; second transfer units, each of which is disposed between the laterally adjacent developing unit block and auxiliary processing unit block; and a auxiliary transfer mechanism for transferring a substrate between the first transfer units and between the second transfer units.
摘要翻译： 在一个实施例中，涂层和显影装置包括处理块，其包括早期处理单元块的垂直堆叠; 垂直堆叠的后级处理单元块，其横向邻近于相应的早期处理单元块设置; 堆叠在早期处理单元块上的显影单元块的垂直堆叠; 辅助处理单元块的垂直堆叠，其横向邻近于相应的显影单元块设置; 第一传送单元，每个传送单元布置在横向相邻的早期处理单元和后期处理单元之间; 第二转印单元，其各自设置在横向相邻的显影单元块和辅助处理单元块之间; 以及用于在第一转印单元之间和第二转印单元之间转印衬底的辅助转印机构。
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8.发明授权Coating and developing apparatus, coating and developing method and non-transitory tangible medium 有权涂层和显影装置，涂层和显影方法以及非瞬态有形介质公开(公告)号：US08506186B2
公开(公告)日：2013-08-13
申请号：US13225985
申请日：2011-09-06
申请人： Shinichi Hayashi , Yuichi Douki , Akira Miyata , Yuuichi Yamamoto , Kousuke Yoshihara , Nobuaki Matsuoka , Suguru Enokida
发明人： Shinichi Hayashi , Yuichi Douki , Akira Miyata , Yuuichi Yamamoto , Kousuke Yoshihara , Nobuaki Matsuoka , Suguru Enokida
IPC分类号： G03D5/00
CPC分类号： G03F7/3021 , G03F7/162 , H01L21/67178 , H01L21/67742 , H01L21/67745
摘要： A process block including a group of liquid-process related unit blocks, a first heating-process related block arranged on a carrier block side of the group of unit blocks, and a second heating-process related block arranged on an interface block side of the group of unit blocks. The group of liquid-process unit blocks includes doubled unit blocks for preprocessing for forming an antireflection film and a resist film, doubled unit blocks for post-processing for forming an upper layer film and performing a cleaning operation before exposure, and a unit block for developing. The first heating-process related block heats a substrate coated with a resist liquid and a substrate that has been developed. The second heating-process related block heats a substrate that has been exposed but is not yet developed, a substrate on which an antireflection film has been formed and a substrate on which an upper layer film has been formed.
摘要翻译： 一种处理块，包括一组液体处理相关单元块，布置在该组单位块的载体块侧的第一加热处理相关块，以及布置在该单元块的界面块侧的第二加热处理相关块 单位块组。 液体处理单元块组包括用于形成防反射膜和抗蚀剂膜的预处理的双重单元块，用于形成上层膜的后处理和进行曝光之前的清洁操作的双倍单位块，以及用于 发展。 第一加热工艺相关块加热涂覆有抗蚀剂液体和已经显影的基底的基底。 第二加热处理相关块加热已经暴露但尚未显影的基板，已经形成有抗反射膜的基板和已经形成有上层膜的基板。
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9.发明申请SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM 有权基板加工设备，基板加工方法和储存介质公开(公告)号：US20130078059A1
公开(公告)日：2013-03-28
申请号：US13611555
申请日：2012-09-12
CPC分类号： H01L21/67178 , H01L21/67745 , H01L21/67766 , H01L21/67769 , H01L21/67781 , H01L21/68707 , Y10S414/137 , Y10S414/139
摘要： A substrate processing apparatus includes: a carrier block including first and second carrier placement units spaced apart in a right and left direction; a processing block having a layered structure in which a plurality of layered parts are vertically arranged, the layered parts each including a substrate transport mechanism for transporting a substrate and a processing module for processing a substrate; a tower unit including plural substrate placement units located at height positions where a substrate is transferred by the substrate transport mechanism of the layered part corresponding to the substrate placement unit; a first substrate transfer mechanism configured to transfer a substrate between the carrier on the first carrier placement unit and the substrate placement unit of the tower unit; and a second substrate transfer mechanism configured to transfer a substrate between the carrier on the second substrate placement unit and the substrate placement unit of the tower unit.
摘要翻译： 基板处理装置包括：载体块，其包括沿左右方向间隔开的第一和第二载体放置单元; 具有层叠结构的处理块，其中多个层叠部分垂直布置，所述层叠部分各自包括用于输送基板的基板传送机构和用于处理基板的处理模块; 塔架单元，其包括多个基板放置单元，位于基板通过与基板放置单元对应的层叠部的基板输送机构转印的高度位置; 第一基板传送机构，被配置为在第一载体放置单元上的载体和塔单元的基板放置单元之间传送基板; 以及第二基板输送机构，被配置为将基板转移到第二基板放置单元上的载体和塔单元的基板放置单元之间。
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10.发明授权Substrate transfer apparatus, substrate process system, and substrate transfer method 有权基板转印装置，基板处理系统和基板转印方法公开(公告)号：US08277163B2
公开(公告)日：2012-10-02
申请号：US11790568
申请日：2007-04-26
申请人： Akira Murata , Suguru Enokida , Yuichi Douki
发明人： Akira Murata , Suguru Enokida , Yuichi Douki
IPC分类号： B65G1/00
CPC分类号： H01L21/67742 , H01L21/67754 , H01L21/68707
摘要： A substrate transfer apparatus includes forks that are vertically spaced apart from each other with a predetermined distance. When the forks take out the substrates from the first substrate containing part, each of the forks lifts the substrate and supports the same by moving upward from a pre-loading position located below the substrate to be taken out by a predetermined unloading stroke amount. A value of the predetermined distance is set to be equal to the sum of the distance between the substrates contained in the first substrate containing part and the unloading stroke amount.
摘要翻译： 基板传送装置包括彼此垂直间隔开预定距离的叉。 当叉从第一基板容纳部分取出基板时，每个叉子提升基板并且通过从位于基板下方的预加载位置向上移动以通过预定的卸载行程量被取出来支撑基板。 将预定距离的值设定为等于包含在第一基板容纳部中的基板与卸载行程量之间的距离之和。
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