Light-emitting diode with multiple N contact structure

    公开(公告)号:US10177279B2

    公开(公告)日:2019-01-08

    申请号:US15608141

    申请日:2017-05-30

    IPC分类号: H01L33/10 H01L33/38 H01L33/24

    摘要: Provided are a horizontal light emitting diode (LED) device and a method for fabricating the same. The horizontal LED device includes a sapphire substrate; an n-type GaN layer disposed on the sapphire substrate; an activation layer disposed on the n-type GaN layer; a p-type GaN layer disposed on the activation layer; a current spreading layer disposed on the p-type GaN layer; a p-electrode disposed on the current spreading layer; a plurality of holes exposing the n-type GaN layer through the current spreading layer, the p-type GaN layer, and activation layer; and an n-electrode disposed on the exposed n-type GaN layer and being in ohmic contact with the exposed n-type GaN layer at a plurality of positions on bottom surfaces of the plurality of holes.

    LIGHT-EMITTING DIODE WITH MULTIPLE N CONTACT STRUCTURE

    公开(公告)号:US20170352784A1

    公开(公告)日:2017-12-07

    申请号:US15608141

    申请日:2017-05-30

    摘要: Provided are a horizontal light emitting diode (LED) device and a method for fabricating the same. The horizontal LED device includes a sapphire substrate; an n-type GaN layer disposed on the sapphire substrate; an activation layer disposed on the n-type GaN layer; a p-type GaN layer disposed on the activation layer; a current spreading layer disposed on the p-type GaN layer; a p-electrode disposed on the current spreading layer; a plurality of holes exposing the n-type GaN layer through the current spreading layer, the p-type GaN layer, and activation layer; and an n-electrode disposed on the exposed n-type GaN layer and being in ohmic contact with the exposed n-type GaN layer at a plurality of positions on bottom surfaces of the plurality of holes.

    Vertical-structure semiconductor light emitting element and a production method therefor
    3.
    发明授权
    Vertical-structure semiconductor light emitting element and a production method therefor 有权
    垂直结构半导体发光元件及其制造方法

    公开(公告)号:US08932890B2

    公开(公告)日:2015-01-13

    申请号:US13505618

    申请日:2010-11-23

    申请人: Tae Yeon Seong

    发明人: Tae Yeon Seong

    IPC分类号: H01L21/00 H01L33/64 H01L33/00

    CPC分类号: H01L33/647 H01L33/0079

    摘要: The present invention relates to a vertical-structure semiconductor light emitting device and a production method thereof, more specifically, to a vertical-structure semiconductor light emitting device having a high-performance heat sink support comprising a thick metal film or metal foil. The vertical-structure semiconductor light emitting element produced in accordance with the present invention constitutes a highly reliable light emitting element with absolutely no thermal or mechanical damage since it has the high performance heatsink support and so suffers not fine micro-cracking and can be freely subjected to heat treatment and to post-processing including of a side-surface passivation thin film.

    摘要翻译: 垂直结构半导体发光器件及其制造方法技术领域本发明涉及垂直结构半导体发光器件及其制造方法,更具体地说,涉及具有厚金属膜或金属箔的高性能散热器支撑体的垂直结构半导体发光器件。 根据本发明制造的垂直结构半导体发光元件构成了高度可靠的发光元件,绝对没有热或机械损伤,因为它具有高性能的散热器支撑,因此不会发生微细微裂纹并且可以自由地受到影响 进行热处理和后处理,包括侧表面钝化薄膜。

    SUPPORTING SUBSTRATE FOR PREPARING SEMICONDUCTOR LIGHT-EMITTING DEVICE AND SEMICONDUCTOR LIGHT-EMITTING DEVICE USING SUPPORTING SUBSTRATES
    6.
    发明申请
    SUPPORTING SUBSTRATE FOR PREPARING SEMICONDUCTOR LIGHT-EMITTING DEVICE AND SEMICONDUCTOR LIGHT-EMITTING DEVICE USING SUPPORTING SUBSTRATES 审中-公开
    用于制备半导体发光器件的支撑衬底和使用支撑衬底的半导体发光器件

    公开(公告)号:US20110127567A1

    公开(公告)日:2011-06-02

    申请号:US12995998

    申请日:2009-06-02

    申请人: Tae Yeon Seong

    发明人: Tae Yeon Seong

    IPC分类号: H01L33/02

    摘要: The present invention is related to a supporting substrate for preparing a semiconductor light-emitting device employing a multi-layered light-emitting structure thin-film and a method for preparing a semiconductor light-emitting device employing the supporting substrate for preparing a semiconductor light-emitting device. The supporting substrate for preparing a semiconductor light-emitting device is formed by successively laminating a sacrificial layer, a heat-sink layer and a bonding layer on a selected supporting substrate. A method for preparing a semiconductor light-emitting device employing the supporting substrate for preparing a semiconductor light-emitting device includes: preparing a first wafer in which a semiconductor multi-layered light-emitting structure is laminated/grown on an upper part of an initial substrate; preparing a second wafer which is a supporting substrate for preparing a semiconductor light-emitting device; bonding the second wafer on an upper part of the first wafer; separating the initial substrate of the first wafer from a result of the bonding; performing passivation after forming a first ohmic contact electrode on an upper part of the first wafer from which the initial substrate is separated; and preparing a single-chip by severing a result of the passivation.

    摘要翻译: 本发明涉及一种用于制备采用多层发光结构薄膜的半导体发光器件的支撑衬底和一种制备半导体发光器件的方法,所述半导体发光器件采用该支撑衬底来制备半导体发光器件, 发光装置。 用于制备半导体发光器件的支撑衬底通过在所选择的支撑衬底上依次层叠牺牲层,散热层和结合层而形成。 一种制备半导体发光装置的半导体发光装置的制备方法,其特征在于,包括:准备半导体多层发光结构体的第一晶片,所述第一晶片在初始 基质; 制备作为用于制备半导体发光器件的支撑衬底的第二晶片; 将第二晶片接合在第一晶片的上部; 从第一晶片的初始衬底与接合的结果分离; 在从其分离初始衬底的第一晶片的上部形成第一欧姆接触电极之后进行钝化; 并通过切断钝化的结果来制备单芯片。

    Top-emitting nitride-based light emitting device and method of manufacturing the same
    7.
    发明授权
    Top-emitting nitride-based light emitting device and method of manufacturing the same 有权
    顶部发射氮化物基发光器件及其制造方法

    公开(公告)号:US07666693B2

    公开(公告)日:2010-02-23

    申请号:US12180312

    申请日:2008-07-25

    IPC分类号: H01L21/00

    CPC分类号: H01L33/42 H01L33/32

    摘要: Provided are a top-emitting N-based light emitting device and a method of manufacturing the same. The device includes a substrate, an n-type clad layer, an active layer, a p-type clad layer, and a multi ohmic contact layer, which are sequentially stacked. The multi ohmic contact layer includes one or more stacked structures, each including a modified metal layer and a transparent conductive thin film layer, which are repetitively stacked on the p-type clad layer. The modified metal layer is formed of an Ag-based material.

    摘要翻译: 提供了一种顶发射N型发光器件及其制造方法。 该器件包括依次层叠的衬底,n型覆盖层,有源层,p型覆盖层和多欧姆接触层。 多欧姆接触层包括一个或多个堆叠结构,每个层叠结构包括重复堆叠在p型覆盖层上的改性金属层和透明导电薄膜层。 改性金属层由Ag基材料形成。

    Flip-chip nitride light emitting device and method of manufacturing thereof
    9.
    发明授权
    Flip-chip nitride light emitting device and method of manufacturing thereof 有权
    倒装氮化物发光器件及其制造方法

    公开(公告)号:US07491564B2

    公开(公告)日:2009-02-17

    申请号:US11698193

    申请日:2007-01-26

    IPC分类号: H01L21/00

    摘要: A flip-chip light emitting device and a method of manufacturing thereof are provided. The flip-chip nitride light emitting device includes a substrate, an n type clad layer, an active layer, a p type clad layer, a multi ohmic contact layer, and a reflective layer, which are stacked in this order, wherein the multi ohmic contact layer is obtained by repeatedly stacking at least one stack unit of a reforming metal layer and a transparent conductive thin film, and wherein the reforming metal layer mainly contains silver (Ag). According to the flip-chip light emitting device and the method of manufacturing thereof, since the ohmic contact characteristics associated with a p type clad layer can be improved, it is possible to increase wire bonding efficiency and yield in a packaging process. In addition, since a low non-contact resistance and a good current-voltage characteristic can be obtained, it is possible to improve light emitting efficiency and to expand life time of the flip-chip light emitting device.

    摘要翻译: 提供了一种倒装芯片发光器件及其制造方法。 倒装氮化物发光器件包括依次堆叠的衬底,n型覆盖层,有源层,ap型覆盖层,多欧姆接触层和反射层,其中多欧姆接触 通过重复堆叠重整金属层和透明导电薄膜的至少一个堆叠单元获得层,其中重整金属层主要含有银(Ag)。 根据倒装芯片发光器件及其制造方法,由于能够提高与p型覆盖层相关的欧姆接触特性,所以能够提高封装工序中的引线接合效率和收率。 此外,由于可以获得低的非接触电阻和良好的电流 - 电压特性,所以可以提高发光效率并延长倒装芯片发光器件的使用寿命。

    Nitride-based light emitting device and method of manufacturing the same
    10.
    发明授权
    Nitride-based light emitting device and method of manufacturing the same 有权
    氮化物基发光器件及其制造方法

    公开(公告)号:US07485479B2

    公开(公告)日:2009-02-03

    申请号:US11649236

    申请日:2007-01-04

    IPC分类号: H01L21/00

    摘要: Provided are a nitride-based light emitting device and a method of manufacturing the same. The nitride-based light emitting device has a structure in which at least an n-cladding layer, an active layer, and a p-cladding layer are sequentially formed on a substrate. The light emitting device further includes an ohmic contact layer composed of a zinc (Zn)-containing oxide containing a p-type dopant formed on the p-cladding layer. The method of manufacturing the nitride-based light emitting device includes forming an ohmic contact layer composed of Zn-containing oxide containing a p-type dopant on the p-cladding layer, the ohmic contact layer being made and annealing the resultant structure. The nitride-based light emitting device and manufacturing method provide excellent I-V characteristics by improving ohmic contact with a p-cladding layer while significantly enhancing light emission efficiency of the device due to high light transmittance of a transparent electrode.

    摘要翻译: 提供一种氮化物系发光器件及其制造方法。 氮化物系发光器件具有在衬底上依次形成至少n包层,有源层和p包层的结构。 发光装置还包括由含有含锌(Zn)的氧化物构成的欧姆接触层,该氧化物含有形成在p包覆层上的p型掺杂剂。 制造氮化物系发光器件的方法包括在p包覆层上形成由含有p型掺杂剂的含Zn氧化物构成的欧姆接触层,形成欧姆接触层并退火所得到的结构。 基于氮化物的发光器件和制造方法通过改善与p型覆层的欧姆接触而提供优异的I-V特性,同时由于透明电极的高透光率而显着提高了器件的发光效率。