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1.发明授权Compound, radical polymerization initiator, method for producing compound, polymer, resist composition, and method for forming resist pattern 有权化合物，自由基聚合引发剂，化合物的制备方法，聚合物，抗蚀剂组合物和形成抗蚀剂图案的方法公开(公告)号：US09097971B2
公开(公告)日：2015-08-04
申请号：US14126535
申请日：2012-06-15
申请人： Yoshiyuki Utsumi , Takahiro Dazai , Jun Iwashita , Kenri Konno
发明人： Yoshiyuki Utsumi , Takahiro Dazai , Jun Iwashita , Kenri Konno
IPC分类号： G03F7/004 , G03F7/038 , C08F4/04 , G03F7/039 , C07C309/12 , C07C381/12 , C07C25/18
CPC分类号： G03F7/038 , C07C25/18 , C07C309/12 , C07C381/12 , C07C2601/14 , C07C2603/74 , C08F4/04 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A compound represented by formula (I). In the formula, R1 represents a hydrocarbon group of 1 to 10 carbon atoms; Z represents a hydrocarbon group of 1 to 10 carbon atoms or a cyano group; provided that R1 and Z may be mutually bonded to form a ring; X represents a divalent linking group having any one selected from —O—C(═O)—, —NH—C(═O)— and —NH—C(═NH)— on a terminal that comes into contact with Q; p represents an integer of 1 to 3; Q represents a hydrocarbon group having a valency of (p+1), provided that, when p is 1, Q may be a single bond; R2 represents a single bond, an alkylene group which may have a substituent or an arylene group which may have a substituent; q represents 0 or 1; r represents an integer of 0 to 8; and A+ represents a metal cation or an organic cation.
摘要翻译： 由式（I）表示的化合物。 在该式中，R 1表示1〜10个碳原子的烃基; Z表示1〜10个碳原子的烃基或氰基; 条件是R1和Z可以相互键合形成环; X表示在与Q接触的端子上具有选自-O-C（= O） - ， - NH-C（= O） - 和-NH-C（= NH））中任一个的二价连接基团; p表示1〜3的整数， Q表示具有（p + 1）价的烃基，条件是当p为1时，Q可以是单键; R2表示单键，可以具有取代基的亚烷基或可具有取代基的亚芳基; q表示0或1; r表示0〜8的整数， A +表示金属阳离子或有机阳离子。
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2.发明授权Method of producing polymeric compound, resist composition, and method of forming resist pattern 有权制备高分子化合物的方法，抗蚀剂组合物和形成抗蚀剂图案的方法公开(公告)号：US08987386B2
公开(公告)日：2015-03-24
申请号：US13491860
申请日：2012-06-08
IPC分类号： C08F228/02 , C08F228/06 , C08F8/34 , C08F20/36 , C08F20/38 , C08F220/18 , C08F220/28 , C08F220/34 , C08F220/38 , C08F8/00 , G03F7/20 , G03F7/004 , G03F7/11 , G03F7/038 , G03F7/039
CPC分类号： C08F8/34 , C08F220/18 , C08F220/28 , C08F228/02 , C08F228/06 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/20 , G03F7/2041 , Y10S522/904
摘要： A method of producing a polymeric compound containing a structural unit that decomposes upon exposure to generate an acid, the method including: synthesizing a precursor polymer by polymerizing a water-soluble monomer having an anionic group, washing the precursor polymer with water, and subsequently subjecting the precursor polymer to a salt exchange with an organic cation. Also, a polymeric compound produced using the method of producing a polymeric compound, and a method of forming a resist pattern using the resist composition.
摘要翻译： 一种制备含有暴露后分解产生酸的结构单元的聚合物的方法，该方法包括：通过聚合具有阴离子基团的水溶性单体，用水洗涤前体聚合物，然后经受 该前体聚合物与有机阳离子进行盐交换。 另外，使用高分子化合物的制造方法制造的高分子化合物，以及使用该抗蚀剂组合物形成抗蚀剂图案的方法。
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3.发明授权Positive resist composition, method of forming resist pattern, and polymeric compound 有权正型抗蚀剂组合物，形成抗蚀剂图案的方法和聚合物公开(公告)号：US08541529B2
公开(公告)日：2013-09-24
申请号：US13454399
申请日：2012-04-24
CPC分类号： G03F7/2041 , C08F28/06 , C08F220/28 , C08F228/06 , G03F7/0045 , G03F7/0397
摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) (R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group.
摘要翻译： 一种正性抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解度的碱成分（A）和暴露时产生酸的酸产生剂组分（B），所述碱成分（A）包含高分子化合物 A1），其含有由通式（a0-1）表示的结构单元（a0）（R2表示二价连接基团，R3表示在其环骨架中含有-SO2-的环状基团）和结构单元（a1）得自 来自含有酸解离的溶解抑制基团的丙烯酸酯。
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4.发明授权Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound 有权用于浸渍曝光的抗蚀组合物，形成抗蚀图案的方法和含氟聚合物公开(公告)号：US08475997B2
公开(公告)日：2013-07-02
申请号：US13336131
申请日：2011-12-23
申请人： Daiju Shiono , Tomoyuki Hirano , Sanae Furuya , Takahiro Dazai , Hiroaki Shimizu , Tsuyoshi Kurosawa , Hideto Nito , Tsuyoshi Nakamura
发明人： Daiju Shiono , Tomoyuki Hirano , Sanae Furuya , Takahiro Dazai , Hiroaki Shimizu , Tsuyoshi Kurosawa , Hideto Nito , Tsuyoshi Nakamura
CPC分类号： C08F214/18 , C08F220/18 , C08F220/24 , C08F220/28 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.
摘要翻译： 一种浸渍曝光用抗蚀剂组合物，包括：含有具有碱解离基团的结构单元（f1）和由通式（f2-1）表示的结构单元（f2）的含氟聚合物（F）（其中R表示 氢原子，低级烷基或卤代低级烷基; W为通式（w-1）〜（w-4）中任一个表示的基团）; 在酸性作用下在碱性显影液中表现出改变的溶解性的碱成分（A） 和在曝光时产生酸的酸发生剂组分（B）。
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公开(公告)号：US20130022911A1
公开(公告)日：2013-01-24
申请号：US13552485
申请日：2012-07-18
申请人： Yoshiyuki Utsumi , Takahiro Dazai
发明人： Yoshiyuki Utsumi , Takahiro Dazai
IPC分类号： C08F228/06 , G03F7/20 , G03F7/004
CPC分类号： G03F7/0045 , C08F220/38 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： A polymer containing an anion part which generates acid upon exposure on at least one terminal of the main chain, and at least one structural unit selected from the group consisting of a structural unit (a0) containing a —SO2-containing cyclic group, a structural unit (a3) containing at least one group selected from the group consisting of —OH, —COOH, —CN, —SO2NH2 and —CONH2 and a structural unit (a5) which generates acid upon exposure.
摘要翻译： 含有阴离子部分的聚合物，其在主链的至少一个末端暴露时产生酸，以及至少一种选自包含含-SO 2的环状基团的结构单元（a0），结构单元 含有选自-OH，-COOH，-CN，-SO 2 NH 2和-CONH 2中的至少一种基团的单元（a3）和暴露时产生酸的结构单元（a5）。
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6.发明申请POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND 有权正极性组合物，形成耐火模式的方法和聚合物公开(公告)号：US20120202151A1
公开(公告)日：2012-08-09
申请号：US13454399
申请日：2012-04-24
CPC分类号： G03F7/2041 , C08F28/06 , C08F220/28 , C08F228/06 , G03F7/0045 , G03F7/0397
摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) (R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group.
摘要翻译： 一种正性抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解度的碱成分（A）和暴露时产生酸的酸产生剂组分（B），所述碱成分（A）包含高分子化合物 A1），其含有由通式（a0-1）表示的结构单元（a0）（R2表示二价连接基团，R3表示在其环骨架中含有-SO2-的环状基团）和结构单元（a1）得自 来自含有酸解离的溶解抑制基团的丙烯酸酯。
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7.发明授权Polymer compound, positive resist composition, and method of forming resist pattern 有权高分子化合物，正性抗蚀剂组合物和形成抗蚀剂图案的方法公开(公告)号：US08105749B2
公开(公告)日：2012-01-31
申请号：US12814356
申请日：2010-06-11
申请人： Takahiro Dazai , Takayoshi Mori , Hiroaki Shimizu , Kyoko Ohshita
发明人： Takahiro Dazai , Takayoshi Mori , Hiroaki Shimizu , Kyoko Ohshita
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/28 , C08F220/38 , Y10S430/111
摘要： There is provided a positive resist composition including a resin component (A) which displays increased solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates an acid upon exposure, wherein the resin component (A) includes a polymer compound (A1) containing a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) derived from an acrylate ester which has an acid dissociable, dissolution inhibiting group: (in the formula (a0-1), R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; two of R′ each independently represents a hydrogen atom, a lower alkyl group, or an alkoxy group of 1 to 5 carbon atoms; X represents an alkylene group of 1 to 5 carbon atoms, an oxygen atom, or a sulfur atom.).
摘要翻译： 提供一种正性抗蚀剂组合物，其包含在酸作用下在碱性显影液中显示增加的溶解性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），其中树脂组分（A） 包括含有下述通式（a0-1）表示的结构单元（a0）的高分子化合物（A1）和来自具有酸解离性，溶解抑制基团的丙烯酸酯的结构单元（a1）（ 在式（a0-1）中，R表示氢原子，低级烷基或卤代低级烷基; R'两个各自独立地表示氢原子，低级烷基或烷氧基， 5个碳原子; X表示1至5个碳原子的亚烷基，氧原子或硫原子）。
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公开(公告)号：US07960091B2
公开(公告)日：2011-06-14
申请号：US12356011
申请日：2009-01-19
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/2041
摘要： A resist composition comprising a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure, and a nitrogen-containing organic compound (D), the nitrogen-containing organic compound (D) including a nitrogen-containing polymeric compound (D1) having a structural unit (d0) containing a nitrogen atom in the side chain thereof.
摘要翻译： 一种抗蚀剂组合物，其含有在酸作用下在碱显影液中溶解度变化的碱成分（A），曝光时产生酸的酸发生剂成分（B）和含氮有机化合物（D）， 含有有机化合物（D），其含有在其侧链中含有氮原子的结构单元（d0）的含氮高分子化合物（D1）。
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9.发明申请POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING POLYMERIC COMPOUND 有权正极性组合物，使用它的耐热图案的形成方法和含氟聚合物公开(公告)号：US20110117499A1
公开(公告)日：2011-05-19
申请号：US12824089
申请日：2010-06-25
CPC分类号： C09D133/16 , C08F220/24 , C08F2438/00 , G03F7/0046 , G03F7/0397 , G03F7/2041 , C08L33/08 , C08L33/16 , C08L53/02 , C08F220/18
摘要： A fluorine-containing polymeric compound which contains a structural unit (f1) that is decomposable in an alkali developing solution as a block copolymer portion, a base component (A) that exhibits increased solubility in an alkali developing solution under the action of acid, and an acid generator component (B) that generates acid upon exposure.
摘要翻译： 含有可在碱性显影液中作为嵌段共聚物部分分解的结构单元（f1）的含氟聚合物，在酸性作用下在碱性显影液中显示出增加的溶解性的碱成分（A），以及 酸性发生剂组分（B），其在暴露时产生酸。
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10.发明申请POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN 有权聚合物化合物，阳离子组合物和形成耐蚀图案的方法公开(公告)号：US20100248148A1
公开(公告)日：2010-09-30
申请号：US12814356
申请日：2010-06-11
申请人： Takahiro DAZAI , Takayoshi MORI , Hiroaki SHIMIZU , Kyoko OHSHITA
发明人： Takahiro DAZAI , Takayoshi MORI , Hiroaki SHIMIZU , Kyoko OHSHITA
IPC分类号： G03F7/004 , C08F232/08 , G03F7/20
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/28 , C08F220/38 , Y10S430/111
摘要： There is provided a positive resist composition including a resin component (A) which displays increased solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates an acid upon exposure, wherein the resin component (A) includes a polymer compound (A1) containing a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) derived from an acrylate ester which has an acid dissociable, dissolution inhibiting group: (in the formula (a0-1), R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; two of R′ each independently represents a hydrogen atom, a lower alkyl group, or an alkoxy group of 1 to 5 carbon atoms; X represents an alkylene group of 1 to 5 carbon atoms, an oxygen atom, or a sulfur atom.).
摘要翻译： 提供一种正性抗蚀剂组合物，其包含在酸作用下在碱性显影液中显示增加的溶解性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），其中树脂组分（A） 包括含有下述通式（a0-1）表示的结构单元（a0）的高分子化合物（A1）和来自具有酸解离性，溶解抑制基团的丙烯酸酯的结构单元（a1）（ 在式（a0-1）中，R表示氢原子，低级烷基或卤代低级烷基; R'两个各自独立地表示氢原子，低级烷基或烷氧基， 5个碳原子; X表示1至5个碳原子的亚烷基，氧原子或硫原子）。
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