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    Method of depositing silicon oxide film by plasma enhanced atomic layer deposition at low temperature
    2.
    发明授权
    Method of depositing silicon oxide film by plasma enhanced atomic layer deposition at low temperature 有权
    在低温下通过等离子体增强原子层沉积沉积氧化硅膜的方法

    公开(公告)号：US08197915B2

    公开(公告)日：2012-06-12

    申请号：US12416809

    申请日：2009-04-01

    申请人： Takahiro Oka ,  Akira Shimizu

    发明人： Takahiro Oka ,  Akira Shimizu

    IPC分类号： H05H1/24 ,  C23C16/00

    CPC分类号： C23C16/402 ,  C23C16/45542 ,  G03F7/40 ,  H01L21/02164 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/0337 ,  H01L21/32139

    摘要： A method of depositing a silicon oxide film on a resist pattern or etched lines formed on a substrate by plasma enhanced atomic layer deposition (PEALD) includes: providing a substrate on which a resist pattern or etched lines are formed in a PEALD reactor; controlling a temperature of a susceptor on which the substrate is placed at less than 50° C. as a deposition temperature; introducing a silicon-containing precursor and an oxygen-supplying reactant to the PEALD reactor and applying RF power therein in a cycle, while the deposition temperature is controlled substantially or nearly at a constant temperature of less than 50° C., thereby depositing a silicon oxide atomic layer on the resist pattern or etched lines; and repeating the cycle multiple times substantially or nearly at the constant temperature to deposit a silicon oxide atomic film on the resist pattern or etched lines.

    摘要翻译： 通过等离子体增强原子层沉积（PEALD）在抗蚀剂图案或在衬底上形成的蚀刻线上沉积氧化硅膜的方法包括：提供在其中在PEALD反应器中形成抗蚀剂图案或蚀刻线的衬底; 将其上放置基板的基座的温度控制在低于50℃作为沉积温度; 在PEALD反应器中引入含硅前体和供氧反应物并在其中施加RF功率，同时基本上或几乎处于小于50℃的恒定温度下控制沉积温度，从而沉积硅 抗蚀剂图案或蚀刻线上的氧化物原子层; 并且在恒定温度下基本上或接近多次重复该循环，以将氧化硅原子膜沉积在抗蚀剂图案或蚀刻线上。

    Process for producing bent pipe for line pipe
    3.
    发明授权
    Process for producing bent pipe for line pipe 有权
    管线弯管生产工艺

    公开(公告)号：US08038811B2

    公开(公告)日：2011-10-18

    申请号：US12565254

    申请日：2009-09-23

    申请人： Takahiro Oka

    发明人： Takahiro Oka

    IPC分类号： C21D9/08 ,  C22C38/02 ,  C22C38/04

    CPC分类号： C22C38/44 ,  C21D8/10 ,  C21D9/08 ,  C22C38/004 ,  C22C38/02 ,  C22C38/04 ,  C22C38/18 ,  C22C38/46 ,  C22C38/50

    摘要： A steel pipe is prepared, which contains, by mass, at most 0.009% C, at most 1.0% Mn, at most 1.0% Si, at most 0.04% P, at most 0.005% S, 0.01 to 0.2% Ti, 0.01 to 0.10% V, 0.001 to 0.1% Al, at most 0.1% N, 4.0 to 8.0% Ni, 9.0 to 15.0% Cr, and 1.5 to 7.0% Mo, the balance being Fe and impurities. The prepared steel pipe is bent into a bend pipe. The bend pipe is quenched at a quenching temperature lower than 950° C. The quenched bend pipe is tempered. Accordingly, the bend pipe in accordance with the present invention has excellent SSC resistance.

    摘要翻译： 制备钢管，其质量含量最多为0.009％，至多1.0％的Mn，至多1.0％的Si，至多0.04％的P，至多0.005％的S，0.01至0.2％的Ti，0.01至 0.10％V，0.001〜0.1％Al，0.1％N以下，Ni：4.0〜8.0％，Cr：9.0〜15.0％，Mo：1.5〜7.0％，余量为Fe和杂质。 准备好的钢管弯曲成弯管。 弯曲管在低于950℃的淬火温度下淬火。淬火的弯管被回火。 因此，根据本发明的弯曲管具有优异的耐SSC性。

    Process for continuously producing a high-melt viscoelastic ethylene-propylene copolymer
    8.
    发明授权
    Process for continuously producing a high-melt viscoelastic ethylene-propylene copolymer 失效
    用于连续生产高熔点粘弹性乙烯 - 丙烯共聚物的方法

    公开(公告)号：US4760113A

    公开(公告)日：1988-07-26

    申请号：US942796

    申请日：1986-12-17

    申请人： Hiromasa Chiba ,  Shunji Kawazoe ,  Takahiro Oka

    发明人： Hiromasa Chiba ,  Shunji Kawazoe ,  Takahiro Oka

    IPC分类号： C08F210/16 ,  C08F2/00 ,  C08F2/02 ,  C08F2/04 ,  C08F2/06 ,  C08F4/60 ,  C08F4/64 ,  C08F4/642 ,  C08F6/00 ,  C08F6/06 ,  C08F297/08

    CPC分类号： C08F297/083

    摘要： A continuous polymerization process for producing a high-melt viscoelastic ethylene-propylene copolymer by the use of Ziegler-Natta catalyst, which process make it possible to stably produce an ethylene-propylene block copolymer having superior physical properties suitable to sheet molding and blow molding and capable of producing large-size molded products is provided,which process comprises(a) feeding propylene and ethylene in a weight proportion of ethylene in the total of propylene and ethylene of 0-5% into 3 or more polymerization vessels among 4 or more polymerization vessels connected in series, to carry out continuous polymerization step (i) and successively feeding ethylene and propylene in a weight proportion of ethylene in the total of ethylene and propylene of 10-100% into one or more polymerization vessels, to carry out continuous polymerization process (ii); (b) feeding the total quantity of the catalyst only to the first polymerization vessel; (c) feeding the total quantity of hydrogen substantially only to the first polymerization vessel; and (d) making the quantity of polymer obtained in step (i) 60-95 weight % based on the total polymerization quantity.

    摘要翻译： 通过使用齐格勒 - 纳塔催化剂制造高熔点粘弹性乙烯 - 丙烯共聚物的连续聚合方法，该方法使得可以稳定地制备具有适合于片材成型和吹塑成型的优异物理性能的乙烯 - 丙烯嵌段共聚物，以及 提供能够生产大尺寸模制产品的方法，该方法包括（a）在4个或更多个聚合物中将丙烯和乙烯总量为0-5％的乙烯的重量比例的丙烯和乙烯进料到3个或更多个聚合容器中 串联连接的容器，进行连续聚合步骤（i），并将乙烯和丙烯的总重量为10-100％的乙烯和丙烯的重量比连续地供入到一个或多个聚合容器中，以进行连续聚合 方法（ii）; （b）仅向第一聚合容器供给催化剂总量; （c）基本上仅向第一聚合容器供给总量的氢; 和（d）基于总聚合量使步骤（i）中获得的聚合物的量为60-95重量％。

    Liquid crystal display device
    9.
    发明授权
    Liquid crystal display device 有权
    液晶显示装置

    公开(公告)号：US07907241B2

    公开(公告)日：2011-03-15

    申请号：US12085971

    申请日：2006-08-30

    申请人： Kenji Fujita ,  Takayuki Natsume ,  Tetsuya Inoue ,  Takahiro Oka

    发明人： Kenji Fujita ,  Takayuki Natsume ,  Tetsuya Inoue ,  Takahiro Oka

    IPC分类号： G02F1/1335

    CPC分类号： G02F1/13363 ,  G02B5/3016 ,  G02F1/133371 ,  G02F1/133555 ,  G02F1/133707 ,  G02F1/1393 ,  G02F2001/133565 ,  G02F2001/133633 ,  G02F2001/133638 ,  G02F2413/02 ,  G02F2413/07 ,  G02F2413/09

    摘要： To provide a liquid crystal display device capable of improving display characteristics. The liquid crystal display device of the present invention is a liquid crystal display device including a structure in which the first substrate including a reflective layer, a liquid crystal layer, the second substrate, and a polarizer are stacked in this order from a back face to a display face, wherein the liquid crystal display device includes a retardation layer, in a region on a liquid crystal layer side of the reflective layer of the first substrate, or in a region where the reflective layer is not arranged of the first substrate, or in the second substrate, and the retardation layer provides two or more regions having different retardations in a display surface plane.

    摘要翻译： 提供能够提高显示特性的液晶显示装置。 本发明的液晶显示装置是具有以下结构的液晶显示装置，该液晶显示装置的第一基板包括反射层，液晶层，第二基板以及偏振片， 显示面，其中液晶显示装置包括延迟层，在第一基板的反射层的液晶层侧的区域中，或者在反射层未设置第一基板的区域中，或 在第二基板中，延迟层在显示面平面上提供具有不同延迟的2个以上的区域。