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20 条记录 (耗时 0.021 秒)

    METHOD OF MEASURING AAS EMF
    1.
    发明申请
    METHOD OF MEASURING AAS EMF 有权

    公开(公告)号：US20220264319A1

    公开(公告)日：2022-08-18

    申请号：US17624691

    申请日：2020-06-30

    申请人： Weihong LIU ,  Guoqiang LU ,  Edward MAH ,  SMITH Daryl ,  Dimple THOMAS ,  Guoqiang XUE

    发明人： Weihong LIU ,  Guoqiang LU ,  Edward MAH ,  Daryl SMITH ,  Dimple THOMAS ,  Guoqiang XUE

    IPC分类号： H04W16/28 ,  H04B7/06 ,  H04W24/10 ,  H04B17/318

    摘要： Embodiments of a method for measurement of electromagnetic field strength at a point of interest in a coverage area of a 2-dimensional (2D) active antenna system (AAS). The 2D AAS transmits with a load factor of 100 percent. The 2D AAS sweeps a predefined range of azimuth and elevation angles, and azimuth and elevation directions which yield highest EMF at the point of interest are determined. First beamforming weights are determined based on the azimuth and elevation directions and the 2D AAS caused to apply the first beamforming weights. The 2D AAS sweeps a co-phasing angle from 0 to 360 degrees, and a co-phasing angle which yields highest EMF is determined. Second beamforming weights are determined based on azimuth and elevation directions and the co-phasing angle, and the 2D AAS caused to apply the second beamforming weights. The EMF strength at the point of interest is measured.

    Positive photosensitive material
    4.
    发明授权
    Positive photosensitive material 有权
    正感光材料

    公开(公告)号：US09012126B2

    公开(公告)日：2015-04-21

    申请号：US13524790

    申请日：2012-06-15

    申请人： Weihong Liu ,  PingHung Lu ,  Chunwei Chen ,  Stephen Meyer ,  Medhat Toukhy ,  SookMee Lai

    发明人： Weihong Liu ,  PingHung Lu ,  Chunwei Chen ,  Stephen Meyer ,  Medhat Toukhy ,  SookMee Lai

    IPC分类号： G03F7/039 ,  G03F7/004

    CPC分类号： G03F7/004 ,  G03F7/0392 ,  G03F7/0397

    摘要： The invention relates to a novel positive working photosensitive composition having: at least one photoacid generator; at least one novolak polymer; at least one polymer, having a polymer backbone, said polymer comprising a structure of the following formula: wherein R1-R5 are, independently, —H or —CH3, A is a linear or branched C1-C10 alkylene group, B is a C1-C12 alkyl or alicyclic group, D is a linking group that may be a chemical bond, a carboxylate group, wherein the carbonyl carbon is bonded to the polymer backbone, or a —COOCH2— group, wherein the carbonyl carbon is bonded to the polymer backbone, Ar is a substituted or unsubstituted aromatic group or heteroaromatic group, E is a linear or branched C2-C10 alkylene group, G is an acid cleavable group. The invention further relates to a process for using the novel composition for forming an image.

    摘要翻译： 本发明涉及一种新型的正性光敏组合物，其具有：至少一种光致酸发生剂; 至少一种酚醛清漆聚合物; 至少一种具有聚合物主链的聚合物，所述聚合物包含下式的结构：其中R 1 -R 5独立地是-H或-CH 3，A是直链或支链C 1 -C 10亚烷基，B是C1 -C 12烷基或脂环基，D是可以是化学键的连接基团，其中羰基碳键合到聚合物主链上的羧酸酯基团或-COOCH 2 - 基团，其中羰基碳键合到聚合物上 骨架，Ar是取代或未取代的芳基或杂芳基，E是直链或支链C 2 -C 10亚烷基，G是酸可裂解基团。 本发明还涉及使用该组合物形成图像的方法。

    Antireflective Coating Composition and Process Thereof
    8.
    发明申请
    Antireflective Coating Composition and Process Thereof 有权
    防反射涂料组合物及其工艺

    公开(公告)号：US20090130591A1

    公开(公告)日：2009-05-21

    申请号：US11944105

    申请日：2007-11-21

    申请人： Huirong Yao ,  Zhong Xiang ,  Jian Yin ,  Weihong Liu

    发明人： Huirong Yao ,  Zhong Xiang ,  Jian Yin ,  Weihong Liu

    IPC分类号： G03C1/73 ,  G03C5/00

    CPC分类号： G03F7/091 ,  G03F7/0046

    摘要： The present invention relates to an antireflective composition comprising a polymer, a thermal acid generator and optionally a crosslinking agent, where the polymer comprises at least one hydrophobic unit (1), at least one chromophore unit (2), at least one unit with a crosslinking site (3) and optionally a unit capable of crosslinking the polymer, where, R1 to R8 are independently selected from hydrogen and C1-C4 alkyl, W1 is a fully or partially fluorinated alkylene group, X is selected from F, H and OH; W2 comprises a chromophore group, and W3 Y comprises a crosslinking site. The invention also relates to a process for using the antireflective coating composition.

    摘要翻译： 本发明涉及包含聚合物，热酸产生剂和任选的交联剂的抗反射组合物，其中所述聚合物包含至少一个疏水单元（1），至少一个生色团单元（2），至少一个具有 交联位点（3）和任选的能够交联聚合物的单元，其中R1至R8独立地选自氢和C1-C4烷基，W1是完全或部分氟化的亚烷基，X选自F，H和OH ; W2包含发色团，W3 Y包含交联位点。 本发明还涉及使用抗反射涂料组合物的方法。