Positive photosensitive material
    3.
    发明授权
    Positive photosensitive material 有权
    正感光材料

    公开(公告)号:US09012126B2

    公开(公告)日:2015-04-21

    申请号:US13524790

    申请日:2012-06-15

    IPC分类号: G03F7/039 G03F7/004

    摘要: The invention relates to a novel positive working photosensitive composition having: at least one photoacid generator; at least one novolak polymer; at least one polymer, having a polymer backbone, said polymer comprising a structure of the following formula: wherein R1-R5 are, independently, —H or —CH3, A is a linear or branched C1-C10 alkylene group, B is a C1-C12 alkyl or alicyclic group, D is a linking group that may be a chemical bond, a carboxylate group, wherein the carbonyl carbon is bonded to the polymer backbone, or a —COOCH2— group, wherein the carbonyl carbon is bonded to the polymer backbone, Ar is a substituted or unsubstituted aromatic group or heteroaromatic group, E is a linear or branched C2-C10 alkylene group, G is an acid cleavable group. The invention further relates to a process for using the novel composition for forming an image.

    摘要翻译: 本发明涉及一种新型的正性光敏组合物,其具有:至少一种光致酸发生剂; 至少一种酚醛清漆聚合物; 至少一种具有聚合物主链的聚合物,所述聚合物包含下式的结构:其中R 1 -R 5独立地是-H或-CH 3,A是直链或支链C 1 -C 10亚烷基,B是C1 -C 12烷基或脂环基,D是可以是化学键的连接基团,其中羰基碳键合到聚合物主链上的羧酸酯基团或-COOCH 2 - 基团,其中羰基碳键合到聚合物上 骨架,Ar是取代或未取代的芳基或杂芳基,E是直链或支链C 2 -C 10亚烷基,G是酸可裂解基团。 本发明还涉及使用该组合物形成图像的方法。

    Antireflective coating composition and process thereof
    5.
    发明授权
    Antireflective coating composition and process thereof 有权
    防反射涂料组合物及其工艺

    公开(公告)号:US08039201B2

    公开(公告)日:2011-10-18

    申请号:US11944105

    申请日:2007-11-21

    IPC分类号: G03C1/73 G03F7/11

    CPC分类号: G03F7/091 G03F7/0046

    摘要: The present invention relates to an antireflective composition comprising a polymer, a thermal acid generator and optionally a crosslinking agent, where the polymer comprises at least one hydrophobic unit (1), at least one chromophore unit (2), at least one unit with a crosslinking site (3) and optionally a unit capable of crosslinking the polymer, where, R1 to R8 are independently selected from hydrogen and C1-C4 alkyl, W1 is a fully or partially fluorinated alkylene group, X is selected from F, H and OH; W2 comprises a chromophore group, and W3 Y comprises a crosslinking site. The invention also relates to a process for using the antireflective coating composition.

    摘要翻译: 本发明涉及包含聚合物,热酸产生剂和任选的交联剂的抗反射组合物,其中所述聚合物包含至少一个疏水单元(1),至少一个生色团单元(2),至少一个具有 交联位点(3)和任选的能够交联聚合物的单元,其中R1至R8独立地选自氢和C1-C4烷基,W1是完全或部分氟化的亚烷基,X选自F,H和OH ; W2包含发色团,W3 Y包含交联位点。 本发明还涉及使用抗反射涂料组合物的方法。