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公开(公告)号：US10316245B2
公开(公告)日：2019-06-11
申请号：US14762173
申请日：2014-01-16
IPC分类号： C09K11/02 , B32B7/12 , B32B27/08 , B32B27/36 , B82Y20/00 , B82Y40/00 , C09K11/56 , C09K11/88 , H01L33/50
摘要： A quantum dot film article includes a first barrier film, a second barrier film, and a quantum dot layer separating the first barrier from the second barrier film. The quantum dot layer includes quantum dots dispersed in a polymer material. The polymer material includes a methacrylate polymer, an epoxy polymer and a photoinitiator.
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公开(公告)号：US11312100B2
公开(公告)日：2022-04-26
申请号：US16066903
申请日：2016-12-22
发明人： Jeffrey L. Solomon , Saswata Chakraborty , Robert J. Devoe , Wayne S. Mahoney , Eric W. Nelson , Kundapur Raveesh Shenoy
IPC分类号： B32B3/30 , B32B7/12 , B32B27/08 , B32B27/30 , B32B27/36 , B32B27/38 , B32B7/05 , G02B5/02 , B32B27/00 , B29D11/00 , B32B7/14 , B32B27/32 , B32B27/40 , B32B27/28 , B32B37/14 , G02F1/1335
摘要： Article comprising a first microstructured layer comprising a first material, and having first and second opposed major surfaces, the first major surface being a microstructured surface, and the microstructured surface having peaks and valleys, wherein the peaks are microstructural features each having a height defined by the distance between the peak of the respective microstructural feature and an adjacent valley; and a second layer comprising an adhesive material, and having a first and second opposed major surfaces, the adhesive material comprising a reaction product of a mixture comprising (meth)acrylate and epoxy in the presence of each other, wherein at least a portion of the second major surface of the second layer is directly attached to at least a portion of the first major microstructured surface of the first layer.
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公开(公告)号：US20160097884A1
公开(公告)日：2016-04-07
申请号：US14968217
申请日：2015-12-14
发明人： Bryan V. Hunt , Eric W. Nelson
IPC分类号： G02B5/04
CPC分类号： G02B5/045 , C08F265/04 , C08F289/00 , C08F290/06 , C08F291/00 , C08L51/003 , C08L51/08 , C09D151/003 , C09D151/08 , G02B1/04 , Y10T428/24355 , C08L2666/02
摘要： Polymerizable resin compositions and microstructures comprising the reaction product of such polymerizable resin compositions are described. The microstructures comprise the reaction product of a polymerizable resin composition comprising an organic portion having a refractive index of at least 1.56 wherein the polymerizable resin composition comprises a fluorene-containing monomer.
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公开(公告)号：US09244193B2
公开(公告)日：2016-01-26
申请号：US13911336
申请日：2013-06-06
发明人： Bryan V. Hunt , Eric W. Nelson
IPC分类号： G02B1/04 , C08F265/04 , C08F289/00 , C08F290/06 , C08F291/00 , C08L51/00 , C08L51/08 , C09D151/00 , C09D151/08
CPC分类号： G02B5/045 , C08F265/04 , C08F289/00 , C08F290/06 , C08F291/00 , C08L51/003 , C08L51/08 , C09D151/003 , C09D151/08 , G02B1/04 , Y10T428/24355 , C08L2666/02
摘要： Polymerizable resin compositions and microstructures comprising the reaction product of such polymerizable resin compositions are described. The microstructures comprise the reaction product of a polymerizable resin composition comprising an organic portion having a refractive index of at least 1.56 wherein the polymerizable resin composition comprises a fluorene-containing monomer.
摘要翻译： 描述了可聚合树脂组合物和包含这些可聚合树脂组合物的反应产物的微结构。 微结构包括包含折射率至少为1.56的有机部分的可聚合树脂组合物的反应产物，其中可聚合树脂组合物包含含芴单体。
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公开(公告)号：US20130266763A1
公开(公告)日：2013-10-10
申请号：US13911336
申请日：2013-06-06
发明人： Bryan V. Hunt , Eric W. Nelson
IPC分类号： G02B1/04
CPC分类号： G02B5/045 , C08F265/04 , C08F289/00 , C08F290/06 , C08F291/00 , C08L51/003 , C08L51/08 , C09D151/003 , C09D151/08 , G02B1/04 , Y10T428/24355 , C08L2666/02
摘要： Polymerizable resin compositions and microstructures comprising the reaction product of such polymerizable resin compositions are described. The microstructures comprise the reaction product of a polymerizable resin composition comprising an organic portion having a refractive index of at least 1.56 wherein the polymerizable resin composition comprises a fluorene-containing monomer.
摘要翻译： 描述了可聚合树脂组合物和包含这些可聚合树脂组合物的反应产物的微结构。 微结构包括包含折射率至少为1.56的有机部分的可聚合树脂组合物的反应产物，其中可聚合树脂组合物包含含芴单体。
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公开(公告)号：US20210386522A1
公开(公告)日：2021-12-16
申请号：US16754211
申请日：2018-11-20
发明人： Saswata Chakraborty , Benjamin C. Mac Murray , Eric W. Nelson , Thomas P. Klun , Wayne S. Mahoney , Chad M. Amb , George W. Griesgraber , Dana R. Reed , Ahmed S. Abuelyaman , Robert S. Clough , James D. Hansen , Daniel J. Skamser , Ian Dailey , John M. Riedesel
IPC分类号： A61C7/08 , C08F220/34 , C08F2/50 , C08F220/18
摘要： An orthodontic article is described comprising a cured composition comprising the reaction product of free-radically polymerizable resin comprising at least one monomer, oligomer and/or polymer, comprising at least two (meth)acryl moieties; a monofunctional reactive diluent; and a polymer or macromolecule comprising a free-radical photoinitiator group. The polymer or macromolecule has a molecular weight of at least 500 g/mole. In one embodiment, the cured composition comprises a first and second photoinitiator wherein at least one is a polymer or macromolecule. Also described are photopolymerizable compositions and methods.
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公开(公告)号：US10199603B2
公开(公告)日：2019-02-05
申请号：US14907276
申请日：2014-07-22
IPC分类号： H01L51/56 , C09J5/00 , C08J7/04 , H01L51/52 , G02F1/13357 , H01L27/32 , H01L51/00 , H01L51/50 , G02F1/1335
摘要： The present disclosure relates to forming a bond with a high peel resistance between a bonding layer and an adjacent barrier layer. Such articles are particularly useful in the preparation of a device, in particular a luminescent device, and a method is described for assembly of the luminescent device. The luminescent device includes an encapsulation system using flexible transparent barrier film and an ultraviolet (UV) radiation curable (meth)acrylate matrix. The moisture sensitive luminescent material can be, for example, a quantum dot material disposed in a film, or a film construction that includes an OLED structure.
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公开(公告)号：US20190016085A1
公开(公告)日：2019-01-17
申请号：US16066903
申请日：2016-12-22
发明人： Jeffrey L. Solomon , Saswata Chakraborty , Robert J. Devoe , Wayne S. Mahoney , Eric W. Nelson , Kundapur Raveesh Shenoy
摘要： Article comprising a first microstructured layer comprising a first material, and having first and second opposed major surfaces, the first major surface being a microstructured surface, and the microstructured surafce having peaks and valleys, wherein the peaks are microstructural features each having a height defined by the distance between the peak of the respective microstructural feature and an adjacent valley; and a second layer comprising an adhesive material, and having a first and second opposed major surfaces, the adhesive material comprising a reaction product of a mixture comprising (meth)acrylate and epoxy in the presence of each other, wherein at least a portion of the second major surface of the second layer is directly attached to at least a portion of the first major microstructured surface of the first layer.
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公开(公告)号：US20240110084A1
公开(公告)日：2024-04-04
申请号：US18253964
申请日：2021-12-03
发明人： Uma Rames Krishna Lagudu , Benjamin R. Coonce , Morgan A. Priolo , William Blake Kolb , Eric W. Nelson
IPC分类号： C09J135/02 , B08B7/00 , C09J4/00 , C09J5/00
CPC分类号： C09J135/02 , B08B7/0014 , C09J4/00 , C09J5/00 , C09J2433/00 , H01L21/02096
摘要： The present disclosure provides laminates, which include adhesive materials and methods that allow for the removal of contaminants, e.g. particulate contaminants, from a substrate surface. In one embodiment, the laminates include (i) a substrate with contaminant disposed on its surface, (ii) a liquid, adhesive precursor and (iii) a film layer. The liquid, adhesive precursor is disposed between the substrate and the film layer. In another embodiment, the laminates include (i) a substrate with contaminant disposed on its surface, (ii) a cured adhesive layer and (iii) a film layer. The cured adhesive layer is disposed between the substrate and the film layer. The laminates may be used to remove contaminant from the substrate surface by removal of the film layer and the cured adhesive layer, which entraps the contaminant therein.
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10.发明授权公开(公告)号：US11904031B2
公开(公告)日：2024-02-20
申请号：US16754186
申请日：2018-11-20
发明人： Saswata Chakraborty , Benjamin C. MacMurray , Eric W. Nelson , Thomas P. Klun , Richard J. Pokorny , Wayne S. Mahoney , Chad M. Amb , George W. Griesgraber , Dana R. Reed , Ahmed S. Abuelyaman , Robert S. Clough , James D. Hansen , Daniel J. Skamser , Ian Dailey , John M. Riedesel
IPC分类号： A61K6/62 , A61C7/08 , A61C7/00 , A61K6/893 , C08L75/14 , B33Y70/00 , B33Y80/00 , B33Y10/00 , B29C64/124
CPC分类号： A61K6/62 , A61C7/002 , A61C7/08 , A61K6/893 , B29C64/124 , B33Y10/00 , B33Y70/00 , B33Y80/00 , C08L75/14
摘要： An orthodontic article is described comprising the reaction product of a free-radically polymerizable resin; a first free-radical photoinitiator having sufficient absorbance at a first wavelength range; and a second free-radical initiator selected from a second photoinitiator having sufficient absorbance at a second wavelength range, wherein the second wavelength range is different than the first wavelength range, or a thermal free-radical initiator. In some embodiments, the first free-radical photoinitiator exhibits a maximum absorbance at a wavelength of the range of 370-380 nm or 320-330 nm and/or comprises photoinitiator groups selected from acyl phosphine oxide or alkyl amine acetophenone. Also described are photopolymerizable compositions and methods.
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