摘要:
The invention relates to a process for reducing the defectivity of a block copolymer (BCP1) film, the lower surface of which is in contact with a preneutralized surface (N) of a substrate (S) and the upper surface of which is covered by an upper surface neutralization layer (TC) in order to make it possible to obtain an orientation of the nanodomains of the block copolymer (BCP1) perpendicularly to the two lower and upper interfaces, where the upper surface neutralization layer (TC) employed to cover the upper surface of the block copolymer (BCP1) film comprises a second block copolymer (BCP2).
摘要:
A process for preparing a nanostructured assembly by annealing a composition comprising a block copolymer on a surface. The block copolymer includes a first block resulting from the polymerization of at least one cyclic monomer having a structure as described herein. The block copolymer also includes a second block that includes a vinyl aromatic monomer.
摘要:
The invention relates to a process that enables the creation of nanometric structures by self-assembly of block copolymers, at least one of the blocks of which is crystallizable or has at least one liquid crystal phase.
摘要:
The invention relates to stable compositions of carbon nanotubes and of electrolytic polymers, these electrolytic polymers being characterized by the presence of phosphonyl imide or sulfonyl imide functions or alternatively phosphoric acid functions. The invention also relates to the manufacture of transparent electrodes comprising these compositions of carbon nanotubes and of electrolytic polymers.
摘要:
The present invention relates to a process for the perpendicular orientation of nanodomains of block copolymers on a substrate by using a sublayer of random or gradient copolymers whose monomers differ at least in part from those present, respectively, in each of the blocks of the block copolymer.
摘要:
The invention relates to a process for producing a film of self-assembled block copolymers on a substrate, said process consisting in carrying out a simultaneous deposition of block copolymer and of random copolymer by means of a solution containing a blend of block copolymer and of random copolymer of different chemical nature and which are immiscible, then in carrying out an annealing treatment allowing the promotion of the phase segregation inherent in the self-assembly of block copolymers.
摘要:
The invention relates to a process that enables the creation of nanometric structures by self-assembly of block copolymers, at least one of the blocks of which results from the polymerization of monomers comprising at least one cyclic entity corresponding to the formula I. where X═Si(R1,R2); Ge(R1,R2) Z═Si(R3,R4); Ge(R3,R4); O; S; C(R3,R4) Y═O; S; C(R5,R6) T=O; S; C(R7,R8) R1, R2, R3, R4, R5, R6, R7, R8 are selected from hydrogen, linear, branched or cyclic alkyl groups, with or without heteroatoms, and aromatic groups with or without heteroatoms.
摘要:
Some embodiments relate to an electrophoretic ink including particles that may have a negative charge, dispersed in a non-polar organic solvent. The ink includes a trialkylamine charge-control agent, selected from the following charge-control agents: tributylamine, triisobutylamine, tripentylamine, trihexylamine, tri(2-ethylhexyl)amine, trioctylamine, triisooctylamine, tridodecylamine, triisododecylamine. The particles have a hydrophobic surface and an isoelectric point (IEP) or a point of zero charge (PZC) that is lower than the pKa of the charge-control agent.