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公开(公告)号：US20180171134A1
公开(公告)日：2018-06-21
申请号：US15579112
申请日：2016-05-26
申请人： ARKEMA FRANCE , INSTITUT POLYTECHNIQUE DE BORDEAUX , UNIVERSITE DE BORDEAUX , CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)
CPC分类号： C08L53/005 , C08G2261/126 , C08G2261/136 , C08G2261/1426 , C08G2261/146 , C08L27/12 , C08L33/10 , C08L2203/16 , G01R33/46 , G03F7/0002
摘要： The invention relates to a process for reducing the defectivity of a block copolymer (BCP1) film, the lower surface of which is in contact with a preneutralized surface (N) of a substrate (S) and the upper surface of which is covered by an upper surface neutralization layer (TC) in order to make it possible to obtain an orientation of the nanodomains of the block copolymer (BCP1) perpendicularly to the two lower and upper interfaces, where the upper surface neutralization layer (TC) employed to cover the upper surface of the block copolymer (BCP1) film comprises a second block copolymer (BCP2).
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2.发明申请PROCESS THAT ENABLES THE CREATION OF NANOMETRIC STRUCTURES BY SELF-ASSEMBLY OF BLOCK COPOLYMERS 审中-公开使用嵌段共聚物自组装制备纳米结构的方法公开(公告)号：US20160333221A1
公开(公告)日：2016-11-17
申请号：US15103740
申请日：2014-12-11
申请人： CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) , UNIVERSITE DE BORDEAUX , INSTITUT POLYTECHNIQUE DE BORDEAUX , ARKEMA FRANCE
发明人： Muhammad MUMTAZ , Karim AISSOU , Cyril BROCHON , Eric CLOUTET , Guillaume FLEURY , Georges HADZIIOANNOU , Christophe NAVARRO , Celia NICOLET , Xavier CHEVALIER
IPC分类号： C09D183/00 , G03F7/00 , B81C1/00 , C08G77/00
CPC分类号： C09D183/00 , B81C1/00428 , B81C2201/0149 , B82Y40/00 , C08G77/00 , C09D153/00 , G03F7/0002
摘要： The invention relates to a process that enables the creation of nanometric structures by self-assembly of block copolymers, at least one of the blocks of which is crystallizable or has at least one liquid crystal phase.
摘要翻译： 本发明涉及一种能够通过嵌段共聚物的自组装形成纳米结构的方法，其中至少一个嵌段是可结晶的或具有至少一个液晶相。
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公开(公告)号：US20160319158A1
公开(公告)日：2016-11-03
申请号：US15103748
申请日：2014-12-10
申请人： ARKEMA FRANCE , UNIVERSITE DE BORDEAUX , INSTITUT POLYTECHNIQUE DE BORDEAUX , CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)
发明人： Guillaume FLEURY , Christophe NAVARRO , Georges HADZIIOANNOU , Celia NICOLET , Xavier CHEVALIER , Chrystilla REBOUL , Veronica CASTILLO , Gilles PECASTAINGS
IPC分类号： C09D187/00 , B05D3/06 , H01L21/027 , B01J31/06
CPC分类号： C09D187/005 , B01J31/06 , B05D3/06 , B81C1/00031 , B81C2201/0149 , C08F293/005 , C08F2438/02 , C08J9/26 , C09D153/00 , G03F7/0002 , H01L21/0271
摘要： The invention relates to a process for producing a film of self-assembled block copolymers on a substrate, said process consisting in carrying out a simultaneous deposition of block copolymer and of random copolymer by means of a solution containing a blend of block copolymer and of random copolymer of different chemical nature and which are immiscible, then in carrying out an annealing treatment allowing the promotion of the phase segregation inherent in the self-assembly of block copolymers.
摘要翻译： 本发明涉及在基材上制备自组装嵌段共聚物的膜的方法，所述方法包括通过含有嵌段共聚物和随机的共混物的溶液同时沉积嵌段共聚物和无规共聚物 共聚物，其不同的化学性质并且不混溶，然后进行退火处理，允许促进嵌段共聚物的自组装固有的相分离。
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4.发明申请PROCESS THAT ENABLES THE CREATION OF NANOMETRIC STRUCTURES BY SELF-ASSEMBLY OF BLOCK COPOLYMERS 审中-公开使用嵌段共聚物自组装制备纳米结构的方法公开(公告)号：US20160333216A1
公开(公告)日：2016-11-17
申请号：US15103736
申请日：2014-12-11
申请人： ARKEMA FRANCE , CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE , INSTITUT POLYTECHNIQUE DE BORDEAUX , UNIVERSITE DE BORDEAUX
发明人： Muhammad MUMTAZ , Karim AISSOU , Cyril BROCHON , Eric CLOUTET , Guillaume FLEURY , Georges HADZIIOANNOU , Christophe NAVARRO , Celia NICOLET , Xavier CHEVALIER
IPC分类号： C09D153/00 , B05D1/28 , B05D1/00
CPC分类号： C09D153/00 , B05D1/005 , B05D1/28 , B81C1/00031 , B81C2201/0149 , B82Y40/00 , C08G77/60 , G03F7/0002 , H01L21/0271 , Y10S977/892
摘要： The invention relates to a process that enables the creation of nanometric structures by self-assembly of block copolymers, at least one of the blocks of which results from the polymerization of monomers comprising at least one cyclic entity corresponding to the formula I. where X═Si(R1,R2); Ge(R1,R2) Z═Si(R3,R4); Ge(R3,R4); O; S; C(R3,R4) Y═O; S; C(R5,R6) T=O; S; C(R7,R8) R1, R2, R3, R4, R5, R6, R7, R8 are selected from hydrogen, linear, branched or cyclic alkyl groups, with or without heteroatoms, and aromatic groups with or without heteroatoms.
摘要翻译： R 1，R 2，R 3，R 4，R 5，R 6，R 7，R 8选自具有或不具有杂原子的氢，直链，支链或环状烷基，以及具有或不具有杂原子的芳族基团。
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5.发明申请公开(公告)号：US20180173094A1
公开(公告)日：2018-06-21
申请号：US15579063
申请日：2016-05-26
申请人： ARKEMA FRANCE , CENTER NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) , INSTITUT POLYTECHNIQUE DE BORDEAUX , UNIVERSITE DE BORDEAUX
CPC分类号： G03F7/0002 , G03F7/168 , G03F7/2002
摘要： The invention relates to a process for controlling the surface energy at the upper interface of a block copolymer (BCP1), the lower interface of which is in contact with a preneutralized surface of a substrate, in order to make it possible to obtain an orientation of the nanodomains of the block copolymer (BCP1) perpendicularly to the two lower and upper interfaces, the said process consisting in covering the upper surface of the block copolymer (BCP1) with an upper surface neutralization layer (TC) and being characterized in that the said upper surface neutralization layer (TC) comprises a second block copolymer (BCP2).
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6.发明申请公开(公告)号：US20150328661A1
公开(公告)日：2015-11-19
申请号：US14809722
申请日：2015-07-27
发明人： Christophe NAVARRO , Xavier CHEVALIER , Celia NICOLET , Ilias ILIOPOULOS , Raluca TIRON , Guillaume FLEURY , Georges HADZllOANNOU
CPC分类号： B05D3/046 , B05D1/005 , B05D3/0254 , C08F293/005 , C08F2438/02 , C08J5/18 , C08J2353/00 , C08L53/00 , C08L2205/025 , C08L2205/03 , C09D153/00 , G03F1/50 , G03F1/68 , G03F7/0002
摘要： The present invention relates to a process for producing nanostructured films obtained from block copolymers exhibiting a dispersity index of between 1.1 and 2, limits included, without nanostructuring defects, on a surface, in order for this treated surface to be able to be used as masks for applications in microelectronics.
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7.发明申请公开(公告)号：US20180203348A1
公开(公告)日：2018-07-19
申请号：US15545068
申请日：2016-01-21
申请人： ARKEMA FRANCE
CPC分类号： G03F7/0002 , B05D1/005 , B05D3/0254 , C08L53/00 , C08L2205/02 , C09D153/00 , G03F1/68 , G03F7/162 , G03F7/168
摘要： The present invention relates to a process for controlling the critical dimension uniformity of ordered films of block copolymers on a nanometric scale. The invention also relates to the compositions used for controlling the critical dimension uniformity of ordered films of block copolymers and to the resulting ordered films that can be used in particular as masks in the lithography field.
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8.发明申请公开(公告)号：US20170307973A1
公开(公告)日：2017-10-26
申请号：US15510204
申请日：2015-09-09
申请人： Arkema France
IPC分类号： G03F7/00 , C09D153/00 , C09D125/14 , G03F1/50 , B05D3/00
CPC分类号： G03F7/0002 , B05D3/002 , C09D125/14 , C09D153/00 , G03F1/50
摘要： The present invention relates to a method for controlling the level of defects in films obtained using a composition comprising a blend of block copolymers and polymers deposited on a surface. The polymers comprise at least one monomer identical to those present in one or other block of the block copolymers.
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公开(公告)号：US20170145250A1
公开(公告)日：2017-05-25
申请号：US15317803
申请日：2015-06-01
申请人： Arkema France
IPC分类号： C09D153/00 , G03F7/00 , B05D1/00 , C08F297/02
CPC分类号： C09D153/00 , B05D1/005 , B82Y30/00 , B82Y40/00 , C08F297/026 , C08J5/18 , C08J2325/08 , C08J2333/08 , C08L53/00 , G03F7/0002
摘要： The invention relates to a block copolymer film nanostructured into nanodomains, obtained from a base block copolymer having a molecular weight of greater than 50 kg/mol, and preferably greater than 100 kg/mol and less than 250 kg/mol, and at least one block of which comprises styrene, and at least one other block of which comprises methyl methacrylate. This film is characterized in that the styrene-based block is formed by a copolymer of styrene and diphenylethylene (DPE).
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10.发明申请PROCESS FOR CONTROLLING THE PERIOD CHARACTERIZING THE MORPHOLOGY OBTAINED FROM A BLEND OF BLOCK COPOLYMERS AND OF CO(POLYMERS) OF ONE OF THE BLOCKS 有权控制块状共聚物和块体之一的CO（聚合物）混合物获得的形态的期间的方法公开(公告)号：US20150030971A1
公开(公告)日：2015-01-29
申请号：US14340075
申请日：2014-07-24
申请人： Arkema France
CPC分类号： B05D3/046 , B05D3/0254 , B05D3/0493 , C08F2/001 , C08F297/026 , C09D153/00 , G03F1/68 , G03F7/00 , G03F7/0002 , C08L25/06
摘要： The present invention relates to a process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of (co)polymers of one of the blocks on a surface employing a particular way of carrying out the synthesis of the blend of block copolymers and of (co)polymers of one of the blocks.
摘要翻译： 本发明涉及一种用于控制表面形貌的时期的方法，其特征在于使用嵌段共聚物的共混物和表面上的一个嵌段的（共））聚合物，其特征在于使用特定的方式进行嵌段共聚物的共混物 和其中一个嵌段的（共）聚合物。
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