公开(公告)号：US5932940A

公开(公告)日：1999-08-03

申请号：US749454

申请日：1996-11-15

申请人： Alan H. Epstein ,  Stephen D. Senturia ,  Ian A. Waitz ,  Jeffrey H. Lang ,  Stuart A. Jacobson ,  Fredric F. Ehrich ,  Martin A. Schmidt ,  G. K. Ananthasuresh ,  Mark S. Spearing ,  Kenneth S. Breuer ,  Steven F. Nagle

发明人： Alan H. Epstein ,  Stephen D. Senturia ,  Ian A. Waitz ,  Jeffrey H. Lang ,  Stuart A. Jacobson ,  Fredric F. Ehrich ,  Martin A. Schmidt ,  G. K. Ananthasuresh ,  Mark S. Spearing ,  Kenneth S. Breuer ,  Steven F. Nagle

IPC分类号： F01D5/28 ,  F01D15/06 ,  F01D25/20 ,  F01K13/00 ,  F02C3/05 ,  F02K9/48 ,  F23R3/42 ,  H01L29/84 ,  F02C3/04 ,  H02K29/00

CPC分类号： F23R3/42 ,  F01D15/06 ,  F01D25/20 ,  F01D5/28 ,  F01K13/00 ,  F02C3/05 ,  F02K9/48 ,  F05D2220/50 ,  F05D2230/14 ,  F05D2250/82 ,  F05D2250/84 ,  F05D2300/2261 ,  F05D2300/2283 ,  F05D2300/607 ,  F23C2900/03001

摘要： The invention provides a micro-gas turbine engine and associated microcomponentry. The engine components, including, e.g., a compressor, a diffuser having diffuser vanes, a combustion chamber, turbine guide vanes, and a turbine are each manufactured by, e.g., microfabrication techniques, of a structural material common to all of the elements, e.g., a microelectronic material such as silicon or silicon carbide. Vapor deposition techniques, as well as bulk wafer etching techniques, can be employed to produce the engine. The engine includes a rotor having a shaft with a substantially untapered compressor disk on a first end, defining a centrifugal compressor, and a substantially untapered turbine disk on the opposite end, defining a radial inflow turbine. The rotor is preferably formed of a material characterized by a strength-to-density ratio that enables a rotor speed of at least about 500,000 rotations per minute. An annular, axial-flow combustion chamber is provided that is located axially between the compressor and turbine disks and that has a ratio of annular height to axial length of at least about 0.5. The micro-gas turbine engine can be configured with an integral microgenerator as a source of electrical power, and can be employed for a wide range of power, propulsion, and thermodynamic cycle applications.

摘要翻译： 本发明提供了一种微型燃气涡轮发动机和相关的微型部件。 包括例如压缩机，具有扩散器叶片的扩散器，燃烧室，涡轮引导叶片和涡轮机的发动机部件各自通过例如微细加工技术制造所有元件共有的结构材料，例如 ，微电子材料如硅或碳化硅。 可以采用气相沉积技术以及体晶片蚀刻技术来生产发动机。 发动机包括具有轴的转子，该轴具有在第一端上具有基本上未经紧固的压缩机盘，限定离心式压缩机，以及在相对端上限定径向流入涡轮机的基本上未配套的涡轮盘。 转子优选由特征在于强度与密度之比的材料形成，其能够使转子速度为每分钟至少约50万转。 提供了一种环形的轴向流动燃烧室，其轴向位于压缩机和涡轮盘之间，并且具有至少约0.5的环形高度与轴向长度的比率。 微型燃气涡轮发动机可以配置有作为电力源的整体微型发电机，并且可以用于广泛的功率，推进和热力循环应用。

公开(公告)号：US06392313B1

公开(公告)日：2002-05-21

申请号：US09354544

申请日：1999-07-15

申请人： Alan H. Epstein ,  Stephen D. Senturia ,  Ian A. Waitz ,  Jeffrey H. Lang ,  Stuart A. Jacobson ,  Fredric F. Ehrich ,  Martin A. Schmidt ,  G. K. Ananthasuresh ,  Mark S. Spearing ,  Kenneth S. Breuer ,  Steven F. Nagle

发明人： Alan H. Epstein ,  Stephen D. Senturia ,  Ian A. Waitz ,  Jeffrey H. Lang ,  Stuart A. Jacobson ,  Fredric F. Ehrich ,  Martin A. Schmidt ,  G. K. Ananthasuresh ,  Mark S. Spearing ,  Kenneth S. Breuer ,  Steven F. Nagle

IPC分类号： H01L2984

CPC分类号： F23R3/42 ,  F01D5/28 ,  F01D15/06 ,  F01D25/20 ,  F01K13/00 ,  F02C3/05 ,  F02K9/48 ,  F05D2220/50 ,  F05D2230/14 ,  F05D2250/82 ,  F05D2250/84 ,  F05D2300/2261 ,  F05D2300/2283 ,  F05D2300/607 ,  F23C2900/03001

摘要： The invention overcomes limitations of conventional power and thermodynamic sources by with micromachinery components that enable production of significant power and efficient operation of thermodynamic systems in the millimeter and micron regime to meet the efficiency, mobility, modularity, weight, and cost requirements of many modern applications. A micromachine of the invention has a rotor disk journalled for rotation in a stationary structure by a journal bearing. A plurality of radial flow rotor blades, substantially untapered in height, are disposed on a first rotor disk face, and an electrically conducting region is disposed on a rotor disk face. A plurality of stator electrodes that are electrically interconnected to define multiple electrical stator phases are disposed on a wall of the stationary structure located opposite the electrically conducting region of the rotor disk. A first orifice in the stationary structure provides fluidic communication with the first rotor disk face at a location radially central of the rotor blades, and a second orifice in the stationary structure provides fluidic communication with the first rotor disk face at a location radially peripheral of the rotor blades. An electrical connection to the stator electrode configuration is provided for stator electrode excitation and for power transfer with the stator electrode configuration as the rotor disk rotates.

摘要翻译： 本发明克服了常规功率和热力学源的限制，其中微机械组件能够在毫米和微米范围内产生显着功率和热力系统的有效运行，以满足许多现代应用的效率，移动性，模块化，重量和成本要求 。 本发明的微型机械具有转轴，该转子盘通过轴颈轴承在静止结构中旋转。 基本上没有高度的多个径流式转子叶片设置在第一转子盘面上，导电区域设置在转子盘面上。 电气互连以限定多个电定子相的多个定子电极设置在固定结构的与转子盘的导电区域相对的位置的壁上。 固定结构中的第一孔口在转子叶片的径向中心的位置处提供与第一转子盘面的流体连通，并且固定结构中的第二孔口在第一转子盘面的径向周边的位置处提供与第一转子盘面的流体连通 转子叶片。 提供与定子电极配置的电连接用于定子电极激励和用于当转子盘旋转时具有定子电极配置的功率传递。

公开(公告)号：US06768756B2

公开(公告)日：2004-07-27

申请号：US09804618

申请日：2001-03-12

申请人： Dale C. Flanders ,  Steven F. Nagle ,  Margaret B. Stern

发明人： Dale C. Flanders ,  Steven F. Nagle ,  Margaret B. Stern

IPC分类号： H01S313

CPC分类号： G02B26/001 ,  G02B5/1828 ,  G02B26/02 ,  G02B26/0833 ,  G02B26/0875

摘要： An optical membrane device and method for making such a device are described. This membrane is notable in that it comprises an optically curved surface. In some embodiments, this curved optical surface is optically concave and coated, for example, with a highly reflecting (HR) coating to create a curved mirror. In other embodiments, the optical surface is optically convex and coated with, preferably, an antireflective (AR) coating to function as a refractive or diffractive lens.

摘要翻译： 对光学膜装置及其制造方法进行说明。 该膜是显着的，因为它包括光学曲面。 在一些实施例中，该弯曲的光学表面是光学凹入的并且例如用高反射（HR）涂层涂覆以形成弯曲的镜。 在其它实施例中，光学表面是光学凸起的并且涂覆有优选抗反射（AR）涂层，用作折射或衍射透镜。

公开(公告)号：US07770231B2

公开(公告)日：2010-08-03

申请号：US11832881

申请日：2007-08-02

申请人： Craig Prater ,  Chanmin Su ,  Nghi Phan ,  Jeffrey M. Markakis ,  Craig Cusworth ,  Jian Shi ,  Johannes H. Kindt ,  Steven F. Nagle ,  Wenjun Fan

发明人： Craig Prater ,  Chanmin Su ,  Nghi Phan ,  Jeffrey M. Markakis ,  Craig Cusworth ,  Jian Shi ,  Johannes H. Kindt ,  Steven F. Nagle ,  Wenjun Fan

IPC分类号： G01N23/00

CPC分类号： G01Q10/04 ,  G01Q10/065 ,  G01Q20/02 ,  G01Q60/38

摘要： A method and apparatus are provided that have the capability of rapidly scanning a large sample of arbitrary characteristics under force control feedback so has to obtain a high resolution image. The method includes generating relative scanning movement between a probe of the SPM and a sample to scan the probe through a scan range of at least 4 microns at a rate of at least 30 lines/sec and controlling probe-sample interaction with a force control slew rate of at least 1 mm/sec. A preferred SPM capable of achieving these results has a force controller having a force control bandwidth of at least closed loop bandwidth of at least 10 kHz.

摘要翻译： 提供一种具有在力控制反馈下快速扫描任意特征的大样本的能力的方法和装置，因此必须获得高分辨率图像。 该方法包括在SPM的探针和样品之间产生相对扫描运动，以至少以30线/秒的速率扫描探针至少4微米的扫描范围，并且控制与力控制回转的探针 - 样品相互作用 速率至少为1毫米/秒。 能够实现这些结果的优选SPM具有力控制器，其具有至少10kHz的至少闭环带宽的力控制带宽。

公开(公告)号：US07823216B2

公开(公告)日：2010-10-26

申请号：US11833104

申请日：2007-08-02

申请人： Wenjun Fan ,  Steven F. Nagle

发明人： Wenjun Fan ,  Steven F. Nagle

IPC分类号： G01Q70/16

CPC分类号： G01Q60/38

摘要： A method of producing a probe device for a metrology instrument such as an AFM includes providing a substrate having front and back surfaces and then forming an array of tip height structures on the first surface of the substrate, the structures having varying depths corresponding to selectable tip heights. The back surface of the substrate is etched until a thickness of the substrate substantially corresponds to a selected tip height, preferably by monitoring this etch visually and/or monitoring the etch rate. The tips are patterned from the front side of the wafer relative to fixed ends of the cantilevers, and then etched using an anisotropic etch. As a result, probe devices having sharp tips and short cantilevers exhibit fundamental resonant frequencies greater than 700 kHz or more.

摘要翻译： 制造诸如AFM的计量仪器的探针装置的方法包括提供具有前表面和后表面的基底，然后在基底的第一表面上形成尖端高度结构阵列，所述结构具有对应于可选尖端的不同深度 高度。 蚀刻衬底的背面，直到衬底的厚度基本上对应于所选择的尖端高度，优选通过视觉监测该蚀刻和/或监测蚀刻速率。 从晶片的前侧相对于悬臂的固定端图案化尖端，然后使用各向异性蚀刻进行蚀刻。 结果，具有尖尖和短悬臂的探针装置表现出大于700kHz或更高的基本谐振频率。

公开(公告)号：US07208333B2

公开(公告)日：2007-04-24

申请号：US10840814

申请日：2004-05-08

申请人： Dale C. Flanders ,  Steven F. Nagle ,  Margaret B. Stern

发明人： Dale C. Flanders ,  Steven F. Nagle ,  Margaret B. Stern

IPC分类号： H01L21/00

CPC分类号： G02B26/001 ,  G02B5/1828 ,  G02B26/02 ,  G02B26/0833 ,  G02B26/0875

摘要： An optical membrane device and method for making such a device are described. This membrane is notable in that it comprises an optically curved surface. In some embodiments, this curved optical surface is optically concave and coated, for example, with a highly reflecting (HR) coating to create a curved mirror. In other embodiments, the optical surface is optically convex and coated with, preferably, an antireflective (AR) coating to function as a refractive or diffractive lens.

摘要翻译： 对光学膜装置及其制造方法进行说明。 该膜是显着的，因为它包括光学曲面。 在一些实施例中，该弯曲的光学表面是光学凹入的并且例如用高反射（HR）涂层涂覆以形成弯曲的镜。 在其它实施例中，光学表面是光学凸起的并且涂覆有优选抗反射（AR）涂层，用作折射或衍射透镜。

公开(公告)号：US20090031792A1

公开(公告)日：2009-02-05

申请号：US11833104

申请日：2007-08-02

申请人： Wenjun Fan ,  Steven F. Nagle

发明人： Wenjun Fan ,  Steven F. Nagle

IPC分类号： G01B5/28

CPC分类号： G01Q60/38

摘要： A method of producing a probe device for a metrology instrument such as an AFM includes providing a substrate having front and back surfaces and then forming an array of tip height structures on the first surface of the substrate, the structures having varying depths corresponding to selectable tip heights. The back surface of the substrate is etched until a thickness of the substrate substantially corresponds to a selected tip height, preferably by monitoring this etch visually and/or monitoring the etch rate. The tips are patterned from the front side of the wafer relative to fixed ends of the cantilevers, and then etched using an anisotropic etch. As a result, probe devices having sharp tips and short cantilevers exhibit fundamental resonant frequencies greater than 700 kHz or more.

摘要翻译： 制造诸如AFM的计量仪器的探针装置的方法包括提供具有前表面和后表面的基底，然后在基底的第一表面上形成尖端高度结构阵列，所述结构具有对应于可选尖端的不同深度 高度。 蚀刻衬底的背面，直到衬底的厚度基本上对应于所选择的尖端高度，优选通过视觉监测该蚀刻和/或监测蚀刻速率。 从晶片的前侧相对于悬臂的固定端图案化尖端，然后使用各向异性蚀刻进行蚀刻。 结果，具有尖尖和短悬臂的探针装置表现出大于700kHz或更高的基本谐振频率。

公开(公告)号：US06643075B2

公开(公告)日：2003-11-04

申请号：US09878800

申请日：2001-06-11

申请人： Xiaomei Wang ,  Peter S. Whitney ,  Steven F. Nagle ,  Dale C. Flanders

发明人： Xiaomei Wang ,  Peter S. Whitney ,  Steven F. Nagle ,  Dale C. Flanders

IPC分类号： G02B702

CPC分类号： G02B6/423

摘要： An optical system assembly technique utilizes a templating system for locating optical components 200 on optical benches 150. Specifically, the template system comprises a template substrate 102 that is placed over the optical bench. The substrate 102 has at least one alignment slot 104 that is formed through the substrate. This alignment slot 104 has an alignment feature 120, against which an optical component 200 is registered. In order to improve the accuracy of the alignment of the optical component on the optical bench, the slot 104 has a reentrant, such as a smooth or step, sidewall 106 extending from the alignment feature 120 into the template substrate 102. This way, there is a single point or near single point of contact between the optical component 200 and the template 102, to thereby improve the placement precision for the optical component on the optical bench 150.

公开(公告)号：US20090032706A1

公开(公告)日：2009-02-05

申请号：US11832881

申请日：2007-08-02

申请人： Craig Prater ,  Chanmin Su ,  Nghi Phan ,  Jeffrey M. Markakis ,  Craig Cusworth ,  Jian Shi ,  Johannes H. Kindt ,  Steven F. Nagle ,  Wenjun Fan

发明人： Craig Prater ,  Chanmin Su ,  Nghi Phan ,  Jeffrey M. Markakis ,  Craig Cusworth ,  Jian Shi ,  Johannes H. Kindt ,  Steven F. Nagle ,  Wenjun Fan

IPC分类号： G01N23/00

CPC分类号： G01Q10/04 ,  G01Q10/065 ,  G01Q20/02 ,  G01Q60/38

摘要： A method and apparatus are provided that have the capability of rapidly scanning a large sample of arbitrary characteristics under force control feedback so has to obtain a high resolution image. The method includes generating relative scanning movement between a probe of the SPM and a sample to scan the probe through a scan range of at least 4 microns at a rate of at least 30 lines/sec and controlling probe-sample interaction with a force control slew rate of at least 1 mm/sec. A preferred SPM capable of achieving these results has a force controller having a force control bandwidth of at least closed loop bandwidth of at least 10 kHz.

摘要翻译： 提供一种具有在力控制反馈下快速扫描任意特征的大样本的能力的方法和装置，因此必须获得高分辨率图像。 该方法包括在SPM的探针和样品之间产生相对扫描运动，以至少以30线/秒的速率扫描探针至少4微米的扫描范围，并且控制与力控制回转的探针 - 样品相互作用 速率至少为1毫米/秒。 能够实现这些结果的优选SPM具有力控制器，其具有至少10kHz的至少闭环带宽的力控制带宽。

公开(公告)号：US06790698B2

公开(公告)日：2004-09-14

申请号：US09954861

申请日：2001-09-18

申请人： Michael F. Miller ,  Minh Van Le ,  Christopher C. Cook ,  Dale C. Flanders ,  Steven F. Nagle

发明人： Michael F. Miller ,  Minh Van Le ,  Christopher C. Cook ,  Dale C. Flanders ,  Steven F. Nagle

IPC分类号： H01L2100

CPC分类号： B81B3/0083 ,  B81B2201/042 ,  B81B2201/047 ,  B81C1/0038 ,  B81C2201/0159 ,  B81C2201/053 ,  B81C2201/056 ,  G02B26/001

摘要： A process for patterning dielectric layers of the type typically found in optical coatings in the context of MEMS manufacturing is disclosed. A dielectric coating is deposited over a device layer, which has or will be released, and patterned using a mask layer. In one example, the coating is etched using the mask layer as a protection layer. In another example, a lift-off process is shown. The primary advantage of photolithographic patterning of the dielectric layers in optical MEMS devices is that higher levels of consistency can be achieved in fabrication, such as size, location, and residual material stress. Competing techniques such as shadow masking yield lower quality features and are difficult to align. Further, the minimum feature size that can be obtained with shadow masks is limited to ˜100 &mgr;m, depending on the coating system geometry, and they require hard contact with the surface of the wafer, which can lead to damage and/or particulate contamination.

摘要翻译： 公开了一种用于在MEMS制造的上下文中通常在光学涂层中发现的类型的介电层图案的工艺。 电介质涂层沉积在器件层上，器件层已经或将被释放，并使用掩模层进行图案化。 在一个实例中，使用掩模层作为保护层来蚀刻涂层。 在另一示例中，示出了剥离过程。 光学MEMS器件中电介质层的光刻图案的主要优点是可以在诸如尺寸，位置和残余材料应力的制造中实现更高水平的稠度。 诸如阴影掩蔽的竞争技术产生较低的质量特征并且难以对准。 此外，根据涂层系统的几何形状，使用荫罩可获得的最小特征尺寸限制在〜100μm，并且它们需要与晶片的表面硬接触，这可能导致损坏和/或微粒污染。