Film-type heating element
    4.
    发明授权

    公开(公告)号:US10237919B2

    公开(公告)日:2019-03-19

    申请号:US14124414

    申请日:2012-05-31

    摘要: The invention relates to a heating element comprising a substrate (1) equipped with a thin-film multilayer, the thin-film multilayer comprising a film (3) suited to being heated, this film having a sheet resistance of between 20 and 200 Ω/square, the heating element also comprising two conductive collectors suited to being fed with electrical voltage, the film suited to being heated being a transparent electrically conductive oxide film and the film (3) suited to being heated not being machined and being electrically connected to the two conductive collectors, the film (3) suited to being heated having a thickness of between 50 nm and 300 nm.The invention allows a heating element, with a film suited to being heated that is simple to manufacture, to be easily installed in an electric vehicle or easily connected to the national grid.

    Method for manufacturing a mask having submillimetric apertures for a submillimetric electrically conductive grid, and mask and submillimetric electrically conductive grid
    5.
    发明授权
    Method for manufacturing a mask having submillimetric apertures for a submillimetric electrically conductive grid, and mask and submillimetric electrically conductive grid 失效
    用于制造具有亚毫米级导电栅格的亚毫米孔的掩模的方法,以及掩模和亚毫米级导电栅格

    公开(公告)号:US08697186B2

    公开(公告)日:2014-04-15

    申请号:US13120292

    申请日:2009-09-24

    IPC分类号: B05D5/00

    摘要: A process for manufacturing a mask having submillimetric openings, in which: for a masking layer, a first solution of colloidal nanoparticles in a first solvent is deposited, the particles having a given glass transition temperature Tg, the drying of the masking layer, known as the first masking layer, is carried out at a temperature below said temperature Tg until a mask having a two-dimensional network of substantially straight-edged submillimetric openings, that defines a mask zone known as a network mask zone is obtained, a solid mask zone is formed by a liquid deposition, on the face, of a second masking zone, the solid mask zone being adjacent to and in contact with the network mask zone, and/or at least one cover zone is formed, the cover zone being in contact with the network mask zone, and/or after the drying of the first masking layer, a filled mask zone is formed by filling, via a liquid route, openings of a portion of the network mask zone. The invention also relates to the mask and the electroconductive grid obtained.

    摘要翻译: 一种用于制造具有亚毫米开口的掩模的方法,其中:对于掩模层沉积胶体纳米颗粒在第一溶剂中的第一溶液沉积,所述颗粒具有给定的玻璃化转变温度Tg,掩蔽层的干燥,称为 第一掩蔽层在低于所述温度Tg的温度下进行,直到获得限定了称为网络掩模区的掩模区的具有基本上直边的亚毫米开口的二维网络的掩模,固体掩模区 通过在第二掩蔽区域的表面上的液体沉积形成,固体掩模区域与网络掩模区域相邻并且与网络掩模区域接触,和/或形成至少一个覆盖区域,覆盖区域接触 和/或在第一掩蔽层的干燥之后,经由液体路径填充网络掩模区的一部分的开口形成填充的掩模区。 本发明还涉及所获得的掩模和导电栅格。