摘要:
A material is applied to a part. The part is placed in a deposition chamber and a first electric potential is applied to the part. Components are evaporated for forming the material. The evaporated components are ionized. The first electric potential is modulated so as to draw the ionized component to the part. The modulation comprises a plurality of first steps for PA-PVD. Each of the first steps comprises a series of pulses of negative potential. The modulation further comprises a plurality of second steps for PVD alternating with the first steps.
摘要:
An apparatus for applying a coating to a substrate comprises a deposition chamber. A crucible may hold a melt pool of coating material. The melt pool is rotated during deposition.
摘要:
A ceramic material is applied to a part. The part is placed in a deposition chamber and a first electric potential is applied to the part. Components are evaporated for forming the material. The evaporated components are ionized. The first electric potential is modulated so as to draw the ionized component to the part. The modulation comprises maintaining at least an ion current density in a range of 2-1000 mA/cm2.
摘要翻译:将陶瓷材料施加到部件上。 该部件被放置在沉积室中,并且第一电位被施加到该部件上。 蒸发组分以形成材料。 蒸发的组分被电离。 调制第一电位以将电离成分吸引到该部分。 该调制包括将至少离子电流密度保持在2-1000mA / cm 2的范围内。
摘要:
A coated part is exposed to a gas flow. The gas flow has a characteristic gas flow direction distribution over a surface of the coated part. The coated part has a substrate having a substrate surface and a coating over the substrate surface. The coating comprises at least one coating layer. A first such layer is columnar and has a column boundary direction distribution. The column boundary direction distribution is selected for partial local alignment with the gas flow direction distribution.
摘要:
A material is applied to a part. The part is placed in a deposition chamber and a first electric potential is applied to the part. Components are evaporated for forming the material. The evaporated components are ionized. The first electric potential is modulated so as to draw the ionized component to the part. The modulation comprises a plurality of first steps for PA-PVD. Each of the first steps comprises a series of pulses of negative potential. The modulation further comprises a plurality of second steps for PVD alternating with the first steps.
摘要:
A ceramic material is applied to a part. The part is placed in a deposition chamber and a first electric potential is applied to the part. Components are evaporated for forming the material. The evaporated components are ionized. The first electric potential is modulated so as to draw the ionized component to the part. The modulation comprises maintaining at least an ion current density in a range of 2-1000 mA/cm2.
摘要翻译:将陶瓷材料施加到部件上。 该部件被放置在沉积室中,并且第一电位被施加到该部件上。 蒸发组分以形成材料。 蒸发的组分被电离。 调制第一电位以将电离成分吸引到该部分。 该调制包括将至少离子电流密度保持在2-1000mA / cm 2的范围内。
摘要:
A deposition apparatus includes a deposition chamber and a deposition material source. An electron beam source is positioned to direct a first electron beam to vaporize a portion of the deposition material. A first electrode is provided for generating a primary plasma from the deposition material source. A second electrode is provided for generating a secondary plasma and further accelerating ions from the primary plasma. A bias electric potential is applied to the workpiece to draw ions from the secondary plasma to the workpiece. A control system may be coupled to the electron beam source, the bias voltage source, and power supplies for the first and second electrodes.
摘要:
A coated part is exposed to a gas flow. The gas flow has a characteristic gas flow direction distribution over a surface of the coated part. The coated part has a substrate having a substrate surface and a coating over the substrate surface. The coating comprises at least one coating layer. A first such layer is columnar and has a column boundary direction distribution. The column boundary direction distribution is selected for partial local alignment with the gas flow direction distribution.
摘要:
The disclosure provides an apparatus for depositing a coating on one or more parts (21). The apparatus has: a chamber (22); a part holder (64) for carrying the part(s); a bias voltage source (94) coupled to the part(s) to apply a bias voltage to the part(s); a source (34) of the coating material; a plurality of temperature sensors (76); and a plurality of leads (90) passing outputs of the temperature sensors out from the chamber. A temperature monitoring system (150) has a temperature data processor (300). At least one fiber optic link (223) couples the temperature data processor to the temperature sensors so as to electrically isolate the temperature data processor from the bias voltage.
摘要:
A process for adjusting a feed rate in an electron-beam physical vapor deposition apparatus includes the steps of positioning a target at a first height within a chamber of an electron-beam physical vapor deposition apparatus; feeding the target at a rate into a beam of electrons generated by an electron gun of the electron-beam physical vapor deposition apparatus; evaporating the target with the beam of electrons; monitoring the first height by measuring a difference between a first light intensity and a second light intensity of at least one image of the target using an optical sensor disposed proximate to the chamber; determining a change in the first height; and adjusting a target feed rate.