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    Electron cyclotron resonance equipment with variable flare angle of horn antenna
    3.
    发明授权
    Electron cyclotron resonance equipment with variable flare angle of horn antenna 失效
    具有喇叭天线可变喇叭角的电子回旋共振设备

    公开(公告)号：US07410552B2

    公开(公告)日：2008-08-12

    申请号：US11007878

    申请日：2004-12-09

    申请人： Ji-Hyun Hur ,  Jai-Kwang Shin ,  Jae-Joon Oh

    发明人： Ji-Hyun Hur ,  Jai-Kwang Shin ,  Jae-Joon Oh

    IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306

    CPC分类号： H01J37/3222 ,  H01J37/32192 ,  H01J37/32678

    摘要： An electron cyclotron resonance equipment generates plasma by application of a processing gas and microwave energy into a vacuum chamber having a wafer therein in an environment of reduced pressure. The equipment includes a horn antenna assembly mounted onto an uppermost end of the vacuum chamber for radiating the microwave energy supplied from a high-frequency generator into the vacuum chamber. The horn antenna enables extension and retraction in a lengthwise direction to change a flare angle of the horn antenna. The equipment is provided with a fixed antenna and a plurality of mobile antennas to configure a horn antenna assembly, thereby enabling control of the flare angle in the horn antenna as a result of displacement of the mobile antennas. Thus, the uniformity in radiation of the microwave energy within plasma chamber can be controlled with efficiency.

    摘要翻译： 电子回旋共振设备通过在减压环境中将处理气体和微波能量施加到其中具有晶片的真空室中来产生等离子体。 该设备包括安装在真空室的最上端的喇叭天线组件，用于将从高频发生器提供的微波能量辐射到真空室中。 喇叭天线能够在长度方向上伸长和缩回以改变喇叭天线的喇叭角。 该设备设置有固定天线和多个移动天线以配置喇叭天线组件，从而由于移动天线的位移而能够控制喇叭天线中的喇叭角。 因此，能够有效地控制等离子体室内的微波能量的辐射的均匀性。

    Electron cyclotron resonance equipment with variable flare angle of horn antenna
    4.
    发明申请
    Electron cyclotron resonance equipment with variable flare angle of horn antenna 失效
    具有喇叭天线可变喇叭角的电子回旋共振设备

    公开(公告)号：US20050160986A1

    公开(公告)日：2005-07-28

    申请号：US11007878

    申请日：2004-12-09

    申请人： Ji-Hyun Hur ,  Jai-Kwang Shin ,  Jae-Joon Oh

    发明人： Ji-Hyun Hur ,  Jai-Kwang Shin ,  Jae-Joon Oh

    IPC分类号： H01L21/3065 ,  C23C16/00 ,  H01J37/32

    CPC分类号： H01J37/3222 ,  H01J37/32192 ,  H01J37/32678

    摘要： An electron cyclotron resonance equipment generates plasma by application of a processing gas and microwave energy into a vacuum chamber having a wafer therein in an environment of reduced pressure. The equipment includes a horn antenna assembly mounted onto an uppermost end of the vacuum chamber for radiating the microwave energy supplied from a high-frequency generator into the vacuum chamber. The horn antenna enables extension and retraction in a lengthwise direction to change a flare angle of the horn antenna. The equipment is provided with a fixed antenna and a plurality of mobile antennas to configure a horn antenna assembly, thereby enabling control of the flare angle in the horn antenna as a result of displacement of the mobile antennas. Thus, the uniformity in radiation of the microwave energy within plasma chamber can be controlled with efficiency.

    摘要翻译： 电子回旋共振设备通过在减压环境中将处理气体和微波能量施加到其中具有晶片的真空室中来产生等离子体。 该设备包括安装在真空室的最上端的喇叭天线组件，用于将从高频发生器提供的微波能量辐射到真空室中。 喇叭天线能够在长度方向上伸长和缩回以改变喇叭天线的喇叭角。 该设备设置有固定天线和多个移动天线以配置喇叭天线组件，从而由于移动天线的位移而能够控制喇叭天线中的喇叭角。 因此，能够有效地控制等离子体室内的微波能量的辐射的均匀性。

    Plasma doping method and plasma doping apparatus for performing the same
    5.
    发明申请
    Plasma doping method and plasma doping apparatus for performing the same 审中-公开
    等离子体掺杂法和等离子体掺杂装置

    公开(公告)号：US20070077366A1

    公开(公告)日：2007-04-05

    申请号：US11542468

    申请日：2006-10-04

    申请人： Gyeong-Su Keum ,  Ji-Hyun Hur ,  Jai-Hyung Won ,  No-Hyun Huh ,  Jae-Joon Oh

    发明人： Gyeong-Su Keum ,  Ji-Hyun Hur ,  Jai-Hyung Won ,  No-Hyun Huh ,  Jae-Joon Oh

    IPC分类号： C23C14/00 ,  H05H1/24 ,  G21G5/00

    CPC分类号： C23C14/48 ,  H01L21/2236

    摘要： A method of doping ions into an object using plasma, including providing a doping gas between a first electrode and a second electrode, where an object is disposed between the first and the second electrodes, applying a first power to the first electrode and grounding the second electrode, exciting the doping gas to a plasma state, directing ions toward the object to be doped, applying a second power to the second electrode and grounding the first electrode, and counting a dose of the ions directed toward the second electrode, and an apparatus for performing the same.

    摘要翻译： 一种使用等离子体将离子掺杂到物体中的方法，包括在第一电极和第二电极之间提供掺杂气体，其中物体设置在第一和第二电极之间，向第一电极施加第一电力并将第二电极接地 将掺杂气体激发到等离子体状态，将离子引向待掺杂的物体，向第二电极施加第二功率并将第一电极接地，并计数朝向第二电极的离子的剂量;以及设备 执行相同。

    Plasma doping method and plasma doping apparatus for performing the same
    6.
    发明申请
    Plasma doping method and plasma doping apparatus for performing the same 审中-公开
    等离子体掺杂法和等离子体掺杂装置

    公开(公告)号：US20070087584A1

    公开(公告)日：2007-04-19

    申请号：US11542639

    申请日：2006-10-04

    申请人： Gyeong-Su Keum ,  Ji-Hyun Hur ,  Jai-Hyung Won ,  No-Hyun Huh ,  Jae-Joon Oh

    发明人： Gyeong-Su Keum ,  Ji-Hyun Hur ,  Jai-Hyung Won ,  No-Hyun Huh ,  Jae-Joon Oh

    IPC分类号： H01L21/31 ,  H01L21/469 ,  H01L29/76 ,  H01L29/94 ,  H01L31/00

    CPC分类号： H01J37/32422 ,  H01J37/32412 ,  H01J37/32577 ,  H01L21/2236

    摘要： In a method of doping ions into an object, such as a substrate, using plasma, a doping gas may be provided between first and second electrodes in a chamber. An electric field may be formed between the first and the second electrodes to excite the doping gas to a plasma state. The electric field may be formed by applying a first power having a first positive electric potential and a second power having a second positive electric potential, the second positive electric potential being higher than the first positive electric potential. The electric field may be reversed in direction by blocking the second power from being applied to the second electrode. Accumulated ions on the substrate may be effectively neutralized by introducing electrons toward the substrate so that arcing generation may be prevented.

    摘要翻译： 在使用等离子体将离子掺杂到诸如衬底的物体的方法中，可以在腔室中的第一和第二电极之间提供掺杂气体。 可以在第一和第二电极之间形成电场，以将掺杂气体激发到等离子体状态。 电场可以通过施加具有第一正电位的第一电力和具有第二正电位的第二电力而形成，第二正电位高于第一正电位。 电场可以通过阻止第二功率施加到第二电极而在方向上反转。 可以通过向基板引入电子来有效地中和衬底上的累积离子，从而可以防止产生电弧。