Electron cyclotron resonance equipment with variable flare angle of horn antenna
    3.
    发明授权
    Electron cyclotron resonance equipment with variable flare angle of horn antenna 失效
    具有喇叭天线可变喇叭角的电子回旋共振设备

    公开(公告)号:US07410552B2

    公开(公告)日:2008-08-12

    申请号:US11007878

    申请日:2004-12-09

    IPC分类号: C23C16/00 C23F1/00 H01L21/306

    摘要: An electron cyclotron resonance equipment generates plasma by application of a processing gas and microwave energy into a vacuum chamber having a wafer therein in an environment of reduced pressure. The equipment includes a horn antenna assembly mounted onto an uppermost end of the vacuum chamber for radiating the microwave energy supplied from a high-frequency generator into the vacuum chamber. The horn antenna enables extension and retraction in a lengthwise direction to change a flare angle of the horn antenna. The equipment is provided with a fixed antenna and a plurality of mobile antennas to configure a horn antenna assembly, thereby enabling control of the flare angle in the horn antenna as a result of displacement of the mobile antennas. Thus, the uniformity in radiation of the microwave energy within plasma chamber can be controlled with efficiency.

    摘要翻译: 电子回旋共振设备通过在减压环境中将处理气体和微波能量施加到其中具有晶片的真空室中来产生等离子体。 该设备包括安装在真空室的最上端的喇叭天线组件,用于将从高频发生器提供的微波能量辐射到真空室中。 喇叭天线能够在长度方向上伸长和缩回以改变喇叭天线的喇叭角。 该设备设置有固定天线和多个移动天线以配置喇叭天线组件,从而由于移动天线的位移而能够控制喇叭天线中的喇叭角。 因此,能够有效地控制等离子体室内的微波能量的辐射的均匀性。

    Electron cyclotron resonance equipment with variable flare angle of horn antenna
    4.
    发明申请
    Electron cyclotron resonance equipment with variable flare angle of horn antenna 失效
    具有喇叭天线可变喇叭角的电子回旋共振设备

    公开(公告)号:US20050160986A1

    公开(公告)日:2005-07-28

    申请号:US11007878

    申请日:2004-12-09

    摘要: An electron cyclotron resonance equipment generates plasma by application of a processing gas and microwave energy into a vacuum chamber having a wafer therein in an environment of reduced pressure. The equipment includes a horn antenna assembly mounted onto an uppermost end of the vacuum chamber for radiating the microwave energy supplied from a high-frequency generator into the vacuum chamber. The horn antenna enables extension and retraction in a lengthwise direction to change a flare angle of the horn antenna. The equipment is provided with a fixed antenna and a plurality of mobile antennas to configure a horn antenna assembly, thereby enabling control of the flare angle in the horn antenna as a result of displacement of the mobile antennas. Thus, the uniformity in radiation of the microwave energy within plasma chamber can be controlled with efficiency.

    摘要翻译: 电子回旋共振设备通过在减压环境中将处理气体和微波能量施加到其中具有晶片的真空室中来产生等离子体。 该设备包括安装在真空室的最上端的喇叭天线组件,用于将从高频发生器提供的微波能量辐射到真空室中。 喇叭天线能够在长度方向上伸长和缩回以改变喇叭天线的喇叭角。 该设备设置有固定天线和多个移动天线以配置喇叭天线组件,从而由于移动天线的位移而能够控制喇叭天线中的喇叭角。 因此,能够有效地控制等离子体室内的微波能量的辐射的均匀性。

    Apparatus for generating inductively-coupled plasma and antenna coil structure thereof for generating inductive electric fields
    5.
    发明申请
    Apparatus for generating inductively-coupled plasma and antenna coil structure thereof for generating inductive electric fields 审中-公开
    用于产生用于产生感应电场的感应耦合等离子体和天线线圈结构的装置

    公开(公告)号:US20050109462A1

    公开(公告)日:2005-05-26

    申请号:US10909467

    申请日:2004-08-02

    CPC分类号: H01J37/321

    摘要: Disclosed is an apparatus for generating inductively-coupled plasma (ICP). The ICP generation apparatus includes a source region where an ICP antenna coil is mounted, the ICP antenna coil generating inductive electric fields for generating plasma and having a serially-connected concentric circle-type structure, the total number of windings of the ICP antenna coil being greater than 2, the ICP antenna coil having a structure in which at least one circular winging closest to the center of the concentric circle is wound in a direction opposite to that of the other windings; a sealed chamber in which a predetermined process is performed on a sample placed on a chuck therein through a reaction between plasma ions and reactive radicals; and a radio frequency (RF) power supply for providing RF electric power of a predetermined frequency to the ICP antenna coil in the source region.

    摘要翻译: 公开了一种用于产生电感耦合等离子体(ICP)的装置。 ICP发生装置包括安装有ICP天线线圈的源极区域,ICP天线线圈产生用于产生等离子体的感应电场并具有串联连接的同心圆形结构,ICP天线线圈的总线圈数为 大于2,ICP天线线圈具有其中最靠近同心圆的中心的至少一个圆形翼沿与其它绕组的方向相反的方向缠绕的结构; 密封室,其中通过等离子体离子和反应性基团之间的反应对放置在其上的卡盘上的样品进行预定处理; 以及用于向源极区域中的ICP天线线圈提供预定频率的RF电力的射频(RF)电源。

    Semiconductor device
    6.
    发明申请
    Semiconductor device 有权
    半导体器件

    公开(公告)号:US20110221482A1

    公开(公告)日:2011-09-15

    申请号:US12923857

    申请日:2010-10-12

    IPC分类号: H03K3/01 H03K17/00

    摘要: Provided is a semiconductor device that may include a switching device having a negative threshold voltage, and a driving unit between a power terminal and a ground terminal and providing a driving voltage for driving the switching device. The switching device may be connected to a virtual ground node having a virtual ground voltage that is greater than a ground voltage supplied from the ground terminal and may be turned on when a difference between the driving voltage and the virtual ground voltage is greater than the negative threshold voltage.

    摘要翻译: 提供一种半导体器件,其可以包括具有负阈值电压的开关器件,以及电源端子和接地端子之间的驱动单元,并且提供用于驱动开关器件的驱动电压。 开关器件可以连接到具有大于从接地端子提供的接地电压的虚拟接地电压的虚拟接地节点,并且当驱动电压和虚拟接地电压之间的差大于负值时,可以导通 阈值电压。

    Sputtering apparatus for forming a metal film using a magnetic field
    9.
    发明授权
    Sputtering apparatus for forming a metal film using a magnetic field 有权
    使用磁场形成金属膜的溅射装置

    公开(公告)号:US06723215B2

    公开(公告)日:2004-04-20

    申请号:US10106220

    申请日:2002-03-27

    IPC分类号: C23C1435

    CPC分类号: C23C14/35 H01J37/3402

    摘要: A sputtering apparatus includes a sputtering chamber, a target disposed in the sputtering chamber, and a magnetic field generator for generating a rotating magnetic field at the front of the target. The magnetic field generator includes a main magnetic field-generating part that faces the back of the target and is horizontally (laterally) offset from a vertical line passing through the center of the target. A magnetic annulus of the main magnetic field-generating part forms a magnetic enclosure having openings therethrough at locations faced in the directions of the central and peripheral portions of the target. The magnetic field-generating part thus produces a magnetic field having a non-uniform distribution at the front of the target. A substrate is positioned within the sputtering chamber facing the front of the target. A metal layer is formed by sputtering atoms from the front of the target onto the substrate. The behavior of the sputtered atoms can be effectively controlled by the magnetic field.

    摘要翻译: 溅射装置包括溅射室,设置在溅射室中的靶和用于在靶的前部产生旋转磁场的磁场发生器。 磁场发生器包括面向目标背面的水平(横向)偏离通过目标中心的垂直线的主磁场产生部分。 主磁场产生部分的磁环形成一个磁性外壳,在与目标的中心部分和周边部分的方向相对的位置处具有穿过其的开口。 因此,磁场产生部分产生在靶的前部具有不均匀分布的磁场。 衬底位于溅射室内面向靶的前部。 通过将原子从靶的前部溅射到基底上而形成金属层。 溅射原子的行为可以被磁场有效地控制。

    SPIN TRANSISTOR AND METHOD OF OPERATING THE SAME
    10.
    发明申请
    SPIN TRANSISTOR AND METHOD OF OPERATING THE SAME 有权
    旋转晶体管及其操作方法

    公开(公告)号:US20100271112A1

    公开(公告)日:2010-10-28

    申请号:US12742221

    申请日:2008-11-04

    IPC分类号: H03K3/01 H01L29/78

    摘要: Disclosed are a spin transistor and a method of operating the spin transistor. The disclosed spin transistor includes a channel formed of a magnetic material selectively passing a spin-polarized electron having a specific direction, a source formed of a magnetic material, a drain, and a gate electrode. When a predetermined voltage is applied to the gate electrode, the channel selectively passes a spin-polarized electron having a specific direction and thus, the spin transistor is selectively turned on.

    摘要翻译: 公开了自旋晶体管和操作自旋晶体管的方法。 所公开的自旋晶体管包括由选择性地通过具有特定方向的自旋极化电子的磁性材料形成的沟道,由磁性材料形成的源极,漏极和栅电极。 当预定电压施加到栅电极时,沟道选择性地通过具有特定方向的自旋极化电子,因此自旋晶体管选择性地导通。