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1.发明授权Polishing head for chemical mechanical polishing using linear planarization technology 失效抛光头采用线性平面化技术进行化学机械抛光公开(公告)号：US06425812B1
公开(公告)日：2002-07-30
申请号：US09475543
申请日：1999-12-30
IPC分类号： B24B722
CPC分类号： B24B37/30
摘要： A polishing head for performing chemical-mechanical polishing on a linear polisher has a flexible diaphragm coupling between a wafer carrier and a support housing which houses the wafer carrier. The diaphragm allows the carrier to move-substantially in the vertical direction within the housing, but a center shaft assembly limits movement in the horizontal direction.
摘要翻译： 用于在线性抛光机上进行化学机械抛光的抛光头具有在晶片载体和容纳晶片载体的支撑壳体之间的柔性膜片联接。 隔膜允许载体基本上在壳体内沿垂直方向移动，但是中心轴组件限制了在水平方向上的移动。
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2.发明授权Method and apparatus for conditioning a polishing pad used in chemical mechanical planarization 失效用于调理用于化学机械平面化的抛光垫的方法和装置公开(公告)号：US06328637B1
公开(公告)日：2001-12-11
申请号：US09612992
申请日：2000-07-10
IPC分类号： B24B100
CPC分类号： B24B53/017 , B24B49/16 , B24D5/02
摘要： A method and apparatus for conditioning a polishing pad is described. The method includes steps of moving a cylindrical roller having an abrasive substance affixed to it against a moving polishing pad. The roller may be passively rotated by contact with the polishing pad, or actively reciprocated, while maintaining a pressure against the polishing pad. The apparatus includes a cylindrical roller attached to one or more pressure application devices mechanically connected to the roller.
摘要翻译： 描述了一种用于调节抛光垫的方法和装置。 该方法包括将具有固定在其上的磨料的圆柱滚子移动到移动的抛光垫上的步骤。 辊可以通过与抛光垫接触而被动地旋转，或者主动往复运动，同时保持对抛光垫的压力。 该装置包括一个连接到一个或多个压力施加装置的圆柱滚子，该压力施加装置机械地连接到滚子上。
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公开(公告)号：US20070202785A1
公开(公告)日：2007-08-30
申请号：US11614940
申请日：2006-12-21
申请人： Jeonghoon Oh , Tsz-Sin Siu , Hung Chen , Andrew Nagengast , Steven Zuniga , Thomas Brezoczky
发明人： Jeonghoon Oh , Tsz-Sin Siu , Hung Chen , Andrew Nagengast , Steven Zuniga , Thomas Brezoczky
IPC分类号： B24B41/06
CPC分类号： B24B37/30 , B24B41/06 , B29C33/424 , B29C35/02 , B29K2023/00 , B29K2083/00 , B29K2995/0074 , B29L2031/755
摘要： A flexible membrane for use in a carrier head has a generally circular main portion with a lower surface, an annular outer portion for connection to a base assembly, and an annular flap extending from the main portion on a side opposite the lower surface for connection to the base assembly. At least one surface of the flap has a surface texture to prevent adhesion.
摘要翻译： 用于载体头部的柔性膜具有大致圆形的主要部分，具有下表面，用于连接到基座组件的环形外部部分和从主体部分在与下表面相对的一侧延伸的环形挡片，用于连接到 基座组件。 翼片的至少一个表面具有表面纹理以防止粘附。
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4.发明授权Method and apparatus for conditioning a polishing pad used in chemical mechanical planarization 失效用于调理用于化学机械平面化的抛光垫的方法和装置
公开(公告)号：US6086460A
公开(公告)日：2000-07-11
申请号：US188779
申请日：1998-11-09
IPC分类号： B24B53/00 , B24B49/16 , B24B53/007 , B24B53/017 , B24B53/12 , B24B55/06 , B24D5/02 , H01L21/304 , B24B1/00
CPC分类号： B24B53/017 , B24B49/16 , B24D5/02
摘要： A method and apparatus for conditioning a polishing pad is described. The method includes steps of moving a cylindrical roller having an abrasive substance affixed to it against a moving polishing pad. The roller may be passively rotated by contact with the polishing pad, or actively reciprocated, while maintaining a pressure against the polishing pad. The apparatus includes a cylindrical roller attached to one or more pressure application devices mechanically connected to the roller.
摘要翻译： 描述了一种用于调节抛光垫的方法和装置。 该方法包括将具有固定在其上的磨料的圆柱滚子移动到移动的抛光垫上的步骤。 辊可以通过与抛光垫接触而被动地旋转，或者主动往复运动，同时保持对抛光垫的压力。 该装置包括一个连接到一个或多个压力施加装置的圆柱滚子，该压力施加装置机械地连接到滚子上。
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5.发明申请Apparatus and methods for sealing an electrical connection to at least one elongated photovoltaic module 审中-公开用于密封与至少一个细长光伏模块的电连接的装置和方法公开(公告)号：US20090178701A1
公开(公告)日：2009-07-16
申请号：US12011533
申请日：2008-01-28
申请人： Andrew Nagengast , Thomas Brezoczky
发明人： Andrew Nagengast , Thomas Brezoczky
IPC分类号： H01L31/042 , B23P19/00
CPC分类号： H01L31/035281 , F24S10/45 , F24S25/30 , F24S25/35 , H01L31/02008 , H01L31/048 , H02S20/20 , H02S30/20 , Y02E10/47 , Y02E10/50 , Y10T29/5313
摘要： In some embodiments, an apparatus for producing electric energy from light energy includes an elongated photovoltaic module (EPM) and a cover engageable therewith. The EPM includes at least one electrical output contact and the cover includes at least one electrical connector operable to electrically engage at least one electrical output contact(s). The cover sealingly engages the EPM around at least one of its electrical output contact(s).
摘要翻译： 在一些实施例中，用于从光能产生电能的装置包括细长光伏模块（EPM）和可与其接合的盖。 EPM包括至少一个电输出触点，并且盖包括至少一个电连接器，其可操作以电耦合至少一个电输出触点。 盖子围绕其电输出触头中的至少一个密封地接合EPM。
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6.发明申请Apparatus and methods for retaining a plurality of elongated photovoltaic modules 审中-公开用于保持多个细长光伏模块的装置和方法公开(公告)号：US20090078306A1
公开(公告)日：2009-03-26
申请号：US12069813
申请日：2008-02-13
申请人： Andrew Nagengast , Thomas Brezoczky
发明人： Andrew Nagengast , Thomas Brezoczky
IPC分类号： H01L31/048 , H01L31/042 , B29C39/00
CPC分类号： H01L31/035281 , F24S10/45 , F24S25/30 , F24S25/35 , H01L31/02008 , H01L31/048 , H02S20/20 , H02S30/20 , Y02E10/47 , Y02E10/50 , Y10T29/5313
摘要： In some embodiments, an apparatus for assisting in retaining at least two elongated photovoltaic modules includes a carrier having at least first and second adjacent receptacles. Each receptacle is engageable with at least one elongated photovoltaic module and the carrier is moveable between the first and second receptacles.
摘要翻译： 在一些实施例中，用于辅助保持至少两个细长光伏模块的装置包括具有至少第一和第二相邻容座的载体。 每个容器可与至少一个细长的光伏模块接合，并且载体可在第一和第二容器之间移动。
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7.发明申请公开(公告)号：US20070289124A1
公开(公告)日：2007-12-20
申请号：US11757069
申请日：2007-06-01
IPC分类号： H05K13/04
CPC分类号： H01L21/6838 , B24B37/30 , H01L21/67005 , Y10T29/5313 , Y10T279/11
摘要： The present invention relates to an apparatus and method for improving and speeding up substrate loading process. One embodiment provides a method for vacuum chucking a substrate. The method comprises venting a center chamber of a flexible membrane configured for mounting the substrate, moving the substrate such that a backside of the substrate is in full contact with the flexible membrane, and vacuuming the center chamber to vacuum chuck the backside of the substrate to the flexible membrane.
摘要翻译： 本发明涉及一种用于改善和加速基板加载过程的装置和方法。 一个实施例提供了用于真空吸附衬底的方法。 该方法包括将配置用于安装衬底的柔性膜的中心室排出，移动衬底，使得衬底的背面与柔性膜完全接触，并且抽真空中心室以将衬底的背面真空吸附到 柔性膜。
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8.发明授权Carrier head with a vibration reduction feature for a chemical mechanical polishing system 有权具有用于化学机械抛光系统的减振特征的承载头公开(公告)号：US06739958B2
公开(公告)日：2004-05-25
申请号：US10102083
申请日：2002-03-19
IPC分类号： B24B2900
CPC分类号： B24B37/30
摘要： Embodiments of the present invention are directed to a carrier head for positioning a substrate on a polishing surface. The carrier head includes a housing connectable to a drive shaft to rotate therewith; a base; a detachable plate removably mounted on top of the housing; a gimbal mechanism connecting the housing to the base to permit the base to move with respect to the housing such that the base remains substantially parallel to the polishing surface; and a flexible membrane defining a mounting surface for the substrate.
摘要翻译： 本发明的实施例涉及一种用于将基板定位在抛光表面上的载体头。 承载头包括可连接到驱动轴以与其一起旋转的壳体; 一个基地 可拆卸地安装在所述壳体的顶部上的可拆卸板; 将所述壳体连接到所述基座的万向架机构，以允许所述基座相对于所述壳体移动，使得所述基座保持基本上平行于所述抛光表面; 以及限定用于基底的安装表面的柔性膜。
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公开(公告)号：US06592439B1
公开(公告)日：2003-07-15
申请号：US09709769
申请日：2000-11-10
申请人： Shijian Li , Manoocher Birang , Ramin Emami , Andrew Nagengast , Douglas Orcutt Brown , Shi-Ping Wang , Martin Scales , John White
发明人： Shijian Li , Manoocher Birang , Ramin Emami , Andrew Nagengast , Douglas Orcutt Brown , Shi-Ping Wang , Martin Scales , John White
IPC分类号： B24B2900
CPC分类号： B25B11/005 , B24B21/04 , B24B37/16 , H01L21/30625
摘要： Generally, a method and apparatus for retaining polishing material is provided. In one embodiment, the apparatus includes a platen having a top surface, a plurality of channels and one or more vacuum ports. The top surface is adapted to support the polishing material. The plurality of channels are formed in a polishing area of the top surface. The vacuum ports are disposed in the platen and at least one port is in communication with at least one of the channels. Upon application of a vacuum to the ports, the channels remove fluids under the polishing material while securing the polishing material to the top surface.
摘要翻译： 通常，提供了用于保持抛光材料的方法和装置。 在一个实施例中，该装置包括具有顶表面，多个通道和一个或多个真空端口的压板。 顶表面适于支撑抛光材料。 多个通道形成在顶表面的抛光区域中。 真空端口设置在压板中，并且至少一个端口与至少一个通道连通。 当向端口施加真空时，通道在将抛光材料固定到顶表面的同时移除抛光材料下面的流体。
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10.发明授权公开(公告)号：US07527271B2
公开(公告)日：2009-05-05
申请号：US11757069
申请日：2007-06-01
IPC分类号： B23B31/30
CPC分类号： H01L21/6838 , B24B37/30 , H01L21/67005 , Y10T29/5313 , Y10T279/11
摘要： The present invention relates to an apparatus and method for improving and speeding up substrate loading process. One embodiment provides a method for vacuum chucking a substrate. The method comprises venting a center chamber of a flexible membrane configured for mounting the substrate, moving the substrate such that a backside of the substrate is in full contact with the flexible membrane, and vacuuming the center chamber to vacuum chuck the backside of the substrate to the flexible membrane.
摘要翻译： 本发明涉及一种用于改善和加速基板加载过程的装置和方法。 一个实施例提供了用于真空吸附衬底的方法。 该方法包括将配置用于安装衬底的柔性膜的中心室排出，移动衬底，使得衬底的背面与柔性膜完全接触，并且抽真空中心室以将衬底的背面真空吸附到 柔性膜。
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