公开(公告)号：US20210176831A1

公开(公告)日：2021-06-10

申请号：US17106735

申请日：2020-11-30

Applicant: APPLIED MATERIALS, INC.

Inventor： Pingyan LEI ,  Dien-Yeh WU ,  Jallepally RAVI ,  Manjunatha KOPPA ,  Ambarish TOORIHAL ,  Sandesh YADAMANE ,  Vinod Konda PURATHE ,  Xiaoxiong YUAN

IPC: H05B3/48 ,  C23C14/54 ,  C23C16/458 ,  C23C16/455 ,  H05B3/14

Abstract: Embodiments of a lid heater for a deposition chamber are provided herein. In some embodiments, a lid heater for a deposition chamber includes a ceramic heater body having a first side opposite a second side, wherein the ceramic heater body includes a first plurality of gas channels extending from one or more first gas inlets on the first side, wherein each of the one or more first gas inlets extend to a plurality of first gas outlets on the second side; a heating element embedded in the ceramic heater body; and an RF electrode embedded in the ceramic heater body proximate the second side, wherein the first plurality of gas channels extend through the RF electrode.

公开(公告)号：US20160192444A1

公开(公告)日：2016-06-30

申请号：US14634711

申请日：2015-02-27

Applicant: APPLIED MATERIALS, INC.

Inventor： TOMOHARU MATSUSHITA ,  Jallepally RAVI ,  Cheng-Hsiung TSAI ,  Aravind KAMATH ,  Xiaoxiong YUAN ,  Manjunatha KOPPA

IPC: H05B3/26 ,  H05B3/12

CPC classification number: H05B3/26 ,  H01L21/67103 ,  H05B2203/037

Abstract: Embodiments of substrate supports are provided herein. In some embodiments, a substrate support may include a body having a support surface; and a first heater disposed within the body and having a first heating coil and multiple heating zones, wherein a pitch of windings of the first heating coil vary among each of the multiple heating zones to define a predetermined heating ratio between the multiple heating zones.

Abstract translation: 本文提供了基板支撑件的实施例。 在一些实施例中，衬底支撑件可以包括具有支撑表面的主体; 以及第一加热器，其设置在所述主体内并且具有第一加热线圈和多个加热区域，其中所述第一加热线圈的绕组间距在每个所述多个加热区域中变化以限定所述多个加热区域之间的预定加热比。

公开(公告)号：US20190032210A1

公开(公告)日：2019-01-31

申请号：US15661441

申请日：2017-07-27

Applicant: APPLIED MATERIALS, INC.

Inventor： Muhannad MUSTAFA ,  Muhammad M. RASHEED ,  Mario Dan SANCHEZ ,  Yu CHANG ,  William Kuang ,  Vinod Konda PURATHE ,  Manjunatha KOPPA

IPC: C23C16/455 ,  G01K7/16 ,  C23C16/458

Abstract: Embodiments of the present disclosure are directed to a quick disconnect resistance temperature detector (RTD) heater assembly, that includes a first assembly comprising a pedestal, a pedestal shaft, an adapter, one or more heater power supply terminals, and at least one RTD, and a second assembly comprising a rotating module having a central opening, and a cable assembly partially disposed in the central opening and securely fastened to the rotating module, wherein the first assembly is removably coupled to the second assembly, wherein the cable assembly includes one or more power supply sockets that receive the heater power supply terminals when the first and second assemblies are coupled together, and wherein the cable assembly includes one or more spring loaded RTD pins that contact the at least one RTD disposed in the first assembly when the first and second assemblies are coupled together.

公开(公告)号：US20230374660A1

公开(公告)日：2023-11-23

申请号：US17663695

申请日：2022-05-17

Applicant: Applied Materials, Inc.

Inventor： Harpreet SINGH ,  Jallepally RAVI ,  Zubin HUANG ,  Manjunatha KOPPA ,  Sandesh YADAMANE ,  Srinivas TOKUR MOHANA ,  Shreyas PATIL SHANTHAVEERASWAMY ,  Kai WU ,  Peiqi WANG ,  Mingrui ZHAO

IPC: C23C16/455 ,  C23C16/06 ,  H01L21/285

CPC classification number: C23C16/45561 ,  C23C16/06 ,  H01L21/28568 ,  C23C16/45591

Abstract: A substrate processing system is provided having a processing chamber. The processing chamber includes a lid plate, one or more chamber sidewalls, and a chamber base that collectively define a processing volume. An annular plate is coupled to the lid plate, and an edge manifold is fluidly coupled to the processing chamber through the annular plate and the lid plate. The substrate processing system includes a center manifold that is coupled to the lid plate.

公开(公告)号：US20160172227A1

公开(公告)日：2016-06-16

申请号：US14962446

申请日：2015-12-08

Applicant: APPLIED MATERIALS, INC.

Inventor： Ryan HANSON ,  Manjunatha KOPPA ,  Vijay D. PARKHE ,  John C. FORSTER ,  Keith A. MILLER

IPC: H01L21/683 ,  H02N13/00

CPC classification number: H01L21/6833 ,  H02N13/00

Abstract: An electrostatic chuck includes a puck having a support surface to support a substrate when disposed thereon and an opposing second surface, wherein one or more chucking electrodes are embedded in the puck, a body having a support surface coupled to the second surface of the puck to support the puck, a DC voltage sensing circuit disposed on support surface of the puck, and an inductor disposed in the body and proximate the support surface of the body, wherein the inductor is electrically coupled to DC voltage sensing circuit, and wherein the inductor is configured to filter high frequency current flow in order to accurately measure DC potential on the substrate.

Abstract translation: 静电卡盘包括具有支撑表面以支撑基板并且相对的第二表面的圆盘，其中一个或多个夹紧电极嵌入该圆盘中，具有联接到该圆盘的第二表面的支撑表面的本体 支撑圆盘，设置在圆盘的支撑表面上的直流电压检测电路和设置在主体中并靠近主体的支撑表面的电感器，其中电感器电耦合到直流电压感测电路，并且其中电感器是 被配置为过滤高频电流以准确测量衬底上的直流电位。

公开(公告)号：US20210130956A1

公开(公告)日：2021-05-06

申请号：US17078664

申请日：2020-10-23

Applicant: APPLIED MATERIALS, INC.

Inventor： Pingyan LEI ,  Dien-Yeh WU ,  Jallepally RAVI ,  Takashi KURATOMI ,  Xiaoxiong YUAN ,  Manjunatha KOPPA ,  Vinod Konda PURATHE

IPC: C23C16/455

Abstract: Embodiments of showerheads are provided herein. In some embodiments, a showerhead for use in a process chamber includes a gas distribution plate having an upper surface and a lower surface; a plurality of channels extending through the gas distribution plate substantially perpendicular to the lower surface; a plurality of first gas delivery holes extending from the upper surface to the lower surface between adjacent channels of the plurality of channels to deliver a first process gas through the gas distribution plate; and a plurality of second gas delivery holes extending from the plurality of channels to the lower surface to deliver a second process gas therethrough without mixing with the first process gas.

公开(公告)号：US20170004982A1

公开(公告)日：2017-01-05

申请号：US14788127

申请日：2015-06-30

Applicant: APPLIED MATERIALS, INC.

Inventor： Mukund SUNDARARAJAN ,  Ananthkrishna JUPUDI ,  Manjunatha KOPPA ,  Saket RATHI

IPC: H01L21/67 ,  H01L21/687

CPC classification number: H01L21/68785 ,  H01L21/68742 ,  H01L21/68764

Abstract: Embodiments of batch processing apparatus and collapsible substrate support are provided herein. In some embodiments, a collapsible substrate support includes a base linearly moveable between a first position and a second position; and a first plurality of substrate support elements coupled to the base and including a lowermost substrate support element disposed in a fixed position with respect to the base and an uppermost substrate support element disposed above the lowermost substrate support element, wherein the uppermost substrate support element is linearly movable between a first position nearer to the lowermost substrate support element and a second position further from the lowermost substrate support element.

Abstract translation: 本文提供批处理装置和可折叠基板支撑件的实施例。 在一些实施例中，可折叠基板支撑件包括可在第一位置和第二位置之间线性移动的基座; 以及耦合到所述基座并且包括相对于所述基座设置在固定位置的最下面的基板支撑元件和设置在所述最下面的基板支撑元件上方的最上面的基板支撑元件的第一多个基板支撑元件，其中所述最上面的基板支撑元件是 可在最靠近最底层支撑元件的第一位置与最下面的衬底支撑元件之间的第二位置之间直线移动。

公开(公告)号：US20150146339A1

公开(公告)日：2015-05-28

申请号：US14550106

申请日：2014-11-21

Applicant: Applied Materials, Inc.

Inventor： Govinda RAJ ,  Cheng-Hsiung TSAI ,  Robert T. HIRAHARA ,  Kadthala R. NARENDRNATH ,  Manjunatha KOPPA ,  Ross MARSHALL

IPC: H01L21/683

CPC classification number: H01L21/6875 ,  H01L21/6831 ,  Y10T428/24298 ,  Y10T428/24314

Abstract: Embodiments are directed to an electrostatic chuck surface having minimum contact area features. More particularly, embodiments of the present invention provide an electrostatic chuck assembly having a pattern of raised, elongated surface features for providing reduced particle generation and reduced wear of substrates and chucking devices.

Abstract translation: 实施例涉及具有最小接触面积特征的静电卡盘表面。 更具体地，本发明的实施例提供一种具有凸起的细长表面特征图案的静电卡盘组件，用于提供减少的颗粒产生和减少基板和夹紧装置的磨损。