公开(公告)号：US20070052948A1

公开(公告)日：2007-03-08

申请号：US11594075

申请日：2006-11-08

申请人： Arie Den Boef ,  Hans Van Der Laan ,  Antonius Van Dijsseldonk ,  Mircea Dusa ,  Antoine Kiers

发明人： Arie Den Boef ,  Hans Van Der Laan ,  Antonius Van Dijsseldonk ,  Mircea Dusa ,  Antoine Kiers

IPC分类号： G01B9/00

CPC分类号： G03F7/706

摘要： In a method according to one embodiment of the invention, aberrations in a lithographic apparatus are detected by printing a test pattern having at least one degree of symmetry and being sensitive to a particular aberration in the apparatus, and using a scatterometer to derive information concerning the aberration. The test structure may comprise a two-bar grating, in which case the inner and outer duty ratios can be reconstructed to derive information indicative of comatic aberration. Alternatively, a hexagonal array of dots can be used, such that scatterometry data can be used to reconstruct dot diameters indicative of 3-wave aberration.

公开(公告)号：US20060139598A1

公开(公告)日：2006-06-29

申请号：US11019524

申请日：2004-12-23

申请人： Antonius Van Dijsseldonk ,  Dominicus Jacobus Adrianus Franken ,  Robertus De Jongh ,  Jacob Kleijn ,  Bastiaan Jansen ,  Marc Van Der Wijst

发明人： Antonius Van Dijsseldonk ,  Dominicus Jacobus Adrianus Franken ,  Robertus De Jongh ,  Jacob Kleijn ,  Bastiaan Jansen ,  Marc Van Der Wijst

IPC分类号： G03B27/54

CPC分类号： G03F7/709 ,  G03F7/70266 ,  G03F7/70825

摘要： A lithographic apparatus includes a projection system including a movable optical element. The movable optical element is capable, by a displacement thereof to influence a position quantity of a radiation beam projected by the projection system. A control device is provided to drive the optical element actuator to influence a position quantity of the movable optical element, thereby influencing a position quantity of the radiation beam as projected by the projection system. The control device is adapted to move the movable optical element to position the radiation beam as projected by the projection system with respect to the substrate, or to correct a position quantity of the radiation beam as projected by the projection system caused by any type of disturbance on the projection system.

摘要翻译： 光刻设备包括包括可移动光学元件的投影系统。 可移动光学元件能够通过其位移来影响由投影系统投射的辐射束的位置量。 提供控制装置以驱动光学元件致动器来影响可移动光学元件的位置量，从而影响由投影系统投射的辐射束的位置量。 控制装置适于移动可移动光学元件以将投影系统相对于基板投射的辐射束定位，或者校正由任何类型的扰动引起的由投影系统投影的辐射束的位置量 在投影系统上。

公开(公告)号：US20050134818A1

公开(公告)日：2005-06-23

申请号：US10738129

申请日：2003-12-18

申请人： Antonius Van Dijsseldonk ,  Marcel Marie Dierichs ,  Harm-Jan Voorma

发明人： Antonius Van Dijsseldonk ,  Marcel Marie Dierichs ,  Harm-Jan Voorma

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70216 ,  G03F7/70275 ,  G03F7/70308

摘要： A lithographic apparatus including a radiation attenuator or a variable aperture system, such as masking blades, arranged in or near an intermediate focus of the projection system. Besides a radiation attenuator or a variable aperture system, a measuring system may be arranged in the intermediate focus. By placing one or more of such systems in the intermediate focus of the projection system, instead of near the reticle in the illumination system, fewer design restrictions occur because of more space available, resulting in a lower design cost.

摘要翻译： 包括布置在投影系统的中间焦点中或其附近的辐射衰减器或可变孔径系统（例如掩模刀片）的光刻设备。 除了辐射衰减器或可变孔径系统之外，测量系统可以布置在中间焦点中。 通过将一个或多个这样的系统放置在投影系统的中间焦点中，而不是靠近照明系统中的掩模版，由于更多的可用空间而发生较少的设计限制，导致较低的设计成本。

公开(公告)号：US20060132743A1

公开(公告)日：2006-06-22

申请号：US11015727

申请日：2004-12-20

申请人： Uwe Mickan ,  Antonius Van Dijsseldonk

发明人： Uwe Mickan ,  Antonius Van Dijsseldonk

IPC分类号： G03B27/52

CPC分类号： G03F9/7026 ,  G03F9/7065 ,  G03F9/7088

摘要： A lithographic apparatus having a projection system that includes a plurality of mirrors arranged to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes an autofocus system having a light source, a position sensitive detector, and a light directing arrangement for directing a first portion of light from the light source to the position sensitive detector. The light directing arrangement further directs a second portion of light from the light source into the projection system and, after the second portion of light has traveled through the projection system to the substrate and back through the projection system to the light directing arrangement, the second portion of light is directed onto the position sensitive detector.

摘要翻译： 一种具有投影系统的光刻设备，该投影系统包括多个反射镜，所述多个反射镜布置成将图案化的辐射束投影到基板的目标部分上。 光刻设备还包括具有光源，位置敏感检测器和用于将来自光源的第一部分光引导到位置敏感检测器的光引导装置的自动对焦系统。 光引导装置进一步将来自光源的第二部分光引导到投影系统中，并且在第二部分光已经穿过投影系统移动到基板并且通过投影系统返回到光引导装置之后，第二部分 光的一部分被引导到位置敏感检测器上。

公开(公告)号：US20060126041A1

公开(公告)日：2006-06-15

申请号：US11012062

申请日：2004-12-15

申请人： Antonius Van Dijsseldonk ,  Mustafa Amhaouch ,  Wilhelmus Box ,  Johannes Jacobs ,  Hernes Jacobs ,  Marius Ravensbergen ,  Martinus Arnoldus Terken ,  Robert Livesey ,  Franciscus Catharina Van Vroonhoven

发明人： Antonius Van Dijsseldonk ,  Mustafa Amhaouch ,  Wilhelmus Box ,  Johannes Jacobs ,  Hernes Jacobs ,  Marius Ravensbergen ,  Martinus Arnoldus Terken ,  Robert Livesey ,  Franciscus Catharina Van Vroonhoven

IPC分类号： G03B27/42

CPC分类号： G03F7/70841 ,  G03F7/70991

摘要： A vacuum operated lithographic apparatus is disclosed. The apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection system, or any combination thereof. An interior of the vacuum housing includes a plurality of transport circuits for transporting fluids and/or electrical signals for use in a first process mode for lithographic processing. At least one of the transport circuits is adapted to transport energy towards the interior of the vacuum housing to stimulate outgassing in the vacuum housing for use in a second process mode for bringing the lithographic apparatus into a vacuum operating condition.

摘要翻译： 公开了一种真空操作的光刻设备。 该装置包括用于向构造成支撑图案形成装置的支撑件，或衬底台，或投影系统或其任何组合提供真空环境的真空壳体。 真空壳体的内部包括用于输送用于光刻处理的第一工艺模式的流体和/或电信号的多个输送电路。 传送电路中的至少一个适于将能量传送到真空壳体的内部，以刺激真空壳体中的除气，以用于使光刻设备进入真空操作状态的第二工艺模式。

公开(公告)号：US20060109442A1

公开(公告)日：2006-05-25

申请号：US10995536

申请日：2004-11-24

申请人： Erik Loopstra ,  Petrus Bartray ,  Antonius Van Dijsseldonk ,  Paulus Liebregts

发明人： Erik Loopstra ,  Petrus Bartray ,  Antonius Van Dijsseldonk ,  Paulus Liebregts

IPC分类号： G03B27/52

CPC分类号： G03F7/70141 ,  G03F7/70091

摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation and projection system configured to project the radiation beam onto a target portion of a substrate. At least one of the illumination system and the projection system includes a focusing element for reflecting or refracting the beam. A plurality of stop discs is provided, each having an aperture therethrough, together with a disc positioner configured to place one of the stop discs adjacent the focusing element to control the numerical aperture (NA) of the projection system or illumination system. The apparatus further includes a disc changer configured to select one of the stop discs and provide the selected stop disc to the disc positioner, the disc changer being external to the projection system or illumination system.

摘要翻译： 光刻设备包括被配置为提供辐射束和投影系统的照明系统，其配置成将辐射束投影到基板的目标部分上。 照明系统和投影系统中的至少一个包括用于反射或折射光束的聚焦元件。 提供了多个止动盘，每个具有穿过其中的孔，以及配置成将止动盘中的一个邻近聚焦元件放置的盘定位器，以控制投影系统或照明系统的数值孔径（NA）。 该装置还包括一个换盘器，其被配置为选择一个停止盘并将所选择的停止盘提供给盘定位器，换盘器位于投影系统或照明系统的外部。

公开(公告)号：US20050231704A1

公开(公告)日：2005-10-20

申请号：US10823775

申请日：2004-04-14

申请人： Uwe Mickan ,  Antonius Van Dijsseldonk

发明人： Uwe Mickan ,  Antonius Van Dijsseldonk

IPC分类号： G03B27/72 ,  G03F7/11 ,  G03F7/20 ,  H01L21/027

CPC分类号： G03F7/11 ,  G03F7/70941

摘要： A method of fabricating a device using a lithographic process, the method comprising applying a layer of radiation sensitive resist on top of the device, applying a metallic layer on top of the resist layer, and exposing a part of the resist layer to radiation while coupling the metallic layer to a fixed potential so as to apply an electric field across the resist layer, the direction of the electric field being substantially perpendicular to the plane of the resist layer.

摘要翻译： 一种使用光刻工艺制造器件的方法，所述方法包括在器件的顶部上施加一层辐射敏感抗蚀剂，在抗蚀剂层的顶部上施加金属层，并将抗蚀层的一部分暴露于辐射同时耦合 将金属层固定为电位，以便在抗蚀剂层上施加电场，电场的方向基本上垂直于抗蚀剂层的平面。

公开(公告)号：US20050018154A1

公开(公告)日：2005-01-27

申请号：US10844570

申请日：2004-05-13

申请人： Wilhelmus Box ,  Antonius Van Dijsseldonk ,  Dominicus Jacobus Franken ,  Martinus Leenders ,  Erik Loopstra ,  Josephus Smits ,  Marc Van Der Wijst

发明人： Wilhelmus Box ,  Antonius Van Dijsseldonk ,  Dominicus Jacobus Franken ,  Martinus Leenders ,  Erik Loopstra ,  Josephus Smits ,  Marc Van Der Wijst

IPC分类号： G21K1/06 ,  G02B7/182 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52 ,  G21K5/00

CPC分类号： G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70991

摘要： A lithographic projection apparatus contains a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system contains one or more optically active mirrors and heat shields located to intercept heat radiation to or from the mirrors and/or their support. The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields may include heat shields that intercept heat radiation to or from the support and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.

摘要翻译： 光刻投影设备包含投影系统，该投影系统配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包含一个或多个光学反射镜和隔热罩，其被定位成拦截到达镜子和/或其支撑件的热辐射。 热屏蔽被主动冷却，镜子和隔热罩和镜子分别支撑在支撑框架上，以减少由于主动冷却引起的反射镜振动。 隔热罩可以包括热屏蔽件，该隔热板截取向支撑和/或相应的隔热板的热辐射，用于隔离到或从反射镜散发的各个反射镜。