Shape memory foam member and method of producing the same
    2.
    发明授权
    Shape memory foam member and method of producing the same 有权
    形状记忆泡沫构件及其制造方法

    公开(公告)号:US06817441B2

    公开(公告)日:2004-11-16

    申请号:US09781953

    申请日:2001-02-14

    IPC分类号: E04B184

    摘要: A shape memory foam member is disclosed. A coefficient of water absorption of the shape memory foam member is in the range between 0.01 g/cm3 and 0.2 g/cm3 in a non-compressed state. The shape memory foam member is compressed with heating; cooled with keeping the shape memory foam member in the compressed state; and released from the compressive pressure on the shape memory foam member after cooling. The original shape of the shape memory foam member is substantially recovered by heating.

    摘要翻译: 公开了形状记忆泡沫构件。 形状记忆泡沫构件的吸水系数在非压缩状态下在0.01g / cm 3至0.2g / cm 3之间的范围内。 形状记忆泡沫构件被加热压缩; 冷却形状记忆泡沫构件处于压缩状态; 并且在冷却后从形状记忆泡沫构件上的压缩压力释放出来。 形状记忆泡沫构件的原始形状通过加热基本回收。

    Vulcanized rubber composition
    5.
    发明授权
    Vulcanized rubber composition 失效
    硫化橡胶组合物

    公开(公告)号:US5912288A

    公开(公告)日:1999-06-15

    申请号:US698933

    申请日:1996-08-16

    CPC分类号: C08K5/0091 C08K5/1515

    摘要: Disclosed is a rubber composition for fluorocarbons and/or refrigerating machine oil use, which comprises at least one of a nitrile group-containing rubber, a chloroprene rubber, and an ethylene propylene rubber as a base and at least one of an epoxy compound selected from the group consisting of a monofunctional epoxy compound, a glycidyl ether type epoxy compound and a glycidyl ether type epoxy compound and a compound represented by formula: ##STR1## wherein R.sup.1 represents a hydrogen atom or an alkyl group, R.sup.2 represents an alkyl group or a phenyl group, R.sup.3 represents an alkyl group, an alkoxy group or an alkenyloxy group, and n is 1 or 2.

    摘要翻译: 公开了一种用于碳氟化合物和/或冷冻机油用途的橡胶组合物,其包含含腈基的橡胶,氯丁二烯橡胶和作为基料的乙丙橡胶中的至少一种和至少一种选自 由单官能环氧化合物,缩水甘油醚型环氧化合物和缩水甘油醚型环氧化合物组成的组和由下式表示的化合物:其中R1表示氢原子或烷基,R2表示烷基或苯基, R3表示烷基,烷氧基或烯氧基,n为1或2。

    Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method
    6.
    发明授权
    Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method 有权
    化学机械抛光水性分散体和化学机械抛光方法

    公开(公告)号:US07550020B2

    公开(公告)日:2009-06-23

    申请号:US11180619

    申请日:2005-07-14

    IPC分类号: C09G1/02 C09G1/04

    CPC分类号: H01L21/31053 C09G1/02

    摘要: A chemical mechanical polishing aqueous dispersion comprises abrasives in a concentration of not more than 1.5% by mass, wherein the abrasives comprise ceria and have an average dispersed particle diameter of not less than 1.0 μm. A chemical mechanical polishing method comprises polishing an insulating film by the use of the chemical mechanical polishing aqueous dispersion. By the use of the chemical mechanical polishing aqueous dispersion, occurrence of polishing scratches can be suppressed without lowering a removal rate.

    摘要翻译: 化学机械研磨用水分散体包含浓度为1.5质量%以下的研磨剂,其中研磨剂包含二氧化铈,平均分散粒径不小于1.0μm。 化学机械抛光方法包括通过使用化学机械抛光水分散体抛光绝缘膜。 通过使用化学机械研磨水分散体,可以抑制抛光划痕的发生,而不降低去除率。

    Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method
    7.
    发明授权
    Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method 有权
    化学机械抛光水性分散体和化学机械抛光方法

    公开(公告)号:US07252782B2

    公开(公告)日:2007-08-07

    申请号:US11038190

    申请日:2005-01-21

    IPC分类号: C09K13/06

    摘要: A chemical mechanical polishing aqueous dispersion comprises abrasives (A) containing ceria, an anionic water-soluble polymer (B) and a cationic surfactant (C), wherein the amount of the anionic water-soluble polymer (B) is in the range of 60 to 600 parts by mass based on 100 parts by mass of the abrasives (A) containing ceria, and the amount of the cationic surfactant (C) is in the range of 0.1 to 100 ppm based on the whole amount of the chemical mechanical polishing aqueous dispersion.

    摘要翻译: 化学机械抛光水分散体包含含有二氧化铈的研磨剂(A),阴离子水溶性聚合物(B)和阳离子表面活性剂(C),其中阴离子水溶性聚合物(B)的量在60 相对于100质量份含有二氧化铈的研磨剂(A)为600质量份,阳离子性表面活性剂(C)的含量相对于化学机械研磨用水的总量为0.1〜100ppm 分散。

    Floating structure
    10.
    发明申请
    Floating structure 有权
    浮动结构

    公开(公告)号:US20060045628A1

    公开(公告)日:2006-03-02

    申请号:US10932250

    申请日:2004-09-02

    IPC分类号: E02B17/08

    CPC分类号: B63B35/4413 B63B39/03

    摘要: The present invention relates to a floating structure to receive maritime production or drilling installations that is provided with means to reduce movement caused by the action of environmental forces on it. These means confer a more stable behavior on the structure's movements.

    摘要翻译: 本发明涉及一种用于接收海上生产或钻井设备的浮动结构,该浮动结构具有减少由环境作用力引起的移动的装置。 这些意味着赋予结构运动更稳定的行为。