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公开(公告)号:US20080217555A1
公开(公告)日:2008-09-11
申请号:US12100570
申请日:2008-04-10
申请人: Billy W. Ward , Lou Farkas , John A. Notte , Randall Percival
发明人: Billy W. Ward , Lou Farkas , John A. Notte , Randall Percival
IPC分类号: H01J27/26
CPC分类号: H01J37/08 , H01J27/26 , H01J2237/06341 , H01J2237/065 , H01J2237/0807 , H01J2237/28
摘要: In one aspect the invention provides a gas field ion source assembly that includes an ion source in connection with an optical column such that an ion beam generated at the ion source travels through the optical column. The ion source includes an emitter having a width that tapers to a tip comprising a few atoms. In other aspects, the methods provide for manufacturing, maintaining and enhancing the performance of a gas field ion source including sharpening the tip of the ion source in situ.
摘要翻译: 在一个方面,本发明提供了一种气体离子源组件,其包括与光学柱连接的离子源,使得在离子源处产生的离子束穿过光学柱。 离子源包括具有与包含少量原子的尖端逐渐变细的宽度的发射体。 在其它方面,该方法提供制造,维持和增强气体离子源的性能,包括原位锐化离子源的尖端。
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公开(公告)号:US09159527B2
公开(公告)日:2015-10-13
申请号:US12100570
申请日:2008-04-10
申请人: Billy W. Ward , Lou Farkas , John A. Notte , Randall Percival
发明人: Billy W. Ward , Lou Farkas , John A. Notte , Randall Percival
CPC分类号: H01J37/08 , H01J27/26 , H01J2237/06341 , H01J2237/065 , H01J2237/0807 , H01J2237/28
摘要: In one aspect the invention provides a gas field ion source assembly that includes an ion source in connection with an optical column such that an ion beam generated at the ion source travels through the optical column. The ion source includes an emitter having a width that tapers to a tip comprising a few atoms. In other aspects, the methods provide for manufacturing, maintaining and enhancing the performance of a gas field ion source including sharpening the tip of the ion source in situ.
摘要翻译: 在一个方面,本发明提供了一种气体离子源组件,其包括与光学柱连接的离子源,使得在离子源处产生的离子束穿过光学柱。 离子源包括具有与包含少量原子的尖端逐渐变细的宽度的发射体。 在其它方面,该方法提供制造,维持和提高气体离子源的性能,包括原位锐化离子源的尖端。
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公开(公告)号:US20110240853A1
公开(公告)日:2011-10-06
申请号:US12997371
申请日:2008-06-13
IPC分类号: G01N23/225 , G01N23/00
CPC分类号: H01J37/304 , H01J37/20 , H01J37/265 , H01J37/28 , H01J37/3056 , H01J2237/0216 , H01J2237/0805 , H01J2237/0807 , H01J2237/2007 , H01J2237/204 , H01J2237/2482
摘要: Ion sources, systems and methods are disclosed. In some embodiments, the ion sources, systems and methods can exhibit relatively little undesired vibration and/or can sufficiently dampen undesired vibration. This can enhance performance (e.g., increase reliability, stability and the like). In certain embodiments, the ion sources, systems and methods can enhance the ability to make tips having desired physical attributes (e.g., the number of atoms on the apex of the tip). This can enhance performance (e.g., increase reliability, stability and the like).
摘要翻译: 公开了离子源,系统和方法。 在一些实施例中,离子源,系统和方法可以表现出相对较少的不期望的振动和/或可以充分地抑制不需要的振动。 这可以提高性能(例如,增加可靠性,稳定性等)。 在某些实施方案中,离子源,系统和方法可以增强制备具有期望物理属性的尖端(例如尖端顶点上的原子数)的能力。 这可以提高性能(例如,增加可靠性,稳定性等)。
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公开(公告)号:US08461557B2
公开(公告)日:2013-06-11
申请号:US12997371
申请日:2008-06-13
CPC分类号: H01J37/304 , H01J37/20 , H01J37/265 , H01J37/28 , H01J37/3056 , H01J2237/0216 , H01J2237/0805 , H01J2237/0807 , H01J2237/2007 , H01J2237/204 , H01J2237/2482
摘要: Ion sources, systems and methods are disclosed. In some embodiments, the ion sources, systems and methods can exhibit relatively little undesired vibration and/or can sufficiently dampen undesired vibration. This can enhance performance (e.g., increase reliability, stability and the like). In certain embodiments, the ion sources, systems and methods can enhance the ability to make tips having desired physical attributes (e.g., the number of atoms on the apex of the tip). This can enhance performance (e.g., increase reliability, stability and the like).
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公开(公告)号:US08124941B2
公开(公告)日:2012-02-28
申请号:US12493566
申请日:2009-06-29
CPC分类号: H01J37/08 , H01J27/024 , H01J2237/061 , H01J2237/0805 , H01J2237/0807
摘要: Disclosed are charged particle systems that include a tip, at least one gas inlet configured to supply gas particles to the tip, and a element having a curved surface positioned to adsorb un-ionized gas particles, and to direct desorbing gas particles to propagate toward the tip. The charged particle systems can include a field shunt connected to the tip, and configured to adjust an electric field at an apex of the tip.
摘要翻译: 公开了一种带电粒子系统,其包括尖端,至少一个气体入口被配置为向尖端供应气体颗粒,以及具有定位成吸附未离子化气体颗粒的弯曲表面的元件,并且引导解吸气体颗粒向着 小费。 带电粒子系统可以包括连接到尖端的场分流器,并且被配置为调整尖端的顶点处的电场。
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公开(公告)号:US20100012839A1
公开(公告)日:2010-01-21
申请号:US12493566
申请日:2009-06-29
CPC分类号: H01J37/08 , H01J27/024 , H01J2237/061 , H01J2237/0805 , H01J2237/0807
摘要: Disclosed are charged particle systems that include a tip, at least one gas inlet configured to supply gas particles to the tip, and a element having a curved surface positioned to adsorb un-ionized gas particles, and to direct desorbing gas particles to propagate toward the tip. The charged particle systems can include a field shunt connected to the tip, and configured to adjust an electric field at an apex of the tip.
摘要翻译: 公开了一种带电粒子系统,其包括尖端,至少一个气体入口被配置为向尖端供应气体颗粒,以及具有定位成吸附未离子化气体颗粒的弯曲表面的元件,并且引导解吸气体颗粒向着 小费。 带电粒子系统可以包括连接到尖端的场分流器,并且被配置为调整尖端的顶点处的电场。
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公开(公告)号:US20070138388A1
公开(公告)日:2007-06-21
申请号:US11600250
申请日:2006-11-15
申请人: Billy Ward , John Notte , Louis Farkas , Randall Percival , Raymond Hill
发明人: Billy Ward , John Notte , Louis Farkas , Randall Percival , Raymond Hill
IPC分类号: H01J49/00
CPC分类号: H01J37/08 , B82Y10/00 , B82Y40/00 , H01J27/26 , H01J37/20 , H01J37/252 , H01J37/28 , H01J37/3056 , H01J37/3174 , H01J2237/0807 , H01J2237/202 , H01J2237/20228 , H01J2237/2566 , H01J2237/2623 , H01J2237/2812 , H01J2237/30438 , H01J2237/3174 , H01J2237/31755
摘要: Ion sources, systems and methods are disclosed.
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公开(公告)号:US20070205375A1
公开(公告)日:2007-09-06
申请号:US11599935
申请日:2006-11-15
申请人: Billy Ward , John Notte , Louis Farkas , Randall Percival , Raymond Hill , Shawn McVey , Johannes Bihr
发明人: Billy Ward , John Notte , Louis Farkas , Randall Percival , Raymond Hill , Shawn McVey , Johannes Bihr
CPC分类号: H01J37/08 , B82Y10/00 , B82Y40/00 , H01J27/26 , H01J37/20 , H01J37/252 , H01J37/28 , H01J37/3056 , H01J37/3174 , H01J2237/0807 , H01J2237/202 , H01J2237/20228 , H01J2237/2566 , H01J2237/2623 , H01J2237/2812 , H01J2237/30438 , H01J2237/3174 , H01J2237/31755
摘要: Ion sources, systems and methods are disclosed.
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公开(公告)号:US20070194226A1
公开(公告)日:2007-08-23
申请号:US11600535
申请日:2006-11-15
申请人: Billy Ward , John Notte , Louis Farkas , Randall Percival , Raymond Hill , Lars Markwort , Dirk Aderhold
发明人: Billy Ward , John Notte , Louis Farkas , Randall Percival , Raymond Hill , Lars Markwort , Dirk Aderhold
IPC分类号: G21K7/00
CPC分类号: H01J37/08 , B82Y10/00 , B82Y40/00 , H01J27/26 , H01J37/20 , H01J37/252 , H01J37/28 , H01J37/3056 , H01J37/3174 , H01J2237/0807 , H01J2237/202 , H01J2237/20228 , H01J2237/2566 , H01J2237/2623 , H01J2237/2812 , H01J2237/30438 , H01J2237/3174 , H01J2237/31755
摘要: Ion sources, systems and methods are disclosed.
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公开(公告)号:US20070210250A1
公开(公告)日:2007-09-13
申请号:US11600861
申请日:2006-11-15
申请人: Billy Ward , John Notte , Louis Farkas , Randall Percival , Raymond Hill , Lars Markwort , Dirk Aderhold
发明人: Billy Ward , John Notte , Louis Farkas , Randall Percival , Raymond Hill , Lars Markwort , Dirk Aderhold
IPC分类号: G01N23/00
CPC分类号: H01J37/08 , B82Y10/00 , B82Y40/00 , H01J27/26 , H01J37/20 , H01J37/252 , H01J37/28 , H01J37/3056 , H01J37/3174 , H01J2237/0807 , H01J2237/202 , H01J2237/20228 , H01J2237/2566 , H01J2237/2623 , H01J2237/2812 , H01J2237/30438 , H01J2237/3174 , H01J2237/31755
摘要: Ion sources, systems and methods are disclosed.
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