Source/drain doping technique for ultra-thin-body SOI MOS transistors
    1.
    发明授权
    Source/drain doping technique for ultra-thin-body SOI MOS transistors 有权
    超薄体SOI MOS晶体管的源极/漏极掺杂技术

    公开(公告)号:US06403433B1

    公开(公告)日:2002-06-11

    申请号:US09397217

    申请日:1999-09-16

    IPC分类号: H01L21336

    CPC分类号: H01L29/66772 H01L29/78618

    摘要: An ultra-large-scale integrated (ULSI) circuit includes MOSFETs on an SOI substrate. The MOSFETs include elevated source and drain regions. The elevated source and drain regions are amorphized before doping. Neutral ion species can be utilized to amorphize the elevated source and drain region. Dopants are activated in a low-temperature rapid thermal anneal process.

    摘要翻译: 超大规模集成(ULSI)电路包括SOI衬底上的MOSFET。 MOSFET包括升高的源极和漏极区域。 在掺杂之前,升高的源极和漏极区非晶化。 中性离子物质可用于使提升的源极和漏极区域非晶化。 掺杂剂在低温快速热退火工艺中被激活。

    Method of forming a CMOS transistor having ultra shallow source and drain regions
    2.
    发明授权
    Method of forming a CMOS transistor having ultra shallow source and drain regions 有权
    形成具有超浅源极和漏极区域的CMOS晶体管的方法

    公开(公告)号:US06521501B1

    公开(公告)日:2003-02-18

    申请号:US09310170

    申请日:1999-05-11

    IPC分类号: H01L21336

    摘要: A method of forming a CMOS structure, the method including the acts of: forming a gate structure over a substrate layer; forming a silicide layer over the substrate layer; forming shallow source/drain areas in the substrate layer; forming an oxide diffusion barrier layer over the structure; forming a metal absorption layer over the oxide diffusion barrier layer; and melting portions of the substrate layer directly overlying the shallow source/drain areas, thereby transforming the shallow source/drain areas into shallow source/drain regions. The act of melting includes the act of exposing the metal absorption layer to pulsed laser beams.

    摘要翻译: 一种形成CMOS结构的方法,所述方法包括以下动作:在衬底层上形成栅极结构; 在衬底层上形成硅化物层; 在衬底层中形成浅的源极/漏极区域; 在所述结构上形成氧化物扩散阻挡层; 在所述氧化物扩散阻挡层上形成金属吸收层; 并且将衬底层的部分直接覆盖在浅源极/漏极区域上,从而将浅的源极/漏极区域变换成浅的源极/漏极区域。 熔化的行为包括将金属吸收层暴露于脉冲激光束的行为。

    Method of tilted implant for pocket, halo and source/drain extension in ULSI dense structures
    3.
    发明授权
    Method of tilted implant for pocket, halo and source/drain extension in ULSI dense structures 有权
    在ULSI密集结构中用于口袋,晕圈和源极/漏极延伸的倾斜植入物的方法

    公开(公告)号:US06190980B1

    公开(公告)日:2001-02-20

    申请号:US09150874

    申请日:1998-09-10

    IPC分类号: H01L21336

    摘要: A method of performing tilted implantation for pocket, halo and source/drain extensions in ULSI dense structures. The method overcomes the process limit, due to shadowing effects, in dense structures, of using large angle tilted implant techniques in ULSI circuits. A gate opening in an oxide layer is defined and partially filled by insertion of nitride spacers to define an actual gate window opening. The small angle tilted implant technique has the equivalent doping effect of large angle tilted implants, and circumvents the maximum angle limit (&thgr;MAX) that occurs in the large angle implant method. The small angle tilted implant technique also automatically provides self alignment of the pocket/halo/extension implant to the gate of the device.

    摘要翻译: 在ULSI致密结构中进行凹槽,晕圈和源极/漏极延伸的倾斜注入的方法。 该方法克服了在密集结构中的阴影效应,在ULSI电路中使用大角度倾斜植入技术的过程极限。 通过插入氮化物间隔物限定氧化层中的开口,并且通过插入氮化物间隔物来部分地填充以限定实际的门窗开口。 小角度倾斜植入技术具有大角度倾斜植入物的等效掺杂效应,并避开了大角度植入法中发生的最大角度限制(thetaMAX)。 小角度倾斜植入技术还自动提供袋/晕/延伸植入物到装置的门的自对准。

    Very low thermal budget channel implant process for semiconductors
    4.
    发明授权
    Very low thermal budget channel implant process for semiconductors 有权
    用于半导体的非常低的热预算通道注入工艺

    公开(公告)号:US06180468B2

    公开(公告)日:2001-01-30

    申请号:US09177774

    申请日:1998-10-23

    IPC分类号: H01L21336

    摘要: An ultra-low thermal budget process is provided for channel implant by using a reverse process sequence where a conventional MOS transistor is formed without the channel implant. The originally deposited polysilicon gate is removed, a nitride film deposition and etch is used to form a nitride spacer with a predetermined configuration, and a self-aligned channel implant is performed. After the channel implantation, anneal and super-retrograded doping, the nitride spacer and the gate oxide are removed for subsequent regrowth of a second gate oxide and a polysilicon deposition to form a second polysilicon gate.

    摘要翻译: 通过使用反向工艺流程为通道注入提供超低热量预算过程,其中形成常规MOS晶体管而不需要沟道注入。 去除原来沉积的多晶硅栅极,使用氮化物膜沉积和蚀刻来形成具有预定配置的氮化物间隔物,并且执行自对准沟道注入。 在通道注入,退火和超退火掺杂之后,去除氮化物间隔物和栅极氧化物,以便随后的第二栅极氧化物的再生长和多晶硅沉积形成第二多晶硅栅极。

    Circuit fabrication method which optimizes source/drain contact resistance
    5.
    发明授权
    Circuit fabrication method which optimizes source/drain contact resistance 有权
    优化源极/漏极接触电阻的电路制造方法

    公开(公告)号:US06265291B1

    公开(公告)日:2001-07-24

    申请号:US09224754

    申请日:1999-01-04

    申请人: Bin Yu Emi Ishida

    发明人: Bin Yu Emi Ishida

    IPC分类号: H01L2104

    CPC分类号: H01L21/28518 H01L21/26506

    摘要: A method of manufacturing an integrated circuit to optimize the contact resistance between impurity diffusing layers and silicide is disclosed herein. The method includes implanting a first material to a layer of semiconductor to create a buried amorphous silicon layer; implanting a second material in the layer of semiconductor and buried amorphous layer, forming a dopant profile region with a curved shape; depositing a layer of metal on the layer of semiconductor; melting the buried amorphous layer to reconfigure the curved shape to a substantially vertical profile of maximum dopant concentration; and forming silicide with the layer of semiconductor and layer of metal, the bottom of the silicide located in the vertical shape on the dopant profile region.

    摘要翻译: 本文公开了制造用于优化杂质扩散层和硅化物之间的接触电阻的集成电路的方法。 该方法包括将第一材料注入到半导体层中以产生埋入的非晶硅层; 将第二材料注入到半导体层和埋入非晶层中,形成具有弯曲形状的掺杂剂分布区域; 在半导体层上沉积金属层; 熔化埋入的非晶层以将弯曲形状重新配置为最大掺杂剂浓度的基本垂直分布; 并且用半导体层和金属层形成硅化物,硅化物的底部位于掺杂物分布区域上的垂直形状。

    DAISY CHAIN DISTRIBUTION IN DATA CENTERS
    6.
    发明申请
    DAISY CHAIN DISTRIBUTION IN DATA CENTERS 有权
    数据中心的DAISY链分配

    公开(公告)号:US20150286441A1

    公开(公告)日:2015-10-08

    申请号:US14746582

    申请日:2015-06-22

    IPC分类号: G06F3/06

    摘要: A method and a system to provide daisy chain distribution in data centers are provided. A node identification module identifies three or more data nodes of a plurality of data nodes. The identification of three or more data nodes indicates that the respective data nodes are to receive a copy of a data file. A connection creation module to, using one or more processors, create communication connections between the three or more data nodes. The communication connections form a daisy chain beginning at a seeder data node of the three or more data nodes and ending at a terminal data node of the three or more data nodes.

    摘要翻译: 提供了一种在数据中心提供菊花链分发的方法和系统。 节点识别模块识别多个数据节点中的三个或多个数据节点。 三个或更多个数据节点的标识指示相应的数据节点要接收数据文件的副本。 连接创建模块,用于使用一个或多个处理器在三个或更多个数据节点之间建立通信连接。 通信连接形成从三个或更多个数据节点的播种器数据节点开始并且结束于三个或更多个数据节点的终端数据节点的菊花链。

    Method and device for data transmission
    7.
    发明授权
    Method and device for data transmission 有权
    用于数据传输的方法和装置

    公开(公告)号:US09143297B2

    公开(公告)日:2015-09-22

    申请号:US13977907

    申请日:2011-07-21

    IPC分类号: H04W4/00 H04L5/00

    CPC分类号: H04L5/0048 H04L5/0053

    摘要: The present disclosure discloses a method and a device for transmitting data. The method includes: a UE determining, according to a preset rule, whether to transmit PUCCH and/or PUSCH and/or an SRS or not on a last symbol of a current subframe; the UE determining the PUCCH and/or the PUSCH to be transmitted on the current subframe according to availability of the last symbol of the current subframe for transmitting the PUCCH and/or the PUSCH; and the UE transmitting the PUCCH and/or the PUSCH on the current subframe and/or transmitting the SRS on the last symbol of the current subframe. In virtue of the present disclosure, it can be realized that a plurality of types of physical uplink signals/channels are simultaneously transmitted.

    摘要翻译: 本公开公开了一种用于发送数据的方法和装置。 该方法包括:UE根据预设规则确定是否在当前子帧的最后一个符号上发送PUCCH和/或PUSCH和/或SRS; UE根据用于发送PUCCH和/或PUSCH的当前子帧的最后一个符号的可用性来确定要在当前子帧上发送的PUCCH和/或PUSCH; 并且UE在当前子帧上发送PUCCH和/或PUSCH,和/或在当前子帧的最后一个符号上发送SRS。 凭借本公开,可以实现同时发送多种类型的物理上行链路信号/信道。

    Method and Apparatus for Sending Hybrid Automatic Repeat Request Acknowledge Information
    8.
    发明申请
    Method and Apparatus for Sending Hybrid Automatic Repeat Request Acknowledge Information 有权
    用于发送混合自动重传请求确认信息的方法和装置

    公开(公告)号:US20140369290A1

    公开(公告)日:2014-12-18

    申请号:US14369403

    申请日:2012-03-09

    IPC分类号: H04L1/18 H04W72/04 H04W72/02

    摘要: Provided are a method and apparatus for sending Hybrid Automatic Repeat Request Acknowledge (HARQ-ACK) information. The method includes: when a terminal employs a physical uplink control channel (PUCCH) format 3 to transmit HARQ-ACK information and the HARQ-ACK information is transmitted over a uplink physical shared channel (PUSCH), determining the number of downlink subframes for serving cells to feed back the HARQ-ACK information; determining the number of encoded modulated symbols required for sending the HARQ-ACK information according to the determined number of downlink subframes; and mapping the HARQ-ACK information to be sent to the PUSCH of a specified uplink subframe according to the number of encoded modulated symbols and sending the HARQ-ACK information. The technical solutions provided by the disclosure are applied to improve the performance of the HARQ-ACK information, and thus improve the data performance.

    摘要翻译: 提供了一种用于发送混合自动重传请求确认(HARQ-ACK)信息的方法和装置。 该方法包括:当终端采用物理上行链路控制信道(PUCCH)格式3来发送HARQ-ACK信息,并且通过上行链路物理共享信道(PUSCH)发送HARQ-ACK信息时,确定用于服务的下行链路子帧的数量 小区来反馈HARQ-ACK信息; 根据确定的下行链路子帧的数量确定发送HARQ-ACK信息所需的编码调制符号的数量; 以及根据编码的调制符号的数量映射要发送到指定上行链路子帧的PUSCH的HARQ-ACK信息,并发送HARQ-ACK信息。 应用本公开提供的技术方案来改进HARQ-ACK信息的性能,从而提高数据性能。

    Base Station, Terminal, System And Method For Data Transmitting In Time-Division Duplex System
    9.
    发明申请
    Base Station, Terminal, System And Method For Data Transmitting In Time-Division Duplex System 有权
    基站,终端,时分双工系统中数据传输的系统和方法

    公开(公告)号:US20140177491A1

    公开(公告)日:2014-06-26

    申请号:US14236164

    申请日:2011-12-21

    申请人: Peng Hao Bo Dai Bin Yu

    发明人: Peng Hao Bo Dai Bin Yu

    IPC分类号: H04W56/00 H04W72/14 H04W72/04

    摘要: A base station, a terminal, a system and methods for performing data transmission in a Time Division Duplex (TDD) system are disclosed. One of the methods includes: the base station sending an uplink scheduling grant signaling to the terminal on a carrier m, and after receiving uplink data sent by the terminal through a Physical Uplink Shared Channel (PUSCH) on a carrier n, the base station sending an ACK/NACK feedback signaling corresponding to the PUSCH to the terminal on the carrier m; wherein, m≠n; a timing relationship between a subframe by which the base station sends the uplink scheduling grant signaling and/or the ACK/NACK feedback signaling and a subframe where the PUSCH is located is identical with a Hybrid Automatic Repeat Request (HARQ) timing relationship corresponding to an uplink/downlink configuration of the carrier m or the carrier n.

    摘要翻译: 公开了一种在时分双工(TDD)系统中执行数据传输的基站,终端,系统和方法。 方法之一包括:基站向载波m上的终端发送上行调度授权信令,在通过载波n上的物理上行链路共享信道(PUSCH)接收到终端发送的上行数据之后,基站发送 与载波m上的终端对应的PUSCH的ACK / NACK反馈信令; 其中,m≠n; 基站发送上行链路调度授权信令的子帧与/或ACK / NACK反馈信令的子帧与PUSCH所在的子帧之间的定时关系与对应于上行链路调度许可信令的混合自动重复请求(HARQ)定时关系相同 载波m或载波n的上行链路/下行链路配置。