Ammonia annealed and wet oxidized LPCVD oxide to replace ono films for
high integrated flash memory devices
    2.
    发明授权
    Ammonia annealed and wet oxidized LPCVD oxide to replace ono films for high integrated flash memory devices 失效
    氨退火和湿氧化LPCVD氧化物以替代用于高集成闪存器件的膜

    公开(公告)号:US6162684A

    公开(公告)日:2000-12-19

    申请号:US266714

    申请日:1999-03-11

    摘要: In one embodiment, the present invention relates to a method of forming a flash memory cell, involving the steps of forming a tunnel oxide on a substrate; forming a first polysilicon layer over the tunnel oxide; forming an insulating layer over the first polysilicon layer, the insulating layer comprising an oxide layer made by low pressure chemical vapor deposition at a temperature from about 600.degree. C. to about 850.degree. C. using SiH.sub.4 and N.sub.2 O, annealing in an NH.sub.3 atmosphere at a temperature from about 800.degree. C. to about 900.degree. C., and wet oxidizing using O.sub.2 and H.sub.2 at a temperature from about 820.degree. C. to about 880.degree. C.; forming a second polysilicon layer over the insulating layer; etching at least the first polysilicon layer, the second polysilicon layer and the insulating layer, thereby defining at least one stacked gate structure; and forming a source region and a drain region in the substrate, thereby forming at least one memory cell.

    摘要翻译: 在一个实施例中,本发明涉及一种形成闪速存储器单元的方法,包括在衬底上形成隧道氧化物的步骤; 在隧道氧化物上形成第一多晶硅层; 在所述第一多晶硅层上形成绝缘层,所述绝缘层包括通过使用SiH 4和N 2 O在约600℃至约850℃的温度下由低压化学气相沉积制成的氧化物层,在NH 3气氛中退火 温度为约800℃至约900℃,并在约820℃至约880℃的温度下使用O 2和H 2进行湿氧化。 在所述绝缘层上形成第二多晶硅层; 至少蚀刻第一多晶硅层,第二多晶硅层和绝缘层,从而限定至少一个堆叠栅极结构; 以及在衬底中形成源区和漏区,由此形成至少一个存储单元。

    Nitrogen ion implanted amorphous silicon to produce oxidation resistant
and finer grain polysilicon based floating gates
    3.
    发明授权
    Nitrogen ion implanted amorphous silicon to produce oxidation resistant and finer grain polysilicon based floating gates 失效
    氮离子注入的非晶硅,以产生抗氧化和更细晶粒多晶硅的浮栅

    公开(公告)号:US6114230A

    公开(公告)日:2000-09-05

    申请号:US993443

    申请日:1997-12-18

    摘要: A polysilicon-based floating gate is formed so as to be resistant to oxidation that occurs during multiple thermo-cycles in fabrication. Accordingly, edge erase times in NOR-type memory devices may be minimized. Additionally, manufacture of oxidation resistant floating gates reduces variations in edge erase times among multiple NOR-type memory devices. A layer of amorphous silicon is deposited over a silicon substrate by directing a mixture of silane and a phosphene-helium gas mixture at the surface of the silicon substrate. Later, N+ ions are implanted into the amorphous silicon. The amorphous silicon layer is then etched so as to overlap slightly with regions that will later correspond to the source and drain regions. Next, a lower oxide layer of an ONO dielectric is deposited and the device is heated. A thermo-cycle is eliminated by heating the amorphous silicon during formation of the oxide layer rather than immediately following its deposition. Later, the nitride and oxide layers of the ONO dielectric, a second polysilicon layer, a tungsten silicide layer, and SiON layers are successively formed.

    摘要翻译: 形成基于多晶硅的浮栅,以便在制造中的多个热循环期间耐氧化。 因此,NOR型存储器件中的边沿擦除时间可以最小化。 此外,抗氧化浮动栅极的制造减少了多个NOR型存储器件之间的边缘擦除时间的变化。 通过在硅衬底的表面处引导硅烷和磷 - 氦气混合物的混合物,在硅衬底上沉积非晶硅层。 之后,将N +离子注入到非晶硅中。 然后蚀刻非晶硅层,以便稍后与稍后对应于源极和漏极区的区域重叠。 接下来,沉积ONO电介质的低氧化物层,并加热该器件。 通过在形成氧化物层期间加热非晶硅而不是在其沉积之后立即消除热循环。 随后,依次形成ONO电介质,第二多晶硅层,硅化钨层和SiON层的氮化物层和氧化物层。

    Manufacturing process to eliminate polystringers in high density
nand-type flash memory devices
    4.
    发明授权
    Manufacturing process to eliminate polystringers in high density nand-type flash memory devices 失效
    消除高密度nand型闪存器件中的多边形的制造工艺

    公开(公告)号:US5994239A

    公开(公告)日:1999-11-30

    申请号:US993343

    申请日:1997-12-18

    IPC分类号: H01L21/762 H01L21/00

    摘要: Polystringers that cause NAND-type memory core cells to malfunction are removed. A SiON layer, tungsten silicide layer, second polysilicon layer, ONO dielectric, and first polysilicon layer are successively removed from between NAND-type flash memory core cells leaving ONO fence that shields some first polysilicon layer material from removal. Next, the device is exposed to oxygen gas in a high temperature environment to oxidize the surface of the device, and in particular to remove the polystringers.

    摘要翻译: 导致NAND型存储器核心单元发生故障的聚束器被去除。 从NAND型闪速存储器核心单元之间连续地去除SiON层,硅化钨层,第二多晶硅层,ONO电介质和第一多晶硅层,留下ONO栅栏,屏蔽了一些第一多晶硅层材料的去除。 接下来,该装置在高温环境中暴露于氧气以氧化装置的表面,并且特别是去除多边形。

    Soybean Plant and Seed Corresponding to Transgenic Event MON87754 and Methods for Detection Thereof
    5.
    发明申请
    Soybean Plant and Seed Corresponding to Transgenic Event MON87754 and Methods for Detection Thereof 有权
    大豆植物和种子对应于转基因事件MON87754及其检测方法

    公开(公告)号:US20110252510A1

    公开(公告)日:2011-10-13

    申请号:US13060852

    申请日:2009-07-15

    摘要: The present invention provides the transgenic soybean event MON87754, and the cells, seeds, plant parts, and plants comprising DNA diagnostic for this transgenic soybean event. The event itself functions to increase the oil content of soybeans carrying the event in their genome relative to commodity versions of soy. The invention also provides compositions comprising nucleotide sequences that are diagnostic for said soybean event in a sample, methods for detecting the presence of said soybean event nucleotide sequences in a sample, probes and primers for use in detecting nucleotide sequences that are diagnostic for the presence of said soybean event in a sample, growing the seeds of such soybean event into soybean plants, and breeding to produce soybean plants comprising DNA diagnostic for the soybean event.

    摘要翻译: 本发明提供了转基因大豆事件MON87754以及包含对该转基因大豆事件诊断的DNA的细胞,种子,植物部分和植物。 该事件本身的作用是增加大豆在其基因组中携带与大豆商品版相关事件的含油量。 本发明还提供了包含对样品中的所述大豆事件进行诊断的核苷酸序列的组合物,用于检测样品中所述大豆事件核苷酸序列的存在的方法,用于检测诊断存在的核苷酸序列的探针和引物 在样品中说大豆事件,将这种大豆事件的种子种植成大豆植物,并育种以生产包含大豆事件DNA诊断的大豆植物。

    Prosthesis, delivery system and method for neurovascular aneurysm repair
    6.
    发明申请
    Prosthesis, delivery system and method for neurovascular aneurysm repair 审中-公开
    神经血管动脉瘤修复的假体,输送系统和方法

    公开(公告)号:US20060004438A1

    公开(公告)日:2006-01-05

    申请号:US11154056

    申请日:2005-06-15

    IPC分类号: A61F2/06

    摘要: The present invention is directed to a prosthesis for treating an aneurysm, and delivery systems and methods therefor. The prosthesis includes a radially expanding distal section coupled to a helical section, the helical section including a localized feature configured to exclude or retard blood flow into an aneurysm. Methods of loading the prosthesis onto a specially-designed delivery system that facilitates proper orientation of the prosthesis within a target vessel, and methods of using the delivery system to deliver the prosthesis, also are provided.

    摘要翻译: 本发明涉及一种用于治疗动脉瘤的假体及其输送系统及其方法。 所述假体包括联接到螺旋部分的径向扩张的远端部分,所述螺旋部分包括被配置为排除或阻止血液流入动脉瘤的局部特征。 还提供了将假体装载到促进假体在靶容器内的正确取向的专门设计的输送系统上的方法,以及使用输送系统输送假体的方法。

    Catheters with improved transition
    7.
    发明授权
    Catheters with improved transition 有权
    改善过渡的导管

    公开(公告)号:US06702802B1

    公开(公告)日:2004-03-09

    申请号:US09596014

    申请日:2000-06-15

    IPC分类号: A61M2500

    摘要: The present invention is directed to a balloon catheter, such as a dilatation catheter and a stent delivery catheter with improved stiffness transition and specifically with no sudden changes in stiffness along the catheter length. The balloon catheters of the present invention may be used alone or be mounted with a stent in. The balloon catheters of the present invention may be used in peripheral, coronary, or neurovascular applications. The present catheter has more than one portion with different bending stiffness values, each portion comprising of components that gradually transition the bending stiffness of that portion to an adjacent portion, thus reducing the differential in bending stiffness in moving from one region to another, when the catheter is used alone or in combination with a stent in a stent delivery system.

    摘要翻译: 本发明涉及一种球囊导管,例如扩张导管和支架输送导管,其具有改善的刚度转变,具体而言沿导管长度没有突然的刚度变化。 本发明的气囊导管可以单独使用或安装有支架。本发明的气囊导管可用于外周,冠状动脉或神经血管应用。 本导管具有不止一个具有不同弯曲刚度值的部分,每个部分包括将该部分的弯曲刚度逐渐过渡到相邻部分的部件,从而减少了从一个区域移动到另一个区域时的弯曲刚度差异, 导管单独使用或与支架在支架输送系统中组合使用。

    LPCVD oxide and RTA for top oxide of ONO film to improve reliability for
flash memory devices
    8.
    发明授权
    LPCVD oxide and RTA for top oxide of ONO film to improve reliability for flash memory devices 有权
    LPCVD氧化物和RTA用于ONO膜的顶部氧化物,以提高闪存器件的可靠性

    公开(公告)号:US6074917A

    公开(公告)日:2000-06-13

    申请号:US189227

    申请日:1998-11-11

    摘要: In one embodiment, the present invention relates to a method of forming a flash memory cell, involving the steps of forming a tunnel oxide on a substrate; forming a first polysilicon layer over the tunnel oxide; forming an insulating layer over the first polysilicon layer, the insulating layer comprising a first oxide layer over the first polysilicon layer, a nitride layer over the first oxide layer, and a second oxide layer over the nitride layer, wherein the second oxide layer is made by forming the second oxide layer by low pressure chemical vapor deposition at a temperature from about 600.degree. C. to about 850.degree. C. using SiH.sub.4 and N.sub.2 O and annealing in an N.sub.2 O atmosphere at a temperature from about 700.degree. C. to about 950.degree. C.; forming a second polysilicon layer over the insulating layer; etching at least the first polysilicon layer, the second polysilicon layer and the insulating layer, thereby defining at least one stacked gate structure; and forming a source region and a drain region in the substrate, thereby forming at least one memory cell.

    摘要翻译: 在一个实施例中,本发明涉及一种形成闪速存储器单元的方法,包括在衬底上形成隧道氧化物的步骤; 在隧道氧化物上形成第一多晶硅层; 在所述第一多晶硅层上形成绝缘层,所述绝缘层包括所述第一多晶硅层上的第一氧化物层,所述第一氧化物层上的氮化物层和所述氮化物层上的第二氧化物层,其中所述第二氧化物层被制成 通过使用SiH 4和N 2 O在约600℃至约850℃的温度下通过低压化学气相沉积形成第二氧化物层,并在N2O气氛中在约700℃至约950℃的温度下退火 C。; 在所述绝缘层上形成第二多晶硅层; 至少蚀刻第一多晶硅层,第二多晶硅层和绝缘层,从而限定至少一个堆叠栅极结构; 以及在衬底中形成源区和漏区,由此形成至少一个存储单元。

    TEST VEHICLES FOR EVALUATING RESISTANCE OF THIN LAYERS
    9.
    发明申请
    TEST VEHICLES FOR EVALUATING RESISTANCE OF THIN LAYERS 有权
    用于评估薄层电阻的测试车辆

    公开(公告)号:US20140084948A1

    公开(公告)日:2014-03-27

    申请号:US13624104

    申请日:2012-09-21

    IPC分类号: G01R27/08 H01L21/3205

    摘要: Provided are test vehicles for evaluating various semiconductor materials. These materials may be used for various integrated circuit components, such as embedded resistors of resistive random access memory cells. Also provided are methods of fabricating and operating these test vehicles. A test vehicle may include two stacks protruding through an insulating body. Bottom ends of these stacks may include n-doped poly-silicon and may be interconnected by a connector. Each stack may include a titanium nitride layer provided over the poly-silicon end, followed by a titanium layer over the titanium nitride layer and a noble metal layer over the titanium layer. The noble metal layer extends to the top surface of the insulating body and forms a contact surface. The titanium layer may be formed in-situ with the noble metal layer to minimize oxidation of the titanium layer, which is used as an adhesion and oxygen getter.

    摘要翻译: 提供用于评估各种半导体材料的测试车辆。 这些材料可用于各种集成电路部件,例如电阻随机存取存储器单元的嵌入式电阻器。 还提供了制造和操作这些测试车辆的方法。 测试车辆可以包括通过绝缘体突出的两个堆叠。 这些堆叠的底端可以包括n掺杂的多晶硅,并且可以通过连接器互连。 每个堆叠可以包括设置在多晶硅端上的氮化钛层,随后是氮化钛层上的钛层和钛层上的贵金属层。 贵金属层延伸到绝缘体的顶表面并形成接触表面。 钛层可以与贵金属层原位形成,以最小化用作粘合和氧气吸气剂的钛层的氧化。

    Measuring device and method of measuring
    10.
    发明申请
    Measuring device and method of measuring 有权
    测量装置及测量方法

    公开(公告)号:US20050115093A1

    公开(公告)日:2005-06-02

    申请号:US10903718

    申请日:2004-07-30

    摘要: a device for measuring dimensions in a hollow organ of the body, includes: a length of conduit; a measuring mechanism on one end of the conduit; and an indicator in connection with a second end of the conduit. The indicator is in operative connection with the measuring mechanism to provide an indication of a dimension measured by the measuring mechanism. In one embodiment, the measuring mechanism includes extending members that open and close in the manner of forceps to contact the walls of the organ.

    摘要翻译: 一种用于测量身体中空器官尺寸的装置,包括:一段导管; 导管一端的测量机构; 以及与导管的第二端连接的指示器。 指示器与测量机构操作连接,以提供由测量机构测量的尺寸的指示。 在一个实施例中,测量机构包括以镊子的方式打开和关闭的延伸构件以接触器官的壁。