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    Light mixing module
    3.
    发明授权
    Light mixing module 有权
    光混合模块

    公开(公告)号：US08870431B2

    公开(公告)日：2014-10-28

    申请号：US13331053

    申请日：2011-12-20

    申请人： Hui-Hsiung Lin ,  Chiun-Lern Fu ,  Hsiao-Wen Hung ,  Wen-Hsun Yang ,  Chi-Hung Liao ,  Wen-Jung Chen

    发明人： Hui-Hsiung Lin ,  Chiun-Lern Fu ,  Hsiao-Wen Hung ,  Wen-Hsun Yang ,  Chi-Hung Liao ,  Wen-Jung Chen

    IPC分类号： F21V7/04 ,  G02F1/1335 ,  F21V8/00 ,  F21Y105/00 ,  F21K99/00 ,  F21Y101/02 ,  F21V5/00

    CPC分类号： G02F1/133602 ,  F21K9/62 ,  F21K9/64 ,  F21V5/002 ,  F21Y2105/00 ,  F21Y2115/10 ,  G02B6/0036 ,  G02B6/005 ,  G02F1/133606 ,  G02F2001/133614

    摘要： A mixing light module includes a matrix, a fluorescent film, and a plurality of micro-structures. The matrix includes an incidence surface, an emission surface and a reflective surface. The fluorescent film disposed on or above the emission surface has an upper surface and a lower surface and includes a plurality of fluorescent particles. The matrix receives a first light having a first wavelength, and the reflective surface reflects the first light to make the first light to be emitted from the emission surface. Since the plurality of fluorescent particles receives a part of the first light from the emission surface, the plurality of fluorescent particles is excited to emit a second light having a second wavelength. The second light and the first light are mixed into a predetermined light. The plurality of micro-structures is used to make the first light or the second light uniform.

    摘要翻译： 混合光模块包括基体，荧光膜和多个微结构。 该矩阵包括入射表面，发射表面和反射表面。 布置在发射表面上或上方的荧光膜具有上表面和下表面，并且包括多个荧光颗粒。 矩阵接收具有第一波长的第一光，并且反射表面反射第一光以使第一光从发射表面发射。 由于多个荧光颗粒从发射表面接收第一光的一部分，所以激发多个荧光粒子发射具有第二波长的第二光。 将第二光和第一光混合成预定光。 多个微结构用于使第一光或第二光均匀。

    Method to simplify twin stage scanner OVL machine matching
    4.
    发明授权
    Method to simplify twin stage scanner OVL machine matching 有权
    简化双级扫描仪OVL机器匹配的方法

    公开(公告)号：US07333173B2

    公开(公告)日：2008-02-19

    申请号：US10818582

    申请日：2004-04-06

    申请人： Shun-Jiang Chiang ,  Chi-Hung Liao ,  Heng-Hsin Liu

    发明人： Shun-Jiang Chiang ,  Chi-Hung Liao ,  Heng-Hsin Liu

    IPC分类号： G03B27/42 ,  G03B27/32

    CPC分类号： G03F7/70633

    摘要： Multiple scanner or stepper machines are provided. A photoresist layer is coated on a monitor wafer. The photoresist layer is exposed through a mask pattern on a first of the multiple machines. The mask pattern is shifted by an offset and the photoresist layer is exposed through the mask pattern on another of the multiple machines. The shifting and exposing steps are continued for each of the multiple machines. A pattern on the monitor wafer is measured using an overlay measurement tool. Machine constants for each machine except the first machine of the multiple machines are updated based on results of the measuring to provide overlay control machine matching.

    摘要翻译： 提供多台扫描仪或步进机。 将光致抗蚀剂层涂覆在监视器晶片上。 光致抗蚀剂层通过多个机器中的第一个上的掩模图案曝光。 掩模图案偏移偏移，并且光致抗蚀剂层通过多个机器中的另一个上的掩模图案曝光。 对于多台机器中的每一台，继续移动和曝光步骤。 使用覆盖测量工具测量监视器晶片上的图案。 除了多台机器的第一台机器之外的每台机器的机器常数都会根据测量结果进行更新，以提供覆盖控制机器的匹配。

    METHOD OF WAFER HEIGHT MAPPING
    5.
    发明申请
    METHOD OF WAFER HEIGHT MAPPING 失效
    WAFER HEIGHT MAPPING方法

    公开(公告)号：US20050259272A1

    公开(公告)日：2005-11-24

    申请号：US10849455

    申请日：2004-05-19

    申请人： Chun-Sheng Wang ,  Yi-Chang Sung ,  Chi-Hung Liao ,  Li-Kong Turn ,  Louie Liu

    发明人： Chun-Sheng Wang ,  Yi-Chang Sung ,  Chi-Hung Liao ,  Li-Kong Turn ,  Louie Liu

    IPC分类号： G01B11/00 ,  G01B11/06 ,  G01B11/30 ,  G03B27/52 ,  G03F9/00

    CPC分类号： G01B11/0608 ,  G03F9/7034 ,  G03F9/7069 ,  G03F9/7088

    摘要： An improved method of wafer height mapping using a wafer level sensor eliminates or substantially minimizes the “spacing” in the wafer height mapping data usually caused by having an exposure field on a wafer whose width is less than the width of the measurement spot array of the wafer level sensor and also not being a multiple of the width of a single measurement spot. According to the improved method, the measurement spot array is first translated towards one edge of the exposure field and scanned. Then the measurement spot array is translated towards the other edge of the exposure field and scanned second time to map the area that was missed during the first mapping scan.

    摘要翻译： 使用晶片级传感器的晶片高度映射的改进方法消除或基本上最小化晶片高度映射数据中的“间隔”，通常是由于在晶片上具有宽度小于其的测量点阵列的宽度的曝光场 晶圆级传感器，也不是单个测量点的宽度的倍数。 根据改进的方法，测量点阵列首先被转换成曝光场的一个边缘并进行扫描。 然后，测量点阵列朝向曝光区域的另一边缘平移，第二次扫描以映射第一次映射扫描期间遗漏的区域。

    Method for improved photomask alignment after epitaxial process through 90° orientation change
    6.
    发明授权
    Method for improved photomask alignment after epitaxial process through 90° orientation change 有权
    在通过90°取向变化的外延工艺后改进光掩模对准的方法

    公开(公告)号：US06468704B1

    公开(公告)日：2002-10-22

    申请号：US09835027

    申请日：2001-04-16

    申请人： Chi-Hung Liao ,  Yih-Ann Lin ,  Sheng-Liang Pan ,  Cheng-Yu Chu ,  Kuo-Liang Lu ,  Yu Hsi Wang

    发明人： Chi-Hung Liao ,  Yih-Ann Lin ,  Sheng-Liang Pan ,  Cheng-Yu Chu ,  Kuo-Liang Lu ,  Yu Hsi Wang

    IPC分类号： G03F900

    CPC分类号： G03F9/7046 ,  G03F9/7076 ,  H01L23/544 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A method for alignment to an alignment mark array within a patterned electronic material layer, formed on a substrate employed in a microelectronics fabrication, with improved registration accuracy of a subsequent step-and-repeat photomask pattern. There is first provided a substrate upon which is formed a patterned microelectronics layer containing an alignment mark array. There is then formed over the substrate and patterned layer, covering over the alignment marks, a subsequent layer or layers which may be of opaque material. In order to align properly a patterned photomask for patterning the overlying layer by means of conventional photolithography, the alignment mark array is located by first scanning with a laser light source contained within a step-and-repeat apparatus containing the patterned photomask and detecting the optical radiation signal scattered from the alignment mark array. The accuracy of location may be enhanced by rotating the orientation of the alignment mark array with respect to the direction of scanning with the laser light source by 90 degrees to render the subsequent orientation orthogonal to the first orientation, and then repeating the scanning operation. The altered nature of the back-scattered light signal from the orthogonal scanning direction provides additional information for improving the precision of location and alignment.

    摘要翻译： 一种用于对准图案化电子材料层内的对准标记阵列的方法，其形成在微电子制造中使用的衬底上，具有改进的后续步进重复光掩模图案的配准精度。 首先设置有基板，在其上形成包含对准标记阵列的图案化微电子层。 然后在衬底和图案化层上形成覆盖对准标记的后续层或层，其可以是不透明材料。 为了适当地对准用于通过常规光刻法图案化上覆层的图案化光掩模，通过首先用包含在包含图案化光掩模的步进重复设备中的激光源进行扫描来定位对准标记阵列，并且检测光学 从对准标记阵列散射的辐射信号。 可以通过将对准标记阵列的方向相对于激光光源的扫描方向旋转90度来使得随后的方向与第一方位正交，然后重复扫描操作来提高位置的精度。 来自正交扫描方向的反向散射光信号的改变性质提供了用于提高位置和对准精度的附加信息。

    LIGHT MIXING MODULE
    7.
    发明申请
    LIGHT MIXING MODULE 有权
    光混合模块

    公开(公告)号：US20120170282A1

    公开(公告)日：2012-07-05

    申请号：US13331053

    申请日：2011-12-20

    申请人： Hui-Hsiung Lin ,  Chiun-Lern Fu ,  Hsiao-Wen Hung ,  Wen-Hsun Yang ,  Chi-Hung Liao ,  Wen-Jung Chen

    发明人： Hui-Hsiung Lin ,  Chiun-Lern Fu ,  Hsiao-Wen Hung ,  Wen-Hsun Yang ,  Chi-Hung Liao ,  Wen-Jung Chen

    IPC分类号： F21V9/16 ,  F21V7/00

    CPC分类号： G02F1/133602 ,  F21K9/62 ,  F21K9/64 ,  F21V5/002 ,  F21Y2105/00 ,  F21Y2115/10 ,  G02B6/0036 ,  G02B6/005 ,  G02F1/133606 ,  G02F2001/133614

    摘要： A mixing light module includes a matrix, a fluorescent film, and a plurality of micro-structures. The matrix includes an incidence surface, an emission surface and a reflective surface. The fluorescent film disposed on or above the emission surface has an upper surface and a lower surface and includes a plurality of fluorescent particles.The matrix receives a first light having a first wavelength, and the reflective surface reflects the first light to make the first light to be emitted from the emission surface. Since the plurality of fluorescent particles receives a part of the first light from the emission surface, the plurality of fluorescent particles is excited to emit a second light having a second wavelength. The second light and the first light are mixed into a predetermined light. The plurality of micro-structures is used to make the first light or the second light uniform.

    摘要翻译： 混合光模块包括基体，荧光膜和多个微结构。 该矩阵包括入射表面，发射表面和反射表面。 布置在发射表面上或上方的荧光膜具有上表面和下表面，并且包括多个荧光颗粒。 矩阵接收具有第一波长的第一光，并且反射表面反射第一光以使第一光从发射表面发射。 由于多个荧光颗粒从发射表面接收第一光的一部分，所以激发多个荧光粒子发射具有第二波长的第二光。 将第二光和第一光混合成预定光。 多个微结构用于使第一光或第二光均匀。

    Color dividing optical device and image apparatus with the application
    8.
    发明授权
    Color dividing optical device and image apparatus with the application 有权
    分色光学装置与图像装置的应用

    公开(公告)号：US08189260B2

    公开(公告)日：2012-05-29

    申请号：US12414649

    申请日：2009-03-30

    申请人： Hui-Hsiung Lin ,  Chi-Hung Liao

    发明人： Hui-Hsiung Lin ,  Chi-Hung Liao

    IPC分类号： G02B5/18 ,  G02B27/10

    CPC分类号： G02B27/1086 ,  G02B3/0037 ,  G02B5/1842 ,  G02B5/1866 ,  G02B19/0028 ,  G02B19/0066 ,  G02B27/1006 ,  G02B27/102 ,  G02B27/123

    摘要： A color dividing optical device has an integrated structure of dual surfaces, each has a micro/nano structure. The optical device can perform beam splitting and color dividing on an incident light source, which has a constitution from multiple different wavelengths. In a space, the original incident light source is equally split into multiple light beams in an array, according to light intensity. At the same time, the light beam constituted from different wavelengths is divided into multiple sub-light sources, according to the wavelength, so as to have the function to propagate a color array with color dividing. The optical device with capability of modulating the color wavelengths can transform the wide-band incident light source into sub-light beams in array with color dividing (wavelength dividing) and beam splitting.

    摘要翻译： 分色光学装置具有双面表面的整体结构，每个具有微/纳米结构。 光学装置可以在具有多个不同波长的结构的入射光源上进行光束分割和分色。 在一个空间中，根据光强度，原始入射光源被等分成阵列中的多个光束。 同时，根据波长将由不同波长构成的光束分成多个子光源，以具有传播彩色分色的功能。 具有调制色彩波长能力的光学装置可以将宽带入射光源变换成具有分色（波长分割）和分束的阵列中的亚光束。

    System and method for photolithography in semiconductor manufacturing
    9.
    发明授权
    System and method for photolithography in semiconductor manufacturing 有权
    半导体制造中的光刻系统和方法

    公开(公告)号：US07968258B2

    公开(公告)日：2011-06-28

    申请号：US11129968

    申请日：2005-05-16

    申请人： Wei-Yu Su ,  Yi-Ming Dai ,  Chi-Hung Liao ,  Chun-Hung Kung

    发明人： Wei-Yu Su ,  Yi-Ming Dai ,  Chi-Hung Liao ,  Chun-Hung Kung

    IPC分类号： G03F9/00 ,  G03F7/20

    CPC分类号： G03F9/7026 ,  G03F9/7011 ,  G03F9/7019

    摘要： A method for photolithography in semiconductor manufacturing includes providing one or more masks for a wafer; defining a reference focus plane of a first mask of the one or more masks; defining a reference focus plane of a second mask of the one or more masks; and determining the best focus for the second mask based on the best focus of the first mask and the Z direction difference of the first and second masks, using the reference focus planes of the first and second masks.

    摘要翻译： 半导体制造中的光刻方法包括：提供用于晶片的一个或多个掩模; 定义所述一个或多个掩模的第一掩模的参考聚焦平面; 定义所述一个或多个掩模的第二掩模的参考聚焦平面; 并且使用第一和第二掩模的参考聚焦平面，基于第一掩模的最佳焦点和第一和第二掩模的Z方向差确定第二掩模的最佳聚焦。