Method for Laterally Cutting Through a Semiconductor Wafer and Optoelectronic Component
    5.
    发明申请
    Method for Laterally Cutting Through a Semiconductor Wafer and Optoelectronic Component 有权
    用于横向切割半导体晶片和光电元件的方法

    公开(公告)号:US20090290610A1

    公开(公告)日:2009-11-26

    申请号:US11991488

    申请日:2006-08-07

    IPC分类号: H01S5/00 H01L21/30 H01L33/00

    摘要: A method for laterally dividing a semiconductor wafer (1) comprises the method steps of: providing a growth substrate (2); epitaxially growing a semiconductor layer sequence (3), which comprises a functional semiconductor layer (5), onto the growth substrate (2); applying a mask layer (10) to partial regions of the semiconductor layer sequence (3) in order to produce masked regions (11) and unmasked regions (12); implanting ions through the unmasked regions (12) in order to produce implantation regions (13) in the semiconductor wafer (1); and dividing the semiconductor wafer (1) along the implantation regions (13), wherein the growth substrate (2) or at least one part of the growth substrate (2) is separated from the semiconductor wafer.

    摘要翻译: 一种用于横向分割半导体晶片(1)的方法包括以下方法步骤:提供生长衬底(2); 在生长衬底(2)上外延生长包括功能半导体层(5)的半导体层序列(3); 将掩模层(10)施加到所述半导体层序列(3)的部分区域以产生掩蔽区域(11)和未屏蔽区域(12); 通过未掩模区域(12)注入离子,以便在半导体晶片(1)中产生注入区域(13); 以及沿着所述注入区域(13)划分所述半导体晶片(1),其中所述生长衬底(2)或所述生长衬底(2)的至少一部分与所述半导体晶片分离。

    Optoelectronic component
    8.
    发明授权
    Optoelectronic component 有权
    光电元件

    公开(公告)号:US08406265B2

    公开(公告)日:2013-03-26

    申请号:US12679892

    申请日:2008-08-29

    IPC分类号: H01S5/00 H01S3/091

    摘要: An optoelectronic component (1) is specified, comprising a semiconductor body (2) with a semiconductor layer sequence. The semiconductor layer sequence of the semiconductor body (2) comprises a pump region (3) provided for generating a pump radiation and an emission region (4) provided for generating an emission radiation. The emission region (4) and the pump region (3) are arranged one above the other. The pump radiation optically pumps the emission region (4) during operation of the optoelectronic component (1). The emission radiation emerges from the semiconductor body (2) with the semiconductor layer sequence in a lateral direction during operation of the optoelectronic component (1).

    摘要翻译: 规定了光电子部件(1),其包括具有半导体层序列的半导体本体(2)。 半导体本体(2)的半导体层序列包括用于产生泵浦辐射的泵浦区域(3)和用于产生发射辐射的发射区域(4)。 发射区域(4)和泵浦区域(3)彼此上下排列。 在光电子部件(1)的操作期间,泵浦辐射光学泵浦发射区域(4)。 在光电子部件(1)的操作期间,发射辐射从半导体本体(2)出射,半导体层序列沿横向方向。

    Optoelectronic Component
    9.
    发明申请
    Optoelectronic Component 有权
    光电元件

    公开(公告)号:US20100296538A1

    公开(公告)日:2010-11-25

    申请号:US12679892

    申请日:2008-08-29

    IPC分类号: H01S5/343

    摘要: An optoelectronic component (1) is specified, comprising a semiconductor body (2) with a semiconductor layer sequence. The semiconductor layer sequence of the semiconductor body (2) comprises a pump region (3) provided for generating a pump radiation and an emission region (4) provided for generating an emission radiation. The emission region (4) and the pump region (3) are arranged one above the other. The pump radiation optically pumps the emission region (4) during operation of the optoelectronic component (1). The emission radiation emerges from the semiconductor body (2) with the semiconductor layer sequence in a lateral direction during operation of the optoelectronic component (1).

    摘要翻译: 规定了光电子部件(1),其包括具有半导体层序列的半导体本体(2)。 半导体本体(2)的半导体层序列包括用于产生泵浦辐射的泵浦区域(3)和用于产生发射辐射的发射区域(4)。 发射区域(4)和泵浦区域(3)彼此上下排列。 在光电子部件(1)的操作期间,泵浦辐射光学泵浦发射区域(4)。 在光电子部件(1)的操作期间,发射辐射从半导体本体(2)出射,半导体层序列沿横向方向。

    Method for laterally cutting through a semiconductor wafer and optoelectronic component
    10.
    发明授权
    Method for laterally cutting through a semiconductor wafer and optoelectronic component 有权
    用于横向切割半导体晶片和光电子部件的方法

    公开(公告)号:US07943484B2

    公开(公告)日:2011-05-17

    申请号:US11991488

    申请日:2006-08-07

    IPC分类号: H01L21/30

    摘要: A method for laterally dividing a semiconductor wafer (1) comprises the method steps of: providing a growth substrate (2); epitaxially growing a semiconductor layer sequence (3), which comprises a functional semiconductor layer (5), onto the growth substrate (2); applying a mask layer (10) to partial regions of the semiconductor layer sequence (3) in order to produce masked regions (11) and unmasked regions (12); implanting ions through the unmasked regions (12) in order to produce implantation regions (13) in the semiconductor wafer (1); and dividing the semiconductor wafer (1) along the implantation regions (13), wherein the growth substrate (2) or at least one part of the growth substrate (2) is separated from the semiconductor wafer.

    摘要翻译: 一种用于横向分割半导体晶片(1)的方法包括以下方法步骤:提供生长衬底(2); 在生长衬底(2)上外延生长包括功能半导体层(5)的半导体层序列(3); 将掩模层(10)施加到所述半导体层序列(3)的部分区域以产生掩蔽区域(11)和未屏蔽区域(12); 通过未掩模区域(12)注入离子,以便在半导体晶片(1)中产生注入区域(13); 以及沿着所述注入区域(13)划分所述半导体晶片(1),其中所述生长衬底(2)或所述生长衬底(2)的至少一部分与所述半导体晶片分离。