Metal oxynitride transistor devices
    4.
    发明申请
    Metal oxynitride transistor devices 审中-公开
    金属氮氧化物晶体管器件

    公开(公告)号:US20160308067A1

    公开(公告)日:2016-10-20

    申请号:US14545285

    申请日:2015-04-17

    摘要: A thin film transistor with a first metal oxynitride channel layer or a first metal oxide channel layer is provided to have controlled channel doping concentrations in a bottom surface region, a central channel region and a top surface region so that doping concentration ratios between the bottom surface region and the central channel region and between the top surface region and the central channel region are greater than a first threshold doping ratio and less than a second threshold doping ratio in order to retain more uniform charge carrier mobility values in the first channel layer and to improve the performance of the thin film transistor devices.

    摘要翻译: 提供了具有第一金属氧氮化物沟道层或第一金属氧化物沟道层的薄膜晶体管,以在底表面区域,中心沟道区域和顶表面区域中具有受控的沟道掺杂浓度,使得底表面 区域和中心沟道区域之间以及顶表面区域和中心沟道区域之间的区域大于第一阈值掺杂比并且小于第二阈值掺杂比,以便在第一沟道层中保持更均匀的载流子迁移率值,并且 提高薄膜晶体管器件的性能。

    HIGH ELECTRON MOBILITY THIN FILM TRANSISTORS

    公开(公告)号:US20200075778A1

    公开(公告)日:2020-03-05

    申请号:US15999949

    申请日:2018-09-05

    摘要: Structures of high electron mobility thin film transistors (HEM-TFTs) are provided in this invention. In one embodiment, HEM-TFTs with a single heterojunction structure are disclosed to have a substrate, a first metal oxide channel layer, a first spacer layer, a first doped layer, a first barrier layer, a source, a drain and a gate. In another embodiment, HEM-TFTs with a double heterojunction structure are provided to have a substrate, a second barrier layer, a second doped layer, a second spacer layer, a first metal oxide channel layer, a second spacer layer, a second doped layer, a second barrier layer, a source, a drain and a gate. In yet another embodiment, HEM-TFTs with a single heterojunction structure are disclosed to comprise a substrate, a first metal oxynitride channel layer, a first spacer layer, a first doped layer, a first barrier layer, a source, a drain and a gate. In still another embodiment, HEM-TFTs with a double heterojunction structure are provided to include a substrate, a first barrier layer, a first doped layer, a first spacer layer, a first metal oxynitride channel layer, a second spacer layer, a second doped layer, a second barrier layer, a source, a drain and a gate.