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1.发明申请公开(公告)号：US20120205787A1
公开(公告)日：2012-08-16
申请号：US13423838
申请日：2012-03-19
申请人： Dario L. Goldfarb , Libor Vyklick , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
发明人： Dario L. Goldfarb , Libor Vyklick , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
IPC分类号： H01L21/312 , H01L29/02
CPC分类号： G03F7/091
摘要： An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
摘要翻译： 提供了包含至少两种聚合物组分并且包含发色团部分和透明部分的抗反射涂层。 抗反射涂层可用于提供在光致抗蚀剂层下形成的单层复合渐变抗反射涂层。
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公开(公告)号：US08137874B2
公开(公告)日：2012-03-20
申请号：US12018541
申请日：2008-01-23
申请人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
发明人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
CPC分类号： G03F7/091
摘要： An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
摘要翻译： 提供了包含至少两种聚合物组分并且包含发色团部分和透明部分的抗反射涂层。 抗反射涂层可用于提供在光致抗蚀剂层下形成的单层复合渐变抗反射涂层。
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3.发明申请公开(公告)号：US20090186294A1
公开(公告)日：2009-07-23
申请号：US12018541
申请日：2008-01-23
申请人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
发明人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
CPC分类号： G03F7/091
摘要： An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
摘要翻译： 提供了包含至少两种聚合物组分并且包含发色团部分和透明部分的抗反射涂层。 抗反射涂层可用于提供在光致抗蚀剂层下形成的单层复合渐变抗反射涂层。
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公开(公告)号：US08652762B2
公开(公告)日：2014-02-18
申请号：US13423838
申请日：2012-03-19
申请人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
发明人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
IPC分类号： H01L21/312 , H01L29/02 , G03F7/38
CPC分类号： G03F7/091
摘要： An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
摘要翻译： 提供了包含至少两种聚合物组分并且包含发色团部分和透明部分的抗反射涂层。 抗反射涂层可用于提供在光致抗蚀剂层下形成的单层复合渐变抗反射涂层。
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公开(公告)号：US06818381B2
公开(公告)日：2004-11-16
申请号：US10026184
申请日：2001-12-21
申请人： Mahmoud M. Khojasteh , Timothy M. Hughes , Ranee W. Kwong , Pushkara Rao Varanasi , William R. Brunsvold , Margaret C. Lawson , Robert D. Allen , David R. Medeiros , Ratnam Sooriyakumaran , Phillip Brock
发明人： Mahmoud M. Khojasteh , Timothy M. Hughes , Ranee W. Kwong , Pushkara Rao Varanasi , William R. Brunsvold , Margaret C. Lawson , Robert D. Allen , David R. Medeiros , Ratnam Sooriyakumaran , Phillip Brock
IPC分类号： G03F711
CPC分类号： G03F7/094 , G03F7/0045 , G03F7/0382 , G03F7/0395 , G03F7/0758 , G11B5/3163
摘要： Compositions suitable for forming planarizing underlayers for multilayer lithographic processes are characterized by the presence of (A) a polymer containing: (i) cyclic ether moieties, (ii) saturated polycyclic moieties, and (iii) aromatic moieties for compositions not requiring a separate crosslinker, or (B) a polymer containing: (i) saturated polycyclic moieties, and (ii) aromatic moieties for compositions requiring a separate crosslinker. The compositions provide outstanding optical, mechanical and etch selectivity properties. The compositions are especially useful in lithographic processes using radiation less than 200 nm in wavelength to configure underlying material layers.
摘要翻译： 适用于形成用于多层平版印刷工艺的平坦化底层的组合物的特征在于（A）含有（i）环醚部分，（ii）饱和多环部分和（iii）不需要单独交联剂的组合物的芳族部分的聚合物 ，或（B）含有：（i）饱和多环部分的聚合物，和（ii）需要单独交联剂的组合物的芳族部分。 该组合物提供优异的光学，机械和蚀刻选择性。 组合物在使用波长小于200nm的辐射的光刻工艺中特别有用，以配置下层材料层。
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公开(公告)号：US06927015B2
公开(公告)日：2005-08-09
申请号：US10920762
申请日：2004-08-18
申请人： Mahmoud M. Khojasteh , Timothy M. Hughes , Ranee W. Kwong , Pushkara Rao Varanasi , William R. Brunsvold , Margaret C. Lawson , Robert D. Allen , David R. Medeiros , Ratnam Sooriyakumaran , Phillip Brock
发明人： Mahmoud M. Khojasteh , Timothy M. Hughes , Ranee W. Kwong , Pushkara Rao Varanasi , William R. Brunsvold , Margaret C. Lawson , Robert D. Allen , David R. Medeiros , Ratnam Sooriyakumaran , Phillip Brock
IPC分类号： C08F30/08 , C08F32/00 , C08F230/08 , C08K5/41 , C08K5/54 , C08L43/04 , C08L45/00 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/075 , G03F7/09 , G11B5/31 , H01L21/027 , G03F7/40 , G03F7/11
CPC分类号： G03F7/094 , G03F7/0045 , G03F7/0382 , G03F7/0395 , G03F7/0758 , G11B5/3163
摘要： Compositions suitable for forming planarizing underlayers for multilayer lithographic processes are characterized by the presence of (A) a polymer containing: (i) cyclic ether moieties, (ii) saturated polycyclic moieties, and (iii) aromatic moieties for compositions not requiring a separate crosslinker, or (B) a polymer containing: (i) saturated polycyclic moieties, and (ii) aromatic moieties for compositions requiring a separate crosslinker. The compositions provide outstanding optical, mechanical and etch selectivity properties. The compositions are especially useful in lithographic processes using radiation less than 200 nm in wavelength to configure underlying material layers.
摘要翻译： 适用于形成用于多层平版印刷工艺的平坦化底层的组合物的特征在于（A）含有（i）环醚部分，（ii）饱和多环部分和（iii）不需要单独交联剂的组合物的芳族部分的聚合物 ，或（B）含有：（i）饱和多环部分的聚合物，和（ii）需要单独交联剂的组合物的芳族部分。 该组合物提供优异的光学，机械和蚀刻选择性。 组合物在使用波长小于200nm的辐射的光刻工艺中特别有用，以配置下层材料层。
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7.发明授权Functionalized carbosilane polymers and photoresist compositions containing the same 有权官能化碳硅烷聚合物和含有它们的光致抗蚀剂组合物公开(公告)号：US07883828B2
公开(公告)日：2011-02-08
申请号：US12057478
申请日：2008-03-28
申请人： Robert D. Allen , Matthew E. Colburn , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong
发明人： Robert D. Allen , Matthew E. Colburn , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong
CPC分类号： G03F7/0757 , C08G77/60 , G03F7/0046 , G03F7/0382 , G03F7/0392 , Y10S430/106 , Y10S430/108 , Y10S430/12 , Y10S430/122 , Y10S430/126
摘要： Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.
摘要翻译： 提供了在193nm处具有小于3.0μm-1的吸光度和相对高的折射率的线性或分支官能化的聚碳硅烷。 官能化聚碳硅烷含有至少一个酸不稳定或水溶性碱可溶的侧基。 还公开了含有适用于光刻（例如浸渍光刻）的官能化聚碳硅烷的光致抗蚀剂制剂。
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公开(公告)号：US20100168337A1
公开(公告)日：2010-07-01
申请号：US12687380
申请日：2010-01-14
IPC分类号： C08L27/12
CPC分类号： G03F7/2041 , G03F7/11 , Y10S438/952
摘要： A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer between an immersion fluid and a photoresist layer, disperse non-homogenously throughout the topcoat layer.
摘要翻译： 用于浸渍光刻的面漆材料和使用面漆材料进行浸渍光刻的方法。 面漆材料包括第一聚合物和第二聚合物的混合物。 面涂层材料的第一和第二聚合物当面涂层材料形成浸渍流体和光致抗蚀剂层之间的顶涂层时，不均匀地分散在整个顶涂层中。
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公开(公告)号：US20090081585A1
公开(公告)日：2009-03-26
申请号：US12057478
申请日：2008-03-28
申请人： Robert D. Allen , Matthew E. Colburn , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong
发明人： Robert D. Allen , Matthew E. Colburn , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong
CPC分类号： G03F7/0757 , C08G77/60 , G03F7/0046 , G03F7/0382 , G03F7/0392 , Y10S430/106 , Y10S430/108 , Y10S430/12 , Y10S430/122 , Y10S430/126
摘要： Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.
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10.发明申请FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME 审中-公开功能性碳化硅聚合物和含有它的光电组合物公开(公告)号：US20090081579A1
公开(公告)日：2009-03-26
申请号：US11859805
申请日：2007-09-24
申请人： Robert D. Allen , Matthew E. Colburn , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong
发明人： Robert D. Allen , Matthew E. Colburn , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong
CPC分类号： G03F7/0757 , C08G77/60 , G03F7/0046 , G03F7/0382 , G03F7/0392 , Y10S430/106 , Y10S430/108 , Y10S430/12 , Y10S430/122 , Y10S430/126
摘要： Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.
摘要翻译： 提供了在193nm处具有小于3.0mum-1的吸光度和相对高的折射率的线性或支化官能化聚碳硅烷。 官能化聚碳硅烷含有至少一个酸不稳定或水溶性碱可溶的侧基。 还公开了含有适用于光刻（例如浸渍光刻）的官能化聚碳硅烷的光致抗蚀剂制剂。
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