UV LED BASED LAMP FOR COMPACT UV CURING LAMP ASSEMBLIES
    1.
    发明申请
    UV LED BASED LAMP FOR COMPACT UV CURING LAMP ASSEMBLIES 有权
    紫外线LED基灯,用于紧凑型UV固化灯组件

    公开(公告)号:US20110147356A1

    公开(公告)日:2011-06-23

    申请号:US12974335

    申请日:2010-12-21

    IPC分类号: H05B3/00

    CPC分类号: H05B3/0057 B05D3/067

    摘要: An ultraviolet (UV) LED-based lamp for UV curing lamp assemblies is disclosed. An array of UV emitting LEDs are packaged together and arranged along the length of a cylindrical lens to form a UV LED-based optical component assembly. The UV LED-based optical component assembly may be made to be modular. A UV LED lamp assembly may comprise a plurality of UV LED-based optical component assemblies arranged around a workpiece tube. The workpiece tube may be filled with an inert gas and may be made of quartz or glass. One or more curved back reflectors may be placed opposite the LED UV LED-based optical component assemblies to collect UV light escaping the workpiece tube and refocus the light to the other side of the workpiece. The UV LEDs may be arranged on a single surface or a multi-level tiered platform.

    摘要翻译: 公开了一种用于UV固化灯组件的紫外(UV)LED基灯。 UV发光LED的阵列被包装在一起并沿着柱面透镜的长度布置以形成基于UV LED的光学部件组件。 UV基于LED的光学部件组件可以被制成模块化的。 UV LED灯组件可以包括围绕工件管布置的多个基于UV LED的光学部件组件。 工件管可以填充惰性气体,并且可以由石英或玻璃制成。 可以将一个或多个弯曲后反射器放置在与LED UV基于LED的光学部件组件相对的位置,以收集从工件管中逸出的UV光并将光重新聚焦到工件的另一侧。 UV LED可以布置在单个表面或多层分层平台上。

    UV LED based lamp for compact UV curing lamp assemblies
    2.
    发明授权
    UV LED based lamp for compact UV curing lamp assemblies 有权
    UV LED灯,用于紧凑的UV固化灯组件

    公开(公告)号:US08357878B2

    公开(公告)日:2013-01-22

    申请号:US12974335

    申请日:2010-12-21

    IPC分类号: H05B1/00 A21B2/00

    CPC分类号: H05B3/0057 B05D3/067

    摘要: An ultraviolet (UV) LED-based lamp for UV curing lamp assemblies is disclosed. An array of UV emitting LEDs are packaged together and arranged along the length of a cylindrical lens to form a UV LED-based optical component assembly. The UV LED-based optical component assembly may be made to be modular. A UV LED lamp assembly may comprise a plurality of UV LED-based optical component assemblies arranged around a workpiece tube. The workpiece tube may be filled with an inert gas and may be made of quartz or glass. One or more curved back reflectors may be placed opposite the LED UV LED-based optical component assemblies to collect UV light escaping the workpiece tube and refocus the light to the other side of the workpiece. The UV LEDs may be arranged on a single surface or a multi-level tiered platform.

    摘要翻译: 公开了一种用于UV固化灯组件的紫外(UV)LED基灯。 UV发光LED的阵列被包装在一起并沿着柱面透镜的长度布置以形成基于UV LED的光学部件组件。 UV基于LED的光学部件组件可以被制成模块化的。 UV LED灯组件可以包括围绕工件管布置的多个基于UV LED的光学部件组件。 工件管可以填充惰性气体,并且可以由石英或玻璃制成。 可以将一个或多个弯曲后反射器放置在与LED UV基于LED的光学部件组件相对的位置,以收集从工件管中逸出的UV光并将光重新聚焦到工件的另一侧。 UV LED可以布置在单个表面或多层分层平台上。

    Elliptical light source for ultraviolet (UV) curing lamp assemblies
    3.
    发明授权
    Elliptical light source for ultraviolet (UV) curing lamp assemblies 失效
    用于紫外(UV)固化灯组件的椭圆光源

    公开(公告)号:US08507884B2

    公开(公告)日:2013-08-13

    申请号:US13344240

    申请日:2012-01-05

    IPC分类号: G21K5/04 G21K5/02

    摘要: A light source having a substantially elliptical cross-section for UV curing lamp assemblies is disclosed. The light source has a pair of end sections and a central section of smaller diameter than the end sections. The end sections are each connected to the central section by a tapered section the diameter of each of which decreases from an end that mates with an end section toward an end that mates with the central section. Each of the end sections has a substantially elliptical cross-section. The central section and the tapered sections may have a substantially elliptical cross-section. The aspect ratio of the elliptical cross-section of the end sections and the central section of the light source is preferably about 2:1.

    摘要翻译: 公开了一种具有用于UV固化灯组件的基本椭圆截面的光源。 光源具有一对端部部分和直径小于端部部分的中心部分。 端部各自通过锥形部分连接,锥形部分的每一个的直径从与端部相配合的端部朝向与中心部分配合的端部减小。 每个端部部分具有大致椭圆形的横截面。 中心部分和锥形部分可以具有基本椭圆形的横截面。 端部的椭圆截面和光源的中心部分的纵横比优选为约2:1。

    Modular magnetron
    4.
    发明授权
    Modular magnetron 有权
    模块式磁控管

    公开(公告)号:US08836220B2

    公开(公告)日:2014-09-16

    申请号:US13557618

    申请日:2012-07-25

    申请人: Darrin Leonhardt

    发明人: Darrin Leonhardt

    IPC分类号: H01J25/50 H01J23/00 H01J65/04

    摘要: A modular magnetron for use in UV curing lamp assembly is disclosed. The modular magnetron includes a vacuum tube having a vacuum tube body, a top assembly, and a bottom assembly. The top assembly is configured to substantially overlay the vacuum tube. The bottom assembly is configured to substantially extend about the vacuum tube, the vacuum tube being positioned to partially protrude from the bottom assembly, the bottom assembly including a cooling assembly configured to employ a flexible clamp-type fitting about the vacuum tube body for substantially maintaining thermal and electrical conductivity. The top assembly is configured to be releasably fastened to the bottom assembly about the vacuum tube with removable fasteners.

    摘要翻译: 公开了一种用于UV固化灯组件的模块化磁控管。 模块化磁控管包括具有真空管体,顶部组件和底部组件的真空管。 顶部组件构造成基本覆盖真空管。 底部组件构造成基本上围绕真空管延伸,真空管定位成从底部组件部分地突出,底部组件包括冷却组件,该冷却组件构造成围绕真空管体采用柔性夹紧型配件,以便基本上保持 导热和导电性。 顶部组件构造成可拆卸的紧固件可释放地紧固到具有真空管的底部组件。

    Apparatus and Method for Materials Processing with Ion-Ion Plasma
    5.
    发明申请
    Apparatus and Method for Materials Processing with Ion-Ion Plasma 审中-公开
    用离子离子等离子体材料加工的装置和方法

    公开(公告)号:US20080087539A1

    公开(公告)日:2008-04-17

    申请号:US11868979

    申请日:2007-10-09

    IPC分类号: H05F3/00

    摘要: A method and system for material processing employing extracting equivalent fluxes of positive and negative ions at two surfaces from an ion-ion plasma without substantially altering the plasma potential. The extraction is achieved by applying a continuously applied bias to the substrate being processed, in order to attract the ions to the substrate surface to facilitate materials processing such as etching, deposition and chemical modification at the surface. The continuously applied bias is applied via a power source coupled to the plate, also referred to as a stage or chuck, holding the substrate.

    摘要翻译: 一种用于材料处理的方法和系统,其使用从离子离子等离子体两个表面提取正离子和负离子的等效通量而基本上不改变等离子体电位。 通过向被处理的衬底施加连续施加的偏压来实现提取,以便将离子吸引到衬底表面以促进材料处理,例如在表面处的蚀刻,沉积和化学改性。 连续施加的偏压通过耦合到板(也称为平台或卡盘)的电源施加,所述板保持基板。

    SPREAD REFLECTOR FOR A LAMP STRUCTURE
    7.
    发明申请
    SPREAD REFLECTOR FOR A LAMP STRUCTURE 有权
    用于灯泡结构的扩展反射器

    公开(公告)号:US20110002058A1

    公开(公告)日:2011-01-06

    申请号:US12496172

    申请日:2009-07-01

    申请人: Darrin Leonhardt

    发明人: Darrin Leonhardt

    IPC分类号: G02B5/10 F21V7/10

    摘要: A spread primary reflector for a UV curing lamp is disclosed. The spread reflector employs a substrate that has been faceted. The facets may be produced by means of stamping, etching, or a combination of chemical-mechanical processes. The faceting randomizes the focusing effects of the primary reflector's elliptical curvature while maintaining a total directed energy output and hence a uniform irradiance of a work product. The reflector may be made of a stand-alone reflective material with a preformed faceting pattern, such as from a metal substrate and coated with an optical coating to tailor the reflective properties of the surface of the substrate.

    摘要翻译: 公开了用于UV固化灯的扩展的主反射器。 扩散反射器采用已经被刻面的衬底。 小面可以通过冲压,蚀刻或化学机械过程的组合来制造。 面部将主反射器的椭圆曲率的聚焦效应随机化,同时保持总定向能量输出,并因此保持工件的均匀辐照度。 反射器可以由具有预成型刻面图案的独立的反射材料制成,例如从金属基底并涂覆有光学涂层以调整基底表面的反射特性。

    ELECTRON BEAM ENHANCED LARGE AREA DEPOSITION SYSTEM
    8.
    发明申请
    ELECTRON BEAM ENHANCED LARGE AREA DEPOSITION SYSTEM 审中-公开
    电子束增强大面积沉积系统

    公开(公告)号:US20090314633A1

    公开(公告)日:2009-12-24

    申请号:US12548510

    申请日:2009-08-27

    IPC分类号: C23C14/34 C23C14/22

    CPC分类号: C23C14/3478

    摘要: This invention provides a means to deposit thin films and coatings on a substrate using an electron beam generated plasma. The plasma can be used as an ion source in sputter applications, where the ions are used to liberate material from a target surface which can then condense on a substrate to form the film or coating. Alternatively, the plasma may be combined with existing deposition sources including those based on sputter or evaporation techniques. In either configuration, the plasma serves as a source of ion and radical species at the growing film surface in reactive deposition processes. The electron beam large area deposition system (EBELADS) is a new approach to the production of thin films or coatings up to and including several square meters.

    摘要翻译: 本发明提供了使用电子束产生的等离子体在薄膜上沉积薄膜和涂层的方法。 等离子体可用作溅射应用中的离子源,其中离子用于从目标表面释放材料,然后可将其冷凝在基底上以形成膜或涂层。 或者,等离子体可以与现有的沉积源组合,包括基于溅射或蒸发技术的沉积源。 在任一种配置中,等离子体在反应沉积过程中作为生长膜表面的离子和自由基物质的来源。 电子束大面积沉积系统(EBELADS)是生产直到并包括几平方米的薄膜或涂层的新方法。

    Dual large area plasma processing system
    9.
    发明申请
    Dual large area plasma processing system 审中-公开
    双大面积等离子处理系统

    公开(公告)号:US20070119375A1

    公开(公告)日:2007-05-31

    申请号:US11296708

    申请日:2005-11-30

    IPC分类号: C23C16/00

    CPC分类号: C23C16/487

    摘要: A dual large area plasma processing system is provided which can comprise a substrate, a first and second electron beam wherein the substrate is positioned between the first and second electron beam, a first plasma produced by the first electron beam passing through a first gas wherein the first plasma being a first low electron temperature plasma of pre-determined width, length, thickness, and location relative to a surface; and a second plasma produced by the second electron beam passing through a second gas wherein the second plasma being a low electron temperature plasma of pre-determined width, length, thickness, and location relative to a surface. The system can include a first gas manifold that can be located above the first electron beam and control the first gas and a second gas manifold that can be located above the second electron beam and control the second gas. The system can include an external magnetic field for confining the electron beams so as to produce uniform plasmas. Also provided is a method for dual large area plasma processing which can comprise providing a first and second electron beam, providing a substrate between the first electron beam and the second electron beam, passing the first electron beam through a first gas to produce a first plasma, passing the second electron beam through a second gas to produce a second plasma, and providing a first gas manifold that can be located above the first electron beam and supply the first gas.

    摘要翻译: 提供了一种双重大面积等离子体处理系统,其可以包括基板,第一和第二电子束,其中基板位于第一和第二电子束之间,由通过第一气体的第一电子束产生的第一等离子体,其中, 第一等离子体是相对于表面具有预定宽度,长度,厚度和位置的第一低电子温度等离子体; 以及由第二电子束通过第二气体产生的第二等离子体,其中第二等离子体是相对于表面具有预定宽度,长度,厚度和位置的低电子温度等离子体。 该系统可以包括可位于第一电子束上方并控制第一气体的第一气体歧管和可位于第二电子束上方并控制第二气体的第二气体歧管。 该系统可以包括用于限制电子束的外部磁场,以便产生均匀的等离子体。 还提供了一种用于双重大面积等离子体处理的方法,其可以包括提供第一和第二电子束,在第一电子束和第二电子束之间提供衬底,使第一电子束通过第一气体以产生第一等离子体 使第二电子束通过第二气体以产生第二等离子体,并且提供可位于第一电子束上方并提供第一气体的第一气体歧管。

    MODULAR MAGNETRON
    10.
    发明申请
    MODULAR MAGNETRON 有权
    模块磁铁

    公开(公告)号:US20110012508A1

    公开(公告)日:2011-01-20

    申请号:US12504736

    申请日:2009-07-17

    申请人: Darrin Leonhardt

    发明人: Darrin Leonhardt

    IPC分类号: H01J25/50 H01J9/00

    摘要: A modular magnetron for use in UV curing lamp assembly is disclosed. The modular magnetron includes a vacuum tube having a vacuum tube body, a top assembly, and a bottom assembly. The top assembly is configured to substantially overlay the vacuum tube. The bottom assembly is configured to substantially extend about the vacuum tube, the vacuum tube being positioned to partially protrude from the bottom assembly, the bottom assembly including a cooling assembly configured to employ a flexible clamp-type fitting about the vacuum tube body for substantially maintaining thermal and electrical conductivity. The top assembly is configured to be releasably fastened to the bottom assembly about the vacuum tube with removable fasteners.

    摘要翻译: 公开了一种用于UV固化灯组件的模块化磁控管。 模块化磁控管包括具有真空管体,顶部组件和底部组件的真空管。 顶部组件构造成基本覆盖真空管。 底部组件构造成基本上围绕真空管延伸,真空管定位成从底部组件部分地突出,底部组件包括冷却组件,该冷却组件构造成围绕真空管体采用柔性夹紧型配件,以便基本上保持 导热和导电性。 顶部组件构造成可拆卸的紧固件可释放地紧固到具有真空管的底部组件。