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    Apparatus and Method for Materials Processing with Ion-Ion Plasma
    1.
    发明申请
    Apparatus and Method for Materials Processing with Ion-Ion Plasma 审中-公开
    用离子离子等离子体材料加工的装置和方法

    公开(公告)号：US20080087539A1

    公开(公告)日：2008-04-17

    申请号：US11868979

    申请日：2007-10-09

    申请人： Scott G. Walton ,  Darrin Leonhardt ,  Richard F. Fernsler

    发明人： Scott G. Walton ,  Darrin Leonhardt ,  Richard F. Fernsler

    IPC分类号： H05F3/00

    CPC分类号： H01J37/3266 ,  H01J37/32009 ,  H01J37/3233 ,  H01J37/32706

    摘要： A method and system for material processing employing extracting equivalent fluxes of positive and negative ions at two surfaces from an ion-ion plasma without substantially altering the plasma potential. The extraction is achieved by applying a continuously applied bias to the substrate being processed, in order to attract the ions to the substrate surface to facilitate materials processing such as etching, deposition and chemical modification at the surface. The continuously applied bias is applied via a power source coupled to the plate, also referred to as a stage or chuck, holding the substrate.

    摘要翻译： 一种用于材料处理的方法和系统，其使用从离子离子等离子体两个表面提取正离子和负离子的等效通量而基本上不改变等离子体电位。 通过向被处理的衬底施加连续施加的偏压来实现提取，以便将离子吸引到衬底表面以促进材料处理，例如在表面处的蚀刻，沉积和化学改性。 连续施加的偏压通过耦合到板（也称为平台或卡盘）的电源施加，所述板保持基板。

    ELECTRON BEAM ENHANCED LARGE AREA DEPOSITION SYSTEM
    3.
    发明申请
    ELECTRON BEAM ENHANCED LARGE AREA DEPOSITION SYSTEM 审中-公开
    电子束增强大面积沉积系统

    公开(公告)号：US20090314633A1

    公开(公告)日：2009-12-24

    申请号：US12548510

    申请日：2009-08-27

    申请人： Scott G. Walton ,  Darrin Leonhardt ,  Robert A. Meger ,  Richard Fernsler ,  Christopher Muratore

    发明人： Scott G. Walton ,  Darrin Leonhardt ,  Robert A. Meger ,  Richard Fernsler ,  Christopher Muratore

    IPC分类号： C23C14/34 ,  C23C14/22

    CPC分类号： C23C14/3478

    摘要： This invention provides a means to deposit thin films and coatings on a substrate using an electron beam generated plasma. The plasma can be used as an ion source in sputter applications, where the ions are used to liberate material from a target surface which can then condense on a substrate to form the film or coating. Alternatively, the plasma may be combined with existing deposition sources including those based on sputter or evaporation techniques. In either configuration, the plasma serves as a source of ion and radical species at the growing film surface in reactive deposition processes. The electron beam large area deposition system (EBELADS) is a new approach to the production of thin films or coatings up to and including several square meters.

    摘要翻译： 本发明提供了使用电子束产生的等离子体在薄膜上沉积薄膜和涂层的方法。 等离子体可用作溅射应用中的离子源，其中离子用于从目标表面释放材料，然后可将其冷凝在基底上以形成膜或涂层。 或者，等离子体可以与现有的沉积源组合，包括基于溅射或蒸发技术的沉积源。 在任一种配置中，等离子体在反应沉积过程中作为生长膜表面的离子和自由基物质的来源。 电子束大面积沉积系统（EBELADS）是生产直到并包括几平方米的薄膜或涂层的新方法。

    Method and apparatus for producing an ion-ion plasma continuous in time
    4.
    依法登记的发明
    Method and apparatus for producing an ion-ion plasma continuous in time 有权

    公开(公告)号：USH2212H1

    公开(公告)日：2008-04-01

    申请号：US10672269

    申请日：2003-09-26

    申请人： Scott G. Walton ,  Robert Meger ,  Richard Fernsler ,  Darrin Leonhardt

    发明人： Scott G. Walton ,  Robert Meger ,  Richard Fernsler ,  Darrin Leonhardt

    IPC分类号： C23F1/00 ,  C23C16/00

    摘要： An ion-ion plasma source, that features a processing chamber containing a large concentration of halogen or halogen-based gases. A second chamber is coupled to the processing chamber and features an electron source which produces a high energy electron beam. The high energy electron beam is injected into the processing chamber where it is shaped and confined by a means for shaping and confining the high energy electron beam. The high energy electron beam produced in the second chamber when injected into the processing chamber ionizes the halogen gas creating a dense, ion-ion plasma in the processing chamber that is continuous in time. A method for creating an ion-ion plasma continuous in time.

    Modular magnetron
    7.
    发明授权
    Modular magnetron 有权
    模块式磁控管

    公开(公告)号：US08836220B2

    公开(公告)日：2014-09-16

    申请号：US13557618

    申请日：2012-07-25

    申请人： Darrin Leonhardt

    发明人： Darrin Leonhardt

    IPC分类号： H01J25/50 ,  H01J23/00 ,  H01J65/04

    CPC分类号： H01J23/005 ,  H01J25/50 ,  H01J65/044 ,  Y10T29/4902

    摘要： A modular magnetron for use in UV curing lamp assembly is disclosed. The modular magnetron includes a vacuum tube having a vacuum tube body, a top assembly, and a bottom assembly. The top assembly is configured to substantially overlay the vacuum tube. The bottom assembly is configured to substantially extend about the vacuum tube, the vacuum tube being positioned to partially protrude from the bottom assembly, the bottom assembly including a cooling assembly configured to employ a flexible clamp-type fitting about the vacuum tube body for substantially maintaining thermal and electrical conductivity. The top assembly is configured to be releasably fastened to the bottom assembly about the vacuum tube with removable fasteners.

    摘要翻译： 公开了一种用于UV固化灯组件的模块化磁控管。 模块化磁控管包括具有真空管体，顶部组件和底部组件的真空管。 顶部组件构造成基本覆盖真空管。 底部组件构造成基本上围绕真空管延伸，真空管定位成从底部组件部分地突出，底部组件包括冷却组件，该冷却组件构造成围绕真空管体采用柔性夹紧型配件，以便基本上保持 导热和导电性。 顶部组件构造成可拆卸的紧固件可释放地紧固到具有真空管的底部组件。

    UV LED BASED LAMP FOR COMPACT UV CURING LAMP ASSEMBLIES
    9.
    发明申请
    UV LED BASED LAMP FOR COMPACT UV CURING LAMP ASSEMBLIES 有权
    紫外线LED基灯，用于紧凑型UV固化灯组件

    公开(公告)号：US20110147356A1

    公开(公告)日：2011-06-23

    申请号：US12974335

    申请日：2010-12-21

    申请人： Darrin Leonhardt ,  Charles H. Wood ,  Pradyumna K. Swain

    发明人： Darrin Leonhardt ,  Charles H. Wood ,  Pradyumna K. Swain

    IPC分类号： H05B3/00

    CPC分类号： H05B3/0057 ,  B05D3/067

    摘要： An ultraviolet (UV) LED-based lamp for UV curing lamp assemblies is disclosed. An array of UV emitting LEDs are packaged together and arranged along the length of a cylindrical lens to form a UV LED-based optical component assembly. The UV LED-based optical component assembly may be made to be modular. A UV LED lamp assembly may comprise a plurality of UV LED-based optical component assemblies arranged around a workpiece tube. The workpiece tube may be filled with an inert gas and may be made of quartz or glass. One or more curved back reflectors may be placed opposite the LED UV LED-based optical component assemblies to collect UV light escaping the workpiece tube and refocus the light to the other side of the workpiece. The UV LEDs may be arranged on a single surface or a multi-level tiered platform.

    摘要翻译： 公开了一种用于UV固化灯组件的紫外（UV）LED基灯。 UV发光LED的阵列被包装在一起并沿着柱面透镜的长度布置以形成基于UV LED的光学部件组件。 UV基于LED的光学部件组件可以被制成模块化的。 UV LED灯组件可以包括围绕工件管布置的多个基于UV LED的光学部件组件。 工件管可以填充惰性气体，并且可以由石英或玻璃制成。 可以将一个或多个弯曲后反射器放置在与LED UV基于LED的光学部件组件相对的位置，以收集从工件管中逸出的UV光并将光重新聚焦到工件的另一侧。 UV LED可以布置在单个表面或多层分层平台上。

    SPREAD REFLECTOR FOR A LAMP STRUCTURE
    10.
    发明申请
    SPREAD REFLECTOR FOR A LAMP STRUCTURE 有权
    用于灯泡结构的扩展反射器

    公开(公告)号：US20110002058A1

    公开(公告)日：2011-01-06

    申请号：US12496172

    申请日：2009-07-01

    申请人： Darrin Leonhardt

    发明人： Darrin Leonhardt

    IPC分类号： G02B5/10 ,  F21V7/10

    CPC分类号： F26B3/28 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095

    摘要： A spread primary reflector for a UV curing lamp is disclosed. The spread reflector employs a substrate that has been faceted. The facets may be produced by means of stamping, etching, or a combination of chemical-mechanical processes. The faceting randomizes the focusing effects of the primary reflector's elliptical curvature while maintaining a total directed energy output and hence a uniform irradiance of a work product. The reflector may be made of a stand-alone reflective material with a preformed faceting pattern, such as from a metal substrate and coated with an optical coating to tailor the reflective properties of the surface of the substrate.

    摘要翻译： 公开了用于UV固化灯的扩展的主反射器。 扩散反射器采用已经被刻面的衬底。 小面可以通过冲压，蚀刻或化学机械过程的组合来制造。 面部将主反射器的椭圆曲率的聚焦效应随机化，同时保持总定向能量输出，并因此保持工件的均匀辐照度。 反射器可以由具有预成型刻面图案的独立的反射材料制成，例如从金属基底并涂覆有光学涂层以调整基底表面的反射特性。