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    Multi-beam scanning electron beam device and methods of using the same
    1.
    发明授权
    Multi-beam scanning electron beam device and methods of using the same 有权
    多光束扫描电子束装置及其使用方法

    公开(公告)号：US09153413B2

    公开(公告)日：2015-10-06

    申请号：US12528307

    申请日：2008-02-22

    申请人： Gilad Almogy ,  Avishai Bartov ,  Juergen Frosien ,  Pavel Adamec ,  Helmut Banzhof

    发明人： Gilad Almogy ,  Avishai Bartov ,  Juergen Frosien ,  Pavel Adamec ,  Helmut Banzhof

    IPC分类号： G21K7/00 ,  H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28

    CPC分类号： H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/0635 ,  H01J2237/1508 ,  H01J2237/2449 ,  H01J2237/2817

    摘要： A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.

    摘要翻译： 描述了多光束扫描电子束装置（100）。 具有列的多头扫描电子束装置包括用于发射多个电子束（12,13,14）的多光束发射器（110），至少一个共同的电子束光学元件（130） 用于多个电子束中的至少两个的开口，并适用于共同影响多个电子束中的至少两个，用于单独影响多个电子束的至少一个单独的电子束光学元件（140），共同的目标 透镜组件（150），用于聚焦具有用于聚焦多个电子束中的至少两个的共同激发的多个电子束，并且适于将多个电子束聚焦到样本（20）上以产生多个信号 光束（121,131,141）和检测组件（170），用于分别检测相应检测元件上的每个信号光束。

    HIGH THROUGHPUT SEM TOOL
    3.
    发明申请
    HIGH THROUGHPUT SEM TOOL 有权
    高通量扫描仪刀具

    公开(公告)号：US20100320382A1

    公开(公告)日：2010-12-23

    申请号：US12528307

    申请日：2008-02-22

    申请人： Gilad Almogy ,  Avishai Bartov ,  Jürgen Frosien ,  Pavel Adamec ,  Helmut Banzhof

    发明人： Gilad Almogy ,  Avishai Bartov ,  Jürgen Frosien ,  Pavel Adamec ,  Helmut Banzhof

    IPC分类号： G01N23/00 ,  H01J37/147

    CPC分类号： H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/0635 ,  H01J2237/1508 ,  H01J2237/2449 ,  H01J2237/2817

    摘要： A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.

    摘要翻译： 描述了多光束扫描电子束装置（100）。 具有列的多头扫描电子束装置包括用于发射多个电子束（12,13,14）的多光束发射器（110），至少一个共同的电子束光学元件（130） 用于多个电子束中的至少两个的开口，并适用于共同影响多个电子束中的至少两个，用于单独影响多个电子束的至少一个单独的电子束光学元件（140），共同的目标 透镜组件（150），用于聚焦具有用于聚焦多个电子束中的至少两个的共同激发的多个电子束，并且适于将多个电子束聚焦到样本（20）上以产生多个信号 光束（121,131,141）和检测组件（170），用于分别检测相应检测元件上的每个信号光束。

    Achromatic mass separator
    4.
    发明授权
    Achromatic mass separator 有权
    消色差分离器

    公开(公告)号：US08049180B2

    公开(公告)日：2011-11-01

    申请号：US11925598

    申请日：2007-10-26

    申请人： Juergen Frosien ,  Helmut Banzhof

    发明人： Juergen Frosien ,  Helmut Banzhof

    IPC分类号： B01D59/44

    CPC分类号： H01J49/288 ,  H01J37/05 ,  H01J37/08 ,  H01J37/28 ,  H01J2237/057 ,  H01J2237/0805 ,  H01J2237/3174 ,  H01J2237/31749

    摘要： An ion beam device is described. The ion beam device includes an ion beam source for generating an ion beam, the ion beam being emitted along a first axis, an aperture unit adapted to shape the ion beam, and an achromatic deflection unit adapted to deflect ions of the ion beam having a predetermined mass by a deflecting angle. The achromatic deflection unit includes: an electric field generating component for generating an electric field, and a magnetic field generating component for generating a magnetic field substantially perpendicular to the electric field. The device further includes a mass separation aperture adapted for blocking ions with a mass different from the predetermined mass and for allowing ions having the predetermined mass to trespass the mass separator, and an objective lens having a second optical axis, wherein the second optical axis is inclined with regard to the first axis.

    摘要翻译： 描述了离子束装置。 离子束装置包括用于产生离子束的离子束源，沿着第一轴发射的离子束，适于使离子束成形的孔单元，以及适于使离子束的离子偏转的消色差偏转单元， 预定质量的偏转角。 无彩色偏转单元包括：用于产生电场的电场产生部件和用于产生基本上垂直于电场的磁场的磁场产生部件。 该装置还包括质量分离孔，其适于阻挡具有不同于预定质量的质量的离子，并允许具有预定质量的离子侵入质量分离器，以及具有第二光轴的物镜，其中第二光轴为 相对于第一轴倾斜。

    Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen
    5.
    发明授权
    Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen 有权
    用于检查样本的带电粒子束装置的对比度改善的布置和方法

    公开(公告)号：US08164067B2

    公开(公告)日：2012-04-24

    申请号：US12701463

    申请日：2010-02-05

    申请人： Pavel Adamec ,  Helmut Banzhof ,  Ivo Liska

    发明人： Pavel Adamec ,  Helmut Banzhof ,  Ivo Liska

    IPC分类号： G01N23/22 ,  G01N23/00

    CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/2446

    摘要： It is provided a charged particle beam device for inspecting a specimen, comprising a charged particle beam source adapted to generate a primary charged particle beam; an objective lens device adapted to direct the primary charged particle beam onto the specimen; and a detector device comprising one or more charged particle detectors adapted to detect a secondary charged particle beam generated by the primary charged particle beam at the specimen and passing through the objective lens device, the secondary charged particle beam comprising a first group of secondary charged particles starting from the specimen with high starting angles and a second group of secondary charged particles starting from the specimen with low starting angles; wherein at least one of the charged particle detectors is adapted to detect depending on the starting angles one group of the first and the second groups of secondary charged particles.

    摘要翻译： 提供了一种用于检查样本的带电粒子束装置，包括适于产生初级带电粒子束的带电粒子束源; 适于将初级带电粒子束引导到样本上的物镜装置; 以及检测器装置，其包括一个或多个带电粒子检测器，其适于检测在所述样本处由所述初级带电粒子束产生的并通过所述物镜装置的次级带电粒子束，所述次级带电粒子束包括第一组次级带电粒子 从具有较高起始角度的样品开始，第二组二次带电粒子从起始角低的样品开始; 其中所述带电粒子检测器中的至少一个适于根据起始角度检测一组第一和第二组次级带电粒子。

    Multiple electron beam device
    6.
    发明授权
    Multiple electron beam device 有权
    多电子束装置

    公开(公告)号：US07282711B2

    公开(公告)日：2007-10-16

    申请号：US10491939

    申请日：2002-10-04

    申请人： Dieter Winkler ,  Pavel Adamec ,  Achim Göhl ,  Helmut Banzhof

    发明人： Dieter Winkler ,  Pavel Adamec ,  Achim Göhl ,  Helmut Banzhof

    IPC分类号： H01J37/21

    CPC分类号： H01J37/28 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/216 ,  H01J2237/2446 ,  H01J2237/2826 ,  H01J2237/30433 ,  H01J2237/3045

    摘要： The invention provides electron multiple beam devices (1) for probing or structuring a non-transparent specimen (20) with primary electron beams (14) with an array of electron beam sources (3) to generate multiple primary electron beams (14), an electron sensor (12) with electron sensor segments (12a) to detect electrons of the primary electron beams (14) and at least one anode (7) to direct the primary electron beams (14) towards the electron sensor (12). The electron sensor (12) serves to inspect the primary electron beams (14), calibrate the positions of the primary electron beams (14) and possibly adjust final focus length (13) and currents of the primary electron beams before or after a probing or structuring the upper surface (20a) of a non-transparent specimens (20). Further, methods to inspect primary electron beams (14), to adjust final focus lengths (13) and to calibrate the multiple electron beam device (1) are provided.

    摘要翻译： 本发明提供了用于用具有电子束源阵列（3）的一次电子束（14）探测或构造非透明样品（20）以产生多个一次电子束（14）的电子多光束装置（1）， 电子传感器（12），其具有用于检测一次电子束（14）的电子和至少一个阳极（7）的电子传感器段（12a），以将一次电子束（14）引向电子传感器（12）。 电子传感器（12）用于检查一次电子束（14），校准一次电子束（14）的位置，并可能在探测之前或之后校准一次电子束的最终聚焦长度（13）和电流 构造不透明样品（20）的上表面（20a）。 此外，提供了检查一次电子束（14），调整最终聚焦长度（13）和校准多个电子束装置（1）的方法。

    High resolution gas field ion column with reduced sample load
    7.
    发明授权
    High resolution gas field ion column with reduced sample load 有权
    高分辨率气田离子柱，样品负荷降低

    公开(公告)号：US08735847B2

    公开(公告)日：2014-05-27

    申请号：US12277818

    申请日：2008-11-25

    申请人： Helmut Banzhof ,  Juergen Frosien ,  Dieter Winkler

    发明人： Helmut Banzhof ,  Juergen Frosien ,  Dieter Winkler

    IPC分类号： G21K1/08

    CPC分类号： H01J37/04 ,  H01J37/28 ,  H01J2237/0473 ,  H01J2237/0475 ,  H01J2237/0492 ,  H01J2237/08 ,  H01J2237/0807

    摘要： A method of operating a focused ion beam device having a gas field ion source is described. According to some embodiments, the method includes emitting an ion beam from a gas field ion source, providing an ion beam column ion beam energy in the ion beam column which is higher than the final beam energy, decelerating the ion beam for providing a final beam energy on impingement of the ion beam on the specimen of 1 keV to 4 keV, and imaging the specimen.

    摘要翻译： 描述了具有气体场离子源的聚焦离子束装置的操作方法。 根据一些实施例，该方法包括从气体场离子源发射离子束，在离子束列中提供高于最终光束能量的离子束柱离子束能量，使离子束减速以提供最终光束 将离子束撞击在1keV至4keV的样品上的能量，并对样品进行成像。

    Charged particle beam apparatus and method for operating a charged particle beam apparatus
    8.
    发明授权
    Charged particle beam apparatus and method for operating a charged particle beam apparatus 有权
    带电粒子束装置和操作带电粒子束装置的方法

    公开(公告)号：US07838830B2

    公开(公告)日：2010-11-23

    申请号：US11923407

    申请日：2007-10-24

    申请人： Juergen Frosien ,  Helmut Banzhof ,  Jacob Levin ,  Dror Shemesh

    发明人： Juergen Frosien ,  Helmut Banzhof ,  Jacob Levin ,  Dror Shemesh

    IPC分类号： G01N23/00

    CPC分类号： H01J37/1478 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1506 ,  H01J2237/2448 ,  H01J2237/26 ,  H01J2237/2806 ,  H01J2237/31745 ,  H01J2237/31749

    摘要： A charged particle beam apparatus is provided, which comprises a charged particle beam column for generating a primary charged particle beam; a focusing assembly, such as a charged particle lens, e.g., an electrostatic lens, for focusing the primary charged particle beam on a specimen; a detector for detecting charged signal particles which are emerging from the specimen; and a deflector arrangement for deflecting the primary charged particle beam. The deflector arrangement is arranged downstream of the focusing assembly and is adapted for allowing the charged signal particles passing therethrough. The detector is laterally displaced with respect to the optical axis in a deflection direction defined by the post-focusing deflector arrangement.

    摘要翻译： 提供带电粒子束装置，其包括用于产生初级带电粒子束的带电粒子束柱; 聚焦组件，例如带电粒子透镜，例如静电透镜，用于将初级带电粒子束聚焦在样本上; 用于检测从样本出现的带电信号颗粒的检测器; 以及用于偏转初级带电粒子束的偏转器装置。 偏转器布置布置在聚焦组件的下游，并且适于允许带电信号颗粒通过其中。 检测器在由后聚焦偏转器布置限定的偏转方向上相对于光轴横向移位。