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公开(公告)号：US06251328B1
公开(公告)日：2001-06-26
申请号：US08945381
申请日：1998-07-08
IPC分类号： B23K2600
CPC分类号： B23K26/034 , B21D5/00 , B21D26/00 , B23K26/03 , B23K26/0344 , B23K26/0734
摘要： A multiplicity of laser diodes aim laser light directly onto the surface of a workpiece and are disposed over and according to the to-be-shaped contour of a workpiece, so that a detector unit for determining the spatial shaping of the workpiece and an evaluation and control unit can determine process parameters for further illumination in dependence on a comparison of an actual state of shaping and a desired state of shaping of the workpiece.
摘要翻译： 多个激光二极管将激光直接瞄准工件的表面，并且被设置在工件的正面轮廓上并且根据工件的待形状轮廓，使得用于确定工件的空间成形的检测器单元以及评估和 控制单元可以根据成形的实际状态与所需工件的成形状态的比较来确定用于进一步照明的工艺参数。
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公开(公告)号：US5886313A
公开(公告)日：1999-03-23
申请号：US793254
申请日：1997-06-05
IPC分类号： B23K26/06 , B23K26/064 , B23K26/073 , B23K26/08 , B23K26/12 , B23K26/26 , B23K26/00
CPC分类号： B23K26/034 , B23K26/06 , B23K26/0604 , B23K26/064 , B23K26/0648 , B23K26/0652 , B23K26/0665 , B23K26/0732 , B23K26/0846 , B23K26/123 , B23K26/26
摘要： A device for plating two or more metal plates, strips, etc., by the absoron of laser energy. The device is fitted with beam-forming optics which form the laser radiation into a beam with a rectangular cross-section. The radiation source is a laser-diode array in which several laser diodes are disposed next to each other in the same plane to give bars which can be laid next to each other, as well as stacked one on top of each other, in any numbers. In order to homogenize the laser radiation produced by the array to give a rectangular cross-section, the device proposed is fitted with special optics such as a prism which converges in the shape of a wedge, a glass plate, with a rectangular cross-section, reflective boundary drives, etc. The rectangular cross-section beam heats the two surfaces of the metal plates being plated only locally, over limited areas and to small depths, to the plastic state. In addition, sensors and control devices for control of the power of the laser-diode array and/or for changing the speed of advance of the metal plates being plated may be used.
摘要翻译： PCT No.PCT / DE95 / 01126 Sec。 371日期：1997年6月5日 102（e）日期1997年6月5日PCT提交1995年8月21日PCT公布。 公开号WO96 / 05937 日期1996年2月29日用于通过吸收激光能量来镀覆两个或更多个金属板，条带等的装置。 该装置配有波束形成光学器件，其将激光辐射形成为具有矩形横截面的梁。 辐射源是激光二极管阵列，其中几个激光二极管在相同的平面中彼此相邻地设置，以产生彼此相邻放置的条，并且以任何数量彼此堆叠在一起 。 为了均匀化由阵列产生的激光辐射以产生矩形横截面，所提出的装置装配有特殊的光学器件，例如以楔形的形状收敛的棱镜，具有矩形横截面的玻璃板 ，反射边界驱动器等。矩形横截面光束将金属板的两个表面加热，仅在局部地限制区域和较小深度镀覆到塑料状态。 此外，可以使用用于控制激光二极管阵列的功率和/或用于改变被镀的金属板的前进速度的传感器和控制装置。
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公开(公告)号：US5705788A
公开(公告)日：1998-01-06
申请号：US557070
申请日：1995-11-17
申请人： Eckhard Beyer , Konrad Wissenbach , Volker Krause
发明人： Eckhard Beyer , Konrad Wissenbach , Volker Krause
CPC分类号： B23K26/034 , B23K26/03 , B23K26/06 , B23K26/0604 , B23K26/0665 , B23K26/702
摘要： The invention relates to a process for material treatment with diode radiation, especially laser diode radiation. To match the radiation profile to the treatment process, the process is so carried out that radiation emitted from a multiplicity of diodes is directed with a predetermined radiation profile upon the treated region of the workpiece and that a change in the intensity distribution in the radiation profile is effected by controlling the diode output power.
摘要翻译： PCT No.PCT / EP94 / 00706 Sec。 371日期：1995年11月17日 102（e）日期1995年11月17日PCT 1994年3月8日PCT公布。 第WO94 / 26459号公报 日期：1994年11月24日本发明涉及一种二极管辐射材料处理方法，特别是激光二极管辐射。 为了使辐射轮廓与处理过程相匹配，进行这样的处理，即从多个二极管发射的辐射以预定的辐射轮廓指向被处理的工件的区域，并且辐射剖面中的强度分布的变化 通过控制二极管输出功率来实现。
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4.发明授权公开(公告)号：US06534740B1
公开(公告)日：2003-03-18
申请号：US09762434
申请日：2001-02-08
IPC分类号： B23K2600
CPC分类号： B22F3/1055 , B23K26/10 , Y02P10/295
摘要： The present invention relates to a device and a process using a laser beam to scan an area of an object, in particular, for selective laser melting of metal powder for fabrication of a mold. The device is provided with a plotter mechanic with two linear axes (4, 5) over which a carrier element can be positioned and moved, an optical means, which guides the laser beam to the carrier element or provides the laser beam at the carrier element, a scanning means (9) at the carrier element, which guides the laser beam to the area of the object and moves the laser beam back and forth in a presetable angle, a focusing optic (15) for focusing the laser beam (8) onto the area of the object (11). The plotter mechanic is disposed in such a manner that the plotter mechanic can position and move the carrier element at a distance over the area of the object (11), which distance permits the use of a focusing optic (15) of short focal length for focusing said laser beam to a diameter of
摘要翻译： 本发明涉及一种使用激光束扫描物体区域的装置和方法，特别涉及用于制造模具的金属粉末的选择性激光熔化。 该装置设置有具有两个线性轴线（4,5）的绘图仪器，载体元件可以在该线性轴上定位和移动，光学装置将激光束引导到载体元件或在载体元件处提供激光束 ，在载体元件处的扫描装置（9），其将激光束引导到物体的区域并以可预设的角度来回移动激光束;用于聚焦激光束（8）的聚焦光学元件（15） 到物体（11）的区域上。 绘图机械师以这样的方式设置，使得绘图机械师可以在物体（11）的区域上定位和移动载体元件一定距离，该距离允许使用短焦距聚焦光学元件（15） 在所述物体（11）的区域中将所述激光束聚焦到直径<200μm的激光束。 该装置通过使用扫描仪结合了聚焦激光束的快速移动的优点，其优点是通过使用绘图仪来移动光束，处理场的尺寸与聚焦光学元件的焦距无关。
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5.发明授权Process and device for increasing the degree of absorption during superficial solid phase hardening of workpieces by laser radiation 失效用于通过激光辐射增加工件的表面固相硬化期间吸收程度的方法和装置
公开(公告)号：US5902420A
公开(公告)日：1999-05-11
申请号：US913499
申请日：1997-10-17
申请人： Konrad Wissenbach , Ralf Jung , Frank Kupper , Gilbert Vitr
发明人： Konrad Wissenbach , Ralf Jung , Frank Kupper , Gilbert Vitr
CPC分类号： B23K26/034 , B23K26/03 , B23K26/0344 , B23K26/0648 , B23K26/0665 , B23K26/12 , B23K26/123 , B23K26/18 , C21D1/09 , C21D1/76
摘要： In order to harden the surface of workpieces having complex shapes withoutreviously applying absorption promoting surface layers, a mixture of inert gas and oxygen are supplied to the processing zone while the workpiece is exposed to laser radiation. The degree of absorption is maximized by adjusting at least one of the mixing ratio, the volume flow rate, and the processing temperature to conform to a nominal value.
摘要翻译： PCT No.PCT / EP95 / 04581 Sec。 371日期1997年10月17日第 102（e）日期1997年10月17日PCT 1995年11月21日PCT PCT。 公开号WO96 / 28574 日期1996年9月19日为了在没有预先施加吸收促进表面层的情况下硬化具有复杂形状的工件的表面，将惰性气体和氧气的混合物供给到处理区域，同时将工件暴露于激光辐射。 通过调节混合比，体积流量和处理温度中的至少一个以符合标称值来最大化吸收度。
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6.发明授权公开(公告)号：US08809192B2
公开(公告)日：2014-08-19
申请号：US13143940
申请日：2010-01-11
申请人： Dietrich Bertram , Jochen Hugo Stollenwerk , Johannes Krijne , Holger Schwab , Edward Willem Albert Young , Jeroen Henri Antoine Maria Van Buul , Andres Gasser , Konrad Wissenbach , Christian Vedder , Norbert Pirch
发明人： Dietrich Bertram , Jochen Hugo Stollenwerk , Johannes Krijne , Holger Schwab , Edward Willem Albert Young , Jeroen Henri Antoine Maria Van Buul , Andres Gasser , Konrad Wissenbach , Christian Vedder , Norbert Pirch
IPC分类号： H01L21/443
CPC分类号： H01L51/0021 , H01L51/0009 , H05K3/101 , H05K3/3468 , H05K2203/107
摘要： A method for deposition of at least one electrically conducting film on a substrate, wherein the method includes the steps of: selecting a layer of a film material, wherein the layer includes a mask on a front side, and wherein the layer and the mask are one piece; positioning the front side of the layer upon the substrate; applying at least one laser pulse onto a back side of the layer, so as to melt and to vaporize at least parts of the layer such that melt droplets are propelled toward and deposited upon the substrate; and forming the film, wherein at least one slot of the mask limits the distribution of the melt droplets.
摘要翻译： 一种用于在基板上沉积至少一个导电膜的方法，其中所述方法包括以下步骤：选择膜材料层，其中所述层包括正面上的掩模，并且其中所述层和掩模是 一块; 将层的前侧定位在基底上; 将至少一个激光脉冲施加到该层的背面上，以便使该层的至少部分熔化和蒸发，使得熔体液滴朝向和沉积在该基底上; 并且形成所述膜，其中所述掩模的至少一个狭槽限制所述熔体液滴的分布。
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7.发明授权Method for smoothing and polishing surfaces by treating them with energetic radiation 失效通过用能量辐射处理它们来平滑和抛光表面的方法公开(公告)号：US07592563B2
公开(公告)日：2009-09-22
申请号：US10519146
申请日：2003-06-24
IPC分类号： B23K26/00
CPC分类号： C21D1/09 , B23K26/3576 , B24B1/00
摘要： The present invention relates to a method for smoothing and polishing surfaces by treating them with energetic radiation, in particular laser radiation, in which the to-be-smoothed surface is remelted in a first treatment step using said energetic radiation and employing first treatment parameters at least once down to a first remelting depth of approx. 5 to 100 μm, which is greater than a structural depth of the to-be-smoothed structures of said to-be-smoothed surface, wherein continuous radiation or pulsed radiation with a pulse duration of ≧100 μs is employed. The method makes it possible to automatically polish any three-dimensional surface fast and cost effective.
摘要翻译： 本发明涉及一种通过用能量辐射特别是激光辐射处理它们来平滑和抛光表面的方法，其中在第一处理步骤中使用所述能量辐射重新熔化待平滑的表面，并且采用第一处理参数 最少一次到第一个重熔深度约 其大于所述待平滑表面的待平滑结构的结构深度，其中采用脉冲持续时间>100μs的连续辐射或脉冲辐射。 该方法可以快速，经济地自动抛光三维表面。
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8.发明申请Method for smoothing and polishing surfaces by treating them with energetic radiation 失效通过用能量辐射处理它们来平滑和抛光表面的方法公开(公告)号：US20060081573A1
公开(公告)日：2006-04-20
申请号：US10519146
申请日：2003-06-24
IPC分类号： B23K26/00
CPC分类号： C21D1/09 , B23K26/3576 , B24B1/00
摘要： The present invention relates to a method for smoothing and polishing surfaces by treating them with energetic radiation, in particular laser radiation, in which the to-be-smoothed surface (1) is remelted in a first treatment step using said energetic radiation (3) and employing first treatment parameters at least once down to a first remelting depth (10) of approx. 5 to 100 μm, which is greater than a structural depth of the to-be-smoothed structures of said to-be-smoothed surface (1), wherein continuous radiation or pulsed radiation (3) with a pulse duration of ≧100 μs is employed. The method makes it possible to automatically polisch any three-dimensional surface fast and cost effective.
摘要翻译： 本发明涉及一种通过用能量辐射（特别是激光辐射）处理它们来平滑和抛光表面的方法，其中在第一处理步骤中使用所述能量辐射（3）重新熔化待平滑的表面（1） 并且使用至少一次到第一重熔深度（10）的第一处理参数。 其大于所述待平滑化表面（1）的待平滑结构的结构深度，其中脉冲持续时间≥100μs的连续辐射或脉冲辐射（3） 被雇用。 该方法使得可以快速，经济地自动地对三维表面进行绘制。
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公开(公告)号：US06215093B1
公开(公告)日：2001-04-10
申请号：US09319132
申请日：1999-07-12
IPC分类号： B22F3105
CPC分类号： B22F3/1055 , B23K26/32 , B23K26/34 , B23K35/0244 , B23K2103/50 , B29C64/153 , B29C2791/005 , B33Y50/00 , Y02P10/295
摘要： A method is disclosed for manufacturing a molded body, in accordance with three-dimensional CAD data of a model of a molded body, by depositing layers of a metallic material in powder form. Several layers of powder are successively deposited one on top of the other, whereby each layer of powder is heated to a specific temperature by means of a focused laser beam applied to a given area corresponding to a selected cross-sectional area of the model of the molded body, before deposition of the next layer. The laser beam is guided over each layer of powder in accordance with the CAD cross-sectional data of the selected cross-sectional area of the model in such a way that each layer of powder is fixed to the layer below it. The method is characterized in that the metallic material in powder form is applied in the form of a metallic powder free of binders and fluxing agents, that it is heated by the laser beam to melting temperature, that the energy of the laser beam is chosen in such a way that the layer of metallic powder is fully molten throughout at the point of impact of said laser beam, that the laser beam is guided across the specified area of powder in several runs in such a way that each run of the laser beam partly overlaps the preceding run, and that a protective gas atmosphere is maintained above the interaction zone of the laser beam and the metallic powder.
摘要翻译： 公开了根据成型体模型的三维CAD数据，通过以粉末形式沉积金属材料层来制造成型体的方法。 将几层粉末依次沉积在另一层之上，由此通过施加到对应于所选择的模型的所选横截面积的给定区域的聚焦激光束将每层粉末加热到特定温度 成型体，在沉积下一层之前。 根据所选择的模型横截面积的CAD截面数据，激光束被引导到每一层粉末上，使得每层粉末固定在其下面的层中。 该方法的特征在于粉末形式的金属材料以不含粘合剂和助熔剂的金属粉末的形式施加，其被激光束加热至熔融温度，激光束的能量选择在 这样一种方式使得金属粉末层在所述激光束的冲击点处完全熔化，激光束以多次运行被引导穿过特定的粉末区域，使得激光束的每次运行部分地 与先前的运行重叠，并且在激光束和金属粉末的相互作用区域之上保持保护气体气氛。
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10.发明申请公开(公告)号：US20110318924A1
公开(公告)日：2011-12-29
申请号：US13143940
申请日：2010-01-11
申请人： Dietrich Bertram , Jochen Stollenwerk , Johannes Krijne , Holger Schwab , Edward W. A. Young , Jeroen H. A. M. Van Buul , Andres Gasser , Konrad Wissenbach , Christian Vedder , Norbert Pirch
发明人： Dietrich Bertram , Jochen Stollenwerk , Johannes Krijne , Holger Schwab , Edward W. A. Young , Jeroen H. A. M. Van Buul , Andres Gasser , Konrad Wissenbach , Christian Vedder , Norbert Pirch
IPC分类号： H01L21/3205
CPC分类号： H01L51/0021 , H01L51/0009 , H05K3/101 , H05K3/3468 , H05K2203/107
摘要： The invention relates to a method for deposition of at least one electrically conducting film (20) on a substrate (30), comprising the steps: selecting a layer (10) of a film material, wherein the layer (10) comprises a mask (40) on a front side (11) and wherein the layer (10) and the mask (40) are one piece, positioning the front side (11) of the layer (10) upon the substrate (30), applying at least one laser pulse (120) onto a back side (12) of the layer (10), so as to melt and to vaporize at least parts of the layer (10) such that melt droplets (110) are propelled toward and deposited upon said substrate (30), forming the film (20), wherein at least one slot (45) of the mask (40) limits the distribution of said melt droplets (110).
摘要翻译： 本发明涉及一种在衬底（30）上沉积至少一个导电膜（20）的方法，包括以下步骤：选择膜材料层（10），其中所述层（10）包括掩模（ 40）在前侧（11）上，并且其中所述层（10）和所述掩模（40）是一体的，将所述层（10）的前侧（11）定位在所述基底（30）上，施加至少一个 激光脉冲（120）到所述层（10）的背面（12）上，以便熔化并蒸发所述层（10）的至少一部分，使得熔体液滴（110）朝向并沉积在所述衬底上 （30），形成所述膜（20），其中所述掩模（40）的至少一个狭槽（45）限制所述熔体液滴（110）的分布。
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