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18 条记录 (耗时 0.024 秒)

    Four-layer antireflection coating for deposition in in-like DC sputtering apparatus
    5.
    发明授权
    Four-layer antireflection coating for deposition in in-like DC sputtering apparatus 失效
    用于在类似DC溅射装置中沉积的四层抗反射涂层

    公开(公告)号：US5450238A

    公开(公告)日：1995-09-12

    申请号：US165438

    申请日：1993-12-10

    申请人： Erik J. Bjornard ,  Debra M. Steffenhagen ,  Eric R. Dickey

    发明人： Erik J. Bjornard ,  Debra M. Steffenhagen ,  Eric R. Dickey

    IPC分类号： C03C17/34 ,  G02B1/11 ,  G02B5/28

    CPC分类号： G02B1/116 ,  C03C17/3417

    摘要： An antireflection coating for a substrate including four layers and having optimized photopic reflectance and optimized for deposition by sputtering. The first layer (the layer farthest from the substrate) has a refractive index less than the refractive index of the substrate and a thickness of about one-quarter wavelength. The second layer (the layer adjacent the first layer) has an refractive index greater than about 2.2 and a thickness of about a half wavelength. The third layer has refractive index less than that of the second layer. The fourth layer (the layer adjacent the substrate) has a refractive index less than about 2.0 and greater than that of the third layer. The combined thickness of the third and fourth layers is less than about a quarter wavelength. The first and third layers may include silicon dioxide. The second layer may include titanium dioxide or niobium oxide. The fourth layer may include indium oxide, tin oxide, indium tin oxide, or zinc oxide.

    摘要翻译： 一种用于基板的防反射涂层，包括四层，并具有优化的光反射率，并优化用于通过溅射沉积。 第一层（距离衬底最远的层）具有小于衬底的折射率的折射率和约四分之一波长的厚度。 第二层（与第一层相邻的层）具有大于约2.2的折射率和约半波长的厚度。 第三层的折射率小于第二层的折射率。 第四层（邻近衬底的层）的折射率小于约2.0且大于第三层的折射率。 第三层和第四层的组合厚度小于约四分之一波长。 第一层和第三层可以包括二氧化硅。 第二层可以包括二氧化钛或氧化铌。 第四层可包括氧化铟，氧化锡，氧化铟锡或氧化锌。

    Shielding for arc suppression in rotating magnetron sputtering systems
    8.
    发明授权
    Shielding for arc suppression in rotating magnetron sputtering systems 失效
    用于旋转磁控溅射系统中的电弧抑制的屏蔽

    公开(公告)号：US5470452A

    公开(公告)日：1995-11-28

    申请号：US158729

    申请日：1993-11-29

    申请人： Eric R. Dickey ,  Erik J. Bjornard

    发明人： Eric R. Dickey ,  Erik J. Bjornard

    IPC分类号： C23C14/34 ,  C23C14/35 ,  H01J37/34

    CPC分类号： C23C14/3407 ,  C23C14/3414 ,  H01J37/3405 ,  H01J2237/0206

    摘要： A cathode body for a rotating cylindrical magnetron wherein the magnetron provides a sputtering zone extending along the length of the cathode body and circumferentially along a relatively narrow region thereof. The cathode body includes an elongated tubular member having a target material at the outer surface thereof. A collar of electrically-conductive material is located at at least one end of the tubular member, and extends along the tubular member from that one end into the erosion zone. A sleeve of electrically-conductive material may extend circumferentially around the collar.

    摘要翻译： 一种用于旋转圆柱形磁控管的阴极体，其中磁控管提供沿着阴极体的长度延伸并沿着其相对窄的区域周向延伸的溅射区。 阴极体包括在其外表面具有目标材料的细长管状构件。 导电材料的套环位于管状构件的至少一端，并从管状构件的一端延伸到侵蚀区域中。 导电材料套筒可围绕套环周向延伸。

    System for evaluating thin film coatings
    10.
    发明授权
    System for evaluating thin film coatings 失效
    薄膜涂层评估系统

    公开(公告)号：US5772861A

    公开(公告)日：1998-06-30

    申请号：US541201

    申请日：1995-10-16

    申请人： William A. Meredith, Jr. ,  Charles C. Gammans ,  Kelly R. Clayton ,  Erik J. Bjornard ,  Kim D. Powers

    发明人： William A. Meredith, Jr. ,  Charles C. Gammans ,  Kelly R. Clayton ,  Erik J. Bjornard ,  Kim D. Powers

    IPC分类号： C23C14/54 ,  C23C14/56

    CPC分类号： C23C14/56 ,  C23C14/545 ,  C23C14/547

    摘要： A system for evaluating the reflectance of an object (e.g., a CRT) that is coated with an anti-reflective coating material is disclosed. The quality and/or uniformity of the coating is evaluated by a reflectometer. The reflectometer is positioned relative to the object by non-contact sensors. Reflectance data gathered by the reflectometer is analyzed to determine to what extent the actual coating differs from the optimal (i.e., ideal) coating. A feedback system modifies the coating process for subsequent objects in an attempt to fine-tune the coating process and achieve optimal anti-reflective coatings for later objects passing through the system.

    摘要翻译： 公开了一种用于评估涂覆有抗反射涂层材料的物体（例如CRT）的反射率的系统。 通过反射计评价涂层的质量和/或均匀性。 反射计通过非接触传感器相对于物体定位。 分析由反射计收集的反射率数据，以确定实际涂层在何种程度上与最佳（即理想）涂层不同。 反馈系统修改后续物体的涂覆过程，以试图微调涂层工艺，并为后续物体通过系统获得最佳的抗反射涂层。