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    5,10,15,20-tetra(2',6'-dipivaloyloxyphenyl)porphinato metal complex
    2.
    发明授权
    5,10,15,20-tetra(2',6'-dipivaloyloxyphenyl)porphinato metal complex 失效
    5,10,15,20-TETRA（2'，6'-二氟乙炔基）PORPHINATO金属络合物

    公开(公告)号：US5194603A

    公开(公告)日：1993-03-16

    申请号：US601715

    申请日：1990-10-29

    申请人： Eishun Tsuchida ,  Teruyuki Komatsu ,  Etsuo Hasegawa ,  Hiroyuki Nishide

    发明人： Eishun Tsuchida ,  Teruyuki Komatsu ,  Etsuo Hasegawa ,  Hiroyuki Nishide

    IPC分类号： C07D487/22 ,  C07F15/02 ,  C07F15/06

    CPC分类号： C07D487/22

    摘要： The present invention relates to a porphyrin metal complex represented by the formula (1): ##STR1## wherein R is a pivaloyloxy group, M is a transition metal ion of the group IV and the group V metals, X is a halogen ion, and n is 0 or 1.The above compound is used as a more stable artificial oxygen carrier capable of preventing the behavior of oxidation and deterioration.

    摘要翻译： PCT No.PCT / JP90 / 00321 Sec。 371 1990年10月29日第 102（e）1990年10月29日PCT PCT 1990年3月13日PCT公布。 WO90 / 15803 PCT出版物 日本1990年12月27日本发明涉及式（1）表示的卟啉金属络合物：其中R是新戊酰氧基，M是IV族的过渡金属离子和基团 V金属，X是卤素离子，n是0或1.上述化合物用作能够防止氧化和劣化行为的更稳定的人造氧载体。

    Heat exchange tube having multiple fluid paths
    5.
    发明授权
    Heat exchange tube having multiple fluid paths 有权
    具有多个流体路径的换热管

    公开(公告)号：US07849915B2

    公开(公告)日：2010-12-14

    申请号：US10850596

    申请日：2004-05-19

    申请人： Masaaki Kawakubo ,  Etsuo Hasegawa ,  Yoshiki Katoh ,  Ken Muto

    发明人： Masaaki Kawakubo ,  Etsuo Hasegawa ,  Yoshiki Katoh ,  Ken Muto

    IPC分类号： F28F1/00

    CPC分类号： F28F1/022 ,  F28D2021/0073 ,  Y10T29/4935

    摘要： A heat exchange tube having a flat shape includes a plurality of fluid paths having a circular cross section and extending in a longitudinal direction of the tube. Each fluid path is parallel to each other fluid path. The tube is dimensioned such that a distance between two adjacent fluid paths is defined as Wt, and a circumferential thickness between a surface of the tube and an outermost fluid path is defined as Ht. The distance Wt and the circumferential thickness Ht have a relationship as 0.42≦Ht/Wt≦0.98.

    摘要翻译： 具有平坦形状的热交换管包括具有圆形横截面并在管的纵向方向上延伸的多个流体路径。 每个流体路径平行于彼此的流体路径。 该管的尺寸使得两个相邻流体路径之间的距离被定义为Wt，并且管的表面和最外侧流体路径之间的圆周厚度被定义为Ht。 距离Wt和圆周厚度Ht的关系为0.42＆nlE; Ht / Wt＆nlE; 0.98。

    Heat exchanger
    8.
    发明授权
    Heat exchanger 有权
    热交换器

    公开(公告)号：US07044208B2

    公开(公告)日：2006-05-16

    申请号：US10361657

    申请日：2003-02-10

    申请人： Masaaki Kawakubo ,  Norihide Kawachi ,  Ken Muto ,  Ken Yamamoto ,  Etsuo Hasegawa ,  Yoshiki Katoh

    发明人： Masaaki Kawakubo ,  Norihide Kawachi ,  Ken Muto ,  Ken Yamamoto ,  Etsuo Hasegawa ,  Yoshiki Katoh

    IPC分类号： F28F9/02

    CPC分类号： F28D1/05375 ,  F25B9/008 ,  F28D2021/0071 ,  F28D2021/0073 ,  F28F9/0224 ,  F28F9/0278 ,  F28F9/182 ,  F28F9/185 ,  F28F2225/08

    摘要： There is provides a heat exchanger comprising: a plurality of tubes (110) stacked on each other; and a pair of header tanks (140), each header tank (140) having a flow section (151) in which fluid flows, extending in a direction of stack of the tubes (110), wherein both end sections (111) of the tubes (110) in the longitudinal direction are joined to the pair of header tanks (140), the flow section (151) of each header tank (140) and the inside of each tube (110) are communicated with each other, a tip position (a) of the tube end section (111) is arranged in an outside region of the flow section (151), and an inner wall width size (b) of the flow section (151) is smaller than a size (c) in the width direction of the header tank (140) at the tube end section (111).

    摘要翻译： 提供了一种热交换器，包括：彼此堆叠的多个管（110）; 和一对集水箱（140），每个集管箱（140）具有流体流动的流动部分（151），所述流动部分沿着管（110）的堆叠方向延伸，其中， 纵向上的管（110）连接到一对集水箱（140），每个集水箱（140）的流动部分（151）和每个管（110）的内部彼此连通， 管端部（111）的位置（a）配置在流路部（151）的外侧区域，流路部（151）的内壁宽度尺寸（b）小于（c） 在管端部（111）处的集水箱（140）的宽度方向上。

    Photoresist, compounds for composing the photoresist, and method of forming pattern by using the photoresist
    10.
    发明授权
    Photoresist, compounds for composing the photoresist, and method of forming pattern by using the photoresist 失效
    光致抗蚀剂，用于构成光致抗蚀剂的化合物，以及通过使用光致抗蚀剂形成图案的方法

    公开(公告)号：US5994025A

    公开(公告)日：1999-11-30

    申请号：US763054

    申请日：1996-12-10

    申请人： Shigeyuki Iwasa ,  Kaichiro Nakano ,  Katsumi Maeda ,  Takeshi Ohfuji ,  Etsuo Hasegawa

    发明人： Shigeyuki Iwasa ,  Kaichiro Nakano ,  Katsumi Maeda ,  Takeshi Ohfuji ,  Etsuo Hasegawa

    IPC分类号： C08F220/04 ,  C08F220/06 ,  C08F220/10 ,  C08F220/18 ,  C08F220/26 ,  C08F220/28 ,  C09D133/04 ,  C09D133/14 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/11 ,  Y10S430/111

    摘要： There is provided a photoresist including (a) a resin composed of a polymer represented with the following general formula [1], and (b) a photo acid generator which produces acid when exposed to a light: ##STR1## wherein each of R.sup.1, R.sup.3 and R.sup.7 represents one of a hydrogen atom and a methyl group, R.sup.2 represents a hydrocarbon group including a bridged cyclic hydrocarbon group and having a carbon number in the range of 7 to 13 both inclusive, R.sup.4 represents one of a hydrogen atom and a hydrocarbon group having a carbon number of 1 or 2, R.sup.5 represents a hydrocarbon group having a carbon number of 1 or 2, R.sup.6 represents one of (a) a hydrocarbon group having a carbon number in the range of 1 to 12 both inclusive, (b) a hydrocarbon group having a carbon number in the range of 1 to 12 both inclusive and replaced with an alkoxy group having a carbon number in the range of 1 to 12 both inclusive, and (c) a hydrocarbon group having a carbon number in the range of 1 to 12 both inclusive and replaced with an acyl group having a carbon number in the range of 1 to 13 both inclusive, x+y+z=1, x is in the range of 0.1 to 0.9, y is in the range of 0.1 to 0.7, and z is in the range of 0 to 0.7. The resin has a weight percent in the range of 75 to 99.8 both inclusive, and the photo acid generator has a weight percent in the range of 0.2 to 25 both inclusive. The above mentioned photoresist produces no extra polymer by side reaction. Thus, the photoresist has high resolution to thereby make it possible to form a fine pattern without resist residue.

    摘要翻译： 提供了包含（a）由以下通式[1]表示的聚合物构成的树脂的光致抗蚀剂，（b）暴露于光时产生酸的光酸产生剂：其中R1，R3和R7 表示氢原子和甲基中的一个，R 2表示包含桥连环烃基并且碳数为7〜13的碳原子的烃基，R4表示氢原子和具有 碳原子数1或2，R 5表示碳数为1或2的烃基，R 6表示（a）碳原子数为1〜12的烃基，（b）烃 碳数为1〜12的碳原子数为2〜12的碳原子数为2〜12的烷氧基，（c）碳数为1以上的烃基 到12，并用a替代 碳原子数为1〜13的碳原子，x + y + z = 1，x在0.1〜0.9的范围内，y在0.1〜0.7的范围内，z在范围 为0〜0.7。 树脂的重量百分比在75〜99.8之间，光酸产生剂的重量百分比在0.2〜25的范围内。 上述光致抗蚀剂通过副反应不产生额外的聚合物。 因此，光致抗蚀剂具有高分辨率，从而可以形成没有抗蚀剂残留物的精细图案。