System and method for handling cryo-charged particle samples

    公开(公告)号:US11802823B2

    公开(公告)日:2023-10-31

    申请号:US17523246

    申请日:2021-11-10

    Applicant: FEI Company

    CPC classification number: G01N1/42 H01J37/20 H01J37/26 H01J2237/2007

    Abstract: The invention relates to a Cryo-Charged Particle (CCP) sample handling and storage system. The system is used for storing and handling cryo-samples for use in charged particle microscopy, such as cryo-electron microscope samples for use in cryo-transmission electron microscopy. The system comprises a storage apparatus for storing a plurality of CCP samples, and a Charged Particle Apparatus (CPA), such as a cryo-TEM, at a location remote from said storage apparatus. The system further comprises a transfer device that is releasably connectable to said storage apparatus, and that is releasably connectable to said CPA as well. As defined herein, said transfer device is arranged for acquiring a CCP sample from said plurality of CCP samples when connected to said storage apparatus, and arranged for transferring said CCP sample from said transfer device to said CPA when connected to said CPA.

    SYSTEM AND METHOD FOR HANDLING CRYO-CHARGED PARTICLE SAMPLES

    公开(公告)号:US20220155193A1

    公开(公告)日:2022-05-19

    申请号:US17523246

    申请日:2021-11-10

    Applicant: FEI Company

    Abstract: The invention relates to a Cryo-Charged Particle (CCP) sample handling and storage system. The system is used for storing and handling cryo-samples for use in charged particle microscopy, such as cryo-electron microscope samples for use in cryo-transmission electron microscopy. The system comprises a storage apparatus for storing a plurality of CCP samples, and a Charged Particle Apparatus (CPA), such as a cryo-TEM, at a location remote from said storage apparatus. The system further comprises a transfer device that is releasably connectable to said storage apparatus, and that is releasably connectable to said CPA as well. As defined herein, said transfer device is arranged for acquiring a CCP sample from said plurality of CCP samples when connected to said storage apparatus, and arranged for transferring said CCP sample from said transfer device to said CPA when connected to said CPA.

    Cryogenic specimen processing in a charged particle microscope

    公开(公告)号:US10170275B2

    公开(公告)日:2019-01-01

    申请号:US15787352

    申请日:2017-10-18

    Applicant: FEI Company

    Abstract: Surface modification of a cryogenic specimen can be obtained using a charged particle microscope. A specimen is situated in a vacuum chamber on a specimen holder and maintained at a cryogenic temperature. The vacuum chamber is evacuated and a charged-particle beam is directed to a portion of the specimen so as to modify a surface thereof. A thin film monitor is situated in the vacuum chamber and has at least a detection surface maintained at a cryogenic temperature. A precipitation rate of frozen condensate in the vacuum chamber is measured using the thin film monitor, and based on the measured precipitation rate, the surface modification is initiated when the precipitation rate is less than a first pre-defined threshold, or interrupted if the precipitation rate rises above a second pre-defined threshold.

    CHARGED-PARTICLE MICROSCOPE WITH IN SITU DEPOSITION FUNCTIONALITY

    公开(公告)号:US20170345627A1

    公开(公告)日:2017-11-30

    申请号:US15170672

    申请日:2016-06-01

    Applicant: FEI Company

    Abstract: A charged-particle microscope, comprising a vacuum chamber in which are provided: A specimen holder for holding a specimen in an irradiation position; A particle-optical column, for producing a charged particle beam and directing it so as to irradiate the specimen; A detector, for detecting a flux of radiation emanating from the specimen in response to irradiation by said beam, wherein: Said vacuum chamber comprises an in situ magnetron sputter deposition module, comprising a magnetron sputter source for producing a vapor stream of target material; A stage is configured to move a sample comprising at least part of said specimen between said irradiation position and a separate deposition position at said deposition module; Said deposition module is configured to deposit a layer of said target material onto said sample when held at said deposition position.

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