公开(公告)号：US20210286264A1

公开(公告)日：2021-09-16

申请号：US17321803

申请日：2021-05-17

Applicant: FUJIFILM Corporation

Inventor： Akihiro Kaneko ,  Masafumi Kojima ,  Minoru Uemura ,  Akiyoshi Goto ,  Michihiro Shirakawa

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/20 ,  G03F7/038

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin and a compound that generates an acid upon irradiation with actinic rays or radiation, in which an A value determined by Formula (1) is 0.130 or more, and the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more selected from the group consisting of a compound (I) to a compound (III).

公开(公告)号：US09493705B2

公开(公告)日：2016-11-15

申请号：US14201060

申请日：2014-03-07

Applicant: FUJIFILM Corporation

Inventor： Minoru Uemura ,  Yasuhiro Ishiwata ,  Masaru Yoshikawa ,  Takao Taguchi ,  Tomoki Tasaka

IPC: C07C69/76 ,  C09K19/20 ,  G02B5/30 ,  C09K19/38 ,  G02B1/10 ,  G02B1/11 ,  G02B5/20 ,  C09K19/50 ,  C09K19/04 ,  G03H1/02

CPC classification number: G02B1/14 ,  C09K19/3838 ,  C09K19/50 ,  C09K2019/0448 ,  C09K2019/2078 ,  C09K2219/03 ,  G02B1/10 ,  G02B1/105 ,  G02B1/11 ,  G02B5/208 ,  G02B5/3016 ,  G02B5/3083 ,  G03H2001/0264

Abstract: A polymerizable liquid-crystal compound of formula (I) effective for preventing crystal deposition after coating with polymerizable liquid crystal (II) or a polymerizable liquid crystal similar thereto. P represents a polymerizable functional group; Sp represents a spacer or a single bond; Z1 and Z2 each represent —CO—O—; R0 represents a linear alkyl group having 1-15 carbon atoms; R2, R3 and R4 each independently represent an alkyl group having 1-4 carbon atoms, an alkoxy group having 1-4 carbon atoms, an alkoxycarbonyl group having 2-5 carbon atoms, an acyloxy group having 2-5 carbon atoms, an acyl group having 2-4 carbon atoms, an amide group having 2-5 carbon atoms, a cyano group, an amino group, a hydroxyl group, or a halogen atom; r1, r2 and r3 indicate an integer from 0-4; when r1, r2 and r3 each are 2 or more, then R2, R3 and R4 each may be the same or different; however, when R0 is a methyl group, then r2 is not 1.

公开(公告)号：US20210294217A1

公开(公告)日：2021-09-23

申请号：US17320398

申请日：2021-05-14

Applicant: FUJIFILM Corporation

Inventor： Akiyoshi Goto ,  Masafumi Kojima ,  Minoru Uemura ,  Kei Yamamoto ,  Yasuharu Shiraishi ,  Keiyu Ou

IPC: G03F7/20 ,  G03F7/32 ,  G03F7/004 ,  G03F7/40

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes an acid-decomposable resin and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more selected from the group consisting of a compound (I) to a compound (III), and one or more selected from the group consisting of a compound represented by General Formula (1) and a compound represented by General Formula (2).

公开(公告)号：US10047294B2

公开(公告)日：2018-08-14

申请号：US15172282

申请日：2016-06-03

Applicant: FUJIFILM Corporation

Inventor： Shinichi Morishima ,  Nobutaka Iwahashi ,  Masashi Ogiyama ,  Minoru Uemura

IPC: C09B29/08 ,  C09B31/16 ,  C09B31/30 ,  C09B33/18 ,  C09B56/02 ,  C09B56/06 ,  G02F1/1337 ,  G02B5/30 ,  C09K19/60 ,  G02F1/1335 ,  C09B31/043 ,  C09B31/18 ,  C09B33/22 ,  G02B1/10 ,  B05D3/06 ,  B05D3/02

Abstract: Provided is a polarizing film showing high dichroism comprising a substrate, and a photo alignment film and a light absorption anisotropic film laminated on the substrate in this order. The light absorption anisotropic film is obtained by fixing the alignment of a dichroic dye composition comprising at least one nematic liquid crystalline azo dichroic dye and in X-ray diffraction measurement thereof, diffraction peaks derived from periodic structure along a vertical direction to the alignment axis are present, the period indicated by at least one of the diffraction peaks is 3.0 to 15.0 Å and an intensity of the diffraction peak does not show a maximum value in the range of ±70° of the film normal line direction in a plane vertical to the alignment axis.

公开(公告)号：US12216404B2

公开(公告)日：2025-02-04

申请号：US17106170

申请日：2020-11-29

Applicant: FUJIFILM Corporation

Inventor： Masafumi Kojima ,  Minoru Uemura ,  Takashi Kawashima ,  Akiyoshi Goto ,  Kei Yamamoto ,  Kazuhiro Marumo ,  Keiyu Ou

IPC: G03F7/039 ,  C08L33/10 ,  G03F7/038 ,  G03F7/20 ,  G03F7/32

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a photoacid generator A that generates an acid represented by General Formula (I), the acid having a pKa of −1.00 or more; one or more selected from the group consisting of a photoacid generator B that generates an acid having a pKa larger than that of an acid generated from the photoacid generator A by 1.00 or more, and a nitrogen-containing compound C having a pKa of a conjugate acid thereof larger than that of the acid generated from the photoacid generator A by 1.00 or more; and an acid-decomposable resin, in which in a case where the actinic ray-sensitive or radiation-sensitive resin composition includes a photoacid generator D that generates an acid having a pKa of less than −1.00, a ratio of the number of moles of the photoacid generator A to the number of moles of the photoacid generator D in the composition, is 1.0 or more.

公开(公告)号：US12032288B2

公开(公告)日：2024-07-09

申请号：US17307091

申请日：2021-05-04

Applicant: FUJIFILM Corporation

Inventor： Masafumi Kojima ,  Minoru Uemura ,  Akihiro Kaneko ,  Akiyoshi Goto ,  Kei Yamamoto

IPC: G03F7/004 ,  C07C25/18 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C311/48 ,  C07C381/12 ,  C07D327/06 ,  C07D333/46

CPC classification number: G03F7/0045 ,  C07C25/18 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C311/48 ,  C07C381/12 ,  C07D327/06 ,  C07D333/46 ,  C07C2602/42 ,  C07C2603/74

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a compound represented by General Formula (I) and an acid-decomposable resin.

M1+A−-L-B−M2+  (I)

公开(公告)号：US20230161249A1

公开(公告)日：2023-05-25

申请号：US18158892

申请日：2023-01-24

Applicant: FUJIFILM Corporation

Inventor： Minoru Uemura ,  Takeshi Kawabata ,  Toshiaki Fukuhara ,  Akinori Shibuya ,  Kei Yamamoto

IPC: G03F7/038 ,  G03F7/039

CPC classification number: G03F7/038 ,  G03F7/039

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound represented by General Formula (I). In General Formula (I), Ra and Rb each independently represent a hydrogen atom or a substituent, provided that Ra and Rb satisfy the following requirement (1) or (2): (1) at least one of Ra or Rb represents a secondary alkyl group, a tertiary alkyl group, a cycloalkyl group, or a perfluoroalkyl group, and Ra and Rb may be bonded to each other to form a ring, and (2) Ra and Rb are bonded to each other to form a ring, Rc represents a substituent, L0 represents a single bond or a divalent linking group, L1 represents a single bond or a divalent linking group, L2 represents a single bond or a divalent linking group, nM+ represents an organic cationic moiety, and n represents an integer of 1 or more.

公开(公告)号：US09481830B2

公开(公告)日：2016-11-01

申请号：US14204822

申请日：2014-03-11

Applicant: FUJIFILM CORPORATION

Inventor： Tomoki Tasaka ,  Yasuhiro Ishiwata ,  Minoru Uemura ,  Takao Taguchi ,  Masao Nakajima ,  Shunya Katoh

IPC: C09K19/42 ,  C09K19/56 ,  B32B17/10 ,  C09K19/20 ,  G02B5/20 ,  B60J3/04 ,  C09K19/04

CPC classification number: C09K19/56 ,  B32B17/10036 ,  B32B17/10293 ,  B32B17/10504 ,  B32B17/10761 ,  B60J3/04 ,  C09K19/2007 ,  C09K2019/0448 ,  C09K2019/2078 ,  G02B5/208 ,  G02F2201/343 ,  B32B17/10 ,  B32B2367/00

Abstract: A cholesteric liquid-crystal mixture containing a compound represented by the general formula (Ia), a compound represented by the general formula (Ib), a fluorine-containing horizontal alignment agent and a polymerization initiator is capable of forming a film which is prevented from precipitation of liquid-crystal compounds therein, of which the haze is reduced and which has a broad reflection width. Z1—Y1-A1-Y3-M1-Y4-A2-Y2—Z2  General Formula (Ia) Z3—Y5-A3-Y7-M2-P  General Formula (Ib)

公开(公告)号：US09481829B2

公开(公告)日：2016-11-01

申请号：US14163901

申请日：2014-01-24

Applicant: FUJIFILM Corporation

Inventor： Masatoshi Mizumura ,  Shunya Katoh ,  Minoru Uemura ,  Yasuhiro Ishiwata ,  Masaru Yoshikawa ,  Hiroshi Matsuyama

IPC: C07C69/62 ,  C09K19/20 ,  C09K19/54 ,  C07C69/92 ,  C09K19/32 ,  C09K19/34 ,  C09K19/58 ,  C09K19/04

CPC classification number: C09K19/54 ,  C07C69/92 ,  C09K19/2007 ,  C09K19/322 ,  C09K19/3475 ,  C09K19/588 ,  C09K2019/0429 ,  C09K2019/044 ,  C09K2019/2078

Abstract: A compound represented by the following formula (1) has sufficient solubility, a wide usable concentration range, and excellent haze-lowering performance. In the formula, L1 to L6 represent a single bond, —O—, —CO—, —COO—, etc; Sp1 to Sp4 represent a single bond or alkylene of 1 to 10 carbon atoms; A1 and A2 represent trivalent or tetravalent aromatic hydrocarbon or heterocyclic; T represents the following formulae, etc; Hb represent perfluoroalkyl of 2 to 30 carbon atoms; m and n are 2 or 3; and o and p are an integer of 0 or more.