摘要:
A modified sorbitol with improved tableting properties, viz, has a melting point of about 96.degree. C., a bulk density of 0.3-0.6 g/ml, a .gamma.-sorbitol content of at least 90%, a purity of at least 98%, a specific surface area of 0.7-1.5 m.sup.2 /g, a bending strength of at least 7 N/mm.sup.2 at a compressive force of at least 10,000 N, and a friability of less than 1% at a compressive force of at least 10,000 N, can be prepared by obtaining a sorbitol solution by hydrogenation of crystallized glucose at a temperature below 170.degree. C., and spray-drying this solution at a temperature of 140.degree. to 170.degree. C. The sorbitol thus obtained has a water content of less than 1%.The sorbitol is useful for the production of compressed formulations.
摘要:
A modified sorbitol with improved tableting properties, viz, has a melting point of about 96.degree. C., a bulk density of 0.3-0.6 g/ml, a .gamma.-sorbitol content of at least 90%, a purity of at least 98%, a specific surface area of 0.7-1.5 m.sup.2 /g, a bending strength of at least 7 N/mm.sup.2 at a compressive force of at least 10,000 N, and a friability of less than 1% at a compressive force of at least 10,000 N, can be prepared by obtaining a sorbitol solution by hydrogenation of crystallized glucose at a temperature below 170.degree. C., and spray-drying this solution at a temperature of 140.degree. to 170.degree. C. The sorbitol thus obtained has a water content of less than 1%.The sorbitol is useful for the production of compressed formulations.
摘要:
A process for the production of hydroxyamines of the formula IR.sup.1 --CH(OH)--CH(NHR.sup.3)--R.sup.2 (I)whereinR.sup.1 and R.sup.2 independently of one another are H or CH.sub.2 OH andR.sup.3 is H, C.sub.1 -C.sub.4 -alkyl or C.sub.1 -C.sub.4 -hydroxyalkyl comprising reacting an oxo compound with an amine and reducing the resultant ketimine with a reducing agent.
摘要:
A process for preparing an N,N-disubstituted p-phenylenediamine of the formula ##STR1## wherein R.sup.1 is alkyl of 1-6 C atoms, R.sup.2 is alkyl of 1-6 C atoms or alkyl of 1-6 C atoms which is substituted by OH, lower alkoxy, a sulfo group or an alkylsulfonamido group and R.sup.3 is hydrogen or lower alkylor an acid addition salt thereof,comprises adding an alkyl nitrite, as a nitrosation agent,to an aqueous, acid suspension of the corresponding aniline derivative of the formula ##STR2## thereby forming the corresponding N,N-disubstituted p-nitroso-aniline, and subsequently hydrogenating the latter without isolation thereof from the reaction mixture.
摘要:
The invention relates to an improved process for preparing 2-arylbenzimidazole-5-sulfonic acids of the formula I, ##STR1## in which Ar is unsubstituted phenyl or phenyl substituted by one or more C.sub.1 -C.sub.6 alkyl or alkoxy groups andm is 1, 2 or 3,wherein o-phenylenediamine is reacted in the presence of sulfuric acid at between room temperature and 250.degree. C. with a benzoic acid derivative of the formula IIAr(--X).sub.m II in which Ar and m are as above, and X is COO-alkyl, where alkyl is n-alkyl having from 1 to 6 C atoms, COOH, COCl, COBr or CN, and new arylbenzimidazole acids of the formula Ia ##STR2##
摘要:
Materials coated with plate-like pigments and characterized in that the coating shows structuring in defined areas due to a difference in the orientation of the pigment particles are highly suitable in the area of general security printing.
摘要:
The invention relates to negative photoresists of the polyimide type essentially containing, in an organic solvent, in each case at least(a) one polyamide-acid or polyamide-acid derivative prepolymer which can be converted into a highly heat-resistant polyimide polymer,(b) a photoinitiator, and, if appropriate, further customary additives which contain, as the photoinitiator, a compound of the formula IR.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 I in which R.sup.1 and R.sup.2 are as defined.
摘要:
An improved development process for relief structures based on radiation-crosslinked polymeric precursors of polymers which are resistant to high temperature in which the development fluid used is an aliphatic or cycloaliphatic ketone having 3 to 7 carbon atoms, is distinguished by rapid and complete removal of soluble polymeric material from the substrate with, at the same time, a minimum amount of attack on the radiation-crosslinked polymeric structures.
摘要:
Photoresists suitable for use for forming relief structures of highly heat-resistant polymers and which contain soluble polymeric precursors which carry radiation-reactive radicals bonded through carboxylic ester groups have an increased light-sensitivity when they also contain at least one radiation-reactive, polymerizable allyl compound which has a boiling point above 180.degree., the allyl group thereof being bonded via an oxygen, sulfur and/or nitrogen atom. The highly heat-resistant polymers which can be prepared by means of these photoresists have excellent chemical, electrical and mechanical properties.
摘要:
A process for the preparation of [2,2]-paracyclophane comprises contacting aqueous p-methylbenzyltrimethylammonium hydroxide with sodium hydroxide or potassium hydroxide, in the presence of dimethyl sulfoxide, and preferably in the further presence of an inert water-immiscible organic solvent.