-
1.发明授权Photoresists suitable for forming relief structures of highly heat-resistant polymers 失效适用于形成高耐热聚合物浮雕结构的光刻胶
公开(公告)号：US4540650A
公开(公告)日：1985-09-10
申请号：US531781
申请日：1983-09-13
IPC分类号： G03F7/004 , C08F291/18 , G03F7/027 , G03F7/038 , H01L21/027 , G03C1/70 , C08G69/48 , G03C5/16
CPC分类号： G03F7/027 , C08F291/18
摘要： Photoresists suitable for use for forming relief structures of highly heat-resistant polymers and which contain soluble polymeric precursors which carry radiation-reactive radicals bonded through carboxylic ester groups have an increased light-sensitivity when they also contain at least one radiation-reactive, polymerizable allyl compound which has a boiling point above 180.degree., the allyl group thereof being bonded via an oxygen, sulfur and/or nitrogen atom. The highly heat-resistant polymers which can be prepared by means of these photoresists have excellent chemical, electrical and mechanical properties.
摘要翻译： 适用于形成高耐热性聚合物的浮雕结构的光刻胶，其含有可携带通过羧酸酯基团键合的辐射反应性基团的可溶性聚合物前体当它们还含有至少一种辐射反应性可聚合烯丙基 沸点高于180℃的化合物，其烯丙基通过氧，硫和/或氮原子键合。 可通过这些光致抗蚀剂制备的高耐热聚合物具有优异的化学，电学和机械性能。
-
2.发明授权
公开(公告)号：US4539288A
公开(公告)日：1985-09-03
申请号：US561505
申请日：1983-12-15
CPC分类号： G03F7/325
摘要： An improved development process for relief structures based on radiation-crosslinked polymeric precursors of polymers which are resistant to high temperature in which the development fluid used is an aliphatic or cycloaliphatic ketone having 3 to 7 carbon atoms, is distinguished by rapid and complete removal of soluble polymeric material from the substrate with, at the same time, a minimum amount of attack on the radiation-crosslinked polymeric structures.
摘要翻译： 基于辐射交联的高分子聚合物前体的改进的开发方法，该高分子前体耐高温，其中使用的显影液是具有3至7个碳原子的脂族或脂环族酮，其特征在于快速和完全除去可溶性 聚合物材料同时具有对辐射交联的聚合物结构的最小量的攻击。
-
3.发明授权Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material 失效含有萘醌-2-二叠氮基-4-磺酰基的辐射敏感性聚合物及其在正性工作记录材料中的应用
公开(公告)号：US5302488A
公开(公告)日：1994-04-12
申请号：US841545
申请日：1992-02-26
IPC分类号： B41M5/26 , C08F12/00 , C08F212/14 , G03F7/023 , H01L21/027
CPC分类号： G03F7/023
摘要： A radiation-sensitive polymer and a mixture containing this radiation-sensitive polymer as a binder are disclosed. A process for the preparation of the radiation-sensitive polymer binder and a positive-working radiation-sensitive recording material which is prepared using the radiation-sensitive mixture are also disclosed.
摘要翻译： 公开了一种辐射敏感性聚合物和含有该辐射敏感性聚合物作为粘合剂的混合物。 还公开了制备辐射敏感性聚合物粘合剂的方法和使用该辐射敏感性混合物制备的正性辐射敏感记录材料。
-
公开(公告)号：US4765844A
公开(公告)日：1988-08-23
申请号：US920665
申请日：1986-10-20
申请人： Hans-Joachim Merrem , Axel Schmitt
发明人： Hans-Joachim Merrem , Axel Schmitt
IPC分类号： G03C11/00 , G03F7/00 , G03F7/26 , G03F7/42 , H01L21/027 , H01L21/30 , C11D7/32 , C09D9/04 , C23D17/00
CPC分类号： G03F7/425
摘要： The invention relates to solvent systems which are based on water-soluble amino derivatives and propylene glycol components, for removing photoresists. These solvent systems are comprised of(a) from about 10 to 100% by weight of at least one water-soluble amine of the general formula ##STR1## in which R.sup.1, R.sup.2, R.sup.3, R.sup.4 denote H or alkyl groupsn,m denote 0 to 2, ando denotes 1 to 3; and(b) from about 0 to 90% by weight of at least one water-soluble propylene glycol derivative of the general formula ##STR2## in which R.sup.3, R.sup.4 denote H, alkyl or ##STR3## and P denotes 1 to 3.
摘要翻译： 本发明涉及基于水溶性氨基衍生物和丙二醇组分的溶剂系统，用于除去光致抗蚀剂。 这些溶剂体系包括（a）约10至100重量％的至少一种通式为“IMAGE”的水溶性胺，其中R 1，R 2，R 3，R 4表示H或烷基n，m表示 0〜2，o表示1〜3; 和（b）约0至90重量％的至少一种通式为“IMAGE”的水溶性丙二醇衍生物，其中R3，R4表示H，烷基或“IMAGE”，P表示1至3。
-
5.发明授权Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an .alpha.-carbonyl-.alpha.-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compound 失效由正极工作的辐射敏感性混合物和由其制备的复印材料包含α-羰基-α-磺酰基重氮甲烷，水不溶性粘合剂和酸可分解化合物
公开(公告)号：US5340682A
公开(公告)日：1994-08-23
申请号：US46484
申请日：1993-04-09
IPC分类号： G03F7/039 , G03F7/004 , G03F7/016 , G03F7/075 , H01L21/027 , H01L21/30 , G03F7/023 , G03F7/30
CPC分类号： G03F7/0163
摘要： A positive-working radiation-sensitive mixture is disclosed which contains as essential constituents:a) an .alpha.-carbonyl-.alpha.-sulfonyl-diazomethane, which forms a strong acid on irradiation, of the general formula I ##STR1## in which R.sup.1 and R.sup.2, independently of one another, denote an alkyl-, cycloalkyl-, aryl- or heteroaryl radicalb) a compound having at least one C--O--C or C--O--Si bond which can be cleaved by acid, andc) a water-insoluble binder which is soluble or at least swellable in aqueous-alkaline solutions.The radiation-sensitive mixture according to the invention is notable for a high sensitivity over a wide spectral range. It also exhibits a high thermal stability and does not form any corrosive photoylsis products on exposure to light.
摘要翻译： 公开了一种正面工作的辐射敏感性混合物，其包含作为必要成分的：a）在辐射下形成强酸的α-羰基-α-磺酰基重氮甲烷，其通式I（I） R 1和R 2彼此独立地表示烷基 - ，环烷基 - ，芳基 - 或杂芳基b）具有至少一个可被酸裂解的COC或CO-Si键的化合物，和c）不溶于水的 在碱性水溶液中可溶或至少可溶胀的粘合剂。 根据本发明的辐射敏感性混合物在宽光谱范围内对于高灵敏度是显着的。 它还具有高的热稳定性，并且在曝光时不会形成任何腐蚀性的光氧化产物。
-
6.发明授权Positively operating radiation-sensitive mixture containing a polyfunctional .alpha.-diazo-.beta.-keto ester and radiation-sensitive recording material containing this mixture 失效含有多官能（ALPHA）-DIAZO-（BETA）-KETO ESTER和含有该混合物的辐射敏感记录材料的正确操作的辐射敏感性混合物
公开(公告)号：US5198322A
公开(公告)日：1993-03-30
申请号：US466007
申请日：1990-01-12
IPC分类号： G03F7/039 , A61K8/00 , A61Q17/04 , C07C245/18 , C07C271/10 , C07C271/20 , C07C271/24 , C07C275/10 , C07C275/26 , C07C275/32 , C07C275/40 , C07C323/12 , C07D209/48 , C07D251/34 , C07D295/14 , C08F2/50 , C09K3/00 , G03C1/52 , G03F7/004 , G03F7/016 , H01L21/027 , H01L21/30
CPC分类号： C07C245/18 , G03F7/0163 , C07C2101/14
摘要： A positively operating radiation-sensitive mixture comprising a binder which is insoluble in water but soluble or at least swellable in aqueous alkaline solution, and as a photoactive component a polyfunctional .alpha.-diazo-.beta.-keto ester of the general formula I ##STR1## in which R.sup.1 denotes an aliphatic, cycloaliphatic or araliphatic or aromatic radical having 4 to 20 carbon atoms, in which individual CH.sub.2 groups can be replaced by oxygen or sulfur atoms or by ##STR2## or NH groups and/or contain keto groups, X denotes an aliphatic, cycloaliphatic, carbocyclic, heterocyclic or araliphatic radical having 2 to 22 carbon atoms, in which individual CH.sub.2 groups can be replaced by oxygen or sulfur atoms or by the groups --NR.sup.2 --, --C(O)--O--, --C(O)--NR.sup.2 --, --C(O)-- ##STR3## --NR.sup.2 --C(O)--NR.sup.3 --, --O--C(O)--NR.sup.2 --, --C(O)-- ##STR4## or --O--C(O)--O--, or CH groups can be replaced by ##STR5## in which R.sup.2 and R.sup.3 independently of one another represent hydrogen or an aliphatic, carbocyclic or araliphatic radical,m denotes an integer from 2 to 10 andn denotes an integer from 0 to 2, whereinm-n is .gtoreq.2,is described.The radiation-sensitive mixture is particularly suitable for exposure using radiation of wavelength 190 to 300 nm.
摘要翻译： 一种正面工作的辐射敏感性混合物，其包含不溶于水但在碱性水溶液中可溶或至少可溶胀的粘合剂，以及作为光活性组分的通式I的多官能α-重氮基β-酮酯（IMAGE）（ I），其中R1表示具有4至20个碳原子的脂族，脂环族或芳脂族或芳族基团，其中各个CH 2基团可以被氧或硫原子替代，或者通过<或>或/或含有酮基， X表示具有2至22个碳原子的脂族，脂环族，碳环，杂环或芳脂族基团，其中各个CH 2基团可被氧或硫原子替代，或由-NR 2 - ， - C（O）-O-， -C（O）-NR 2 - ， - C（O）-NR 2 -C（O）-NR 3 - ， - OC（O）-NR 2 - ， - C（O） （O）-O-或CH基团可以被其中R 2和R 3彼此独立地表示氢或脂族，碳环或芳脂族基团的“IMAGE”代替，m表示 s为2至10的整数，n表示0至2的整数，其中m-n为> / = 2。 辐射敏感的混合物特别适用于使用波长为190至300nm的辐射的曝光。
-
公开(公告)号：US4842901A
公开(公告)日：1989-06-27
申请号：US151547
申请日：1988-02-02
申请人： Hans-Joachim Merrem , Werner Graf
发明人： Hans-Joachim Merrem , Werner Graf
IPC分类号： H01L21/316 , C03B8/02 , C03B19/12 , C09D183/02 , C23C18/12 , G03F1/00 , G03F1/14 , G03F7/09 , H01L21/312
CPC分类号： H01L21/3121 , C09D183/02 , G03F7/094
摘要： A coating solution for producing glassy layers on a substrate comprises a silicic acid ester, an aliphatic alcohol as a solvent, an acid in a catalytically active quantity, and water. The alcohol contains at least 4 carbon atoms and the acid has a pK.sub.a of less than +3. The viscosity of the coating solution is table even at elevated temperatures and the amount of water added is increased. The glassy layers produced from the coating solution exhibit no striations.
摘要翻译： 用于在基材上生产玻璃层的涂布溶液包括硅酸酯，作为溶剂的脂族醇，催化活性量的酸和水。 醇含有至少4个碳原子，酸的pKa小于+3。 即使在升高的温度下，涂布溶液的粘度是表，并且添加的水的量增加。 由涂层溶液生产的玻璃层不产生条纹。
-
8.发明授权Polyfunctional compounds containing .alpha.-diazo-.beta.-keto ester units and sulfonate units 失效含有（ALPHA）-DIAZO-（BETA） - 酮酯单体和磺酸酯单体的多官能化合物
公开(公告)号：US5191069A
公开(公告)日：1993-03-02
申请号：US694386
申请日：1991-05-01
IPC分类号： C07C303/30 , C07C309/65 , C07C309/67 , C07C309/73 , C07C309/76 , C07C309/77 , C07C315/04 , C07C317/04 , C07D209/48 , C07D251/32 , C07D251/34 , C07D333/20 , C07D333/34 , C07D521/00 , G03F7/016
CPC分类号： C07D209/48 , C07C309/65 , C07C309/67 , C07C309/73 , C07C309/77 , C07D251/32 , C07D333/34 , G03F7/0163 , C07C2101/14 , C07C2103/74
摘要： Polyfunctional compounds containing .alpha.-diazo-.beta.-keto ester units and sulfonate units are disclosed. The polyfunctional compounds have high sensitivity in the deep UV and high thermal stability. Processes for producing the compounds are disclosed. A preferred process first synthesizes .beta.-ketoester/sulfonate precursors and then uses diazo transfer to convert the precursors into the novel compounds. Radiation-sensitive mixtures containing the compounds are also disclosed.
摘要翻译： 公开了含有α-重氮基 - β-酮酯单元和磺酸酯单元的多官能化合物。 多官能化合物在深紫外线和高热稳定性方面具有高灵敏度。 公开了用于生产化合物的方法。 优选的方法首先合成β-酮酯/磺酸盐前体，然后使用重氮转移将前体转化为新化合物。 还公开了含有这些化合物的辐射敏感性混合物。
-
9.发明授权
公开(公告)号：US4927732A
公开(公告)日：1990-05-22
申请号：US260307
申请日：1988-10-20
申请人： Hans-Joachim Merrem , Gerhard Buhr , Ruediger Lenz
发明人： Hans-Joachim Merrem , Gerhard Buhr , Ruediger Lenz
CPC分类号： G03F7/091
摘要： A positive-working photosensitive composition is disclosed that comprises a photosensitive compound which is either of the o-quinone diazide type or comprises a photolytic acid donor in combination with a compound containing a C--O--C group, a binder which is soluble or swellable in an aqueous-alkaline solution and a dye of the general formula I ##STR1## The photosensitive composition of the present invention has a higher photosensitivity than comparable compositions containing other dyes.
摘要翻译： 公开了一种正性感光性组合物，其包含与邻醌二叠氮类型的光敏化合物或包含光解酸供体与含有COC基团的化合物组合的粘合剂，在水溶性溶剂中可溶或溶胀的粘合剂， 碱性溶液和通式I的染料（I）本发明的光敏组合物比含有其它染料的可比组合物具有更高的光敏性。
-
10.发明授权Radiation-sensitive composition containing esterification product of (1,2-naphthoquinone-2-diazide)-sulfonic acid with 2,3,4,4'-tetrahydroxybenzophenone and a di- or tri-hydroxybenzophenone 失效含有（1,2-萘醌-2-二叠氮化物） - 磺酸与2,3,4,4'-四羟基二苯甲酮的酯化产物和二 - 或三 - 羟基二苯甲酮的辐射敏感组合物
公开(公告)号：US5358823A
公开(公告)日：1994-10-25
申请号：US863681
申请日：1992-04-01
IPC分类号： G03F7/00 , G03F7/022 , H01L21/027 , G03F7/023
CPC分类号： G03F7/022
摘要： A radiation-sensitive composition is disclosed comprising a polymeric binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solution and a 2,3,4,4'-tetrahydroxybenzophenone which is partially esterified with (1,2-naphthoquinone 2-diazide)-4- and/or -5-sulfonic acid, which additionally contains either a dihydroxybenzophenone which is completely esterified with (1,2-naphthoquinone 2-diazide)-4- and/or -5-sulfonic acid or a trihydroxybenzophenone which is partially or completely esterified with (1,2-naphthoquinone 2-diazide)-4- and/or -5-sulfonic acid. The weight ratio of esterified 2,3,4,4'-tetrahydroxybenzophenone to esterified di- or trihydroxybenzophenone varies between about 4:6 and 7:3 and the esterified hydroxybenzophenones, as a whole, are present in a proportion of 5 to 40% by weight, based on the total weight of solids contained in the composition. Also disclosed is a radiation-sensitive recording material comprising a support and a layer containing this composition, which is present on the support.
摘要翻译： 公开了一种辐射敏感性组合物，其包含不溶于水，但在碱性水溶液中可溶或至少可溶胀的聚合物粘合剂和被（1,2-萘醌）部分酯化的2,3,4,4'-四羟基二苯甲酮 2-二叠氮基）-4-和/或-5-磺酸，其另外含有与（1,2-萘醌-2-二叠氮化物）-4-和/或-5-磺酸完全酯化的二羟基二苯甲酮或 由（1,2-萘醌-2-二叠氮化物）-4-和/或-5-磺酸部分或完全酯化的三羟基二苯甲酮。 酯化的2,3,4,4'-四羟基二苯甲酮与酯化的二 - 或三羟基二苯甲酮的重量比在约4:6和7:3之间变化，酯化的羟基二苯甲酮整体上以5-40％的比例存在， ，基于组合物中所含的固体的总重量。 还公开了一种辐射敏感记录材料，其包含载体和包含该组合物的层，其存在于载体上。
-
-
-
-
-
-
-
-
-
搜索结果
16 条记录 (耗时 0.023 秒)
