公开(公告)号：US20130248731A1

公开(公告)日：2013-09-26

申请号：US13733955

申请日：2013-01-04

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Sayaka TANIMOTO ,  Hiroya OHTA ,  Makoto SAKAKIBARA ,  Momoyo ENYAMA ,  Kenji TANIMOTO

IPC: H01J37/10

CPC classification number: H01J37/10 ,  H01J37/153 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/1534

Abstract: There is provided both an electron beam apparatus and a lens array, capable of correcting a curvature of field aberration under various optical conditions. The electron beam apparatus comprises the lens array having a plurality of electrodes, and multiple openings are formed in the respective electrodes. An opening diameter distribution with respect to the respective opening diameters of the plural openings formed in the respective electrodes are individually set, and voltages applied to the respective electrodes are independently controlled to thereby independently adjust an image forming position of a reference beam, and a curvature of the lens array image surface.

Abstract translation: 提供能够在各种光学条件下校正场像差曲率的电子束装置和透镜阵列。 电子束装置包括具有多个电极的透镜阵列，并且在各个电极中形成多个开口。 分别设置相对于形成在各个电极中的多个开口的开口直径的开口直径分布，并且独立地控制施加到各个电极的电压，从而独立地调整参考光束的图像形成位置和曲率 的透镜阵列图像表面。

公开(公告)号：US20190206654A1

公开(公告)日：2019-07-04

申请号：US16325662

申请日：2016-08-31

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Noritsugu TAKAHASHI ,  Makoto SAKAKIBARA ,  Wataru MORI ,  Hajime KAWANO ,  Yuko SASAKI

IPC: H01J37/12 ,  H01J37/20 ,  H01J37/21 ,  H01J37/244 ,  H01J37/141

Abstract: A measuring device for measuring a sample by emitting a charged particle beam includes a particle source, an electronic lens, a detector, a stage, a sensor for measuring the environment, and a control device, in which the control device includes a control module having a height calculation module configured to calculate a height estimation value indicating an estimated height of the sample at a measurement position; and a correction value calculation module configured to calculate a correction value reflecting a change of the environment based on the measurement position of the sample and an amount of change of the environment measured by the sensor, and the control module corrects the height estimation value based on the correction value, and sets a control value for controlling focus adjustment using the electronic lens based on the corrected height estimation value.

公开(公告)号：US20170186583A1

公开(公告)日：2017-06-29

申请号：US15304869

申请日：2015-04-20

Applicant: Hitachi High-Technologies Corporation

Inventor： Kaori SHIRAHATA ,  Daisuke BIZEN ,  Makoto SAKAKIBARA ,  Yasunari SOHDA ,  Hajime KAWANO ,  Hideyuki KAZUMI

IPC: H01J37/28 ,  G01N23/225 ,  H01J37/26

CPC classification number: H01J37/28 ,  G01N23/2251 ,  H01J37/252 ,  H01J37/263 ,  H01J49/48 ,  H01J2237/2602 ,  H01J2237/28 ,  H01J2237/2801 ,  H01J2237/2806

Abstract: The scanning electron microscope includes: an electron source; a first deflector for deflecting a primary electron beam emitted from the electron source; a second deflector for focusing the primary electron beam deflected by the first deflector and deflecting a second electron from a sample, which is generated the focused primary electron beam, to the outside of the optical axis; a voltage applying unit for applying a negative voltage to the sample to decelerate the primary electron beam; a spectrometer for dispersing the secondary electron; a detector for detecting the secondary electron passing through the spectrometer; an electrostatic lens provided between the second deflector and the spectrometer; and a voltage control unit that controls the voltage applied to the electrostatic lens based on the negative voltage applied to the sample. The electrostatic lens allows the deflecting action to be overlapped with the converging action.

公开(公告)号：US20190066969A1

公开(公告)日：2019-02-28

申请号：US16115103

申请日：2018-08-28

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Kaori BIZEN ,  Yasunari SOHDA ,  Makoto SAKAKIBARA ,  Hiroya OHTA ,  Kenji TANIMOTO ,  Yusuke ABE

IPC: H01J37/153 ,  H01J37/20 ,  H01J37/14 ,  H01J37/147 ,  H01J37/26

Abstract: There is provided a charged particle beam apparatus including: a charged particle source; a condenser lens and an object lens for converging a charged particle beam from the charged particle source and irradiating the converged charged particle beam to a specimen; and plural image shift deflectors for deflecting the charged particle beam. In the charged particle beam apparatus, the deflection of the charged particle beam is controlled using first control parameters that set the optical axis of a charged particle beam to a first optical axis that passes through the center of the object lens and enters a predefined position of the specimen, and second control parameters that transform the first control parameters so that the first control parameters set the optical axis of the charged particle beam to a second optical axis having a predefined incident angle different from the incident angle of the first optical axis.

公开(公告)号：US20180286629A1

公开(公告)日：2018-10-04

申请号：US15527073

申请日：2015-11-18

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Makoto SAKAKIBARA ,  Hajime KAWANO ,  Makoto SUZUKI ,  Yuji KASAI ,  Daisuke BIZEN ,  Yoshinori MOMONOI

IPC: H01J37/21 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/21 ,  H01J37/147 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/216 ,  H01J2237/2806

Abstract: A charged particle beam device includes a charged particle source that generates a charged particle beam, a focus adjustment unit that adjusts a focal position of the charged particle beam, a deflection unit for scanning the charged particle beam on the sample, a detection unit that detects charged particles generated when the sample is irradiated with the charged particle beam, a detected charged particle selection unit that selects charged particles to be detected by the detection unit, and a control processing unit that makes focus adjustment of the focus adjustment unit and reference adjustment of the detected charged particle selection unit by using information from the detection unit acquired from one scan.

公开(公告)号：US20210125806A1

公开(公告)日：2021-04-29

申请号：US16617319

申请日：2018-03-30

Applicant: Hitachi High-Technologies Corporation

Inventor： Koichi HAMADA ,  Megumi KIMURA ,  Momoyo ENYAMA ,  Ryou YUMIBA ,  Makoto SAKAKIBARA ,  Kei SAKAI ,  Satoru YAMAGUCHI ,  Katsumi SETOGUCHI

IPC: H01J37/22 ,  H01J37/10

Abstract: Provided is an electron beam observation device that includes: an electron source; an objective lens concentrating an electron beam emitted from the electron source; and a control unit configured to perform control such that a plurality of images is generated by capturing images of a reference sample having a specific pattern, and a frequency characteristic is calculated for each of the plurality of images, in which an image is generated based on a secondary signal generated from a sample due to irradiation of the sample with the electron beam, and the control unit holds the plurality of frequency characteristics.

公开(公告)号：US20200185189A1

公开(公告)日：2020-06-11

申请号：US16313708

申请日：2016-07-28

Applicant: Hitachi High-Technologies Corporation

Inventor： Uki IKEDA ,  Daisuke BIZEN ,  Makoto SAKAKIBARA ,  Makoto SUZUKI

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/20 ,  H01J37/26 ,  H01J37/147

Abstract: The purpose of the present invention is to provide a charged-particle beam apparatus capable of performing various types of signal discriminations according to the shape and the size of a sample. The present invention proposes a charged-particle beam apparatus for irradiating a sample disposed in a vacuum vessel with a charged particle beam. The charged-particle beam apparatus is provided with: a first light-generating surface for generating light on the basis of the collision of charged particles released from the sample; a light-guiding member for guiding the generated light to the outside of the vacuum vessel while maintaining the generation distribution of the light generated at the first light-generating surface; a photodetector for detecting the light guided by the light-guiding member to the outside of the vacuum vessel; and a light-transmission restricting member for restricting transmission of the light guided by the light-guiding member between the photodetector and the light-guiding member.

公开(公告)号：US20200266020A1

公开(公告)日：2020-08-20

申请号：US16644871

申请日：2017-09-07

Applicant: Hitachi High-Technologies Corporation

Inventor： Soichiro MATSUNAGA ,  Yasunari SOHDA ,  Souichi KATAGIRI ,  Makoto SAKAKIBARA ,  Hajime KAWANO ,  Takashi DOI

IPC: H01J37/063 ,  H01J37/141 ,  H01J37/244 ,  H01J37/248 ,  H01J37/28 ,  H01J37/295

Abstract: In order to provide an electron gun capable of maintaining a small spot diameter of a beam converged on a sample even when a probe current applied to the sample is increased, a magnetic field generation source 301 is provided with respect to an electron gun including: an electron source 101; an extraction electrode 102 configured to extract electrons from the electron source 101; an acceleration electrode 103 configured to accelerate the electrons extracted from the electron source 101; and a first coil 104 and a first magnetic path 201 having an opening on an electron source side, the first coil 104 and the first magnetic path 201 forming a control lens configured to converge an electron beam emitted from the acceleration electrode 103. The magnetic field generation source is provided for canceling a magnetic field, at an installation position of the electron source 101, generated by the first coil 104 and the first magnetic path 201.

公开(公告)号：US20150228443A1

公开(公告)日：2015-08-13

申请号：US14616658

申请日：2015-02-07

Applicant: Hitachi High-Technologies Corporation

Inventor： Kenichi MORITA ,  Sayaka TANIMOTO ,  Makoto SAKAKIBARA ,  Muneyuki FUKUDA ,  Naomasa SUZUKI ,  Kenji OBARA

IPC: H01J37/141 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/141 ,  H01J37/222 ,  H01J37/243 ,  H01J37/261 ,  H01J37/265 ,  H01J2237/04922 ,  H01J2237/221 ,  H01J2237/2801 ,  H01J2237/2806 ,  H01J2237/2809 ,  H01J2237/2817

Abstract: A charged particle beam apparatus includes a charged particle beam source which irradiates a sample with a charged particle beam, an electromagnetic lens, a lens control electric source for controlling strength of a convergence effect of the electromagnetic lens; and a phase compensation circuit which is connected to the lens control electric source in parallel with the electromagnetic lens, and controls a lens current at the time of switching the strength of the convergence effect of the electromagnetic lens such that the lens current monotonically increases or monotonically decreases.

Abstract translation: 带电粒子束装置包括用带电粒子束照射样本的带电粒子束源，电磁透镜，用于控制电磁透镜的会聚效应的强度的透镜控制电源; 以及相位补偿电路，其与电磁透镜并联连接到透镜控制电源，并且在切换电磁透镜的会聚效果的强度时控制透镜电流，使得透镜电流单调增加或单调 减少