公开(公告)号：US4093464A

公开(公告)日：1978-06-06

申请号：US382864

申请日：1973-07-26

申请人： Hans Ruckert ,  Barbara Wildenhain

发明人： Hans Ruckert ,  Barbara Wildenhain

IPC分类号： G03C1/72 ,  C08L33/00 ,  C08L33/02 ,  C08L61/00 ,  C08L61/04 ,  G03F7/022 ,  G03F7/023 ,  H05K3/00 ,  H05K3/06 ,  G03C1/54 ,  G03C1/60

CPC分类号： G03F7/022 ,  G03F7/0233

摘要： A light-sensitive layer transfer material and such layer disposed on a carrier, for use in screen-printing stencils, printed circuit boards, integrated circuits, intaglio printing plates, relief printing plates, proof prints and the like, which comprises an alkali-soluble phenolic resin, such as phenol-formaldehyde novolacs, an ester or an amide of an o-naphthoquinone-diazide sulphonic acid, such as the p-cumyl phenyl ester of 1,2-naphthoquinone-2-diazide-4-sulphonic acid, etc., and an acrylic resin, such as a polymer of an alkyl ester of acrylic acid or methacrylic acid.

摘要翻译： 一种感光层转印材料和这种层，其设置在载体上，用于丝网印刷模版，印刷电路板，集成电路，凹版印刷版，凸版印刷版，防伪印版等，其包含碱溶性 酚醛树脂，如酚醛酚醛清漆，邻萘醌二叠氮磺酸的酯或酰胺，如1,2-萘醌-2-二叠氮-4-磺酸的对枯基苯基酯等 和丙烯酸树脂，例如丙烯酸或甲基丙烯酸的烷基酯的聚合物。

公开(公告)号：US4401520A

公开(公告)日：1983-08-30

申请号：US244965

申请日：1981-03-18

申请人： Hartmut Steppan ,  Barbara Wildenhain ,  Hans Ruckert

发明人： Hartmut Steppan ,  Barbara Wildenhain ,  Hans Ruckert

IPC分类号： B41C1/14 ,  G03F7/12 ,  C25D1/08

CPC分类号： G03F7/12

摘要： This invention relates to an improvement in the process for the preparation of screen printing stencils by an electroplating method, which comprises coating a metallic matrix, provided in the manner of a screen with dots of insulating material, with a photoresist layer, exposing the photoresist layer imagewise and developing it by washing out, and rendering those areas of the photoresist layer which have remained in place electrically conductive in the course of imaging, electrodepositing metal up to a desired height on the conductive image stencil and on the matrix ridges surrounding the insulating screen dots, and removing the patterned screen printing stencil thus obtained from the matrix, the improvement which comprises rendering the photoresist layer conductive only on its surface and before developing.

摘要翻译： 本发明涉及通过电镀方法制备丝网印刷模版的方法的改进，该方法包括以带有点绝缘材料的丝网的方式涂覆金属基体与光致抗蚀剂层，使光致抗蚀剂层曝光 成像并通过洗出来显影，并且在成像过程中使保留在导电的光致抗蚀剂层的那些区域电镀到导电图案模板上的所需高度和围绕绝缘屏幕的矩阵脊上 点，并且从矩阵中去除由此获得的图案化丝网印刷模板，其改进包括使光致抗蚀剂层仅在其表面上导电并且在显影之前。

公开(公告)号：US4764450A

公开(公告)日：1988-08-16

申请号：US946621

申请日：1986-12-29

申请人： Hans Ruckert ,  Ralf Ohlenmacher

发明人： Hans Ruckert ,  Ralf Ohlenmacher

IPC分类号： G03F7/004 ,  G03F7/022 ,  G03C1/60 ,  G03C1/74

CPC分类号： G03F7/0048 ,  G03F7/022 ,  Y10S430/136

摘要： A positive-working radiation-sensitive coating solution is disclosed which contains a radiation-sensitive compound, e.g., a 1,2-naphthoquinone diazide, or a radiation-sensitive combination of compounds, e.g., a compound with at least one C--O--C bond which can be split by acid and a compound which upon radiation forms a strong acid, and at least one organic solvent which comprises a mono-C.sub.1 to C.sub.4 -alkyl ether of 1,2-propanediol. The coating solution is less toxic and results in a better layer leveling than known positive-working photoresist solutions.

摘要翻译： 公开了一种正面工作的辐射敏感性涂层溶液，其包含辐射敏感化合物，例如1,2-萘醌二叠氮化物或化合物的辐射敏感性组合，例如具有至少一个COC键的化合物，其可以 由酸和化合物分解，其在辐射时形成强酸，以及至少一种包含1,2-丙二醇的单C1至C4烷基醚的有机溶剂。 涂层溶液的毒性较小，导致比已知的正性光刻胶溶液更好的层流平衡。

公开(公告)号：US4506006A

公开(公告)日：1985-03-19

申请号：US449739

申请日：1982-12-14

申请人： Hans Ruckert

发明人： Hans Ruckert

IPC分类号： G03F7/038 ,  G03C7/00 ,  G03C7/407 ,  G03F7/004 ,  G03F7/20 ,  G03F7/26 ,  G03F7/38 ,  H01L21/027 ,  G03C7/26

CPC分类号： G03F7/2022

摘要： A process is described for preparing relief images, in which a light-sensitive material composed of a support and a light-sensitive layer which contains as essential constituents(a) a compound which has at least one C-O-C bond which is cleavable by acid,(b) a compound which forms a strong acid on irradiation and(c) a binder which is insoluble in water and soluble in aqueous-alkaline solutions is imagewise irradiated, warmed to an elevated temperature, cooled down and then irradiated over its entire area, whereafter those parts of the layer which have not been imagewise irradiated are then washed out by developing. The process makes it possible to prepare positive or negative copies by means of the same light-sensitive material in a simple way.

摘要翻译： 描述了一种用于制备浮雕图像的方法，其中由支撑体和感光层组成的感光材料包含作为必要成分（a）具有至少一个COC键的可被酸切割的化合物（a） b）在照射时形成强酸的化合物和（c）不溶于水并可溶于碱性水溶液的粘合剂被成像照射，升温至高温，然后冷却，然后在其整个区域上照射，然后 然后通过显影来洗涤未成像照射的那些部分。 该方法可以通过相同的光敏材料以简单的方式制备正或负的拷贝。

公开(公告)号：US4250247A

公开(公告)日：1981-02-10

申请号：US054809

申请日：1979-07-05

申请人： Jurgen Sander ,  Gerhard Buhr ,  Hans Ruckert

发明人： Jurgen Sander ,  Gerhard Buhr ,  Hans Ruckert

IPC分类号： G03C1/72 ,  C07D263/44 ,  C07D265/26 ,  C08L61/04 ,  G03C5/00 ,  G03F7/004 ,  G03F7/016 ,  G03F7/022 ,  G03F7/038 ,  G03C1/68

CPC分类号： G03F7/0045 ,  G03F7/016 ,  G03F7/022

摘要： This invention relates to an improvement in a radiation-sensitive mixture containing (a) a compound which forms an acid under the influence of actinic radiation and (b) a compound which has at least one acid-cleavable bond and the solubility of which in a liquid developer is increased by the action of an acid, the improvement that the compound which is capable of being cleft by an acid contains at least one N-acyliminocarbonate group as the acid-cleavable group. The invention also relates to a process for producing relief images using the radiation-sensitive mixture.

摘要翻译： 本发明涉及辐射敏感性混合物的改进，其包含（a）在光化辐射影响下形成酸的化合物和（b）具有至少一个酸可切割键的化合物，并且其在 通过酸的作用使液体显影剂增加，改善了能够被酸裂解的化合物含有至少一个N-酰亚胺碳酸酯基作为酸可裂解基团。 本发明还涉及使用该辐射敏感性混合物产生浮雕图像的方法。

公开(公告)号：US6114091A

公开(公告)日：2000-09-05

申请号：US962781

申请日：1997-11-03

申请人： Ulrich Geissler ,  Hans-Dieter Frommeld ,  Hans Ruckert

发明人： Ulrich Geissler ,  Hans-Dieter Frommeld ,  Hans Ruckert

IPC分类号： G03F7/004 ,  C08F2/50 ,  G03F7/027 ,  G03F7/028 ,  G03F7/031 ,  G03F7/032 ,  G03F7/038 ,  H01L21/027 ,  H05K3/06 ,  G03C1/73

CPC分类号： G03F7/031 ,  Y10S430/121 ,  Y10S430/123

摘要： A photopolymerizable composition, which contains a polymeric binder, a compound which can be polymerized by free radicals and has at least one terminal ethylenic double bond and a photoinitiator combination comprising an N-heterocyclic compound, a thioxanthone derivative and a dialkylamino compound, is highly photosensitive and produces photoresist stencils with vertical side walls.

摘要翻译： 含有聚合物粘合剂的可光聚合组合物，可以通过自由基聚合并具有至少一个末端烯属双键的化合物和包含N-杂环化合物，噻吨酮衍生物和二烷基氨基化合物的光引发剂组合是高度光敏的 并产生具有垂直侧壁的光刻胶模版。

公开(公告)号：US4619885A

公开(公告)日：1986-10-28

申请号：US739512

申请日：1985-05-31

申请人： Rainer Wingen ,  Ulrich Geissler ,  Hans Ruckert

发明人： Rainer Wingen ,  Ulrich Geissler ,  Hans Ruckert

IPC分类号： C08F2/00 ,  C07D239/48 ,  C07D471/04 ,  C08F2/48 ,  C08F2/50 ,  G03F7/004 ,  G03F7/031 ,  G03C1/68 ,  G03C1/76

CPC分类号： C07D239/48 ,  C07D471/04 ,  C08F2/50 ,  G03F7/031 ,  Y10S430/121

摘要： A photopolymerizable composition is disclosed which comprises (a) a polymeric binder, (b) a polymerizable compound, and (c) a photoinitiator comprised of a compound according to formula I ##STR1## wherein R.sup.1 is a hydrogen atom, a halogen atom, an alkyl group, alkoxy group, or dialkylamino group,R.sup.1 ' is a hydrogen atom, a halogen atom or an alkyl groupR.sup.2 is an alkyl group or an alkoxycarbonylalkyl group, or, if R.sup.1 and R.sup.2 each denote an alkyl moiety,R.sup.1 and R.sup.2 together form a five- or six-membered ring, andR.sup.3 denotes a tertiary amino group.The compounds are distinguished by their good solubility and high activity in the short-wave visible region of the spectrum.

摘要翻译： 公开了一种可光聚合的组合物，其包含（a）聚合物粘合剂，（b）可聚合化合物，和（c）由根据式I的化合物（I）组成的光引发剂，其中R 1是氢原子，卤素 原子，烷基，烷氧基或二烷基氨基，R1'为氢原子，卤素原子或烷基R2为烷基或烷氧基羰基烷基，或者，如果R1和R2各自表示烷基部分，则R1 和R2一起形成五元或六元环，R 3表示叔氨基。 这些化合物的特征在于其在光谱的短波可见光区域的良好溶解度和高活性。

公开(公告)号：US4101323A

公开(公告)日：1978-07-18

申请号：US669892

申请日：1976-03-24

申请人： Gerhard Buhr ,  Hans Ruckert ,  Hans Werner Frass

发明人： Gerhard Buhr ,  Hans Ruckert ,  Hans Werner Frass

IPC分类号： G03F7/039 ,  G01T1/04 ,  G03C1/72 ,  G03C1/73 ,  G03F3/10 ,  G03F7/004 ,  G03F7/016 ,  G03F7/022 ,  G03C5/00 ,  G03C1/00 ,  G03C1/52

CPC分类号： G03F7/0045 ,  G01T1/04 ,  G03F3/10 ,  G03F7/016 ,  G03F7/022

摘要： This invention relates to a radiation-sensitive copying composition comprising a compound (1) which splits-off an acid upon irradiation and a compound (2) having at least one group selected from the group consisting of a carboxylic ortho acid ester group and a carboxylic acid amide acetal group, which composition, upon irradiation, forms an exposure product having a higher solubility in a liquid developer than the non-irradiated composition.

摘要翻译： 本发明涉及一种辐射敏感复印组合物，其包含在照射时分解酸的化合物（1）和具有至少一个选自羧酸原酸酯基和羧酸的基团的化合物（2） 酰胺缩醛基，该组合物在照射时形成与未照射组合物相比在液体显影剂中具有更高溶解度的曝光产品。

公开(公告)号：US5015554A

公开(公告)日：1991-05-14

申请号：US563677

申请日：1990-08-06

申请人： Hans Ruckert ,  Gabriele Lambert

发明人： Hans Ruckert ,  Gabriele Lambert

IPC分类号： G03C1/72 ,  G03F7/004

CPC分类号： G03F7/0045

摘要： A radiation-sensitive mixture is described comprising a compound which produces a strong acid under the action of actinic radiation, a binder which is insoluble in water, but soluble in organic solvents and aqueous-alkaline solutions, and a compound of either of formulae I and II ##STR1## wherein R denotes a substituted or unsubstituted alkyl group,X denotes a hydrogen or halogen atom or a hydroxyl, alkyl, alkoxy, alkoxycarbonyl, aryloxy or aryl group, andn denotes zero or a number from 1 to 3.The mixture is suitable for the production of printing plates and photoresists and is distinguished by improved high flexibility along with good overdevelopment resistance.

摘要翻译： 描述了一种辐射敏感性混合物，其包括在光化辐射的作用下产生强酸的化合物，不溶于水但可溶于有机溶剂和碱性水溶液的粘合剂，以及式I和 （II）其中R表示取代或未取代的烷基，X表示氢或卤素原子或羟基，烷基，烷氧基，烷氧基羰基，芳氧基或芳基，n表示0或 数字从1到3.该混合物适用于生产印版和光致抗蚀剂，并具有改善的高柔性和良好的过度发展性。

公开(公告)号：US4983501A

公开(公告)日：1991-01-08

申请号：US388817

申请日：1989-08-03

申请人： Hans Ruckert

发明人： Hans Ruckert

IPC分类号： G03F7/004 ,  G03F7/039

CPC分类号： G03F7/0045

摘要： A positive-working radiation-sensitive composition is described, which comprises a binder which is insoluble in water and soluble or swellable in organic solvents and in aqueous-alkaline solutions, a compound which forms a strong acid upon irradiation, and a compound of the general formula ##STR1## wherein R denotes an alkyl group which may be substituted andR.sub.1 and R.sub.2 are identical or different and denote alkyl groups containing 1 to 6 carbon atoms.The composition is suitable for use in the production of radiation-sensitive recording materials such as printing plates or photoresists and is characterized by increased flexibility and good overdevelopment resistance.

摘要翻译： 描述了一种正性辐射敏感组合物，其包含不溶于水且在有机溶剂中和在碱性水溶液中可溶或可溶胀的粘合剂，在照射时形成强酸的化合物和一般化合物 式其中R表示可被取代的烷基，R 1和R 2相同或不同，表示含有1至6个碳原子的烷基。 该组合物适用于生产辐射敏感性记录材料如印刷版或光致抗蚀剂，其特征在于增加了柔韧性和良好的耐发展性。