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24 条记录 (耗时 0.031 秒)

    Acid degradable radiation-sensitive mixture
    2.
    发明授权
    Acid degradable radiation-sensitive mixture 失效
    酸降解辐射敏感性混合物

    公开(公告)号：US4250247A

    公开(公告)日：1981-02-10

    申请号：US054809

    申请日：1979-07-05

    申请人： Jurgen Sander ,  Gerhard Buhr ,  Hans Ruckert

    发明人： Jurgen Sander ,  Gerhard Buhr ,  Hans Ruckert

    IPC分类号： G03C1/72 ,  C07D263/44 ,  C07D265/26 ,  C08L61/04 ,  G03C5/00 ,  G03F7/004 ,  G03F7/016 ,  G03F7/022 ,  G03F7/038 ,  G03C1/68

    CPC分类号： G03F7/0045 ,  G03F7/016 ,  G03F7/022

    摘要： This invention relates to an improvement in a radiation-sensitive mixture containing (a) a compound which forms an acid under the influence of actinic radiation and (b) a compound which has at least one acid-cleavable bond and the solubility of which in a liquid developer is increased by the action of an acid, the improvement that the compound which is capable of being cleft by an acid contains at least one N-acyliminocarbonate group as the acid-cleavable group. The invention also relates to a process for producing relief images using the radiation-sensitive mixture.

    摘要翻译： 本发明涉及辐射敏感性混合物的改进，其包含（a）在光化辐射影响下形成酸的化合物和（b）具有至少一个酸可切割键的化合物，并且其在 通过酸的作用使液体显影剂增加，改善了能够被酸裂解的化合物含有至少一个N-酰亚胺碳酸酯基作为酸可裂解基团。 本发明还涉及使用该辐射敏感性混合物产生浮雕图像的方法。

    Radiation-sensitive mixture and process for the production of relief images
    4.
    发明授权
    Radiation-sensitive mixture and process for the production of relief images 失效
    辐射敏感的混合物和生产浮雕图像的过程

    公开(公告)号：US4311782A

    公开(公告)日：1982-01-19

    申请号：US169133

    申请日：1980-07-15

    申请人： Gerhard Buhr ,  Hans Ruckert

    发明人： Gerhard Buhr ,  Hans Ruckert

    IPC分类号： G03C1/72 ,  C08G65/16 ,  C08L69/00 ,  G03F7/004 ,  G03F7/022 ,  G03F7/038 ,  G03C1/68 ,  G03C5/00

    CPC分类号： G03F7/022 ,  C08G65/16 ,  C08L69/00 ,  G03F7/0045

    摘要： A radiation-sensitive mixture is described which contains (a) a compound which forms an acid under the action of actinic radiation, and (b) a polymeric compound having recurrent orthocarboxylic acid ester groupings, and which comprises a polymeric compound which is built up from recurrent units of the formula I: ##STR1## wherein R.sup.1 is a hydrogen atom or an alkyl, cycloalkyl or aryl group, R.sup.2, R.sup.3 and R.sup.5 are identical or different and denote hydrogen atoms or alkyl or aryl groups, R.sup.4 denotes an alkylene group or --if a.sub.1 =a.sub.2 =1-- also an alkyleneoxy group, it being possible for the alkylene groups to be interrupted by hetero-atoms or by unsaturated or cyclic groups, R.sup.6 denotes a hydrogen atom or a methyl group, a.sub.1 and a.sub.2 each denote, 0, 1 or 2, a.sub.1 +a.sub.2 denotes 1 or 2 and m denotes a number from 3 to 200. The mixtures are suitable for the production of reprographic materials, in particular printing plates, of high photosensitivity.

    摘要翻译： 描述了一种辐射敏感性混合物，其包含（a）在光化辐射的作用下形成酸的化合物，和（b）具有复发性原羧酸酯基团的聚合化合物，并且其包含由 式I的反应性单元：其中R 1是氢原子或烷基，环烷基或芳基，R 2，R 3和R 5相同或不同，表示氢原子或烷基或芳基，R 4表示 亚烷基或-if a1 = a2 = 1-也是亚烷基氧基，亚烷基可以被杂原子或不饱和或环状基团中断，R6表示氢原子或甲基，a1和a2 每个表示0,1或2，a1 + a2表示1或2，m表示3至200的数字。该混合物适用于生产具有高光敏度的复制材料，特别是印刷版。

    Positive-working radiation-sensitive mixture
    5.
    发明授权
    Positive-working radiation-sensitive mixture 失效
    正面工作的辐射敏感混合物

    公开(公告)号：US4506003A

    公开(公告)日：1985-03-19

    申请号：US551025

    申请日：1983-11-14

    申请人： Hans Ruckert ,  Gerhard Buhr ,  Hartmut Steppan

    发明人： Hans Ruckert ,  Gerhard Buhr ,  Hartmut Steppan

    IPC分类号： G03C1/72 ,  C08L33/00 ,  C08L33/02 ,  C08L61/00 ,  C08L61/04 ,  C08L61/06 ,  C08L75/00 ,  C08L75/04 ,  G03C1/74 ,  G03C5/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/16 ,  H01L21/027 ,  H01L21/30 ,  H05K3/00 ,  G03C1/68

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S522/904

    摘要： A positive-working radiation-sensitive mixture is described which is composed of a compound having at least one C--O--C bond which can be split by acid, a compound which forms a strong acid when irradiated, a binder which is insoluble in water and soluble in aqueous-alkaline solutions, and a resin having solubility properties which differ from those of the binder and which is selected from (1) a polyurethane resin obtained from an organic isocyanate and a polymer which contains hydroxyl groups, (2) a polyvinyl alkyl ether, (3) an alkyl acrylate polymer, or (4) a hydrogenated or partially hydrogenated derivative of colophony. As a result of the resin additives, photoresist layers are obtained which have good adhesion to the support, good flexibility, good latitude in developing and good resolution.

    摘要翻译： 描述了一种正性辐射敏感性混合物，其由具有至少一个可被酸分解的COC键的化合物，在照射时形成强酸的化合物，不溶于水并且可溶于水的粘合剂 - 碱性溶液和具有与粘合剂不同的溶解性的树脂，其选自（1）由有机异氰酸酯和含有羟基的聚合物得到的聚氨酯树脂，（2）聚乙烯基烷基醚，（ 3）丙烯酸烷基酯聚合物，或（4）氢化或部分氢化的松香衍生物。 作为树脂添加剂的结果，获得了对支持物具有良好粘附性的光致抗蚀剂层，良好的柔韧性，显影良好的分辨率和良好的分辨率。

    Light-sensitive compounds, light-sensitive mixture, and light-sensitive copying material prepared therefrom
    6.
    发明授权
    Light-sensitive compounds, light-sensitive mixture, and light-sensitive copying material prepared therefrom 失效
    感光性化合物，感光性混合物和由其制备的感光复印材料

    公开(公告)号：US4409314A

    公开(公告)日：1983-10-11

    申请号：US313154

    申请日：1981-10-20

    申请人： Gerhard Buhr ,  Hans Ruckert ,  Paul Stahlhofen

    发明人： Gerhard Buhr ,  Hans Ruckert ,  Paul Stahlhofen

    IPC分类号： G03C1/72 ,  C07C67/00 ,  C07C241/00 ,  C07C247/16 ,  G03F7/022 ,  G03C1/60 ,  C07C113/00 ,  G03C1/54

    CPC分类号： G03F7/022

    摘要： A light-sensitive mixture is described which contains a water-insoluble resinous binder, which is soluble or swellable in aqueous-alkaline solutions, and a novel 1,2-naphthoquinone-2-diazide-sulfonic acid ester of a dihydroxyacylophenone or of a dihydroxybenzoic acid ester of the formula I ##STR1## in which R.sup.1 is an alkyl or alkoxy radical, the carbon chain of which can be interrupted by ether oxygen atoms, R.sup.2 is a hydrogen atom, an alkyl radical having 1-3 carbon atoms, or a chlorine or bromine atom and D is a 1,2-naphthoquinone-2-diazide-sulfonyl radical. The copying materials prepared from this mixture are particularly suitable for the preparation of printing plates which give long print runs and have a high light sensitivity. The compounds of the formula I are distinguished by good solubility in customary coating solvents.

    摘要翻译： 描述了一种光敏混合物，其含有在水性 - 碱性溶液中可溶或溶胀的水不溶性树脂粘合剂，以及新的1,2-二羟基苯乙酮的1,2-萘醌-2-二叠氮化物 - 磺酸酯或二羟基苯甲酸 式I的酸酯，其中R 1是烷基或烷氧基，其碳链可以被醚氧原子间隔，R2是氢原子，具有1-3个碳原子的烷基或 氯或溴原子，D是1,2-萘醌-2-二叠氮磺酰基。 从该混合物制备的复印材料特别适用于制备长印刷运行并具有高光敏性的印版。 式I的化合物的特征在于在常规涂料溶剂中具有良好的溶解性。

    Light-sensitive mixture
    7.
    发明授权
    Light-sensitive mixture 失效
    光敏混合物

    公开(公告)号：US4266001A

    公开(公告)日：1981-05-05

    申请号：US51908

    申请日：1979-06-25

    申请人： Gerhard Buhr ,  Hans Ruckert

    发明人： Gerhard Buhr ,  Hans Ruckert

    IPC分类号： G03C1/72 ,  C08L61/00 ,  C08L61/04 ,  G03F7/022 ,  H01L21/027 ,  G03C1/54 ,  C07C113/00

    CPC分类号： G03F7/022

    摘要： A positive-working light-sensitive mixture for the preparation of printing plates, in particular planographic printing plates, and photoresists is described, which comprises an alkali-soluble binder, preferably a novolak, and an o-naphthoquinone diazide of the formula ##STR1## in which R.sub.1, R.sub.1 ', R.sub.2 and R.sub.2 ' are identical or different and represent hydrogen, chlorine or bromine atoms, alkyl, alkoxy or alkoxyalkyl groups having 1 to 6 carbon atoms or alkenyl groups having 2 to 6 carbon atoms, R.sub.3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R.sub.4 represents a hydrogen atom, an optionally substituted alkyl group, the carbon chain of which can be interrupted by ether oxygen atoms, an optionally substituted cycloalkyl group having 5 to 16 carbon atoms or an optionally substituted alkenyl group having 2 to 16 carbon atoms, n represents zero or an integer from 1 to 4 and D represents a 1,2-naphthoquinone-2-diazide-sulfonyl group. The new naphthoquinone diazides are distinguished by a high solubility in organic solvents and by good reprographic properties.

    摘要翻译： 描述了用于制备印刷版，特别是平版印刷版和光致抗蚀剂的正性工作的感光混合物，其包含碱溶性粘合剂，优选酚醛清漆和下式的邻萘醌二叠氮化物 （I）其中R 1，R 1'，R 2和R 2'相同或不同并且表示氢，氯或溴原子，具有1至6个碳原子的烷基，烷氧基或烷氧基烷基或具有2至6个碳原子的烯基，R 3 表示氢原子或碳原子数1〜4的烷基，R4表示氢原子，可以被醚氧原子间隔的碳链的可以具有取代基的烷基，碳原子数为5〜16的任意取代的环烷基 原子或具有2至16个碳原子的任选取代的烯基，n表示0或1至4的整数，D表示1,2-萘醌-2-二叠氮磺酰基。 新的萘醌二叠氮化物的特征在于在有机溶剂中的高溶解度和良好的再现性能。

    Positive-working radiation-sensitive coating solution and positive photoresist material with monomethyl ether of 1,2-propanediol as solvent
    8.
    发明授权
    Positive-working radiation-sensitive coating solution and positive photoresist material with monomethyl ether of 1,2-propanediol as solvent 失效
    正性辐射敏感涂层溶液和正性光致抗蚀剂材料与1,2-丙二醇的单甲醚作为溶剂

    公开(公告)号：US4764450A

    公开(公告)日：1988-08-16

    申请号：US946621

    申请日：1986-12-29

    申请人： Hans Ruckert ,  Ralf Ohlenmacher

    发明人： Hans Ruckert ,  Ralf Ohlenmacher

    IPC分类号： G03F7/004 ,  G03F7/022 ,  G03C1/60 ,  G03C1/74

    CPC分类号： G03F7/0048 ,  G03F7/022 ,  Y10S430/136

    摘要： A positive-working radiation-sensitive coating solution is disclosed which contains a radiation-sensitive compound, e.g., a 1,2-naphthoquinone diazide, or a radiation-sensitive combination of compounds, e.g., a compound with at least one C--O--C bond which can be split by acid and a compound which upon radiation forms a strong acid, and at least one organic solvent which comprises a mono-C.sub.1 to C.sub.4 -alkyl ether of 1,2-propanediol. The coating solution is less toxic and results in a better layer leveling than known positive-working photoresist solutions.

    摘要翻译： 公开了一种正面工作的辐射敏感性涂层溶液，其包含辐射敏感化合物，例如1,2-萘醌二叠氮化物或化合物的辐射敏感性组合，例如具有至少一个COC键的化合物，其可以 由酸和化合物分解，其在辐射时形成强酸，以及至少一种包含1,2-丙二醇的单C1至C4烷基醚的有机溶剂。 涂层溶液的毒性较小，导致比已知的正性光刻胶溶液更好的层流平衡。

    Process for preparing relief images in imaged irradiated light-sensitive material having acid-cleavable compound by hot air treatment, overall irradiation and alkaline development
    9.
    发明授权
    Process for preparing relief images in imaged irradiated light-sensitive material having acid-cleavable compound by hot air treatment, overall irradiation and alkaline development 失效
    通过热空气处理，整体照射和碱性显影在具有酸可裂解化合物的成像照射的光敏材料中制备浮雕图像的方法

    公开(公告)号：US4506006A

    公开(公告)日：1985-03-19

    申请号：US449739

    申请日：1982-12-14

    申请人： Hans Ruckert

    发明人： Hans Ruckert

    IPC分类号： G03F7/038 ,  G03C7/00 ,  G03C7/407 ,  G03F7/004 ,  G03F7/20 ,  G03F7/26 ,  G03F7/38 ,  H01L21/027 ,  G03C7/26

    CPC分类号： G03F7/2022

    摘要： A process is described for preparing relief images, in which a light-sensitive material composed of a support and a light-sensitive layer which contains as essential constituents(a) a compound which has at least one C-O-C bond which is cleavable by acid,(b) a compound which forms a strong acid on irradiation and(c) a binder which is insoluble in water and soluble in aqueous-alkaline solutions is imagewise irradiated, warmed to an elevated temperature, cooled down and then irradiated over its entire area, whereafter those parts of the layer which have not been imagewise irradiated are then washed out by developing. The process makes it possible to prepare positive or negative copies by means of the same light-sensitive material in a simple way.

    摘要翻译： 描述了一种用于制备浮雕图像的方法，其中由支撑体和感光层组成的感光材料包含作为必要成分（a）具有至少一个COC键的可被酸切割的化合物（a） b）在照射时形成强酸的化合物和（c）不溶于水并可溶于碱性水溶液的粘合剂被成像照射，升温至高温，然后冷却，然后在其整个区域上照射，然后 然后通过显影来洗涤未成像照射的那些部分。 该方法可以通过相同的光敏材料以简单的方式制备正或负的拷贝。