Method for the contactless measurement of the potential waveform in an
electronic component and arrangement for implementing the method
    1.
    发明授权
    Method for the contactless measurement of the potential waveform in an electronic component and arrangement for implementing the method 失效
    用于电子部件中的电位波形的非接触式测量的方法以及用于实现该方法的装置

    公开(公告)号:US4220853A

    公开(公告)日:1980-09-02

    申请号:US22480

    申请日:1979-03-21

    CPC分类号: G01R13/00 G01R31/305

    摘要: A method for the contactless measurement of the potential waveform in an electronic component with a scanning electron microscope in which the electron beam is aimed at a measuring point of the integrated circuit until at least one phase range of the measuring voltage is determined by phase-shifting the pulses of the primary electron beam with respect to the measuring voltage and subsequently, the electron beam jumped to at least one further measuring point where a phase range is determined in the same manner permitting measurement of the potential waveform at different points of the integrated circuit and displayed together on a picture screen.

    摘要翻译: 一种用扫描电子显微镜对电子部件中的电位波形进行非接触式测量的方法,其中电子束瞄准集成电路的测量点,直到测量电压的至少一个相位范围由相移 相对于测量电压的一次电子束的脉冲,随后,电子束跳到至少一个另外的测量点,其中以允许测量集成电路的不同点处的电位波形的相同方式确定相位范围 并一起显示在图片屏幕上。

    Focussing Lens for Charged Particle Beams
    2.
    发明申请
    Focussing Lens for Charged Particle Beams 有权
    用于带电粒子束的聚焦透镜

    公开(公告)号:US20070262255A1

    公开(公告)日:2007-11-15

    申请号:US10587137

    申请日:2005-01-21

    IPC分类号: H01J37/28 H01J1/50 H01J3/14

    CPC分类号: H01J37/28 H01J37/12

    摘要: The present invention relates to a focussing lens (100) for focussing a charged particle beam (7) onto a specimen (3) at a predetermined landing angle (42; 42′; 42) comprising at least one first electrode (26, 105, 105a) having a first aperture (106) to generate a focussing electric field (110) for focussing the charged particle beam (7) onto the specimen (3); and a correcting electrode having a curved surface (115) to compensate for landing angle dependent distortions of the focussing electric field (110) caused by the specimen (3). With the curved surface (115) of the correcting electrode it is possible to improve the focussing of a charged particle beam at landing angles that differ from the perpendicular landing angle.

    摘要翻译: 本发明涉及一种用于以预定的着陆角(42; 42'; 42)将带电粒子束(7)聚焦到样本(3)上的聚焦透镜(100),包括至少一个第一电极(26,105, 105a)具有第一孔径(106)以产生用于将带电粒子束(7)聚焦到样本(3)上的聚焦电场(110); 以及具有弯曲表面(115)的校正电极,用于补偿由样本(3)引起的聚焦电场(110)的着落角度相关的失真。 利用校正电极的弯曲表面(115),可以改善与垂直着陆角不同的着色角度的带电粒子束的聚焦。

    Spectrometer objective for electron beam mensuration techniques
    3.
    发明授权
    Spectrometer objective for electron beam mensuration techniques 失效
    电子束测量技术的光谱仪物镜

    公开(公告)号:US4808821A

    公开(公告)日:1989-02-28

    申请号:US874498

    申请日:1986-06-16

    摘要: A spectrometer objective is composed of a short focal length, asymmetrical objective lens comprising an integrated electrostatic opposing field spectrometer and a single-stage deflection system arranged within the magnetic lens. Since the deflection of primary electrons occurs within the spectrometer objective, the space for a two-state deflection system employed in conventional systems between a condenser lens and an objective lens can be eliminated. The extremely-short structural length of the electron beam measuring apparatus which is thereby obtainable, in turn, has a beneficial effect on the influence of the lateral Boersch effect on probe diameter, this influence increasing with the length of the electron-optical beam path.

    摘要翻译: 光谱仪物镜由包括集成静电相对场光谱仪的短焦距不对称物镜和布置在磁透镜内的单级偏转系统组成。 由于一次电子的偏转发生在光谱仪物镜内,因此可以消除在聚光透镜和物镜之间的常规系统中采用的两状态偏转系统的空间。 由此可以获得电子束测量装置的极短的结构长度,对横向Boersch效应对探针直径的影响具有有益的影响,这种影响随着电子束光路的长度而增加。

    Opposing field spectrometer for electron beam mensuration technology
    4.
    发明授权
    Opposing field spectrometer for electron beam mensuration technology 失效
    电子束测量技术的反射场光谱仪

    公开(公告)号:US4683376A

    公开(公告)日:1987-07-28

    申请号:US773863

    申请日:1985-09-09

    摘要: An electrostatic opposing field spectrometer has an extraction electrode (AN) and an opposing field electrode arrangement with a pair of planar opposing field electrodes (EG1 and EG2) mounted to an outer electrode part (EM) at either end of a truncated conical shaped bore extending therethrough, where the smaller opening of the bore is in the direction of the extraction electrode (AN). The planar opposing field electrodes (EG1 and EG2), in conjunction with the bore surface, generates substantially spherical equi-potential lines (A1 and A2) which transmit a larger solid angle distribution of secondary electrons (SE) triggered at a measuring point (M) on the specimen surface (PR).

    摘要翻译: 静电相对场光谱仪具有提取电极(AN)和相对的场电极装置,其具有一对平面相对的场电极(EG1和EG2),其安装到在截锥形孔延伸的任一端的外电极部分(EM) 其中孔的较小开口沿着提取电极(AN)的方向。 平面相对的场电极(EG1和EG2)与孔表面一起产生基本上球形的等电位线(A1和A2),其传播在测量点(M)处触发的二次电子(SE)的较大立体角分布 )在样品表面(PR)上。

    Charged particle beam apparatus and method for operating the same
    5.
    发明授权
    Charged particle beam apparatus and method for operating the same 有权
    带电粒子束装置及其操作方法

    公开(公告)号:US07045781B2

    公开(公告)日:2006-05-16

    申请号:US10759392

    申请日:2004-01-16

    IPC分类号: H01J37/28

    摘要: A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam to a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.

    摘要翻译: 提供一种带电粒子束装置,其包括用于产生带电粒子的主束的带电粒子源,用于准直所述带电粒子的一次束的孔径装置,其中所述孔口装置适于在所述主光束的准直之间切换 适合于样本的串行成像的宽度以及所述主光束的准直到适合于所述样品的平行成像的宽度,用于聚集所述带电粒子的一次束的聚光透镜,用于偏转所述带电粒子的一次束的扫描装置 用于聚焦所述冷凝的主光束的物镜,用于检测次级带电粒子的扇形检测器。 此外,描述了束装置的几种不同的操作模式,允许串行成像以及平行成像。

    Secondary electron spectrometer for measuring voltages on a sample
utilizing an electron probe
    7.
    发明授权
    Secondary electron spectrometer for measuring voltages on a sample utilizing an electron probe 失效
    二次电子光谱仪,用于使用电子探针测量样品上的电压

    公开(公告)号:US4514682A

    公开(公告)日:1985-04-30

    申请号:US398542

    申请日:1982-07-15

    CPC分类号: H01J49/08 H01J49/44

    摘要: An improved secondary electron spectrometer for measuring voltages occurring on a specimen, such as an integrated circuit chip, utilizing an electron probe has a grating structure for measuring the energy distribution of the secondary electrons independently of the angular distribution of the secondary electrons at the measuring point on the specimen. If the secondary electron spectrometer has an extraction electrode and a deceleration electrode, the grating structure is spherically symmetric.

    摘要翻译: 用于测量在诸如集成电路芯片的样本上发生的电压的改进的二次电子光谱仪利用电子探针具有用于独立于测量点处的二次电子的角分布来测量二次电子的能量分布的光栅结构 在标本上。 如果二次电子光谱仪具有提取电极和减速电极,则光栅结构是球形对称的。

    Charged particle beam device with retarding field analyzer
    8.
    发明授权
    Charged particle beam device with retarding field analyzer 有权
    带延迟场分析仪的带电粒子束装置

    公开(公告)号:US08203119B2

    公开(公告)日:2012-06-19

    申请号:US11568442

    申请日:2005-06-10

    IPC分类号: G01N23/00 G21K7/00

    摘要: The invention provides a charged particle beam device to inspect or structure a specimen with a primary charged particle beam propagating along an optical axis; a beam tube element having a tube voltage; and a retarding field analyzer in the vicinity of the beam tube element to detect secondary charged particles generated by the primary charged particle beam on the specimen. According to the invention, the retarding field analyzer thereby comprises an entrance grid electrode at a second voltage; at least one filter grid electrode at a first voltage; a charged particle detector to detect the secondary charged particles; and at least one further electrode element arranged between the entrance grid electrode and the at least one filter grid electrode. The at least one further electrode element reduces the size of the stray fields regions in the retarding electric field region to improve the energy resolution of the retarding field analyzer. The improvement of the energy resolution is significant, in particular when the beam tube element is part of a high voltage beam tube.

    摘要翻译: 本发明提供一种带电粒子束装置,用于沿着光轴传播的初级带电粒子束来检查或构造样本; 具有管电压的束管元件; 以及在束管元件附近的延迟场分析器,以检测由样品上的一次带电粒子束产生的二次带电粒子。 根据本发明,延迟场分析仪由此包括第二电压的入口栅电极; 至少一个第一电压的滤波栅极; 用于检测次级带电粒子的带电粒子检测器; 以及至少一个另外的电极元件,其布置在所述入口栅格电极和所述至少一个滤光栅格电极之间。 至少一个另外的电极元件减小了延迟电场区域中的杂散场区域的尺寸,以提高延迟场分析器的能量分辨率。 能量分辨率的提高是显着的,特别是当束管元件是高压束管的一部分时。

    Focussing lens for charged particle beams
    9.
    发明授权
    Focussing lens for charged particle beams 有权
    用于带电粒子束的聚焦透镜

    公开(公告)号:US07652263B2

    公开(公告)日:2010-01-26

    申请号:US10587137

    申请日:2005-01-21

    IPC分类号: H01J37/28

    CPC分类号: H01J37/28 H01J37/12

    摘要: A focussing lens for focussing a charged particle beam onto a specimen at a predetermined landing angle. The focussing lens comprises at least one first electrode having a first aperture to generate a focussing electric field for focussing the charged particle beam onto the specimen and a correcting electrode having a curved surface to compensate for landing angle dependent distortions of the focussing electric field caused by the specimen. With the curved surface of the correcting electrode, it is possible to improve the focussing of a charged particle beam at landing angles that differ from the perpendicular landing angle.

    摘要翻译: 一种聚焦透镜,用于以预定的着陆角将带电粒子束聚焦到样本上。 聚焦透镜包括具有第一孔径的至少一个第一电极,以产生用于将带电粒子束聚焦到样本上的聚焦电场,以及具有弯曲表面的校正电极,以补偿由...引起的聚焦电场的着落角度相关失真 标本。 利用校正电极的弯曲表面,可以改善与垂直着陆角不同的着陆角的带电粒子束的聚焦。

    Apparatus and method for inspecting a sample of a specimen by means of an electron beam
    10.
    发明申请
    Apparatus and method for inspecting a sample of a specimen by means of an electron beam 有权
    通过电子束检查试样样品的装置和方法

    公开(公告)号:US20070057182A1

    公开(公告)日:2007-03-15

    申请号:US10554572

    申请日:2004-04-26

    IPC分类号: G21K7/00

    摘要: The invention refers to an apparatus (10) for inspecting a sample (12) of a specimen (14) by means of an electron beam (34) comprising a vacuum chamber (18); an ion beam device (20) for generating an ion beam (22) used for etching a sample (12) from the specimen (14) within said vacuum chamber (18); an electron beam device (30) having a scanning unit (32) for scanning the electron beam (34) across said specimen (14) within said vacuum chamber (18); said electron beam device (30) having a first detector (36) positioned to detect electrons (38) that are released from the specimen (14) in a backward direction with respect to the direction of the electron beam (34); and said electron beam device (30) having a second detector (40) positioned to detect electrons (42) that are released from the sample (12) of the specimen (14) in a forward direction with respect to the direction of the electron beam (34); and separation means (50; 52) within said vacuum chamber (18) to separate the sample (12) from the specimen (14) for the inspection of the sample (12) by means of the second detector (40). With the apparatus according to the invention, it is possible to perform a transmission inspection of a sample of a specimen, e.g. a thin slice of a semiconductor wafer, at a high throughput at comparably low costs.

    摘要翻译: 本发明涉及一种用于通过包括真空室(18)的电子束(34)检查试样(14)的样品(12)的装置(10)。 用于产生用于在所述真空室(18)内从样品(14)蚀刻样品(12)的离子束(22)的离子束装置(20); 具有扫描单元(32)的电子束装置(30),用于在所述真空室(18)内扫过所述试样(14)上的电子束(34)。 所述电子束装置(30)具有第一检测器(36),所述第一检测器(36)定位成检测相对于所述电子束(34)的方向从所述样品(14)沿相反方向释放的电子(38)。 并且所述电子束装置(30)具有第二检测器(40),所述第二检测器(40)定位成检测相对于电子束的方向从样品(14)的样品(12)向前方释放的电子(42) (34); 以及在所述真空室(18)内的分离装置(50; 52),以将样品(12)与样品(14)分离,以便通过第二检测器(40)检查样品(12)。 利用根据本发明的装置,可以对样本的样本进行透射检查,例如, 半导体晶片的薄片,在相当低的成本下处于高产量。