公开(公告)号：US06456010B2

公开(公告)日：2002-09-24

申请号：US09756651

申请日：2001-01-10

申请人： Hideo Yamakoshi ,  Koji Satake ,  Yoshiaki Takeuchi ,  Hiroshi Mashima ,  Tatsufumi Aoi ,  Masayoshi Murata

发明人： Hideo Yamakoshi ,  Koji Satake ,  Yoshiaki Takeuchi ,  Hiroshi Mashima ,  Tatsufumi Aoi ,  Masayoshi Murata

IPC分类号： H01J724

CPC分类号： H01J37/32174 ,  H01J37/32082 ,  H01J37/32165

摘要： A discharge plasma generating method includes (a) opposing a discharge electrode having a substantially plane discharge portion to a substrate to be processed in a vacuum reaction vessel such that the discharge electrode and the substrate are substantially parallel to each other, (b) evacuating the vacuum reaction vessel and supplying a process gas to a space between the discharge electrode and the substrate, and (c) applying HF power to the discharge electrode such that an envelope representing the spatial distribution of a HF voltage &phgr; on the discharge electrode in a split second changes in accordance with a function including time as a parameter, thereby generating a discharge plasma of the process gas between the discharge electrode and the substrate, with substantially no standing wave of the HF voltage &phgr; generated on the discharge electrode.

摘要翻译： 放电等离子体产生方法包括：（a）将具有基本上平面的放电部分的放电电极与真空反应容器中的待处理基板相对，使得放电电极和基板彼此基本平行;（b）将 将真空反应容器供给到放电电极和基板之间的空间，并且（c）向放电电极施加HF功率，使得表示在分离的放电电极上的HF电压phi的空间分布的外壳 根据包括时间的功能作为参数进行第二变化，从而在放电电极和基板之间产生处理气体的放电等离子体，基本上不会在放电电极上产生HF电压phi的驻波。

公开(公告)号：US07319295B2

公开(公告)日：2008-01-15

申请号：US10506544

申请日：2003-03-13

申请人： Hiroshi Mashima ,  Keisuke Kawamura ,  Akemi Takano ,  Yoshiaki Takeuchi ,  Tetsuro Shigemizu ,  Tatsufumi Aoi

发明人： Hiroshi Mashima ,  Keisuke Kawamura ,  Akemi Takano ,  Yoshiaki Takeuchi ,  Tetsuro Shigemizu ,  Tatsufumi Aoi

IPC分类号： H01J7/24

CPC分类号： H01J37/32577 ,  H01J37/32082

摘要： A radio frequency power supply structure and a plasma CVD device comprising the same are provided in which reflection of radio frequency power at a connecting portion where an RF cable connects to an electrode is reduced so that incidence of the radio frequency power into the electrode increases. In the radio frequency power supply structure for use in a device generating plasma by charging a plate-like electrode with a radio frequency power, the radio frequency power supply structure supplying the electrode with the radio frequency power from an RF cable, the RF cable is positioned on an extended plane of a plane formed by the electrode to connect to the electrode at a connecting portion provided on an end peripheral portion of the electrode. The RF cable connects to the electrode substantially in the same plane as the plane formed by the electrode. Voltage acting after the connecting portion becomes symmetric relative to the plane formed by the electrode and the electric line of force also becomes symmetric. Thereby, change of impedance at the connecting portion is reduced, reflection of the radio frequency power at the connecting portion is reduced, incidence of the radio frequency power into the electrode increases and the efficiency of film forming and surface treatment is enhanced.

摘要翻译： 提供射频电源结构和包括该射频电源结构的等离子体CVD装置，其中RF电缆连接到电极的连接部分处的射频功率的反射减小，使得射频功率进入电极的入射增加。 在通过对具有射频功率的板状电极进行充电来生成等离子体的装置的射频电源结构中，射频电源结构从RF电缆向射频电源供给射频电力，RF电缆为 位于由电极形成的平面的延伸平面上，以在设置在电极的端部周边部分上的连接部分处连接到电极。 RF电缆基本上在与电极形成的平面相同的平面中连接到电极。 在连接部分之后作用的电压相对于由电极和电力线形成的平面对称也变为对称。 由此，连接部的阻抗变化减小，连接部处的射频功率的反射减小，电极的射频功率的增加，成膜和表面处理的效率提高。

公开(公告)号：US20050127844A1

公开(公告)日：2005-06-16

申请号：US10506544

申请日：2003-03-13

申请人： Hiroshi Mashima ,  Keisuke Kawamura ,  Akemi Takano ,  Yoshiaki Takeuchi ,  Tetsuro Shigemizu ,  Tatsufumi Aoi

发明人： Hiroshi Mashima ,  Keisuke Kawamura ,  Akemi Takano ,  Yoshiaki Takeuchi ,  Tetsuro Shigemizu ,  Tatsufumi Aoi

IPC分类号： C23C16/509 ,  H01J37/32 ,  H01L21/205 ,  H01J7/24

CPC分类号： H01J37/32577 ,  H01J37/32082

摘要： A radio frequency power supply structure and a plasma CVD device comprising the same are provided in which reflection of radio frequency power at a connecting portion where an RF cable connects to an electrode is reduced so that incidence of the radio frequency power into the electrode increases. In the radio frequency power supply structure for use in a device generating plasma by charging a plate-like electrode with a radio frequency power, the radio frequency power supply structure supplying the electrode with the radio frequency power from an RF cable, the RF cable is positioned on an extended plane of a plane formed by the electrode to connect to the electrode at a connecting portion provided on an end peripheral portion of the electrode. The RF cable connects to the electrode substantially in the same plane as the plane formed by the electrode. Voltage acting after the connecting portion becomes symmetric relative to the plane formed by the electrode and the electric line of force also becomes symmetric. Thereby, change of impedance at the connecting portion is reduced, reflection of the radio frequency power at the connecting portion is reduced, incidence of the radio frequency power into the electrode increases and the efficiency of film forming and surface treatment is enhanced.

摘要翻译： 提供射频电源结构和包括该射频电源结构的等离子体CVD装置，其中RF电缆连接到电极的连接部分处的射频功率的反射减小，使得射频功率进入电极的入射增加。 在通过对具有射频功率的板状电极进行充电来生成等离子体的装置的射频电源结构中，射频电源结构从RF电缆向射频电源供给射频电力，RF电缆为 位于由电极形成的平面的延伸平面上，以在设置在电极的端部周边部分上的连接部分处连接到电极。 RF电缆基本上在与电极形成的平面相同的平面中连接到电极。 在连接部分之后作用的电压相对于由电极和电力线形成的平面对称也变为对称。 由此，连接部的阻抗变化减小，连接部处的射频功率的反射减小，电极的射频功率的增加，成膜和表面处理的效率提高。

公开(公告)号：US06307146B1

公开(公告)日：2001-10-23

申请号：US09404409

申请日：1999-09-23

申请人： Yoshiaki Takeuchi ,  Masayoshi Murata ,  Akemi Takano ,  Tatsuyuki Nishimiya ,  Syouji Morita ,  Tatsufumi Aoi ,  Tatsuji Horioka

发明人： Yoshiaki Takeuchi ,  Masayoshi Murata ,  Akemi Takano ,  Tatsuyuki Nishimiya ,  Syouji Morita ,  Tatsufumi Aoi ,  Tatsuji Horioka

IPC分类号： H01L310376

CPC分类号： H01L31/028 ,  H01L31/03762 ,  H01L31/075 ,  H01L31/202 ,  Y02E10/547 ,  Y02E10/548 ,  Y02P70/521

摘要： An amorphous silicon solar cell includes a substrate, a transparent electrode formed on this substrate, a power-generating film formed on this transparent electrode, and a back-side electrode formed on this power-generating film. The power-generating film is formed by sequentially stacking p-type/i-type/n-type hydrogenated amorphous silicon layers. The defect density of the i-type hydrogenated amorphous silicon layer is less than 1015 defects/cc.

摘要翻译： 非晶硅太阳能电池包括基板，形成在该基板上的透明电极，形成在该透明电极上的发电膜和形成在该发光膜上的背面电极。 发电膜通过依次层叠p型/ i型/ n型氢化非晶硅层而形成。 i型氢化非晶硅层的缺陷密度小于1015缺陷/ cc。

公开(公告)号：US09013170B2

公开(公告)日：2015-04-21

申请号：US13358209

申请日：2012-01-25

申请人： Kengou Yamaguchi ,  Tatsufumi Aoi ,  Takashi Okai

发明人： Kengou Yamaguchi ,  Tatsufumi Aoi ,  Takashi Okai

IPC分类号： G01R31/02 ,  G01R29/08 ,  B64D45/02

CPC分类号： G01R29/0842 ,  B64D45/02

摘要： The present invention has an object to provide a lightning current detection sensor that has a configuration resistant to high voltage and high current in a lightning strike and has high sensitivity and high resolution. In a lightning current detection sensor 10, an insulation-coated wire 22 wound in multiple turns is collectively covered with a base tape 21 and a cover tape 23. Thus, even when the insulation-coated wire 22 is wound in multiple turns to increase sensitivity, a minute area can be detected to increase resolution. Also, with the base tape 21 and the cover tape 23 covering the insulation-coated wire 22 and also a shield portion 12 made of an insulating material and a gap 40 formed between the shield portion 12 and the coil portion 20, a sufficient shielding property is ensured and detection with high accuracy can be performed against high current and high voltage without capacitative coupling.

摘要翻译： 本发明的目的是提供一种雷电流检测传感器，其具有在雷击中耐高压和高电流的结构，并且具有高灵敏度和高分辨率。 在雷电流检测传感器10中，以多匝卷绕的绝缘被覆线22共同地被基带21和盖带23覆盖。因此，即使绝缘覆盖线22以多匝缠绕以增加灵敏度 ，可以检测到一个微小的区域来提高分辨率。 此外，由于基带21和覆盖绝缘被覆线22的覆盖带23以及由绝缘材料制成的屏蔽部12和形成在屏蔽部12和线圈部20之间的间隙40，所以具有足够的屏蔽性 并且可以在没有电容耦合的情况下对高电流和高电压进行高精度的检测。

公开(公告)号：US08101933B2

公开(公告)日：2012-01-24

申请号：US11826929

申请日：2007-07-19

申请人： Tatsufumi Aoi ,  Susumu Urano ,  Shuji Kaneko ,  Hiroyuki Shibata ,  Seinoshin Hamanaka

发明人： Tatsufumi Aoi ,  Susumu Urano ,  Shuji Kaneko ,  Hiroyuki Shibata ,  Seinoshin Hamanaka

IPC分类号： H01J29/02

CPC分类号： A61N5/10 ,  A61N5/1081

摘要： A medical device which can rotate a radiation emitter or the like with high positional precision over an extended period of time is provided. Provided are a support frame installed such that a central axis thereof is positioned substantially horizontally; circular tracks respectively disposed on both side faces of the support frame; a moving gantry configured to revolve relative to the support frame via sliding portions configured to slide on the circular tracks; and revolving driving means for revolving the moving gantry, wherein the moving gantry is constructed of a rigid-framed structure formed of a first side portion and a second side portion disposed so as to flank the support frame from both side faces thereof, and coupling portions for coupling the first side portion and the second side portion.

摘要翻译： 提供了能够在延长的时间段内以高位置精度旋转辐射发射体等的医疗装置。 提供了一种支撑框架，其安装成使得其中心轴线基本上水平地定位; 分别设置在支撑框架的两个侧面上的圆形轨道; 移动台架被构造成通过构造成在圆形轨道上滑动的滑动部分相对于支撑框架旋转; 以及用于使所述移动机架旋转的旋转驱动装置，其中所述移动机架由刚性框架结构构成，所述刚性框架结构由第一侧部和第二侧部构成，所述第一侧部和所述第二侧部设置成从所述支撑框架的两个侧面侧面， 用于联接第一侧部和第二侧部。

公开(公告)号：US07995324B2

公开(公告)日：2011-08-09

申请号：US12225167

申请日：2006-12-26

申请人： Mitsuo Kato ,  Shigenari Horie ,  Tatsufumi Aoi ,  Masaki Kawano ,  Yoshitaka Tsumoto ,  Hiroaki Ogasawara ,  Toshiro Kobayashi

发明人： Mitsuo Kato ,  Shigenari Horie ,  Tatsufumi Aoi ,  Masaki Kawano ,  Yoshitaka Tsumoto ,  Hiroaki Ogasawara ,  Toshiro Kobayashi

IPC分类号： H01L21/683 ,  H02N13/00

CPC分类号： B65G49/061 ,  H01L21/6831 ,  H02N13/00

摘要： An object is providing an electrostatic attraction apparatus and an attracting/releasing method capable of reliably attracting and quickly releasing a glass substrate. An attraction force for attracting a glass substrate is obtained according to the physical properties of the glass substrate. In addition to obtaining an attraction voltage (Vc(t)) required for obtaining the attraction force, a holding voltage (Vh(t)) for holding an attraction state and a release voltage (Vr(t)) for releasing the glass substrate are also obtained (S1 to S7). Attraction time period (tc) is actually measured and if this measured time is different from a preset attraction time (t1), the holding voltage (Vh(t)) and the release voltage (Vr(t)) are recalculated according to the actually measured attraction time period (tc) (S8 to S11).

摘要翻译： 目的在于提供能够可靠地吸引并快速地释放玻璃基​​板的静电吸引装置和吸引/释放方法。 根据玻璃基板的物理性质，得到吸引玻璃基板的吸引力。 除了获得获得吸引力所需的吸引电压（Vc（t））之外，用于保持吸引状态的保持电压（Vh（t））和用于释放玻璃基​​板的释放电压（Vr（t）） （S1〜S7）。 实际测量吸引时间（tc），如果该测量时间与预设吸引时间（t1）不同，则根据实际情况重新计算保持电压（Vh（t））和释放电压（Vr（t）） 测量吸引时间（tc）（S8〜S11）。

公开(公告)号：US06498324B2

公开(公告)日：2002-12-24

申请号：US09976085

申请日：2001-10-15

申请人： Mikio Yamamoto ,  Tatsufumi Aoi ,  Keiji Mizuta

发明人： Mikio Yamamoto ,  Tatsufumi Aoi ,  Keiji Mizuta

IPC分类号： H05B614

CPC分类号： H05B6/145 ,  B21B27/106 ,  B21B37/32 ,  H05B6/06

摘要： An induction heating device is disclosed for heating a rolling roller by induction heating so as to equalize the diameter of the rolling roller. The device includes an induction heater and a means for moving the induction heater to a portion of the roller surface to be heated, while the distance from the induction heater to the surface is maintained constant. An electric power supply means supplies electric power to the induction heater, and a means is provided for adjusting the quantity of heat to be produced by the induction heater according to the quantity of heat that is required by the portion of the roller to be heated. The heat quantity adjusting means includes a frequency control means for controlling the frequency of electric power supplied to the induction heater, wherein the frequency control means adjusts the frequency of electric power within a predetermined frequency range to a frequency which is suitable to produce the quantity of heat required by the portion of the rolling roller to be heated. The greater the amount of heating that is required, the higher the frequency utilized. Preferably, the frequency is adjusted within a range of from about 25 to about 200 kHz.

摘要翻译： 公开了一种感应加热装置，用于通过感应加热来加热滚动辊，以便使滚动辊的直径相等。 该装置包括感应加热器和用于将感应加热器移动到待加热的辊表面的一部分的装置，同时从感应加热器到表面的距离保持恒定。 电力供给装置向感应加热器供给电力，并且提供用于根据加热辊的部分所需的热量调节由感应加热器产生的热量的装置。 热量调节装置包括频率控制装置，用于控制提供给感应加热器的电力频率，其中频率控制装置将预定频率范围内的电力频率调整到适合产生数量的频率 要加热的滚动辊的部分所需的热量。 所需的加热量越大，所使用的频率越高。 优选地，将频率调节在约25至约200kHz的范围内。

公开(公告)号：US5681527A

公开(公告)日：1997-10-28

申请号：US584692

申请日：1996-01-11

申请人： Tatsufumi Aoi ,  Noriyuki Kawada ,  Ritsuo Hashimoto ,  Kenichi Unoki ,  Motomi Nakashima ,  Kazumasa Mihara

发明人： Tatsufumi Aoi ,  Noriyuki Kawada ,  Ritsuo Hashimoto ,  Kenichi Unoki ,  Motomi Nakashima ,  Kazumasa Mihara

IPC分类号： C21C5/52 ,  C22B9/00 ,  F27D3/00 ,  F27D3/14 ,  F27D3/15 ,  F27D9/00 ,  F27D99/00 ,  H05B6/32 ,  C21C5/42

CPC分类号： H05B6/32 ,  C21C5/5241 ,  C22B9/003 ,  F27D3/14 ,  F27D3/15 ,  F27D2003/0054 ,  F27D9/00 ,  F27D99/00 ,  Y02P10/253

摘要： In a molten metal holding apparatus in which an alternating magnetic flux is generated in the horizontal direction at a lower end portion of a molten metal and the molten metal 7 is held within an upper and lower opening container 6 by an electromagnetic force, solid conductors 8 which are not strong magnetic substances are attached to inner surfaces of both side plates 6x of a portion where the alternating magnetic flux passes through of the upper and lower opening container 6. Further, an apparatus including a circuit 3 to overlay a direct current on an exciting coil 2 or an exciting device 20 to let a direct current magnetic flux act is disclosed.

摘要翻译： 在熔融金属保持装置中，在熔融金属的下端部沿水平方向产生交变磁通，并且通过电磁力将熔融金属7保持在上下开口容器6内，固体导体8 不具有强磁性的物质被附着到交换磁通量通过上下开口容器6的部分的两个侧板6x的内表面上。此外，一种装置包括：电路3，用于在直流电流 励磁线圈2或励磁装置20，以公开直流磁通动作。

公开(公告)号：US20140086387A1

公开(公告)日：2014-03-27

申请号：US14007138

申请日：2011-12-26

申请人： Tatsufumi Aoi ,  Yuichiro Kamino ,  Yasuo Ogi ,  Akira Watanabe ,  Nobuyuki Shigeoka

发明人： Tatsufumi Aoi ,  Yuichiro Kamino ,  Yasuo Ogi ,  Akira Watanabe ,  Nobuyuki Shigeoka

IPC分类号： G01V5/00

CPC分类号： G01V5/0041 ,  H05G1/26 ,  H05G1/32 ,  H05G1/34 ,  H05G2/00

摘要： An object is to emit x-rays having a plurality of different energies and to suppress variations in the energy of the created x-rays. In an x-ray generating apparatus (14) provided in an x-ray inspection apparatus (10), a particle accelerator (20) creates a charged particle beam for generating x-rays having a plurality of different energies, and x-rays are emitted by irradiating a target (22) with the charged particle beam. A single-energy control device (40) controls the particle accelerator (20) for each of the x-rays having different energies on the basis of an x-ray radiation level per unit target current obtained from a measured value of the current flowing in the target (22) and a measured value of the radiation level of x-rays emitted from the target (22), when the target (22) is irradiated with the charged particle beam.

摘要翻译： 目的是发射具有多个不同能量的x射线，并且抑制所产生的X射线的能量的变化。 在设置在X射线检查装置（10）中的x射线产生装置（14）中，粒子加速器（20）产生用于产生具有多个能量的x射线的带电粒子束，并且x射线为 通过用带电粒子束照射靶（22）而发射。 单能量控制装置（40）根据从流入的电流的测量值获得的每单位目标电流的X射线辐射水平来控制具有不同能量的每个X射线的粒子加速器（20） 所述目标（22）和当所述目标（22）被所述带电粒子束照射时从所述目标（22）发射的X射线的辐射水平的测量值。