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    Resist composition and method of forming resist pattern
    1.
    发明授权
    Resist composition and method of forming resist pattern 有权
    抗蚀剂图案的抗蚀剂组成和方法

    公开(公告)号：US08012669B2

    公开(公告)日：2011-09-06

    申请号：US12400203

    申请日：2009-03-09

    申请人： Hiroaki Shimizu ,  Yasuhiro Yoshii ,  Yoshiyuki Utumi ,  Hideo Hada

    发明人： Hiroaki Shimizu ,  Yasuhiro Yoshii ,  Yoshiyuki Utumi ,  Hideo Hada

    IPC分类号： G03F7/00 ,  G03F7/004

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    摘要： A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1) shown below (wherein Q1 represents a divalent linkage group containing an oxygen atom; Y1 represents a fluorinated alkylene group of 1 to 4 carbon atoms which may have a substituent, with the proviso that the carbon atom adjacent to the sulfur atom within the —SO3− group has a fluorine atom bonded thereto; X represents a hydrocarbon group of 3 to 30 carbon atoms which may have a substituent; and A+ represents an organic cation), and the resist composition further including an organic compound (C) which generates an acid exhibiting a weaker acid strength than the acid generated from the acid generator (B1) upon exposure. [Chemical Formula 1] X-Q1-Y1—SO3+A+  (b1)

    摘要翻译： 一种抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和曝光时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸发生剂 （b1）由下述通式（b1）表示的化合物（其中Q1表示含有氧原子的二价连接基团; Y1表示可具有取代基的1〜4个碳原子的氟化亚烷基，条件是 与-SO 3 - 基中的硫原子相邻的碳原子具有氟原子键合; X表示可以具有取代基的碳原子数3〜30的烃基，A +表示有机阳离子），抗蚀剂 组合物还包含有机化合物（C），该有机化合物（C）在曝光时产生的酸强度比酸产生剂（B1）产生的酸弱。 [化学式1] X-Q1-Y1-SO3 + A +（b1）

    RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    2.
    发明申请
    RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
    耐蚀组合物和形成耐力图案的方法

    公开(公告)号：US20090226842A1

    公开(公告)日：2009-09-10

    申请号：US12400203

    申请日：2009-03-09

    申请人： Hiroaki Shimizu ,  Yasuhiro Yoshii ,  Yoshiyuki Utumi ,  Hideo Hada

    发明人： Hiroaki Shimizu ,  Yasuhiro Yoshii ,  Yoshiyuki Utumi ,  Hideo Hada

    IPC分类号： G03F7/20 ,  G03F7/027

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    摘要： A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1) shown below (wherein Q1 represents a divalent linkage group containing an oxygen atom; Y1 represents a fluorinated alkylene group of 1 to 4 carbon atoms which may have a substituent, with the proviso that the carbon atom adjacent to the sulfur atom within the —SO3− group has a fluorine atom bonded thereto; X represents a hydrocarbon group of 3 to 30 carbon atoms which may have a substituent; and A+ represents an organic cation), and the resist composition further including an organic compound (C) which generates an acid exhibiting a weaker acid strength than the acid generated from the acid generator (B1) upon exposure. [Chemical Formula 1] X-Q1Y1—SO3+A3   (b1)

    摘要翻译： 一种抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和曝光时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸发生剂 （b1）由下述通式（b1）表示的化合物（其中Q1表示含有氧原子的二价连接基团; Y1表示可具有取代基的1〜4个碳原子的氟化亚烷基，条件是 与-SO 3 - 基中的硫原子相邻的碳原子具有氟原子键合; X表示可以具有取代基的碳原子数3〜30的烃基，A +表示有机阳离子），抗蚀剂 组合物还包含有机化合物（C），该有机化合物（C）在曝光时产生的酸强度比酸产生剂（B1）产生的酸弱。 <？in-line-formula description =“In-line Formulas”end =“lead”？> [化学式1] <？in-line-formula description =“In-line formula”end =“tail”？> ？in-line-formula description =“In-line Formulas”end =“lead”？> X-Q1Y1-SO3 + A3（b1）<？in-line-formula description =“In-line Formulas”end =“tail “？>

    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR
    7.
    发明申请
    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR 有权
    抗蚀剂组合物，形成抗蚀剂图案，新型化合物和酸产生剂的方法

    公开(公告)号：US20090130597A1

    公开(公告)日：2009-05-21

    申请号：US12265607

    申请日：2008-11-05

    申请人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Hideo Hada ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

    发明人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Hideo Hada ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

    IPC分类号： G03F7/031 ,  G03F7/20 ,  C07C309/04 ,  C07D327/04

    CPC分类号： G03F7/0045 ,  C07D327/02 ,  C07D327/04 ,  C07D497/08 ,  C08K5/36 ,  C08K5/42 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

    摘要： A compound represented by general formula (I); and a compound represented by general formula (b1-1). X-Q1-Y1—SO3−M+  [Chemical Formula 1] (I) X-Q1-Y1—SO3−A+ (b1-1) wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an —SO2— bond in the structure thereof; M+ represents an alkali metal ion; and A+ represents an organic cation.

    摘要翻译： 由通式（I）表示的化合物; 和由通式（b1-1）表示的化合物。 <？in-line-formula description =“In-line Formulas”end =“lead”？> X-Q1-Y1-SO3-M + [化学式1] <？in-line-formula description =“ “end =”tail“？> <？in-line-formula description =”In-line formula“end =”lead“？>（I）<？in-line-formula description =”In-line Formulas“end = “tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> X-Q1-Y1-SO3-A + <？in-line-formula description =“In-line Formulas “end =”tail“？> <？in-line-formula description =”在线公式“end =”lead“？>（b1-1）<？in-line-formula description =”In-line Formulas“ end =“tail”？>其中Q1表示二价连接基团或单键; Y1表示可以具有取代基的亚烷基或可以具有取代基的氟化亚烷基; X表示可以具有取代基的3〜30个碳原子的环状基团，其结构中具有-SO 2 - 键; M +表示碱金属离子; 而A +代表有机阳离子。

    Polymer Compound, Photoresist Composition Including the Polymer Compound, and Resist Pattern Formation Method
    9.
    发明申请
    Polymer Compound, Photoresist Composition Including the Polymer Compound, and Resist Pattern Formation Method 有权
    高分子化合物，包含聚合物化合物的光致抗蚀剂组合物和抗蚀剂图案形成方法

    公开(公告)号：US20080166655A1

    公开(公告)日：2008-07-10

    申请号：US10589681

    申请日：2005-01-28

    申请人： Toshiyuki Ogata ,  Syogo Matsumaru ,  Yohei Kinoshita ,  Hideo Hada ,  Daiju Shiono ,  Hiroaki Shimizu ,  Naotaka Kubota

    发明人： Toshiyuki Ogata ,  Syogo Matsumaru ,  Yohei Kinoshita ,  Hideo Hada ,  Daiju Shiono ,  Hiroaki Shimizu ,  Naotaka Kubota

    IPC分类号： G03F7/004 ,  C08G65/34 ,  C07C69/533 ,  C08G63/00 ,  G03F7/26 ,  C07C69/52

    CPC分类号： G03F7/0397 ,  C07C69/54 ,  C07C2603/74 ,  C08F220/28 ,  C08F290/06 ,  C08F290/061 ,  C09D133/14 ,  G03F7/0046 ,  Y10S430/108 ,  Y10S430/111

    摘要： The present invention provides a polymer compound which can constitute a photoresist composition which is capable of having an excellent resolution, forming a fine pattern with a good rectangularity, obtaining favorable resist characteristics even when acid strength of a acid generated from an acid generator is weak, and having favorable sensitivity; a photoresist composition including the polymer compound; and a resist pattern formation method using the photoresist composition. The photoresist composition and the resist pattern formation method use the polymer compound including an alkali soluble group (i), wherein the alkali soluble group (i) is at least one substituent group selected from an alcoholic hydroxyl group, a carboxyl group, or a phenolic hydroxyl group, and the substituent group is protected by an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1): —CH2—OCH2nR1   (1) (wherein R1 represents a cycloaliphatic group which contains no more than 20 carbon atoms and may contain an oxygen atom, a nitrogen atom, a sulfur atom, or a halogen atom, and n represents 0 or an integer of 1 to 5.).

    摘要翻译： 本发明提供一种高分子化合物，其可以构成光刻胶组合物，其能够具有优异的分辨率，形成具有良好矩形性的精细图案，即使酸产生器产生的酸的酸强弱也能获得良好的抗蚀特性， 并具有良好的灵敏度; 包含该高分子化合物的光致抗蚀剂组合物; 以及使用光致抗蚀剂组合物的抗蚀剂图案形成方法。 光致抗蚀剂组合物和抗蚀剂图案形成方法使用包含碱溶性基团（i）的高分子化合物，其中碱溶性基团（i）为选自醇羟基，羧基或酚类中的至少一个取代基 羟基，取代基被通过通式（1）表示的酸解离的溶解抑制基团（ii）保护：<？in-line-formula description =“In-line Formulas”end =“lead”？ > -CH 2 - - - - - - - - - - - - - - （2） （其中R 1表示含有不多于20个碳原子的脂环族基团，并且可以含有氧原子，氮原子， 硫原子或卤素原子，n表示0或1〜5的整数。