Method for automatically sending messages at desired appropriate timings and an automatic message sending service system
    1.
    发明授权
    Method for automatically sending messages at desired appropriate timings and an automatic message sending service system 失效
    以所需适当的时间自动发送消息的方法和自动消息发送服务系统

    公开(公告)号:US07539731B2

    公开(公告)日:2009-05-26

    申请号:US10889095

    申请日:2004-07-13

    IPC分类号: G06F15/16

    摘要: A sender of a message uses a sender's portable telephone device to register, by way of a communication network, to a service agent: user's information, communication partner information, sending conditions, and a message. The service agent monitors whether the sending conditions are met, and when the sending conditions have been satisfied, executes processing to send the entered message to the receiver's portable telephone device of the communication partner that has been registered. The sending conditions include conditions relating to presence information that the communication partner can always access by way of a communication network through the communication partner's own communication terminal.

    摘要翻译: 消息的发送者使用发送者的便携式电话设备通过通信网络向服务代理注册用户信息,通信伙伴信息,发送条件和消息。 服务代理监视是否满足发送条件,并且当发送条件已满足时,执行将输入的消息发送到已经注册的通信伙伴的接收者的便携式电话设备的处理。 发送条件包括与通信对方可以通过通信伙伴自己的通信终端通过通信网络总是访问的存在信息相关的条件。

    Method for automatically sending messages at desired appropriate timings and an automatic message sending service system
    2.
    发明申请
    Method for automatically sending messages at desired appropriate timings and an automatic message sending service system 失效
    以所需适当的时间自动发送消息的方法和自动消息发送服务系统

    公开(公告)号:US20050013291A1

    公开(公告)日:2005-01-20

    申请号:US10889095

    申请日:2004-07-13

    摘要: A sender of a message uses a sender's portable telephone device to register, by way of a communication network, to a service agent: user's information, communication partner information, sending conditions, and a message. The service agent monitors whether the sending conditions are met, and when the sending conditions have been satisfied, executes processing to send the entered message to the receiver's portable telephone device of the communication partner that has been registered. The sending conditions include conditions relating to presence information that the communication partner can always access by way of a communication network through the communication partner's own communication terminal.

    摘要翻译: 消息的发送者使用发送者的便携式电话设备通过通信网络向服务代理注册用户信息,通信伙伴信息,发送条件和消息。 服务代理监视是否满足发送条件,并且当发送条件已满足时,执行将输入的消息发送到已经注册的通信伙伴的接收者的便携式电话设备的处理。 发送条件包括与通信对方可以通过通信伙伴自己的通信终端通过通信网络总是访问的存在信息相关的条件。

    Cad apparatus for designing pattern of electric circuit
    3.
    发明授权
    Cad apparatus for designing pattern of electric circuit 失效
    用于设计电路图案的CAD设备

    公开(公告)号:US5404309A

    公开(公告)日:1995-04-04

    申请号:US830424

    申请日:1992-01-31

    摘要: A CAD apparatus for designing a pattern of an electric circuit, is provided with: a printed resistor shape parameter storing unit for storing values of printed resistor shape parameters including a maximum aspect ratio and a minimum aspect ratio of a printed resistor, which pattern is to be designed; a resistor parameter storing unit for storing values of resistor parameters including a necessary resistance of the printed resistor; a resistor material table storing unit for storing a resistor material table including names of various resistor materials and resistances per unit area of the various resistor materials correspondingly; and an optimum resistor material name storing unit for storing an optimum resistor material name of the printed resistor. The CAD apparatus is also provided with an optimum resistor material selecting unit for calculating aspect ratios of the various resistor materials according to a predetermined rule based on the resistances of the various resistor materials and the necessary resistance, selecting the optimum resistor material according to a predetermined rule based on the values of the calculated aspect ratios and the values of the maximum and minimum aspect ratios, and storing the name of the selected optimum resistor material into the optimum resistor material name storing unit.

    摘要翻译: 一种用于设计电路图案的CAD装置,具有:印刷电阻器形状参数存储单元,用于存储包括印刷电阻器的最大纵横比和最小纵横比的印刷电阻器形状参数的值,该图形为 设计; 电阻器参数存储单元,用于存储包括印刷电阻器的必要电阻的电阻器参数的值; 电阻材料表存储单元,用于相应地存储包含各种电阻材料的各种电阻材料的名称和每单位面积的电阻的电阻器材料表; 以及用于存储印刷电阻器的最佳电阻器材料名称的最佳电阻器材料名称存储单元。 CAD装置还设置有最佳电阻材料选择单元,用于根据各种电阻材料的电阻和所需的电阻,根据预定规则计算各种电阻材料的纵横比,根据预定的方式选择最佳电阻材料 基于计算的宽高比和最大和最小纵横比的值的规则,并将所选择的最佳电阻材料的名称存储到最佳电阻材料名称存储单元中。

    Method of manufacturing a semiconductor device and the semiconductor device
    5.
    发明申请
    Method of manufacturing a semiconductor device and the semiconductor device 有权
    制造半导体器件和半导体器件的方法

    公开(公告)号:US20070026632A1

    公开(公告)日:2007-02-01

    申请号:US11492823

    申请日:2006-07-26

    申请人: Hirohisa Yamamoto

    发明人: Hirohisa Yamamoto

    IPC分类号: H01L21/76

    CPC分类号: H01L21/76235 H01L29/785

    摘要: The present invention provides a method of manufacturing a trench with a rounded corner portion and a broadened opening. Anisotropic oxidation is carried out using a halogen oxidation method using dichloroethylene (DCE) to form an anisotropic oxide film such that the film thickness in a shoulder portion of the trench is thick and gradually decreases nearer the bottom, the anisotropic oxide film is removed, and the shoulder portion of the trench is preferentially backed off, thereby rounding the shoulder portion sufficiently to broaden the opening. Then, an insulating member is embedded in the trench. The rounded portion of the shoulder portion of the trench and vicinity thereof is used as a channel of a MOS transistor.

    摘要翻译: 本发明提供一种制造具有圆角部分和开阔开口的沟槽的方法。 使用二氯乙烯(DCE)的卤素氧化法进行各向异性氧化,形成各向异性氧化膜,使得沟槽的肩部的膜厚变厚,逐渐降低到更接近底部,去除各向异性氧化膜, 优选地将沟槽的肩部退回,从而使肩部充分地倒圆以拓宽开口。 然后,绝缘构件嵌入沟槽中。 沟槽及其附近的肩部的圆形部分被用作MOS晶体管的沟道。

    Exchange servicing development support system with a function of automatic replacement of edited contents
    6.
    发明授权
    Exchange servicing development support system with a function of automatic replacement of edited contents 失效
    交换服务开发支持系统具有自动替换编辑内容的功能

    公开(公告)号:US06631376B1

    公开(公告)日:2003-10-07

    申请号:US09471197

    申请日:1999-12-23

    IPC分类号: G06F1730

    摘要: An exchange servicing development support system automatically replaces definition contents and creates generation codes to new specifications, even if interfacing is changed, by reading servicing definition result files stored in accordance with old specifications. By providing a unit for re-constructing service tree structure data in a format in accordance with information about compatibility description in a menu describing file, the service tree structure data is automatically created. Since information about compatibility is allocated to the menu describing a file stored in the storage device, each unit in the data processing device is adapted to be used for a general purpose. The description of replacement of various patterns can be made by descriptions of information about compatibility in the menu describing file.

    摘要翻译: 交换服务开发支持系统通过读取根据旧规范存储的服务定义结果文件,自动替换定义内容并将生成代码创建为新规范,即使接口更改。 通过提供用于根据关于菜单描述文件中的兼容性描述的信息的格式重新构建服务树结构数据的单元,自动创建服务树结构数据。 由于关于兼容性的信息被分配给描述存储在存储设备中的文件的菜单,所以数据处理设备中的每个单元适于用于通用目的。 可以通过描述关于菜单描述文件中的兼容性的信息来进行各种模式的替换的描述。

    Method of manufacturing a semiconductor device including recessed-channel-array MOSFET having a higher operational speed
    8.
    发明授权
    Method of manufacturing a semiconductor device including recessed-channel-array MOSFET having a higher operational speed 有权
    制造具有较高工作速度的凹槽式阵列MOSFET的半导体器件的制造方法

    公开(公告)号:US07902027B2

    公开(公告)日:2011-03-08

    申请号:US12604006

    申请日:2009-10-22

    申请人: Hirohisa Yamamoto

    发明人: Hirohisa Yamamoto

    IPC分类号: H01L21/336

    摘要: A semiconductor device includes a recessed-channel-array MOSFET including a gate electrode having a portion received in a recess. The gate insulting film has a first portion made of silicon oxide in contact with the sidewall of the recess and a second portion made of silicon oxynitride in contact with the bottom of the recess. The first portion has an equivalent oxide thickness larger than the equivalent oxide thickness of the second portion to reduce the parasitic capacitance of the gate electrode.

    摘要翻译: 一种半导体器件包括凹入沟道阵列MOSFET,其包括具有容纳在凹部中的部分的栅电极。 栅极绝缘膜具有由与凹部的侧壁接触的氧化硅制成的第一部分和与凹部的底部接触的氮氧化硅制成的第二部分。 第一部分具有大于第二部分的等效氧化物厚度的等效氧化物厚度,以减小栅电极的寄生电容。

    Method of manufacturing a semiconductor device and the semiconductor device
    9.
    发明授权
    Method of manufacturing a semiconductor device and the semiconductor device 有权
    制造半导体器件和半导体器件的方法

    公开(公告)号:US07745303B2

    公开(公告)日:2010-06-29

    申请号:US11492823

    申请日:2006-07-26

    申请人: Hirohisa Yamamoto

    发明人: Hirohisa Yamamoto

    IPC分类号: H01L21/76

    CPC分类号: H01L21/76235 H01L29/785

    摘要: The present invention provides a method of manufacturing a trench with a rounded corner portion and a broadened opening. Anisotropic oxidation is carried out using a halogen oxidation method using dichloroethylene (DCE) to form an anisotropic oxide film such that the film thickness in a shoulder portion of the trench is thick and gradually decreases nearer the bottom, the anisotropic oxide film is removed, and the shoulder portion of the trench is preferentially backed off, thereby rounding the shoulder portion sufficiently to broaden the opening. Then, an insulating member is embedded in the trench. The rounded portion of the shoulder portion of the trench and vicinity thereof is used as a channel of a MOS transistor.

    摘要翻译: 本发明提供一种制造具有圆角部分和开阔开口的沟槽的方法。 使用二氯乙烯(DCE)的卤素氧化法进行各向异性氧化,形成各向异性氧化膜,使得沟槽的肩部的膜厚变厚,逐渐降低到更接近底部,去除各向异性氧化膜, 优选地将沟槽的肩部退回,从而使肩部充分地倒圆以使开口变宽。 然后,绝缘构件嵌入沟槽中。 沟槽及其附近的肩部的圆形部分被用作MOS晶体管的沟道。

    Method for manufacturing a semiconductor device
    10.
    发明授权
    Method for manufacturing a semiconductor device 失效
    半导体器件的制造方法

    公开(公告)号:US06624095B1

    公开(公告)日:2003-09-23

    申请号:US09613690

    申请日:2000-07-10

    申请人: Hirohisa Yamamoto

    发明人: Hirohisa Yamamoto

    IPC分类号: H01L2126

    CPC分类号: H01L21/324 H01L21/28061

    摘要: A wafer 38 having an exposed portion of silicon is transferred to a treatment chamber for lamp annealing. The atmosphere of the treatment chamber 32 is converted to a reduced pressure atmosphere (500 Torr) of an inert gas (N2). The wafer 38 is subjected to lamp annealing in the reduced pressure atmosphere of the inert gas (1050° C., 30 seconds).

    摘要翻译: 具有硅暴露部分的晶片38被转移到用于灯退火的处理室。 处理室32的气氛被转化为惰性气体(N 2)的减压气氛(500Torr)。 在惰性气体的减压气氛(1050℃,30秒)中对晶片38进行灯退火。