公开(公告)号：US20100249302A1

公开(公告)日：2010-09-30

申请号：US12749909

申请日：2010-03-30

申请人： Hiroki SUGIURA ,  Masayuki HARADA ,  Takayuki ITO

发明人： Hiroki SUGIURA ,  Masayuki HARADA ,  Takayuki ITO

IPC分类号： C09D5/00 ,  C07C43/12

CPC分类号： C09D4/00 ,  C07C43/123 ,  C08F220/22 ,  C08F222/1006 ,  C09D7/20

摘要： Provided is a liquid composition including a perfluorochloroether solvent that contains a perfluorochloroether compound having a (chlorine content/fluorine content) value within the range of from 1.2 to 4.5; and an organic compound that has a fluorine content of from 0 to 79% by weight and that is dissolved in the perfluorochloroether solvent, wherein the (chlorine content/fluorine content) value is a value defined by the following formula: (chlorine content/fluorine content)value=(number of chlorine atoms in perfluorochloroether×atomic weight of chlorine atom)/(number of fluorine atoms in perfluorochloroether×atomic weight of fluorine atom).

摘要翻译： 本发明提供含有全氟氯醚溶剂的液体组合物，其含有（氯含量/氟含量）值在1.2〜4.5的范围内的全氟氯醚化合物; 和氟含量为0〜79重量％并溶解在全氟氯醚溶剂中的有机化合物，其中（氯含量/氟含量）值为由下式定义的值：（氯含量/氟 含量）值=（全氟氯醚中的氯原子数×氯原子的原子数）/（全氟氯醚中的氟原子数×氟原子的原子数）。

公开(公告)号：US20190061339A1

公开(公告)日：2019-02-28

申请号：US16176726

申请日：2018-10-31

申请人： Ryo TASHIRO ,  Kenichiroh HASHIMOTO ,  Takayuki ITO ,  Kimito ABE

发明人： Ryo TASHIRO ,  Kenichiroh HASHIMOTO ,  Takayuki ITO ,  Kimito ABE

IPC分类号： B41J2/01 ,  B41J2/145

CPC分类号： B41J2/01 ,  B41J2/145 ,  B41J2/21 ,  B41J2/2117

摘要： A liquid discharging unit includes a first color nozzle group that includes nozzle arrays each in which nozzle holes for discharging liquids of process colors are arranged in a sub scanning direction perpendicular to a main scanning direction; a second color nozzle group that is provided on upstream side in the sub scanning direction with respect to the first color nozzle group and includes nozzle arrays each in which nozzle holes for discharging liquids of process colors are arranged in the sub scanning direction; and at least one auxiliary nozzle group that is provided between the first color nozzle group and the second color nozzle group and includes nozzle arrays each in which holes for discharging liquids of colors different from the process colors are arranged in the sub scanning direction. The nozzle groups are respectively arranged to be shifted from each other in the main scanning direction.

公开(公告)号：US20120231393A1

公开(公告)日：2012-09-13

申请号：US13421684

申请日：2012-03-15

申请人： Kana FUJII ,  Tomotaka TSUCHIMURA ,  Toru FUJIMORI ,  Hidenori TAKAHASHI ,  Takayuki ITO

发明人： Kana FUJII ,  Tomotaka TSUCHIMURA ,  Toru FUJIMORI ,  Hidenori TAKAHASHI ,  Takayuki ITO

IPC分类号： G03F7/027 ,  G03F7/016 ,  G03F7/20 ,  G03F7/004

CPC分类号： G03F7/0392 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/30 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/12

摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin that is decomposed when acted on by an acid to thereby increase its solubility in an alkali developer, a compound that generates an acid when exposed to actinic rays or radiation, and any of basic compounds of general formula (1) below.

摘要翻译： 根据一个实施方案，光化射线或辐射敏感性树脂组合物包括当被酸作用时分解的树脂，从而增加其在碱性显影剂中的溶解度，当暴露于光化射线时产生酸的化合物或 辐射和下述通式（1）的任何碱性化合物。

公开(公告)号：US20120021176A1

公开(公告)日：2012-01-26

申请号：US13232441

申请日：2011-09-14

申请人： Takayuki ITO ,  Takashi AONO

发明人： Takayuki ITO ,  Takashi AONO

IPC分类号： B32B5/02 ,  B29C55/18

CPC分类号： B27M1/02 ,  Y10T428/24355

摘要： Plastic-worked lumber. PW1 and PW2 has air-dried specific gravity twice or more than those of lumber before processing NW1 and NW2 and acute crossing angles within a range of 45 degrees or less. The acute crossing angles are formed by all of annual ring lines RL on a butt end surface of the plastic-worked lumber PW1 or PW2 and a heart-side cross grain surface or a pith-side straight grain surface of the plastic-worked lumber PW1 or PW2. The plastic-worked lumber PW1 and PW2 is prepared by heating and compression to lumber NW1 or NW2 so that the lumber NW1 or NW2 is heated and compressed in a thickness direction thereof and plastically worked.

摘要翻译： 塑胶木材。 在处理NW1和NW2之前，PW1和PW2具有两倍或更多的空气比重，在45度或更小的范围内的锐角交叉角。 急剧交叉角由塑性加工的木材PW1或PW2的对接端面上的所有年度环形线RL和塑性加工木材PW1的心脏侧面晶粒表面或髓侧直线晶粒表面形成 或PW2。 通过对木材NW1或NW2进行加热和压缩来制备塑料加工的木材PW1和PW2，使得木材NW1或NW2在其厚度方向被加热和压缩并塑性加工。

公开(公告)号：US20110217054A1

公开(公告)日：2011-09-08

申请号：US13034286

申请日：2011-02-24

申请人： Takayuki ITO ,  Hiroshi Mizuno ,  Kuniya Matsuura ,  Masayuki Satou ,  Takashi Fujiwara

发明人： Takayuki ITO ,  Hiroshi Mizuno ,  Kuniya Matsuura ,  Masayuki Satou ,  Takashi Fujiwara

IPC分类号： G03G15/20 ,  G03G21/20

CPC分类号： G03G15/20 ,  G03G21/20 ,  G03G2215/00772

摘要： A fixing device for fixing a toner image onto a recording paper includes a heating member for heating the recording paper, a pressing member for pressing the heating member by pressure-applying contact, a casing accommodating the heating member and the pressing member, and being provided with an exit port for discharging the recording paper, and a closing unit added to the exit port for keeping a temperature of the casing. The closing unit has a rotation member, and an opposed member forming a nip region together with the rotation member.

摘要翻译： 用于将调色剂图像定影到记录纸上的定影装置包括用于加热记录纸的加热构件，用于通过压力接触按压加热构件的按压构件，容纳加热构件和按压构件的壳体，并且设置 具有用于排出记录纸的出口，以及向出口延伸的闭合单元，用于保持壳体的温度。 关闭单元具有旋转构件，以及与旋转构件一起形成夹持区域的相对构件。

公开(公告)号：US20080255337A1

公开(公告)日：2008-10-16

申请号：US12100352

申请日：2008-04-09

申请人： Takayuki ITO

发明人： Takayuki ITO

IPC分类号： C08G65/04

CPC分类号： C08G65/007

摘要： A crosslinkable fluorine-containing compound, which is an adduct compound having a crosslinkable group, wherein the adduct compound is an adduct of a fluorine-containing compound having, per molecule, 2 or more terminal fluorine-containing vinyl groups each directly bonded to an oxygen atom, and a compound having 2 or more groups represented by —XH, where X represents an oxygen atom or a sulfur atom.

摘要翻译： 作为具有交联性基团的加成化合物的交联性含氟化合物，其中，所述加合物是每分子具有2个以上各自直接与氧结合的末端含氟乙烯基的含氟化合物的加合物 原子和具有由-XH表示的2个以上基团的化合物，其中X表示氧原子或硫原子。

公开(公告)号：US20070047096A1

公开(公告)日：2007-03-01

申请号：US11467668

申请日：2006-08-28

申请人： Takayuki ITO ,  Jun HIRAKAWA

发明人： Takayuki ITO ,  Jun HIRAKAWA

IPC分类号： G02B15/14

CPC分类号： G02B13/06 ,  G02B15/177

摘要： A fisheye lens system includes a negative first lens group and a positive second lens group, which are defined with respect to a maximum air-distance between lens elements constituting the fisheye lens system. The negative first lens group includes a first negative meniscus lens element having the convex surface facing toward the object, a second negative meniscus lens element having the convex surface facing toward the object, and a negative third lens element. The fisheye lens system satisfies the following conditions: 0.25

摘要翻译： 鱼眼镜头系统包括相对于构成鱼眼镜头系统的镜头元件之间的最大空气距离限定的负第一透镜组和正第二透镜组。 负第一透镜组包括具有朝向物体的凸表面的第一负弯月形透镜元件，具有朝向物体的凸表面的第二负弯月透镜元件和负第三透镜元件。 鱼眼镜头系统满足以下条件：0.25

公开(公告)号：US20100248143A1

公开(公告)日：2010-09-30

申请号：US12748728

申请日：2010-03-29

申请人： Takayuki ITO ,  Hidenori TAKAHASHI ,  Tomotaka TSUCHIMURA ,  Shohei KATAOKA ,  Takeshi INASAKI

发明人： Takayuki ITO ,  Hidenori TAKAHASHI ,  Tomotaka TSUCHIMURA ,  Shohei KATAOKA ,  Takeshi INASAKI

IPC分类号： G03F7/004 ,  G03F7/20

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0045 ,  G03F7/0048 ,  G03F7/0392 ,  G03F7/0397

摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition, a resist film formed with the composition, and a pattern-forming method using the same. The actinic ray-sensitive or radiation-sensitive resin composition includes (P) a resin that contains the following repeating units (A), (B) and (C); and a solvent having a boiling temperature of 150° C. or less, (A) a repeating unit containing a group capable of decomposing and forming an acid upon irradiation with an actinic ray or radiation, (B) a repeating unit containing a group capable of decomposing and forming a carboxylic acid by the action of an acid, and (C) a repeating unit containing a carbon-carbon unsaturated bond.

摘要翻译： 提供了一种光化射线敏感或辐射敏感性树脂组合物，由该组合物形成的抗蚀剂膜和使用其的图案形成方法。 光化射线敏感性或辐射敏感性树脂组合物包含（P）含有以下重复单元（A），（B）和（C）的树脂; 和沸点为150℃以下的溶剂，（A）含有能够在光化射线或辐射照射时能够分解形成酸的基团的重复单元，（B）含有能够具有基团的重复单元 通过酸的作用分解和形成羧酸，和（C）含有碳 - 碳不饱和键的重复单元。

公开(公告)号：US20090018881A1

公开(公告)日：2009-01-15

申请号：US12168401

申请日：2008-07-07

申请人： Takayuki ITO ,  Masanori Hirano ,  Yoshiaki Hoshino ,  Yasunobu Takagi

发明人： Takayuki ITO ,  Masanori Hirano ,  Yoshiaki Hoshino ,  Yasunobu Takagi

IPC分类号： G06Q10/00 ,  G06Q50/00 ,  G06F19/00

CPC分类号： G06Q10/04 ,  G06Q10/06375

摘要： A disclosed image processing apparatus includes an adjusting unit configured to convert input image data into image formation data, an arithmetic unit configured to calculate an image formation ink cost based on the converted image formation data, and a determining unit configured to compare the calculated image formation ink cost with a black-and-white image formation ink cost, wherein the calculated image formation ink cost is fixed based on a determination result of the first determining unit.

摘要翻译： 所公开的图像处理装置包括：调整单元，被配置为将输入图像数据转换为图像形成数据;运算单元，被配置为基于转换的图像形成数据计算图像形成墨水成本;以及确定单元，被配置为将计算出的图像形成 基于第一确定单元的确定结果，计算出的图像形成墨水成本是固定的，具有黑白图像形成墨水成本的墨水成本。

公开(公告)号：US20080214020A1

公开(公告)日：2008-09-04

申请号：US12025916

申请日：2008-02-05

申请人： Takayuki ITO ,  Kyoichi Suguro

发明人： Takayuki ITO ,  Kyoichi Suguro

IPC分类号： H01L21/324

CPC分类号： H01L21/324 ,  H01L21/225 ,  H01L21/268 ,  H01L21/67115

摘要： An auxiliary heating process is performed to set the temperature of the outer peripheral portion of a semiconductor substrate higher than that of the central portion thereof by use of an auxiliary heating source which supplementally heats a region of an area smaller than the area of the main surface of the semiconductor substrate from the rear surface of the main surface thereof, pulse-like flash lamp light or laser light is applied in the auxiliary heated state and the heat treatment is performed by use of the applied energy. The flash lamp light is applied to the main surface of the semiconductor substrate in a pulse form of 0.1 ms to 100 ms.

摘要翻译： 执行辅助加热处理，以通过使用辅助加热源来将半导体基板的外周部分的温度设置为高于其中心部分的温度，辅助加热源补充地加热比主表面的面积小的区域的区域 半导体衬底从其主表面的后表面，在辅助加热状态下施加脉冲状闪光灯或激光，并且通过施加的能量进行热处理。 闪光灯以0.1ms至100ms的脉冲形式施加到半导体衬底的主表面。