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1.发明申请Electrode for use in electrochemical device, solid electrolyte/electrode assembly, and production method thereof 失效用于电化学装置的电极，固体电解质/电极组件及其制造方法公开(公告)号：US20070059584A1
公开(公告)日：2007-03-15
申请号：US11518204
申请日：2006-09-11
CPC分类号： C25D1/00 , C25D1/006 , C25D9/04 , C25D11/02 , C25D11/045 , G01N27/4045 , H01M4/0404 , H01M4/134 , H01M4/32 , H01M4/38 , H01M4/387 , H01M4/8807 , H01M4/8817 , H01M4/8853 , H01M4/92 , H01M10/0525 , Y02E60/122
摘要： In an electrode in electrochemical device, particularly an anode lithium ion secondary battery, a cathode for use in alkali storage battery, an electrode for use in fuel cell, or a capacitor electrode, a metal structure has nano size micro-pillars is constructed with an electrode active material being formed on the surface of the metal structure. The metal structure having nano size micro-pillars can be formed, for example, by forming a metal layer as an electrode material by plating to the surface of a substrate having pores and then removing the substrate by dissolution, the metal filled in the pores of the substrate to form a group of micro-pillars. And the active material can be formed by depositing metal by plating. Since the active material is in direct contact with the conductive skeleton, the conducting agent for connecting the active materials to each other may not be added at all.
摘要翻译： 在电化学装置中的电极中，特别是阳极锂离子二次电池，碱性蓄电池用阴极，燃料电池用电极或电容电极中，金属结构具有纳米尺寸的微柱， 电极活性材料形成在金属结构的表面上。 具有纳米尺寸微柱的金属结构可以通过例如通过将具有孔的基板的表面电镀形成作为电极材料的金属层，然后通过溶解除去基板而形成， 底物形成一组微柱。 并且活性物质可以通过电镀沉积金属而形成。 由于活性物质与导电骨架直接接触，所以可能根本不添加用于将活性物质彼此连接的导电剂。
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2.发明授权Electrode for use in electrochemical device, solid electrolyte/electrode assembly, and production method thereof 失效用于电化学装置的电极，固体电解质/电极组件及其制造方法公开(公告)号：US07875387B2
公开(公告)日：2011-01-25
申请号：US11518204
申请日：2006-09-11
CPC分类号： C25D1/00 , C25D1/006 , C25D9/04 , C25D11/02 , C25D11/045 , G01N27/4045 , H01M4/0404 , H01M4/134 , H01M4/32 , H01M4/38 , H01M4/387 , H01M4/8807 , H01M4/8817 , H01M4/8853 , H01M4/92 , H01M10/0525 , Y02E60/122
摘要： In an electrode in electrochemical device, particularly an anode lithium ion secondary battery, a cathode for use in alkali storage battery, an electrode for use in fuel cell, or a capacitor electrode, a metal structure has nano size micro-pillars is constructed with an electrode active material being formed on the surface of the metal structure. The metal structure having nano size micro-pillars can be formed, for example, by forming a metal layer as an electrode material by plating to the surface of a substrate having pores and then removing the substrate by dissolution, the metal filled in the pores of the substrate to form a group of micro-pillars. And the active material can be formed by depositing metal by plating. Since the active material is in direct contact with the conductive skeleton, the conducting agent for connecting the active materials to each other may not be added at all.
摘要翻译： 在电化学装置中的电极中，特别是阳极锂离子二次电池，碱性蓄电池用阴极，燃料电池用电极或电容电极中，金属结构具有纳米尺寸的微柱， 电极活性材料形成在金属结构的表面上。 具有纳米尺寸微柱的金属结构可以通过例如通过将具有孔的基板的表面电镀形成作为电极材料的金属层，然后通过溶解除去基板而形成， 底物形成一组微柱。 并且活性物质可以通过电镀沉积金属而形成。 由于活性物质与导电骨架直接接触，所以可能根本不添加用于将活性物质彼此连接的导电剂。
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公开(公告)号：US20080105651A1
公开(公告)日：2008-05-08
申请号：US11572321
申请日：2005-08-09
CPC分类号： H01L21/3212 , C09G1/02
摘要： A polishing liquid for CMP has a composition loaded with, for example, an inorganic salt, a protective film forming agent and a surfactant capable of imparting a dissolution accelerating activity to enlarge a difference between polishing speed under non-load and polishing speed under load. By virtue of this polishing liquid for CMP, there can be simultaneously accomplished a speed increase for increasing CMP productivity, and wiring planarization for miniaturization and multilayer formation of wiring.
摘要翻译： 用于CMP的抛光液具有负载有例如无机盐，保护膜形成剂和能够赋予溶解促进活性的表面活性剂的组合物，以增加负载下的抛光速度和负载下的抛光速度之间的差异。 由于该CMP用抛光液，可以同时实现提高CMP生产率的速度增加，以及用于小型化和布线的多层形成的布线平面化。
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公开(公告)号：US20070147551A1
公开(公告)日：2007-06-28
申请号：US11643691
申请日：2006-12-22
IPC分类号： H03D1/00
CPC分类号： C09G1/04
摘要： A CMP slurry is mixed with an oxidant in polishing and contains a copper rust inhibitor, a water-soluble polymer, a pH controller capable of forming a complex with copper, and water, and is substantially free from abrasive. The CMP slurry effectively reduces dishing in chemical polishing of copper and forms reliable wiring. Preferably, the contents of the rust inhibitor, the water-soluble polymer, and the oxidant are 0.1 to 5 wt %, 0.05 to 5 wt %, and 0.01 to 5M relative to 1 liter of the CMP slurry, respectively, and the amount of the pH controller is a necessary amount for adjusting pH of the CMP slurry to 1.5 to 2.5.
摘要翻译： 将CMP浆料与抛光中的氧化剂混合，并含有铜锈病抑制剂，水溶性聚合物，能够与铜形成络合物的pH控制剂和水，并且基本上不含研磨剂。 CMP浆料有效减少了铜化学抛光中的凹陷，形成了可靠的布线。 防锈剂，水溶性聚合物和氧化剂的含量优选分别相对于1升CMP浆料为0.1〜5重量％，0.05〜5重量％，0.01〜5微米， pH控制器是将CMP浆料的pH调节至1.5至2.5的必需量。
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5.发明授权公开(公告)号：US08318332B2
公开(公告)日：2012-11-27
申请号：US12819661
申请日：2010-06-21
申请人： Katsumi Mabuchi , Haruo Akahoshi
发明人： Katsumi Mabuchi , Haruo Akahoshi
IPC分类号： G11B5/66
摘要： A discrete track medium and a patterned medium that are excellent in both magnetic recording properties and corrosion resistance are realized. The medium has a magnetic recording layer, which includes a magnetic region formed in a projection portion of a projection/recess pattern over a substrate and a filler region embedded in a recess portion of the projection/recess pattern, and an organic compound, which exhibits corrosion inhibition action for cobalt or cobalt alloys, between the magnetic region and the filler region.
摘要翻译： 实现了磁记录性能和耐腐蚀性优异的离散轨道介质和图案化介质。 介质具有磁记录层，其包括形成在基板上的突出/凹陷图案的突出部分中的磁性区域和嵌入在突出/凹陷图案的凹部中的填充区域以及有机化合物，其表现出 对于钴或钴合金，在磁性区域和填料区域之间的腐蚀抑制作用。
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公开(公告)号：US20110027994A1
公开(公告)日：2011-02-03
申请号：US12900926
申请日：2010-10-08
IPC分类号： H01L21/306
CPC分类号： H01L21/3212 , C09G1/02
摘要： A polishing liquid for CMP has a composition loaded with, for example, an inorganic salt, a protective film forming agent and a surfactant capable of imparting a dissolution accelerating activity to enlarge a difference between polishing speed under non-load and polishing speed under load. By virtue of this polishing liquid for CMP, there can be simultaneously accomplished a speed increase for increasing CMP productivity, and wiring planarization for miniaturization and multilayer formation of wiring.
摘要翻译： 用于CMP的抛光液具有负载有例如无机盐，保护膜形成剂和能够赋予溶解促进活性的表面活性剂的组合物，以增加负载下的抛光速度和负载下的抛光速度之间的差异。 由于该CMP用抛光液，可以同时实现提高CMP生产率的速度增加，以及用于小型化和布线的多层形成的布线平面化。
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公开(公告)号：US20120205010A1
公开(公告)日：2012-08-16
申请号：US13369323
申请日：2012-02-09
申请人： Katsumi Mabuchi , Haruo Akahoshi
发明人： Katsumi Mabuchi , Haruo Akahoshi
IPC分类号： C23C22/73
CPC分类号： C23C22/50 , C08G77/18 , C09D4/00 , C09D5/08 , C09D183/04 , C23C18/122 , C23C18/1241 , C23C18/1245 , C23C18/1254 , C23C22/52 , C23C22/58 , C23C2222/20
摘要： The present invention provides a method of preventing a metal from corroding by giving a high corrosion resistance in the state of retaining the functions of the metal surface, a surface of a thin film material particularly. A stable silane coupling layer which has a robust bond is formed on a metal surface by using a silane coupling agent and an oxidizer in combination.
摘要翻译： 本发明提供一种通过在保持金属表面的功能，特别是薄膜材料的表面的状态下赋予高耐腐蚀性的方式来防止金属腐蚀的方法。 通过组合使用硅烷偶联剂和氧化剂，在金属表面上形成具有坚固结合的稳定的硅烷偶联层。
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公开(公告)号：US08367573B2
公开(公告)日：2013-02-05
申请号：US12366829
申请日：2009-02-06
申请人： Takashi Naito , Shinichi Tachizono , Kei Yoshimura , Hiroki Yamamoto , Hiroshi Yoshida , Shinji Yamada , Katsumi Mabuchi
发明人： Takashi Naito , Shinichi Tachizono , Kei Yoshimura , Hiroki Yamamoto , Hiroshi Yoshida , Shinji Yamada , Katsumi Mabuchi
CPC分类号： H01J9/261 , C03C3/062 , C03C3/21 , C03C8/24 , H01J17/183 , H01L31/022425 , Y02E10/50
摘要： A glass composition substantially free from lead and bismuth and containing vanadium oxide and phosphor oxide as main ingredients, wherein the sintered glass of the glass composition exhibits 109 Ωcm or more at 25° C.
摘要翻译： 基本上不含铅和铋并含有氧化钒和磷氧化物作为主要成分的玻璃组合物，其中玻璃组合物的烧结玻璃在25℃下显示出109＆OHgr·cm或更高。
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公开(公告)号：US08628869B2
公开(公告)日：2014-01-14
申请号：US13361896
申请日：2012-01-30
申请人： Mina Amo , Katsumi Mabuchi , Hiroshi Yoshida , Bruno Marchon , Qing Dai
发明人： Mina Amo , Katsumi Mabuchi , Hiroshi Yoshida , Bruno Marchon , Qing Dai
IPC分类号： G11B5/66
CPC分类号： C07D249/18 , C07D403/12 , C07D403/14 , G11B5/725
摘要： According to one embodiment, a lubricant includes a perfluoropolyether having a chemical structure of: wherein Rf is at least one of: —CF2O(CF2CF2O)m(CF2O)nCF2— and —CF2CF2O(CF2CF2CF2O)kCF2CF2—, with m representing 0 or a positive integer, n representing 0 or a positive integer, and k representing 0 or a positive integer, and wherein R1 to R4 are selected from a group consisting of —H or with at least one of R1 to R4 being
摘要翻译： 根据一个实施方案，润滑剂包括具有以下化学结构的全氟聚醚：其中Rf为至少一种：-CF 2 O（CF 2 CF 2 O）m（CF 2 O）n CF 2 - 和-CF 2 CF 2 O（CF 2 CF 2 CF 2 O）k CF 2 CF 2 - ，其中m表示0或 正整数，n表示0或正整数，k表示0或正整数，并且其中R 1至R 4选自-H或与R 1至R 4中的至少一个为
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10.发明申请公开(公告)号：US20130194693A1
公开(公告)日：2013-08-01
申请号：US13361896
申请日：2012-01-30
申请人： Mina Amo , Katsumi Mabuchi , Hiroshi Yoshida , Bruno Marchon , Qing Dai
发明人： Mina Amo , Katsumi Mabuchi , Hiroshi Yoshida , Bruno Marchon , Qing Dai
IPC分类号： G11B21/02 , C07D403/14 , C07D249/18 , C07D403/12 , G11B5/65 , G11B5/725
CPC分类号： C07D249/18 , C07D403/12 , C07D403/14 , G11B5/725
摘要： According to one embodiment, a lubricant includes a perfluoropolyether having a chemical structure of wherein Rf is at least one of —CF2O(CF2CF2O)m(CF2O)nCF2— and —CF2CF2O(CF2CF2CF2O)kCF2CF2—, with m representing 0 or a positive integer, n representing 0 or a positive integer, and k representing 0 or a positive integer, and wherein R1 to R4 are selected from a group consisting of —H or with at least one of R1 to R4 being
摘要翻译： 根据一个实施方案，润滑剂包括具有以下化学结构的全氟聚醚，其中Rf为-CF 2 O（CF 2 CF 2 O）m（CF 2 O）n CF 2 - 和-CF 2 CF 2 O（CF 2 CF 2 CF 2 O）k CF 2 CF 2 - 中的至少一种，m表示0或正整数 ，n表示0或正整数，k表示0或正整数，并且其中R 1至R 4选自-H或与R 1至R 4中的至少一个为
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