Magnetic recording medium, method for fabricating the same, and magnetic storage device
    2.
    发明授权
    Magnetic recording medium, method for fabricating the same, and magnetic storage device 失效
    磁记录介质,其制造方法和磁存储装置

    公开(公告)号:US08318332B2

    公开(公告)日:2012-11-27

    申请号:US12819661

    申请日:2010-06-21

    IPC分类号: G11B5/66

    CPC分类号: G11B5/855 G11B5/722

    摘要: A discrete track medium and a patterned medium that are excellent in both magnetic recording properties and corrosion resistance are realized. The medium has a magnetic recording layer, which includes a magnetic region formed in a projection portion of a projection/recess pattern over a substrate and a filler region embedded in a recess portion of the projection/recess pattern, and an organic compound, which exhibits corrosion inhibition action for cobalt or cobalt alloys, between the magnetic region and the filler region.

    摘要翻译: 实现了磁记录性能和耐腐蚀性优异的离散轨道介质和图案化介质。 介质具有磁记录层,其包括形成在基板上的突出/凹陷图案的突出部分中的磁性区域和嵌入在突出/凹陷图案的凹部中的填充区域以及有机化合物,其表现出 对于钴或钴合金,在磁性区域和填料区域之间的腐蚀抑制作用。

    POLISHING SLURRY FOR CMP
    3.
    发明申请
    POLISHING SLURRY FOR CMP 审中-公开
    CMP抛光浆

    公开(公告)号:US20110027994A1

    公开(公告)日:2011-02-03

    申请号:US12900926

    申请日:2010-10-08

    IPC分类号: H01L21/306

    CPC分类号: H01L21/3212 C09G1/02

    摘要: A polishing liquid for CMP has a composition loaded with, for example, an inorganic salt, a protective film forming agent and a surfactant capable of imparting a dissolution accelerating activity to enlarge a difference between polishing speed under non-load and polishing speed under load. By virtue of this polishing liquid for CMP, there can be simultaneously accomplished a speed increase for increasing CMP productivity, and wiring planarization for miniaturization and multilayer formation of wiring.

    摘要翻译: 用于CMP的抛光液具有负载有例如无机盐,保护膜形成剂和能够赋予溶解促进活性的表面活性剂的组合物,以增加负载下的抛光速度和负载下的抛光速度之间的差异。 由于该CMP用抛光液,可以同时实现提高CMP生产率的速度增加,以及用于小型化和布线的多层形成的布线平面化。

    Polishing Slurry for Cmp
    4.
    发明申请
    Polishing Slurry for Cmp 审中-公开
    抛光浆料为Cmp

    公开(公告)号:US20080105651A1

    公开(公告)日:2008-05-08

    申请号:US11572321

    申请日:2005-08-09

    IPC分类号: C09K13/00 C03C15/00

    CPC分类号: H01L21/3212 C09G1/02

    摘要: A polishing liquid for CMP has a composition loaded with, for example, an inorganic salt, a protective film forming agent and a surfactant capable of imparting a dissolution accelerating activity to enlarge a difference between polishing speed under non-load and polishing speed under load. By virtue of this polishing liquid for CMP, there can be simultaneously accomplished a speed increase for increasing CMP productivity, and wiring planarization for miniaturization and multilayer formation of wiring.

    摘要翻译: 用于CMP的抛光液具有负载有例如无机盐,保护膜形成剂和能够赋予溶解促进活性的表面活性剂的组合物,以增加负载下的抛光速度和负载下的抛光速度之间的差异。 由于该CMP用抛光液,可以同时实现提高CMP生产率的速度增加,以及用于小型化和布线的多层形成的布线平面化。

    Abrasive-free polishing slurry and CMP process
    5.
    发明申请
    Abrasive-free polishing slurry and CMP process 审中-公开
    无磨料抛光浆和CMP工艺

    公开(公告)号:US20070147551A1

    公开(公告)日:2007-06-28

    申请号:US11643691

    申请日:2006-12-22

    IPC分类号: H03D1/00

    CPC分类号: C09G1/04

    摘要: A CMP slurry is mixed with an oxidant in polishing and contains a copper rust inhibitor, a water-soluble polymer, a pH controller capable of forming a complex with copper, and water, and is substantially free from abrasive. The CMP slurry effectively reduces dishing in chemical polishing of copper and forms reliable wiring. Preferably, the contents of the rust inhibitor, the water-soluble polymer, and the oxidant are 0.1 to 5 wt %, 0.05 to 5 wt %, and 0.01 to 5M relative to 1 liter of the CMP slurry, respectively, and the amount of the pH controller is a necessary amount for adjusting pH of the CMP slurry to 1.5 to 2.5.

    摘要翻译: 将CMP浆料与抛光中的氧化剂混合,并含有铜锈病抑制剂,水溶性聚合物,能够与铜形成络合物的pH控制剂和水,并且基本上不含研磨剂。 CMP浆料有效减少了铜化学抛光中的凹陷,形成了可靠的布线。 防锈剂,水溶性聚合物和氧化剂的含量优选分别相对于1升CMP浆料为0.1〜5重量%,0.05〜5重量%,0.01〜5微米, pH控制器是将CMP浆料的pH调节至1.5至2.5的必需量。

    MAGNETIC RECORDING MEDIUM, METHOD FOR FABRICATING THE SAME, AND MAGNETIC STORAGE DEVICE
    8.
    发明申请
    MAGNETIC RECORDING MEDIUM, METHOD FOR FABRICATING THE SAME, AND MAGNETIC STORAGE DEVICE 失效
    磁记录介质,其制造方法和磁存储装置

    公开(公告)号:US20100323223A1

    公开(公告)日:2010-12-23

    申请号:US12819661

    申请日:2010-06-21

    IPC分类号: G11B5/62 G11B5/84

    CPC分类号: G11B5/855 G11B5/722

    摘要: A discrete track medium and a patterned medium that are excellent in both magnetic recording properties and corrosion resistance are realized. The medium has a magnetic recording layer, which includes a magnetic region formed in a projection portion of a projection/recess pattern over a substrate and a filler region embedded in a recess portion of the projection/recess pattern, and an organic compound, which exhibits corrosion inhibition action for cobalt or cobalt alloys, between the magnetic region and the filler region.

    摘要翻译: 实现了磁记录性能和耐腐蚀性优异的离散轨道介质和图案化介质。 介质具有磁记录层,其包括形成在基板上的突出/凹陷图案的突出部分中的磁性区域和嵌入在突出/凹陷图案的凹部中的填充区域以及有机化合物,其表现出 对于钴或钴合金,在磁性区域和填料区域之间的腐蚀抑制作用。

    High corrosion resistant equipment for a plant
    9.
    发明授权
    High corrosion resistant equipment for a plant 有权
    高耐蚀设备的植物

    公开(公告)号:US08479970B2

    公开(公告)日:2013-07-09

    申请号:US13523404

    申请日:2012-06-14

    IPC分类号: B23K20/12

    摘要: Provided is high corrosion resistant equipment for a plant having the lining structure which exhibits high reliability against breaking of a joining portion over a long use period. The high corrosion resistant equipment for a plant includes a lining plate and a support portion which are made of a high corrosion resistance material and a structural material portion made of a steel material or the like. The lining plate and the support portion include a joining portion to which friction stirring is applied. The support portion is assembled into or fastened to the structural material portion by means of the geometrical structure with a gap interposed between the support portion and the structural material portion. Due to such a constitution, high corrosion resistant equipment for a plant having the lining which exhibits high reliability can be acquired.

    摘要翻译: 本发明提供一种具有衬里结构的植物的高耐腐蚀性设备,其在长期使用期间表现出高的抗连接部分断裂的可靠性。 用于植物的高耐腐蚀设备包括由高耐腐蚀材料制成的衬板和支撑部分以及由钢材等制成的结构材料部分。 衬板和支撑部分包括施加摩擦搅拌的接合部分。 支撑部分通过几何结构组装到结构材料部分中或者紧固到结构材料部分,间隙插入在支撑部分和结构材料部分之间。 由于这样的结构,可以获得具有高可靠性的具有衬里的植物的高耐腐蚀性设备。