公开(公告)号：US20080315089A1

公开(公告)日：2008-12-25

申请号：US12151500

申请日：2008-05-07

申请人： Hiroshi Yasuda ,  Takeshi Haraguchi ,  Yoshihisa Ooae ,  Takamasa Satoh ,  Yoshinori Terui ,  Seiichi Sakawa ,  Ryozo Nonogaki

发明人： Hiroshi Yasuda ,  Takeshi Haraguchi ,  Yoshihisa Ooae ,  Takamasa Satoh ,  Yoshinori Terui ,  Seiichi Sakawa ,  Ryozo Nonogaki

IPC分类号： H01J3/02

CPC分类号： H01J37/073 ,  H01J2237/06316 ,  H01J2237/06341 ,  H01J2237/3175

摘要： An electron gun includes an electron source configured to emit electrons. The electron source includes an electron emission region configured to emit the electrons and an electron emission restrictive region configured to restrict emission of the electrons. The electron emission restrictive region is located on a side surface of the electron source except an electron emission surface on a tip of the electron source and is covered with a different material from the electron source. The electron gun emits thermal field-emitted electrons by applying an electric field to the tip while maintaining a sufficiently low temperature to avoid sublimation of a material of the electron source. The material of the electron source may be lanthanum hexaboride (LaB6) or cerium hexaboride (CeB6). The electron emission restrictive region may be covered with carbon.

摘要翻译： 电子枪包括被配置为发射电子的电子源。 电子源包括配置为发射电子的电子发射区域和被配置为限制电子发射的电子发射限制区域。 电子发射限制区域位于电子源的除了电子源的尖端上的电子发射表面以外的电子源的侧表面上，并被与电子源不同的材料覆盖。 电子枪通过向尖端施加电场而发射热场发射的电子，同时保持足够低的温度以避免电子源的材料的升华。 电子源的材料可以是六硼化镧（LaB 6）或六硼化铈（CeB 6）。 电子发射限制区域可以被碳覆盖。

公开(公告)号：US07919750B2

公开(公告)日：2011-04-05

申请号：US12151500

申请日：2008-05-07

申请人： Hiroshi Yasuda ,  Takeshi Haraguchi ,  Yoshihisa Ooae ,  Takamasa Satoh ,  Yoshinori Terui ,  Seiichi Sakawa ,  Ryozo Nonogaki

发明人： Hiroshi Yasuda ,  Takeshi Haraguchi ,  Yoshihisa Ooae ,  Takamasa Satoh ,  Yoshinori Terui ,  Seiichi Sakawa ,  Ryozo Nonogaki

IPC分类号： H01J29/48 ,  H01J37/073

CPC分类号： H01J37/073 ,  H01J2237/06316 ,  H01J2237/06341 ,  H01J2237/3175

摘要： An electron gun includes an electron source configured to emit electrons. The electron source includes an electron emission region configured to emit the electrons and an electron emission restrictive region configured to restrict emission of the electrons. The electron emission restrictive region is located on a side surface of the electron source except an electron emission surface on a tip of the electron source and is covered with a different material from the electron source. The electron gun emits thermal field-emitted electrons by applying an electric field to the tip while maintaining a sufficiently low temperature to avoid sublimation of a material of the electron source. The material of the electron source may be lanthanum hexaboride (LaB6) or cerium hexaboride (CeB6). The electron emission restrictive region may be covered with carbon.

摘要翻译： 电子枪包括被配置为发射电子的电子源。 电子源包括配置为发射电子的电子发射区域和被配置为限制电子发射的电子发射限制区域。 电子发射限制区域位于电子源的除了电子源的尖端上的电子发射表面以外的电子源的侧表面上，并被与电子源不同的材料覆盖。 电子枪通过向尖端施加电场而发射热场发射的电子，同时保持足够低的温度以避免电子源的材料的升华。 电子源的材料可以是六硼化镧（LaB 6）或六硼化铈（CeB 6）。 电子发射限制区域可以被碳覆盖。

公开(公告)号：US06252344B1

公开(公告)日：2001-06-26

申请号：US09335398

申请日：1999-06-17

申请人： Yoshihisa Ooae ,  Takamasa Satoh ,  Akio Yamada ,  Hiroshi Yasuda

发明人： Yoshihisa Ooae ,  Takamasa Satoh ,  Akio Yamada ,  Hiroshi Yasuda

IPC分类号： H01J2976

CPC分类号： H01J37/241 ,  H01J2237/3175

摘要： An electron gun, preferably a four-pole electron gun, used in an electron beam exposure apparatus is formed by: a cathode for emitting an electron beam when supplying a negative and high-accelerated voltage; a first grid provided downstream of the cathode for focusing a crossover image of the electron beam when supplying a voltage which becomes a reverse bias for the cathode, and the cathode and the first grid being arranged at a high voltage side of a high voltage insulator; an anode for collecting the electron beam which passes through the first grid, and being arranged at a low voltage side of the high voltage insulator; and a second grid provided at the high voltage side of the high voltage insulator and between the first grid and the anode, and having an aperture for limiting an amount of the electron beam passing therethrough. A voltage which becomes a forward bias for the cathode is supplied to the second grid, and the crossover image is focused at the aperture of the second grid.

摘要翻译： 电子束曝光装置中使用的优选四极电子枪的电子枪是通过以下方式形成的：用于在提供负高和高加速电压时发射电子束的阴极; 设置在阴极的下游的第一栅极，用于在提供成为阴极的反向偏压的电压时使聚焦电子束的交叉图像，并且阴极和第一栅极布置在高压绝缘体的高压侧; 用于收集通过第一栅格的电子束并且布置在高压绝缘体的低电压侧的阳极; 以及设置在高压绝缘子的高压侧和第一栅极与阳极之间的第二栅极，并且具有用于限制通过其中的电子束的量的孔。 成为阴极的正向偏压的电压被提供给第二栅极，并且交叉图像聚焦在第二栅极的孔径处。

公开(公告)号：US08390201B2

公开(公告)日：2013-03-05

申请号：US12928899

申请日：2010-12-22

申请人： Hiroshi Yasuda ,  Yoshihisa Ooae ,  Takeshi Haraguchi

发明人： Hiroshi Yasuda ,  Yoshihisa Ooae ,  Takeshi Haraguchi

IPC分类号： H01J25/50

CPC分类号： H01J37/143 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/06 ,  H01J37/3174 ,  H01J2237/0635 ,  H01J2237/14

摘要： A multi-column electron beam exposure apparatus includes: multiple column cells; an electron beam converging unit in which two annular permanent magnets and electromagnetic coils are surrounded by a ferromagnetic frame, the two annular permanent magnets being magnetized in an optical axis direction and symmetrical about the optical axis, where the electromagnetic coils adjust magnetic fields of the annular permanent magnets; and a substrate provided with circular apertures through which electron beams used in the column cells pass, respectively, where the electron beam converging unit is disposed in each of the circular apertures. The two annular permanent magnets may be disposed one above the other in the optical axis direction, and the electromagnetic coils may be provided inside or outside the annular permanent magnets in their radial direction.

摘要翻译： 多列电子束曝光装置包括：多列细胞; 电子束会聚单元，其中两个环形永磁体和电磁线圈被铁磁框架包围，两个环形永磁体沿光轴方向被磁化并且围绕光轴对称，其中电磁线圈调节环形磁场 永久磁铁 以及设置有圆孔的基板，分别在列单元中使用的电子束通过其中电子束会聚单元设置在每个圆形孔中。 两个环形永久磁铁可以在光轴方向上彼此上下配置，并且电磁线圈可以设置在环形永磁体的径向内侧或外侧。

公开(公告)号：US20110148297A1

公开(公告)日：2011-06-23

申请号：US12928899

申请日：2010-12-22

申请人： Hiroshi Yasuda ,  Yoshihisa Ooae ,  Takeshi Haraguchi

发明人： Hiroshi Yasuda ,  Yoshihisa Ooae ,  Takeshi Haraguchi

IPC分类号： H01J23/08 ,  H01F7/00

CPC分类号： H01J37/143 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/06 ,  H01J37/3174 ,  H01J2237/0635 ,  H01J2237/14

摘要： A multi-column electron beam exposure apparatus includes: multiple column cells; an electron beam converging unit in which two annular permanent magnets and electromagnetic coils are surrounded by a ferromagnetic frame, each of the two annular permanent magnets being magnetized in an optical axis direction and being symmetrical about the optical axis, the electromagnetic coils disposed near the annular permanent magnets and used to adjust magnetic fields of the annular permanent magnets; and a substrate provided with circular apertures through which electron beams used in the column cells pass, respectively, the substrate having the electron beam converging unit disposed in a side portion of each of the circular apertures. The two annular permanent magnets may be disposed one above the other in the optical axis direction with same polarities facing each other, and the electromagnetic coils may be provided inside or outside the annular permanent magnets in their radial direction.

摘要翻译： 多列电子束曝光装置包括：多列细胞; 电子束会聚单元，其中两个环形永磁体和电磁线圈被铁磁框架包围，两个环形永磁体中的每一个在光轴方向上被磁化并且围绕光轴对称，电磁线圈设置在环形 永磁体，用于调整环形永磁体的磁场; 以及设置有圆孔的基板，通过该圆形孔分别通过电子束会聚单元的基板，每个圆形孔的侧面部分通过电子束。 两个环形永磁体可以沿着光轴方向一个一个地设置在彼此相同的极性上，并且电磁线圈可以设置在环形永磁体的径向内侧或外侧。

公开(公告)号：US5945683A

公开(公告)日：1999-08-31

申请号：US906389

申请日：1997-08-05

申请人： Tatsuro Ohkawa ,  Yoshihisa Ooae ,  Hitoshi Tanaka ,  Hiroshi Yasuda

发明人： Tatsuro Ohkawa ,  Yoshihisa Ooae ,  Hitoshi Tanaka ,  Hiroshi Yasuda

IPC分类号： H01J37/06 ,  H01J37/063 ,  H01J37/305 ,  H01L21/027

CPC分类号： H01J37/063 ,  H01J2237/30433 ,  H01J2237/3175

摘要： An electron beam exposure device includes an alignment optical system; an electromagnetic lens system; a stage on which the sample is provided; and an electron gun. The electron gun is comprised of an electron generating source; an electron generating source heating element which generates heat for increasing the temperature of the electron generating source; a supporting member which supports the electron generating source and the electron generating source heating element; and a Wehnelt. The electron beam exposure device is provided with at least one auxiliary heating element located at respective portion thermally connected to the electron generating source heating element.

摘要翻译： 电子束曝光装置包括对准光学系统; 电磁透镜系统; 提供样品的阶段; 和电子枪。 电子枪由电子发生源组成; 电子发生源加热元件，其产生用于增加电子发生源的温度的热量; 支撑电子发生源和电子发生源加热元件的支撑构件; 和一个Wehnelt。 电子束曝光装置设置有至少一个位于与电子发生源加热元件热连接的相应部分处的辅助加热元件。

公开(公告)号：US20080169433A1

公开(公告)日：2008-07-17

申请号：US12077153

申请日：2008-03-17

申请人： Hiroshi Yasuda ,  Yoshihisa Ooae

发明人： Hiroshi Yasuda ,  Yoshihisa Ooae

IPC分类号： A61N5/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31793

摘要： Provided is an electron beam exposure apparatus for forming a desired pattern on a sample mounted on a wafer stage by exposure with an electron beam generated form an electron gun. The electron beam exposure apparatus includes: supplying device of injecting a reducing gas into a column in which the electron gun and the wafer stage are housed; and control unit of performing control so that the injection of the reducing gas into the column is continued for a predetermined period of time. Organic contamination is combined with H generated from the reducing gas by irradiation of an electron beam, and then evaporates. Further included is supplying device of injecting an ozone gas into the column. The control unit may perform control so that the injection of the ozone gas into the column in addition to the injection of the reducing gas is continued for a predetermined period of time.

摘要翻译： 提供一种电子束曝光装置，用于通过用电子枪产生的电子束曝光在安装在晶片台上的样品上形成所需图案。 电子束曝光装置包括：将还原气体注入到容纳电子枪和晶片台的列中的供给装置; 以及执行控制的控制单元，使得将还原气体注入到所述列中持续预定时间段。 有机污染与通过照射电子束从还原气体生成的H结合，然后蒸发。 还包括将臭氧气体注入塔的供给装置。 控制单元可以执行控制，使得除了注入还原气体之外，将臭氧气体注入到塔中持续预定的时间段。

公开(公告)号：US06268606B1

公开(公告)日：2001-07-31

申请号：US09337795

申请日：1999-06-22

申请人： Tomohiko Abe ,  Yoshihisa Ooae ,  Hiroshi Yasuda

发明人： Tomohiko Abe ,  Yoshihisa Ooae ,  Hiroshi Yasuda

IPC分类号： H01J3700

CPC分类号： H01J37/1472 ,  H01J2237/1516 ,  H01J2237/3175

摘要： An electrostatic deflector of an electron beam exposure apparatus is disclosed. A cylindrical holding member is made of an insulating material. An electrode including a plurality of electrode members fixedly arranged in spaced relationship to each other and having at least a portion of the surface thereof grown with a metal film is disposed inside the holding member. The electrode members each formed with a metal film on the surface thereof are made of a conductive ceramic having a resistivity selected at least in the range of 0.001 &OHgr;•cm to 1000 &OHgr;•cm.

摘要翻译： 公开了电子束曝光设备的静电偏转器。 圆柱形保持构件由绝缘材料制成。 一种电极，其包括以彼此间隔开的关系固定地布置并且其表面的至少一部分由金属膜生长的多个电极部件设置在保持部件的内部。 每个在其表面上由金属膜形成的电极构件由电阻率选择为至少在0.001欧姆·厘米到1000欧姆·厘米的范围内的导电陶瓷制成。

公开(公告)号：US5981118A

公开(公告)日：1999-11-09

申请号：US42747

申请日：1998-03-17

申请人： Nobuyuki Yasutake ,  Yoshihisa Ooae ,  Kazushi Ishida ,  Hiroshi Yasuda ,  Akiyoshi Tsuda ,  Hitoshi Tanaka

发明人： Nobuyuki Yasutake ,  Yoshihisa Ooae ,  Kazushi Ishida ,  Hiroshi Yasuda ,  Akiyoshi Tsuda ,  Hitoshi Tanaka

IPC分类号： G03F7/20 ,  H01J37/317 ,  G03F9/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/2037 ,  G03F7/2065 ,  H01J37/3174 ,  H01J2237/31774

摘要： With using one scanning stage 19 where a plurality of wafers 16A to 16E is mounted through wafer holders 20A to 20E and balancing stage 21 disposed below scanning stage 19, scanning stage 19 is scanned based on exposure data common to a plurality of charged particle beam exposure apparatus 10A to 10E, and balancing stage 21 is scanned so that barycenter G of scanning stage 19 and balancing stage 21 becomes a fixed point. The positions of reflecting mirrors 70L and 70R secured to stage 19 are measured and based on their values, the expansion/contraction ratio of stage 19 and the positions of samples 16A to 16E are calculated to obtain deviation of the positions from target positions. Stage 19 is modeled such that rigid areas 19A to 19E are loosely connected, and for each area, the positions of three points are measured to calculate deviation of the exposure target position due to rotation of each ridged area. These deviations are corrected by deflectors 18A to 18D.

摘要翻译： 通过使用一个扫描台19，其中通过设置在扫描台19下方的晶片保持器20A至20E和平衡台21安装多个晶片16A至16E，基于多个带电粒子束曝光共同的曝光数据扫描扫描台19 扫描装置10A至10E以及平衡级21，使得扫描级19和平衡级21的重心G成为固定点。 测量固定在工作台19上的反射镜70L和70R的位置，并且基于它们的值，计算级19的伸缩比和样品16A至16E的位置以获得位置与目标位置的偏差。 阶段19被建模为刚性区域19A至19E松散地连接，并且对于每个区域，测量三个点的位置以计算由于每个脊状区域的旋转引起的曝光目标位置的偏差。 这些偏差由偏转器18A至18D校正。

公开(公告)号：US07737421B2

公开(公告)日：2010-06-15

申请号：US12077153

申请日：2008-03-17

申请人： Hiroshi Yasuda ,  Yoshihisa Ooae

发明人： Hiroshi Yasuda ,  Yoshihisa Ooae

IPC分类号： G03B27/42 ,  G03B27/54

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31793

摘要： Provided is an electron beam exposure apparatus for forming a desired pattern on a sample mounted on a wafer stage by exposure with an electron beam generated form an electron gun. The electron beam exposure apparatus includes: supplying device of injecting a reducing gas into a column in which the electron gun and the wafer stage are housed; and control unit of performing control so that the injection of the reducing gas into the column is continued for a predetermined period of time. Organic contamination is combined with H generated from the reducing gas by irradiation of an electron beam, and then evaporates. Further included is supplying device of injecting an ozone gas into the column. The control unit may perform control so that the injection of the ozone gas into the column in addition to the injection of the reducing gas is continued for a predetermined period of time.

摘要翻译： 提供一种电子束曝光装置，用于通过用电子枪产生的电子束曝光在安装在晶片台上的样品上形成所需图案。 电子束曝光装置包括：将还原气体注入到容纳电子枪和晶片台的列中的供给装置; 以及执行控制的控制单元，使得将还原气体注入到所述列中持续预定时间段。 有机污染与通过照射电子束从还原气体生成的H结合，然后蒸发。 还包括向柱中注入臭氧气体的供给装置。 控制单元可以执行控制，使得除了注入还原气体之外，将臭氧气体注入到塔中持续预定的时间段。