Wound dressing
    7.
    发明授权
    Wound dressing 有权
    伤口敷料

    公开(公告)号:US08951599B2

    公开(公告)日:2015-02-10

    申请号:US13677573

    申请日:2012-11-15

    CPC classification number: A61L31/04 A61L15/225

    Abstract: A wound dressing and a method of making the wound dressing is described herein. The wound dressing is formed of an absorbent substrate formed of one or more layers and a low-adherence layer disposed on the substrate. The low-adherence layer can be disposed within at least a portion of the substrate. The low-adherence layer is formed of a mixture of at least one highly fluorinated polymer and at least one acidic polymer. The at least one highly fluorinated polymer has a fluorine content greater than the fluorine content of the at least one acidic polymer.

    Abstract translation: 本文描述了伤口敷料和制造伤口敷料的方法。 伤口敷料由一层或多层形成的吸收性衬底和设置在衬底上的低粘附层形成。 低粘附层可以设置在基底的至少一部分内。 低粘附层由至少一种高度氟化的聚合物和至少一种酸性聚合物的混合物形成。 至少一种高度氟化的聚合物的氟含量大于至少一种酸性聚合物的氟含量。

    Positive tone organic solvent developed chemically amplified resist
    8.
    发明授权
    Positive tone organic solvent developed chemically amplified resist 有权
    正色有机溶剂开发了化学放大抗蚀剂

    公开(公告)号:US08900802B2

    公开(公告)日:2014-12-02

    申请号:US13775122

    申请日:2013-02-23

    Abstract: Provided is a method for developing positive-tone chemically amplified resists with an organic developer solvent having at least one polyhydric alcohol, such as ethylene glycol and/or glycerol, alone or in combination with an additional organic solvent, such as isopropyl alcohol, and/or water. The organic solvent developed positive tone resists described herein are useful for lithography pattern forming processes; for producing semiconductor devices, such as integrated circuits (IC); and for applications where basic solvents are not suitable, such as the fabrication of chips patterned with arrays of biomolecules or deprotection applications that do not require the presence of acid moieties.

    Abstract translation: 提供了一种用具有至少一种多元醇如乙二醇和/或甘油的有机显影剂溶剂单独或与另外的有机溶剂如异丙醇和/或其混合物形成的正性化学放大抗蚀剂的方法,和/ 或水。 本文所述的有机溶剂显影的正色调抗蚀剂可用于光刻图案形成工艺; 用于制造诸如集成电路(IC)的半导体器件; 并且对于不适合碱性溶剂的应用,例如用不需要存在酸部分的生物分子或去保护应用阵列图案化的芯片的制造。

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