CONTROLLING OF PHOTO-GENERATED CHARGE CARRIERS
    2.
    发明申请
    CONTROLLING OF PHOTO-GENERATED CHARGE CARRIERS 有权
    光电充电器的控制

    公开(公告)号:US20140145281A1

    公开(公告)日:2014-05-29

    申请号:US14093172

    申请日:2013-11-29

    CPC classification number: H01L31/035272 G01S7/4914 H01L27/14806

    Abstract: Embodiments related to controlling of photo-generated charge carriers are described and depicted. At least one embodiment provides a semiconductor substrate comprising a photo-conversion region to convert light into photo-generated charge carriers; a region to accumulate the photo-generated charge carriers; a control electrode structure including a plurality of control electrodes to generate a potential distribution such that the photo-generated carriers are guided towards the region to accumulate the photo-generated charge carriers based on signals applied to the control electrode structure; a non-uniform doping profile in the semiconductor substrate to generate an electric field with vertical field vector components in at least a part of the photo-conversion region

    Abstract translation: 描述和描绘与光电荷载体的控制相关的实施例。 至少一个实施例提供了包括光转换区域以将光转换成光生电荷载流子的半导体衬底; 用于积累光生电荷载流子的区域; 控制电极结构,其包括多个控制电极,以产生电位分布,使得所述光生载流子基于施加到所述控制电极结构的信号而被引导到所述区域以累积所述光生电荷载流子; 在半导体衬底中的不均匀掺杂分布,以在光转换区域的至少一部分中产生具有垂直场矢量分量的电场

    IMAGE SENSOR DEVICE
    6.
    发明申请

    公开(公告)号:US20230115183A1

    公开(公告)日:2023-04-13

    申请号:US17938840

    申请日:2022-10-07

    Abstract: An image sensor device includes a pixel. The pixel includes a semiconductor layer having a first surface. A photodiode is formed in the semiconductor layer and is configured to generate charge carriers based on light reaching the photodiode. A storage node is formed in the semiconductor layer, the storage node being arranged so that charge carriers generated in the photodiode are transferred to the storage node. A light-shielding structure is formed in the semiconductor layer and is disposed at least between the first surface of the semiconductor layer and the storage node so as to prevent at least part of the light travelling in the semiconductor layer away from the first surface from reaching the storage node.

    OPTICAL SENSOR DEVICE WITH DEEP AND SHALLOW CONTROL ELECTRODES

    公开(公告)号:US20200158841A1

    公开(公告)日:2020-05-21

    申请号:US16747084

    申请日:2020-01-20

    Abstract: An optical sensor device configured to detect a time of flight of an electromagnetic signal includes a semiconductor substrate having a main surface and a conversion region configured to convert at least a fraction of the electromagnetic signal into photo-generated charge carriers; a first control electrode formed in a trench extending from the main surface into the semiconductor substrate; a second control electrode disposed directly or indirectly on the main surface; a control circuit configured to apply a varying first potential to the first control electrode and to apply a varying second potential to the second control electrode, where the varying second potential has a fixed phase relationship to the first varying potential, to generate electric potential distributions in the conversion region to direct the photo-generated charge carriers; and a readout node arranged in the semiconductor substrate and configured to detect the directed photo-generated charge carriers.

    HETEROEPITAXIAL SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING A HETEROEPITAXIAL SEMICONDUCTOR DEVICE

    公开(公告)号:US20230123410A1

    公开(公告)日:2023-04-20

    申请号:US18046289

    申请日:2022-10-13

    Abstract: A heteroepitaxial semiconductor device includes a bulk semiconductor substrate, a seed layer including a first semiconductor material, the seed layer being arranged at a first side of the bulk semiconductor substrate and including a first side facing the bulk semiconductor substrate, an opposing second side and lateral sides connecting the first and second sides, a separation layer arranged between the bulk semiconductor substrate and the seed layer, a heteroepitaxial structure grown on the second side of the seed layer and including a second semiconductor material, different from the first semiconductor material, and a dielectric material layer arranged on the seed layer and at least partially encapsulating the heteroepitaxial structure, wherein the dielectric material layer also covers the lateral sides of the seed layer.

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